Abstract: Described are a process and a system for processing aromatics-rich fraction oil. The process includes: (1) introducing an aromatics-rich fraction oil into a fifth reaction unit for hydrosaturation, followed by fractionation, to provide a first light component and a first heavy component; (2) introducing a deoiled asphalt and an aromatics-comprising stream including the first heavy component into a hydrogen dissolving unit to be mixed with hydrogen, and introducing the mixed material into a first reaction unit for a hydrogenation reaction; (3) fractionating a liquid-phase product from the first reaction unit to provide a second light component and a second heavy component; (41) introducing the second light component into a second reaction unit for reaction; and (42) introducing the second heavy component into a delayed coking unit for reaction; or using the second heavy component as a component of low sulfur ship fuel oil.

Abstract: A workpiece is measured using multiple-pass spectroscopic ellipsometry and multi-wavelength Raman spectroscopy, which may be performed in the same system. These measurements are combined to form combined measured data. A stress measurement of the workpiece is determined using the combined measured data. The stress measurement can be determined using a model or a machine learning algorithm.

Abstract: Methods and systems for measuring values of one or more parameters of interest, including changes in values of one or more parameters of interest, based on measured spectral differences are presented herein. A trained spectral difference based measurement model determines changes in the values of one or more parameters of interest based on a measure of differences in spectra measured before and after one or more process steps. In some examples, a measure of spectral difference is determined based on a difference in measured intensity, a difference in harmonic signal values, or a difference in value of one or more Mueller Matrix elements. A measure of spectral difference may be expressed as a set of difference values, a scalar value, or coefficients of a functional fit to difference values. A measure of spectral difference may be determined based on a weighting of spectral differences according to wavelength.

Abstract: Methods and systems for compensating systematic errors across a fleet of metrology systems based on a trained error evaluation model to improve matching of measurement results across the fleet are described herein. In one aspect, the error evaluation model is a machine learning based model trained based on a set of composite measurement matching signals. Composite measurement matching signals are generated based on measurement signals generated by each target measurement system and corresponding model-based measurement signals associated with each target measurement system and reference measurement system. The training data set also includes an indication of whether each target system is operating within specification, an indication of the values of system model parameter of each target system, or both.

Abstract: A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.

Abstract: A catalyst has a carrier and a hydrogenation active metal component supported on the carrier. The hydrogenation active metal component contains at least one Group VIB metal component and at least one Group VIII metal component, and the carrier is composed of phosphorus-containing alumina. When the hydrogenation catalyst is measured using a hydrogen temperature programmed reduction method (H2-TPR), the ratio of the peak height of the low-temperature reduction peak, Plow-temp peak, at a temperature of 300-500° C. to the peak height of the high-temperature reduction peak, Phi-temp peak, at a temperature of 650-850° C., i.e. S=Plow-temp peak/Phi-temp peak, is 0.5-2.0; preferably 0.7-1.9, and more preferably 0.8-1.8. The hydrogenation catalyst shows excellent heteroatom removal effect and excellent stability when used in hydrotreatment.

Abstract: Methods and systems for measuring optical properties of transistor channel structures and linking the optical properties to the state of strain are presented herein. Optical scatterometry measurements of strain are performed on metrology targets that closely mimic partially manufactured, real device structures. In one aspect, optical scatterometry is employed to measure uniaxial strain in a semiconductor channel based on differences in measured spectra along and across the semiconductor channel. In a further aspect, the effect of strain on measured spectra is decorrelated from other contributors, such as the geometry and material properties of structures captured in the measurement. In another aspect, measurements are performed on a metrology target pair including a strained metrology target and a corresponding unstrained metrology target to resolve the geometry of the metrology target under measurement and to provide a reference for the estimation of the absolute value of strain.

Abstract: Described are a process and a system for processing aromatics-rich fraction oil. The process includes: (1) introducing an aromatics-rich fraction oil into a fifth reaction unit for hydrosaturation, followed by fractionation, to provide a first light component and a first heavy component; (2) introducing a deoiled asphalt and an aromatics-comprising stream including the first heavy component into a hydrogen dissolving unit to be mixed with hydrogen, and introducing the mixed material into a first reaction unit for a hydrogenation reaction; (3) fractionating a liquid-phase product from the first reaction unit to provide a second light component and a second heavy component; (41) introducing the second light component into a second reaction unit for reaction; and (42) introducing the second heavy component into a delayed coking unit for reaction; or using the second heavy component as a component of low sulfur ship fuel oil.

Abstract: Described are a process and a system for hydrotreating a deoiled asphalt. The process includes: (2) introducing a deoiled asphalt and an aromatics-containing stream into a first reaction unit for hydrogenation reaction, wherein the first reaction unit comprises a mineral-rich precursor material and/or a hydrogenation catalyst, and the first reaction unit is a fixed bed hydrogenation unit; (21) fractionating the liquid-phase product from the first reaction unit to provide a first light component and a first heavy component; (31) introducing the first light component into a second reaction unit for reaction, to provide a gasoline component, a diesel component and/or a BTX feedstock component; and (32) introducing the first heavy component to a delayed coking unit for reaction; or using the first heavy component as a low sulfur ship fuel oil component.

Abstract: A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.

Abstract: Disclosed a combined rock-breaking TBM tunneling method in complex strata for realizing three-way force detection, comprising the steps of preparing a combined mechanical-hydraulic rock-breaking cutter head for TBM construction; starting construction; advancing the combined mechanical-hydraulic rock-breaking cutter head; pushing and pressing against a tunnel face by a mechanical cutter tool; subjecting a three-way force detection cutter to squeezing forces; feeding back three-way force data by a three-way force sensor; processing information by a TBM back-end control processor; obtaining a value of rock-cutter contact angle ?; feeding back parameter information to a TBM cutter head control center by a lithology index center; responding by the TBM cutter head control center, obtaining and adjusting parameters by the mechanical cutter tool equipped with the three-way force sensor; and breaking rock by the combined mechanical-hydraulic rock-breaking cutter head.

Abstract: The present disclosure discloses a rock high-stress high-temperature micro-nano indentation test system, comprising: an X, Y, Z three-direction macroscopic adjustment module, an indentation precision loading module, an indentation test module and an indentation data processing module. The rock high-stress high-temperature micro-nano indentation test system further comprise a two-dimensional horizontal stress loading device, a temperature control device and a vacuum device 13. The rock high-stress high-temperature micro-nano indentation test system provided by the present disclosure has distinctive features of modularity and structuralization, and its test results have high accuracy. The rock high-stress high-temperature micro-nano indentation test system is easy to operate, and provides a theoretical and technical system support for testing the mechanical characteristics of the rock under the high-stress and high-temperature environment in the deep region.

Abstract: A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.

Abstract: The disclosure provides a device and method for measuring radon release amount during rock shearing damage process. The method includes: the sealed chamber where the rock sample placed is vacuumed in the first place, and then the radon released during rock sample shearing damage process is all collected into the radon collection box, and then the concentration of the radon collected in the radon collection box is measured with a radon concentration measure instrument, so that the purity of the radon collected in the radon collection box can be ensured, and thus the accuracy of the concentration of radon measured by the radon concentration measure instrument can be ensured, and the device and method have good practicability.

Abstract: A system includes a light source, a Fourier transform infrared reflectometer (FTIR) spectrometer, and broadband reflectometer optics. The system is configured to measure polarized light and unpolarized reflectivities in a wavelength range from 2 ?m to 20 ?m. The light source can be a laser-driven light source. The spectroscopic reflectometer can include a single channel or two channels.

Abstract: A parameterized geometric model of a structure can be determined based on spectra from a wafer metrology tool. The structure can have geometry-induced anisotropic effects. Dispersion parameters of the structure can be determined from the parameterized geometric model. This can enable metrology techniques to measure nanostructures that have geometries and relative positions with surrounding structures that induce non-negligible anisotropic effects. These techniques can be used to characterize process steps involving metal and semiconductor targets in semiconductor manufacturing of, for example, FinFETs or and gate-all-around field-effect transistors.

Abstract: Methods and systems for measuring optical properties of transistor channel structures and linking the optical properties to the state of strain are presented herein. Optical scatterometry measurements of strain are performed on metrology targets that closely mimic partially manufactured, real device structures. In one aspect, optical scatterometry is employed to measure uniaxial strain in a semiconductor channel based on differences in measured spectra along and across the semiconductor channel. In a further aspect, the effect of strain on measured spectra is decorrelated from other contributors, such as the geometry and material properties of structures captured in the measurement. In another aspect, measurements are performed on a metrology target pair including a strained metrology target and a corresponding unstrained metrology target to resolve the geometry of the metrology target under measurement and to provide a reference for the estimation of the absolute value of strain.

Abstract: Methods and systems for measuring optical properties of transistor channel structures and linking the optical properties to the state of strain are presented herein. Optical scatterometry measurements of strain are performed on metrology targets that closely mimic partially manufactured, real device structures. In one aspect, optical scatterometry is employed to measure uniaxial strain in a semiconductor channel based on differences in measured spectra along and across the semiconductor channel. In a further aspect, the effect of strain on measured spectra is decorrelated from other contributors, such as the geometry and material properties of structures captured in the measurement. In another aspect, measurements are performed on a metrology target pair including a strained metrology target and a corresponding unstrained metrology target to resolve the geometry of the metrology target under measurement and to provide a reference for the estimation of the absolute value of strain.

Abstract: Methods and systems for estimating values of parameters of interest from optical measurements of a sample early in a production flow based on a multidimensional optical dispersion (MDOD) model are presented herein. An MDOD model describes optical dispersion of materials comprising a structure under measurement in terms of parameters external to a base optical dispersion model. In some examples, a power law model describes the physical relationship between the external parameters and a parameter of the base optical dispersion model. In some embodiments, one or more external parameters are treated as unknown values that are resolved based on spectral measurement data. In some embodiments, one or more external parameters are treated as known values, and values of base optical dispersion model parameters, one or more external parameters having unknown values, or both, are resolved based on spectral measurement data and the known values of the one or more external parameters.

Abstract: A method for determining a segmentation threshold of a digital image of a rock-soil material is disclosed. The method comprises the following steps: S1: acquiring a gray-level histogram curve of an SEM image of the rock-soil material; S2: determining a value range of a segmentation threshold T according to the gray-level histogram curve; S3: acquiring second derivatives of the gray-level histogram curve; and S4: determining the segmentation threshold T according to the second derivatives of the gray-level histogram curve and the value range of the segmentation threshold T. The present invention can rapidly and accurately determine the segmentation threshold of the digital image of the rock-soil material, and accurately distinguish a pore or fissure structure from a surface soil skeleton structure of the rock-soil material in the digital image.