Patents by Inventor Dawn V. Muyres

Dawn V. Muyres has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6617609
    Abstract: Provided is an organic thin film transistor comprising a siloxane polymeric layer interposed between a gate dielectric and an organic semiconductor layer. An integrated circuit comprising thin film transistors and methods of making a thin film transistor are also provided. The organic thin film transistors of the invention typically exhibit improvement in one or more transistor properties.
    Type: Grant
    Filed: November 5, 2001
    Date of Patent: September 9, 2003
    Assignee: 3M Innovative Properties Company
    Inventors: Tommie W. Kelley, Larry D. Boardman, Timothy D. Dunbar, Todd D. Jones, Dawn V. Muyres, Mark J. Pellerite, Terrance P. Smith
  • Publication number: 20030150384
    Abstract: Aperture masks and deposition techniques for using aperture masks are described. In addition, techniques for creating aperture masks and other techniques for using the aperture masks are described. The various techniques can be particularly useful in creating circuit elements for electronic displays and low-cost integrated circuits such as radio frequency identification (RFID) circuits. In addition, the techniques can be advantageous in the fabrication of integrated circuits incorporating organic semiconductors, which typically are not compatible with wet processes.
    Type: Application
    Filed: February 14, 2002
    Publication date: August 14, 2003
    Applicant: 3M Innovative Properties Company
    Inventors: Paul F. Baude, Patrick R. Fleming, Michael A. Haase, Tommie W. Kelley, Dawn V. Muyres, Steven Theiss
  • Publication number: 20030152691
    Abstract: In one embodiment, the invention is directed to aperture mask deposition techniques using aperture mask patterns formed in one or more elongated webs of flexible film. The techniques involve sequentially depositing material through mask patterns formed in the film to define layers, or portions of layers, of the circuit. A deposition substrate can also be formed from an elongated web, and the deposition substrate web can be fed through a series of deposition stations. Each deposition station may have an elongated web formed with aperture mask patterns. The elongated web of mask patterns feeds in a direction perpendicular to the deposition substrate web. In this manner, the circuit creation process can be performed in-line. Moreover, the process can be automated to reduce human error and increase throughput.
    Type: Application
    Filed: February 14, 2002
    Publication date: August 14, 2003
    Applicant: 3M Innovative Properties Company
    Inventors: Paul F. Baude, Patrick R. Fleming, Michael A. Haase, Tommie W. Kelley, Dawn V. Muyres, Steven Theiss
  • Publication number: 20030151118
    Abstract: In various embodiments, the invention is directed to aperture mask deposition techniques for use in creating integrated circuits or integrated circuit elements. In other embodiments, the invention is directed to different apparatuses that facilitate the deposition techniques. The techniques generally involve sequentially depositing material through a number of aperture masks formed with patterns that define layers or portions of various layers of a circuit. In this manner, circuits can be created using aperture mask deposition techniques, without requiring any etching or photolithography, which is particularly useful when organic semiconductors are involved. The techniques can be useful in creating circuit elements for electronic displays, low-cost integrated circuits such as radio frequency identification (RFID) circuits, and other circuits.
    Type: Application
    Filed: February 14, 2002
    Publication date: August 14, 2003
    Applicant: 3M Innovative Properties Company
    Inventors: Paul F. Baude, Patrick R. Fleming, Michael A. Haase, Tommie W. Kelley, Dawn V. Muyres, Steven Theiss
  • Publication number: 20030102472
    Abstract: Provided is an organic thin film transistor comprising a siloxane polymeric layer interposed between a gate dielectric and an organic semiconductor layer. An integrated circuit comprising thin film transistors and methods of making a thin film transistor are also provided. The organic thin film transistors of the invention typically exhibit improvement in one or more transistor properties.
    Type: Application
    Filed: November 5, 2001
    Publication date: June 5, 2003
    Applicant: 3M Innovative Properties Company
    Inventors: Tommie W. Kelley, Larry D. Boardman, Timothy D. Dunbar, Todd D. Jones, Dawn V. Muyres, Mark J. Pellerite, Terrance P. Smith
  • Publication number: 20030102471
    Abstract: Provided is an organic thin film transistor comprising a polymeric layer interposed between a gate dielectric and an organic semiconductor layer. Various homopolymers, copolymers, and functional copolymers are taught for use in the polymeric layer. An integrated circuit comprising a multiplicity of thin film transistors and methods of making a thin film transistor are also provided. The organic thin film transistors of the invention typically exhibit improvement in one or more transistor properties.
    Type: Application
    Filed: November 5, 2001
    Publication date: June 5, 2003
    Inventors: Tommie W. Kelley, Larry D. Boardman, Timothy D. Dunbar, Todd D. Jones, Dawn V. Muyres, Mark J. Pellerite, Terrance P. Smith
  • Patent number: 6433359
    Abstract: Provided is an organic thin film transistor comprising a self-assembled monolayer interposed between a gate dielectric and an organic semiconductor layer. The monolayer is a product of a reaction between the gate dielectric and a precursor to the self-assembled monolayer.
    Type: Grant
    Filed: September 6, 2001
    Date of Patent: August 13, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Tommie W. Kelley, Dawn V. Muyres, Mark J. Pellerite, Timothy D. Dunbar, Larry D. Boardman, Terrance P. Smith