Patents by Inventor Dekai Loo

Dekai Loo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150241772
    Abstract: A double coated negative-working dry-film photoresist in the application of printed circuit board is discussed wherein the dry film contains flexible carrier film, flexible cover film, photopolymerizable composition layer, and intermediate protective layer. The character is as following: the intermediate protective layer is between flexible carrier film and photopolymerizable composition layer, transparent, colorless, soluble in the developer solution of photopolymerizable composition, adhesion between both photopolymerizable composition layer and flexible carrier film, but the adhesion with the photopolymerizable composition layer is larger than that with the flexible carrier film. The intermediate protective layer is polyvinyl alcohol (PVA) or carboxyl-containing polymers. Photopolymerizable compositions contain polymeric binder, free-radical photoinitiator, addition-polymerizable monomer, thermo-polymerization inhibitor.
    Type: Application
    Filed: August 2, 2013
    Publication date: August 27, 2015
    Applicant: Zhuhai Dynamic Technology Optical Industry Co., Ltd.
    Inventors: Dekai Loo, Weiguo Yang, Yan Dong
  • Publication number: 20140011946
    Abstract: A stabilizer composition comprising an AB type polymer for use in increasing Open Time of aqueous coating compositions is disclosed. The stabilizers compositions are of utility in many aqueous compositions including paints, stains, varnishes, adhesives and inks. Of particular interest is the use of the stabilizer compositions for in increasing the Open Time of latex paints as well as alkyd emulsion paints.
    Type: Application
    Filed: April 19, 2007
    Publication date: January 9, 2014
    Inventors: Kirill Bakeev, Sung Gun Chu, Tara Lyn Everett, Dirk Kruythoff, Dekai Loo, Tuyen Thanh Nguyen, Willemina Geesien Salomons, Dirk Kruythoff
  • Patent number: 8623977
    Abstract: The present invention involves a cross-linked carboxylic acid hydrophobically modified copolymer product in which cross-linked carboxylic acid is modified with a non-hydrocarbyl hydrophobe, namely, poly(dimethyl siloxane) or fluoronated alkyl methacrylates.
    Type: Grant
    Filed: November 19, 2009
    Date of Patent: January 7, 2014
    Assignee: Hercules Incorporated
    Inventors: Sung G. Chu, Dekai Loo, Hong Yang
  • Publication number: 20100130711
    Abstract: The present invention involves a cross-linked carboxylic acid hydrophobically modified copolymer product in which cross-linked carboxylic acid is modified with a non-hydrocarbyl hydrophobe, namely, poly(dimethyl siloxane) or fluoronated alkyl methacrylates.
    Type: Application
    Filed: November 19, 2009
    Publication date: May 27, 2010
    Applicant: HERCULES INCORPORATED
    Inventors: Sung G. CHU, Dekai LOO, Hong YANG
  • Publication number: 20070249780
    Abstract: A stabilizer composition comprising an AB type polymer for use in increasing Open Time of aqueous coating compositions is disclosed. The stabilizers compositions are of utility in many aqueous compositions including paints, stains, varnishes, adhesives and inks. Of particular interest is the use of the stabilizer compositions for in increasing the Open Time of latex paints as well as alkyd emulsion paints.
    Type: Application
    Filed: April 19, 2007
    Publication date: October 25, 2007
    Inventors: Kirill Bakeev, Sung Chu, Tara Everett, Dirk Kruythoff, Dekai Loo, Tuyen Nguyen, Willemina Salomons, Dirk Kruythoff
  • Patent number: 6342332
    Abstract: A liquid applied photoresist composition is disclosed which exhibits a favorable balance of photospeed and overall physical properties. The photoresist composition includes a binder, a multifunctional monomer, a photoinitiator, and a solvent. The photoinitiator is present in the photoresist in an amount of greater than about 10% by weight of the photoresist without solvent. The photoresist when applied is relatively resistant to blocking when applied to a substrate. A process for producing a negative resist image on a surface using the photoresist is also disclosed.
    Type: Grant
    Filed: February 5, 1996
    Date of Patent: January 29, 2002
    Assignee: MacDermid, Incorporated
    Inventors: Dekai Loo, Richard T. Mayes
  • Patent number: 5391678
    Abstract: Curable compositions including epoxy-functional compounds and polyenes, as well as cyclic polysiloxanes, and/or tetrahedral siloxysilanes, and/or linear polysiloxanes; along with, or instead of these polyenes and silicon compositions, crosslinkable prepolymers prepared from such polyenes and silicon compounds may be included. A curing agent, and yet additionally, a curing accelerator, may also be included. These compositions can be thermally cured, in the presence of hydrosilation catalysts.
    Type: Grant
    Filed: December 3, 1992
    Date of Patent: February 21, 1995
    Assignee: Hercules Incorporated
    Inventors: John K. Bard, Richard L. Brady, Raymond T. Leibfried, Sr., Dekai Loo