Abstract: A laser produced plasma (LPP) light source comprises a rotating target assembly supplying a target into an interaction zone with a focused beam of a high-repetition-rate pulsed laser. High effective cooling of the light source is provided by thermal radiation of a peripheral part of the rotating target assembly and through a meander-shaped gap between the rotating target assembly and a fixed heat exchanger with a gas blowing through the slit gap. In an embodiment, a sealing between the vacuum chamber and a shaft of rotating drive unit is provided by a magnetic fluid seal (MFS) with an additional heat exchanger. A heat transfer from the rotating target assembly is provided through the shaft and MFS to additional heat exchanger and by convection air cooling of a counterweight of the rotating target assembly fixed on the shaft. High brightness and high output power of LPP light source are provided.

Abstract: The light source contains a gas-filled chamber with a plasma sustained by a focused beam of a continuous wave laser. The means for plasma ignition is a solid-state laser system which generates two pulsed laser beams: in a free running mode and in a Q-switched mode. The solid-state laser system contains single active element and its optical cavity is equipped with a Q-switch overlapping only part of a cross section of the intracavity laser beam. One pulsed laser beam provides an optical breakdown after which another pulsed laser beam ignites the plasma, the volume and density of which are sufficient for stationary sustenance of the plasma by the focused beam of the continuous wave laser. EFFECT: simplification of the design of the light source, increase of its reliability and ease of use, creating on this basis of powerful electrode-free high-brightness broadband light sources with high spatial and energy stability.

Abstract: An X-ray beam is generated in an interaction zone of an electron beam and a target, the zone being an annular layer of a molten fusible metal in an annular channel of a rotating anode assembly. The channel has a surface profile which prevents slopping of the molten metal in the radial direction and in both directions along the rotation axis. The liquid-metal target forms a circular cylindrical surface due to the centrifugal force acting thereupon. The linear velocity of the target is preferably higher than 80 m/s; in a vacuum chamber, a changeable membrane made of carbon nanotubes is installed in the X-ray beam path and a protective screen with apertures for electron beam entry and X-ray beam exit is arranged around the interaction zone. The technical result consists in an X-ray source with increased power, brightness, lifetime and ease of use.

Abstract: The light source contains a gas-filled chamber with a plasma sustained by a focused beam of a continuous wave laser. The means for plasma ignition is a solid-state laser system which generates two pulsed laser beams: in a free running mode and in a Q-switched mode. The solid-state laser system contains single active element and its optical cavity is equipped with a Q-switch overlapping only part of a cross section of the intracavity laser beam. One pulsed laser beam provides an optical breakdown after which another pulsed laser beam ignites the plasma, the volume and density of which are sufficient for stationary sustanance of the plasma by the focused beam of the continuous wave laser. EFFECT: simplification of the design of the light source, increase of its reliability and ease of use, creating on this basis of powerful electrode-free high-brightness broadband light sources with high spatial and energy stability.

Abstract: A light source with radiating plasma sustained in the gas-filled chamber by a focused beam of CW laser. The gas is inert gas with a purity of at least 99.99%. The chamber contains a metal housing with at least one window made of MgF2 for outputting a plasma radiation. Each window is located in a hole of the housing on the end of a sleeve and is soldered to the sleeve by means of glass cement, and each sleeve is welded to the hole of the metal housing on the outside seam. The sleeves and the housing are made of an alloy with a coefficient of linear thermal expansion (CLTE), matched with the CLTE of the MgF2 crystal in the direction perpendicular to the optical axis of the MgF2 crystal. The technical result consists in expanding the radiation spectrum of the light source into the VUV region.

Abstract: An X-ray beam is generated in an interaction zone of an electron beam and a target, the zone being an annular layer of a molten fusible metal in an annular channel of a rotating anode assembly. The channel has a surface profile which prevents slopping of the molten metal in the radial direction and in both directions along the rotation axis. The liquid-metal target forms a circular cylindrical surface due to the centrifugal force acting thereupon. The linear velocity of the target is preferably higher than 80 m/s; in a vacuum chamber, a changeable membrane made of carbon nanotubes is installed in the X-ray beam path and a protective screen with apertures for electron beam entry and X-ray beam exit is arranged around the interaction zone. The technical result consists in an X-ray source with increased power, brightness, lifetime and ease of use.

Abstract: A light source with radiating plasma sustained in the gas-filled chamber by a focused beam of CW laser. The gas is inert gas with a purity of at least 99.99%. The chamber contains a metal housing with at least one window made of MgF2 for outputting a plasma radiation. Each window is located in a hole of the housing on the end of a sleeve and is soldered to the sleeve by means of glass cement, and each sleeve is welded to the hole of the metal housing on the outside seam. The sleeves and the housing are made of an alloy with a coefficient of linear thermal expansion (CLTE), matched with the CLTE of the MgF2 crystal in the direction perpendicular to the optical axis of the MgF2 crystal. The technical result consists in expanding the radiation spectrum of the light source into the VUV region.

Abstract: The light source contains a chamber with a region of radiating plasma sustained by a focused beam of a CW laser. The chamber consists of a tube, a bottom and a cap. The cap is arranged for filling the chamber with gas. The tube and bottom are made from an optically transparent material. The bottom is arranged for input into the chamber of the CW laser beam and pulsed laser beams used for the plasma ignition, while the tube is arranged for exit of the output beam of plasma radiation. Preferably shape of the tube is arranged for reducing aberrations which distort a path of rays of plasma radiation passing through the tube wall. The technical result consists in creating electrodeless high-brightness broadband light sources with the high spatial and power stability, and in providing an ability to collect plasma radiation in a spatial angle of more than 9 sr.

Abstract: The light source contains a chamber with a region of radiating plasma sustained by a focused beam of a CW laser. The chamber consists of a tube, a bottom and a cap. The cap is arranged for filling the chamber with gas. The tube and bottom are made from an optically transparent material. The bottom is arranged for input into the chamber of the CW laser beam and pulsed laser beams used for the plasma ignition, while the tube is arranged for exit of the output beam of plasma radiation. Preferably shape of the tube is arranged for reducing aberrations which distort a path of rays of plasma radiation passing through the tube wall. The technical result consists in creating electrodeless high-brightness broadband light sources with the high spatial and power stability, and in providing an ability to collect plasma radiation in a spatial angle of more than 9 sr.

Abstract: The invention relates to plasma light sources with a continuous optical discharge (COD). The light source contains a gas filled chamber with a region of radiating plasma sustained by a focused beam of a CW laser. A density of gas particles in the chamber is less than 90·1019 cm?3 and a temperature of the chamber is in a range from 600 to 900 K or optionally higher. Preferably the density of gas particles is as low as possible and the temperature of the inner surface of the chamber at operation is as high as possible under providing a gas pressure in the chamber of about 50 bar or more. The technical result of the invention consists in providing COD sustaining conditions, which are optimal for achieving high stability and high brightness of the radiating plasma, in the creation on this basis of broadband light sources with ultra-high brightness and stability.

Abstract: A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (e.g., hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, a detection apparatus may be provided as part of a shroud to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream.

Abstract: A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (e.g., hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, a detection apparatus may be provided as part of a shroud to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream.

Abstract: A lithographic apparatus includes an optical element that includes an oriented carbon nanotube sheet. The optical element has an element thickness in the range of about 20-500 nm and has a transmission for EUV radiation having a wavelength in the range of about 1-20 nm of at least about 20% under perpendicular irradiation with the EUV radiation.

Abstract: A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (e.g., hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, a detection apparatus may be provided as part of a shroud to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream.

Abstract: The invention provides a method and apparatus for a commercially viable EUV light source for EUV metrology and actinic inspection of EUV lithography masks. The invention is carried out using a laser target in the form of a continuous jet of liquid Lithium, circulated in a closed loop system by means of a high temperature pump. The collector mirror is placed outside the vacuum chamber in an environment filled with an inert gas and EUV output to a collector mirror is provided through the spectral purity filter, configured as an EUV exit window for the vacuum chamber. In the vacuum chamber, the input window for the laser beam is coated with a screening optical element. Evaporative cleaning of the EUV spectral purity filter and the screening optical element is provided. The protective shield with a temperature higher than 180° C. may be adjusted around the target jet.

Abstract: A multilayer mirror for use in device lithography is configured to reflect and/or pattern radiation having a wavelength in the range of about 6.4 nm to about 7.2 nm. The multilayer mirror has a plurality of alternating layers of materials. The plurality of alternating layers of materials include first layers of materials and second layers of materials. The second layers have a higher refractive index for the radiation than the first layers. The materials of the first layers and the materials of the second layers are mutually chemically unreactive at an interface therebetween at temperatures less than 300° C. This may allow the mirrors to have a narrow boundary region of intermingled materials from alternating layers between the layers, for example of 0.5 nm or less in width, which may improve sharpness of the boundary region and improve reflectivity.

Abstract: A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.

Abstract: A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (e.g., hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, a detection apparatus may be provided as part of a shroud to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream.

Abstract: A multilayer mirror to reflect radiation having a wavelength in the range of 2-8 nm has alternating layers. The alternating layers include a first layer and a second layer. The first and second layers are selected from the group consisting of: U and B4C layers, Th and B4C layers, La and B9C layers, La and B4C layers, U and B9C layers, Th and B9C layers, La and B layers, U and B layers, C and B layers, Th and B layers, U compound and B4C layers, Th compound and B4C layers, La compound and B9C layers, La compound and B4C layers, U compound and a B9C layers, Th compound and a B9C layers, La compound and a B layers, U compound and B layers, and Th compound and a B layers. An interlayer is disposed between at least one of the first layers and the second layer.

Abstract: A multilayer mirror for use in device lithography is configured to reflect and/or pattern radiation having a wavelength in the range of about 6.4 nm to about 7.2 nm. The multilayer mirror has a plurality of alternating layers of materials. The plurality of alternating layers of materials include first layers of materials and second layers of materials. The second layers have a higher refractive index for the radiation than the first layers. The materials of the first layers and the materials of the second layers are mutually chemically unreactive at an interface therebetween at temperatures less than 300° C. This may allow the mirrors to have a narrow boundary region of intermingled materials from alternating layers between the layers, for example of 0.5 nm or less in width, which may improve sharpness of the boundary region and improve reflectivity.