Patents by Inventor Deepak Upadhyaya

Deepak Upadhyaya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming metal electrodes
    Patent number: 6475854
    Abstract: A capacitor structure comprising a bottom electrode, an insulator and a top electrode, and method for manufacturing the same. The bottom and top electrodes preferably include a metal portion and a conducting oxygen-containing metal portion. In one embodiment, a layer of ruthenium is deposited to form a portion of the bottom electrode. Prior to deposition of the insulator, the ruthenium is annealed in an oxygen-containing environment. The insulator is then deposited on the oxygen-containing ruthenium layer. Formation of the top electrode includes depositing a first metal on the insulator, annealing the first metal and then depositing a second metal. The first and second metals may be ruthenium.
    Type: Grant
    Filed: December 21, 2000
    Date of Patent: November 5, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Pravin K. Narwankar, Annabel Nickles, Xiaoliang Jin, Deepak Upadhyaya, Yaxin Wang
  • Method of forming metal electrodes
    Publication number: 20010043453
    Abstract: A capacitor structure comprising a bottom electrode, an insulator and a top electrode, and method for manufacturing the same. The bottom and top electrodes preferably include a metal portion and a conducting oxygen-containing metal portion. In one embodiment, a layer of ruthenium is deposited to form a portion of the bottom electrode. Prior to deposition of the insulator, the ruthenium is annealed in an oxygen-containing environment. The insulator is then deposited on the oxygen-containing ruthenium layer. Formation of the top electrode includes depositing a first metal on the insulator, annealing the first metal and then depositing a second metal. The first and second metals may be ruthenium.
    Type: Application
    Filed: December 21, 2000
    Publication date: November 22, 2001
    Inventors: Pravin K. Narwankar, Annabel Nickles, Xiaoliang Jin, Deepak Upadhyaya, Yaxin Wang
  • Composite materials
    Patent number: 5922460
    Abstract: A metal matrix composite material made of a fiber reinforcement having a coating of gadolinium and gadolinium boride, preferably as discrete layers, each having a thickness of 1 to 6 microns. This composite is made by coating reinforcing fibers with gadolinium using a deposition technique, further coating the fibers with gadolinium boride by a deposition technique and then consolidating the coated fibers into a metal matrix to form the metal matrix composite.
    Type: Grant
    Filed: May 21, 1997
    Date of Patent: July 13, 1999
    Assignee: The Secretary of State for Defence in her Britannic Majesty's Government of the United Kingdom of Great Britain & Northern Ireland of Defence Evaluation and Research Agency
    Inventors: Charles M. Ward-Close, Francis H. Froes, Deepak Upadhyaya, Panos Tsakiropoulos