Patents by Inventor Deepak Jadhav

Deepak Jadhav has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160372351
    Abstract: Embodiments described herein provide a remote plasma system utilizing a microwave source. Additionally, generation and deposition techniques for 2D transition metal chalcogenides with large area uniformity utilizing microwave assisted generation of radicals is disclosed. Plasma may be generated remotely utilizing the microwave source. A processing platform configured to deposit 2D transition metal chalcogenides is also disclosed.
    Type: Application
    Filed: June 21, 2016
    Publication date: December 22, 2016
    Inventors: Kaushal K. SINGH, Deepak JADHAV, Ashutosh AGARWAL, Ashish GOEL, Vijay PARIHAR, Er-Xuan PING, Randhir P.S. THAKUR
  • Publication number: 20160312360
    Abstract: Methods and apparatus for processing a substrate are provided herein. In some embodiments, a substrate processing chamber includes: a chamber body; a chamber lid assembly having a housing enclosing a central channel that extends along a central axis and has an upper portion and a lower portion; a lid plate coupled to the housing and having a contoured bottom surface that extends downwardly and outwardly from a central opening coupled to the lower portion of the central channel to a peripheral portion of the lid plate; and a gas distribution plate disposed below the lid plate and having a plurality of apertures disposed through the gas distribution plate.
    Type: Application
    Filed: June 9, 2015
    Publication date: October 27, 2016
    Inventors: Muhammad M. RASHEED, Srinivas GANDIKOTA, Mario Dan SANCHEZ, Guoqiang JIAN, Yixiong YANG, Deepak JADHAV, Ashutosh AGARWAL
  • Publication number: 20150279635
    Abstract: A deposition system, and a method of operation thereof, includes: a cathode; a shroud below the cathode; a rotating shield below the cathode for exposing the cathode through the shroud and through a shield hole of the rotating shield; and a rotating pedestal for producing a material to form a carrier over the rotating pedestal, wherein the material having a non-uniformity constraint of less than 1% of a thickness of the material and the cathode having an angle between the cathode and the carrier.
    Type: Application
    Filed: January 27, 2015
    Publication date: October 1, 2015
    Inventors: Anantha K. Subramani, Deepak Jadhav, Ashish Goel, Hanbing Wu, Prashanth Kothnur, Chi Hong Ching
  • Publication number: 20130139878
    Abstract: Embodiments of the invention provide a method for forming a solar cell including forming a layer comprising alumina on a substrate and forming a transparent conductive layer on the layer comprising alumina. The method may also include forming a transparent conductive seed layer on the layer comprising alumina and forming a transparent conductive bulk layer on the transparent conductive seed layer. Embodiments of the invention also include photovoltaic devices having a substrate, a layer comprising alumina adjacent to the substrate, a zinc oxide-containing transparent conductive seed layer adjacent to the layer comprising alumina, and a zinc oxide-containing transparent conductive bulk layer adjacent the zinc oxide-containing transparent conductive seed layer.
    Type: Application
    Filed: April 7, 2011
    Publication date: June 6, 2013
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Yashraj K. Bhatnagar, Brenden McComb, Xiao Ming, Deepak Jadhav, Anantha K. Subramani, Wei D. Wang, Jianshe Tang