Patents by Inventor Deyan Wang

Deyan Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10558122
    Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sulfonamide substitution. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
    Type: Grant
    Filed: April 13, 2015
    Date of Patent: February 11, 2020
    Assignee: Rohm and Haas Electronic Materials, LLC
    Inventors: Deyan Wang, Chunyi Wu, George G. Barclay, Cheng-Bai Xu
  • Publication number: 20190346763
    Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises one or more materials that have hetero-substituted carbocyclic aryl groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
    Type: Application
    Filed: July 22, 2019
    Publication date: November 14, 2019
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Cheng-Bai Xu, George G. Barclay
  • Publication number: 20190342237
    Abstract: A method, an apparatus, and an interaction system for obtaining group information are provided. The method may include detecting a triggering operation for a group information platform in an interface of a client end of a mobile group work platform; sending a page acquisition request for the group information platform to a server end of the mobile group work platform; and displaying a function page of the group information platform based on page data returned by the server. Using the technical solutions of the present disclosure, processing of internal events of a group can be implemented on a mobile group work platform, while accesses and processing of events external to the group can also be implemented based on connections and communications between the mobile group work platform and a group information platform, thereby realizing quicker information interactions between inside and outside of the same group, and between different groups.
    Type: Application
    Filed: July 16, 2019
    Publication date: November 7, 2019
    Inventors: Xinglin Ma, Kai ZHOU, Rongjun WANG, Yiran Wang, Deyan CHE
  • Publication number: 20190241522
    Abstract: Disclosed are a nicotinic acid or isonicotinic acid compound and a use thereof. The compound is the compound shown in Formula I, or a pharmaceutically acceptable salt, ester or solvate thereof. Efficacy tests demonstrate that the nicotinic acid compound can inhibit botulinum toxin endopeptidase activity in vitro, and has a significant protective effect on mice poisoned with botulinum toxin. On this basis, the compound may be used to prepare a drug preventing and/or treating botulinum toxin exposure and/or poisoning.
    Type: Application
    Filed: September 8, 2017
    Publication date: August 8, 2019
    Applicant: Academy of Military Medical Sciences
    Inventors: Hui WANG, Tao LI, Zhenyuan MIAO, Jianxin WANG, Deyan LUO, Jie HUANG, Chunlin ZHUANG, Yuelin WU
  • Publication number: 20190235385
    Abstract: Photoresist topcoat compositions, comprising: a first polymer comprising a first repeat unit of general formula (I) and a second repeat unit of general formula (II): wherein: R1 independently represents H, F or optionally fluorinated C1 to C4 alkyl; R2 represents optionally fluorinated linear, branched or cyclic C1 to C20 alkyl; L1 represents a single bond or a multivalent linking group; and n is an integer of from 1 to 5; a second polymer comprising a first repeat unit of general formula (III) and a second repeat unit of general formula (IV): wherein: R3 independently represents H, F or optionally fluorinated C1 to C4 alkyl; R4 represents linear, branched or cyclic C1 to C20 alkyl; R5 represents linear, branched or cyclic C1 to C20 fluoroalkyl; L2 represents a single bond or a multivalent linking group; and n is an integer of from 1 to 5; and a solvent. Coated substrates coated with the described topcoat compositions and methods of processing a photoresist composition are also provided.
    Type: Application
    Filed: January 11, 2019
    Publication date: August 1, 2019
    Inventors: Cong Liu, Doris H. Kang, Deyan Wang, Cheng-Bai Xu, Mingqi Li, Irvinder Kaur
  • Patent number: 10359698
    Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises one or more materials that have hetero-substituted carbocyclic aryl groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
    Type: Grant
    Filed: November 19, 2009
    Date of Patent: July 23, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Cheng-Bai Xu, George G. Barclay
  • Publication number: 20190219543
    Abstract: Acoustic wave sensors comprise: a piezoelectric layer, first and second electrodes arranged with the piezoelectric layer in a piezoelectric transducer circuit; and a polymeric sensing layer for adsorbing a gas-phase analyte, the adsorption of which analyte causes a change in resonant frequency of the piezoelectric transducer circuit, wherein the polymeric sensing layer comprises: (a) a polymer chosen from substituted or unsubstituted: polyarylenes comprising the reaction product of monomers comprising a first monomer comprising an aromatic acetylene group and a second monomer comprising a cyclopentadienone group; polyamides; polypyrazoles; or novolacs; or a cured product thereof; (b) a polymer chosen from substituted or unsubstituted: polyamic acids; or polyamic acid-polyimide copolymers; (c) a polymer formed from one or more monomers comprising a monomer comprising a polar group-substituted arylcyclobutene group, or a cured product thereof; or (d) a polymer comprising polymerized units of a monomer chosen fr
    Type: Application
    Filed: January 8, 2019
    Publication date: July 18, 2019
    Inventors: Christopher GILMORE, Aaron A. Rachford, Hee Jae Yoon, Jaclyn Murphy, Peter Trefonas, III, Deyan Wang
  • Patent number: 10222699
    Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises two or more distinct materials that can be substantially non-mixable with a resin component of the resist. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
    Type: Grant
    Filed: October 27, 2014
    Date of Patent: March 5, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Cheng-Bai Xu, George G. Barclay
  • Patent number: 10197918
    Abstract: Photoresist topcoat compositions, comprising: a first polymer comprising a first repeat unit of general formula (I) and a second repeat unit of general formula (II): wherein: R1 independently represents H, F or optionally fluorinated C1 to C4 alkyl; R2 represents optionally fluorinated linear, branched or cyclic C1 to C20 alkyl; L1 represents a single bond or a multivalent linking group; and n is an integer of from 1 to 5; a second polymer comprising a first repeat unit of general formula (III) and a second repeat unit of general formula (IV): wherein: R3 independently represents H, F or optionally fluorinated C1 to C4 alkyl; R4 represents linear, branched or cyclic C1 to C20 alkyl; R5 represents linear, branched or cyclic C1 to C20 fluoroalkyl; L2 represents a single bond or a multivalent linking group; and n is an integer of from 1 to 5; and a solvent. Coated substrates coated with the described topcoat compositions and methods of processing a photoresist composition are also provided.
    Type: Grant
    Filed: October 12, 2017
    Date of Patent: February 5, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Cong Liu, Doris H. Kang, Deyan Wang, Cheng-Bai Xu, Mingqi Li, Irvinder Kaur
  • Patent number: 10180627
    Abstract: New lithographic processing methods are provided which are particularly useful in immersion lithography schemes. In one aspect, processes of the invention comprise: applying on a substrate a photoresist composition; exposing the photoresist layer to radiation activating for the photoresist composition; removing a portion but not all of the exposed photoresist layer; and developing the treated photoresist layer to provide a photoresist relief image.
    Type: Grant
    Filed: June 8, 2010
    Date of Patent: January 15, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, George G. Barclay, Thomas A. Estelle, Kenneth J. Spizuoco, Doris Kang
  • Patent number: 10167411
    Abstract: Disclosed herein is a block copolymer comprising a first segment and a second segment that are covalently bonded to each other and that are chemically different from each other; where the first segment has a first surface free energy and where the second segment has a second surface free energy; and an additive copolymer; where the additive copolymer comprises a surface free energy reducing moiety where the surface free energy reducing moiety has a lower surface free energy than that of the first segment and the second segment; the additive copolymer further comprising one or more moieties having an affinity to the block copolymer; where the surface free energy reducing moiety is chemically different from the first segment and from the second segment; where the additive copolymer is not water miscible; and where the additive copolymer is not covalently bonded with the block copolymer.
    Type: Grant
    Filed: June 23, 2016
    Date of Patent: January 1, 2019
    Assignees: DOW GLOBAL TECHNOLOGIES LLC, ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Peter Trefonas, III, Phillip D. Hustad, Deyan Wang, Rahul Sharma, Mingqi Li, Jieqian J. Zhang
  • Publication number: 20180286598
    Abstract: A method of making a multilayer structure is provided, comprising providing a substrate; providing a coating composition, comprising: a liquid carrier and a MX/graphitic carbon precursor material having a formula (I); disposing the coating composition on the substrate to form a composite; optionally, baking the composite; annealing the composite under a forming gas atmosphere; whereby the composite is converted into an MX layer and a graphitic carbon layer disposed on the substrate providing the multilayer structure; wherein the MX layer is interposed between the substrate and the graphitic carbon layer in the multilayer structure.
    Type: Application
    Filed: September 29, 2015
    Publication date: October 4, 2018
    Inventors: Deyan Wang, Xiuyan Wang, Shaoguang Feng, Qiaowei Li, Qingqing Pang, Peter Trefonas, III, Zhijian Lu, Hongyu Chen
  • Publication number: 20180282165
    Abstract: Compositions comprising a liquid carrier and certain MX/graphitic carbon precursors are useful in forming multilayer structures having an MX layer and a graphitic carbon layer disposed on a substrate, wherein the MX layer is interposed between the substrate and the graphitic carbon layer in the multilayer structure.
    Type: Application
    Filed: March 6, 2018
    Publication date: October 4, 2018
    Inventor: Deyan Wang
  • Publication number: 20180273388
    Abstract: A method of making a graphitic carbon sheet is provided, comprising providing a substrate; providing a coating composition, comprising: a liquid carrier and a MX/graphitic carbon precursor material having a formula (I); disposing the coating composition on the substrate to form a composite; optionally, baking the composite; annealing the composite under a forming gas atmosphere; whereby the composite is converted into an MX layer and a graphitic carbon layer disposed on the substrate providing a multilayer structure; wherein the MX layer is interposed between the substrate and the graphitic carbon layer in the multilayer structure; exposing the multilayer structure to an acid; and, recovering the graphitic carbon layer as the freestanding graphitic carbon sheet.
    Type: Application
    Filed: September 29, 2015
    Publication date: September 27, 2018
    Inventors: Deyan Wang, Xiuyan Wang, Shaoguang Feng, Qiaowei Li, Qingqing Pang, Peter Trefonas, III, Hongyu Chen
  • Publication number: 20180265363
    Abstract: A method of making a multilayer structure is provided, comprising providing a substrate; providing a coating composition, comprising: a liquid carrier, a polycyclic aromatic additive and a MX/graphitic carbon precursor material having a formula (I); disposing the coating composition on the substrate to form a composite; optionally, baking the composite; annealing the composite under a forming gas atmosphere; whereby the composite is converted into an MX layer and a graphitic carbon layer disposed on the substrate providing the multilayer structure; wherein the MX layer is interposed between the substrate and the graphitic carbon layer in the multilayer structure.
    Type: Application
    Filed: September 29, 2015
    Publication date: September 20, 2018
    Inventors: Deyan Wang, Xiuyan Wang, Shaoguang Feng, Qiaowei Li, Qingqing Pang, Peter Trefonas, III
  • Publication number: 20180224741
    Abstract: A photoimageable composition for preparing a polymeric binder having of one or more of monomer unit copolymers, a photoactive compound, and one or more organometallic compounds is provided. The copolymers include one or more hydroxyl or carboxyl functional groups that react with the organometallic compound to form a crosslinked network upon curing. The photoimageable compositions may be particularly useful in forming a pixel-defining layer of an electronic device. such as an organic light emitting diode. In particular, photoimageable compositions in accordance with embodiments of the present invention are insoluble in the developer prior to exposure to radiation, soluble in the developer following radiation exposure, and have relatively high glass transition temperatures (Tg) making them useful in forming a pixel-defining layer.
    Type: Application
    Filed: July 11, 2016
    Publication date: August 9, 2018
    Inventors: Peng-Wei Chuang, Deyan Wang, Jibin Sun, Peter Trefonas, III, Kathleen M. O'Connell
  • Patent number: 10042259
    Abstract: Topcoat compositions comprise: a matrix polymer; a surface active polymer comprising a polymerized unit formed from a monomer of the following general formula (I): wherein: R1 represents H, F, methyl or fluorinated methyl; R2 represents optionally substituted C1 to C8 alkylene or optionally substituted C1 to C8 fluoroalkylene, optionally comprising one or more heteroatom; R3 represents H, F, optionally substituted C1 to C10 alkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; R4 represents optionally substituted C1 to C8 alkyl, optionally substituted C1 to C8 fluoroalkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; X represents O, S or NR5, wherein R5 is chosen from hydrogen and optionally substituted C1 to C5 alkyl; and a is 0 or 1; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions.
    Type: Grant
    Filed: October 12, 2017
    Date of Patent: August 7, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Irvinder Kaur, Cong Liu, Doris Kang, Mingqi Li, Deyan Wang, Huaxing Zhou
  • Publication number: 20180118970
    Abstract: Topcoat compositions comprise: a matrix polymer; a surface active polymer comprising a polymerized unit formed from a monomer of the following general formula (I): wherein: R1 represents H, F, methyl or fluorinated methyl; R2 represents optionally substituted C1 to C8 alkylene or optionally substituted C1 to C8 fluoroalkylene, optionally comprising one or more heteroatom; R3 represents H, F, optionally substituted C1 to C10 alkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; R4 represents optionally substituted C1 to C8 alkyl, optionally substituted C1 to C8 fluoroalkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; X represents O, S or NR5, wherein R5 is chosen from hydrogen and optionally substituted C1 to C5 alkyl; and a is 0 or 1; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions.
    Type: Application
    Filed: October 12, 2017
    Publication date: May 3, 2018
    Inventors: Irvinder Kaur, Cong Liu, Doris Kang, Mingqi Li, Deyan Wang, Huaxing Zhou
  • Publication number: 20180120703
    Abstract: Photoresist topcoat compositions, comprising: a first polymer comprising a first repeat unit of general formula (I) and a second repeat unit of general formula (II): wherein: R1 independently represents H, F or optionally fluorinated C1 to C4 alkyl; R2 represents optionally fluorinated linear, branched or cyclic C1 to C20 alkyl; L1 represents a single bond or a multivalent linking group; and n is an integer of from 1 to 5; a second polymer comprising a first repeat unit of general formula (III) and a second repeat unit of general formula (IV): wherein: R3 independently represents H, F or optionally fluorinated C1 to C4 alkyl; R4 represents linear, branched or cyclic C1 to C20 alkyl; R5 represents linear, branched or cyclic C1 to C20 fluoroalkyl; L2 represents a single bond or a multivalent linking group; and n is an integer of from 1 to 5; and a solvent. Coated substrates coated with the described topcoat compositions and methods of processing a photoresist composition are also provided.
    Type: Application
    Filed: October 12, 2017
    Publication date: May 3, 2018
    Inventors: Cong Liu, Doris H. Kang, Deyan Wang, Cheng-Bai Xu, Mingqi Li, Irvinder Kaur
  • Patent number: 9958780
    Abstract: In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.
    Type: Grant
    Filed: August 17, 2010
    Date of Patent: May 1, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Peter Trefonas, III, Michael K. Gallagher