Abstract: The present invention describes 2-methyl-quinazoline compounds of general formula (I), methods of preparing said compounds, intermediate compounds useful for preparing said compounds, pharmaceutical compositions and combinations comprising said compounds, and the use of said compounds for manufacturing pharmaceutical compositions. The 2-methyl substituted quinazoline compounds of general formula (I) effectively and selectively inhibit the Ras-Sos interaction without significantly targeting the EGFR receptor. They are therefore useful for the treatment or prophylaxis of diseases, in particular of hyperproliferative disorders, such as cancer as a sole agent or in combination with other active ingredients.

Abstract: A component for a projection exposure apparatus for semiconductor lithography, comprises an optical element and an actuator, which are force-fittingly connected to each other. The actuator at least locally deforms the optical element. The actuator can be configured to minimize the loss in rigidity at the peripheries delimiting the actuator on the imaging quality. A method for designing a component of projection exposure apparatus is provided.

Abstract: The invention relates to a magnetic holding device (10), in particular a clamping device, comprising a holding surface (9) and at least one first permanent magnet (11), characterized in that the holding device (10) comprises at least one second permanent magnet (12) which is rotatably mounted relative to the at least one first permanent magnet (11) about a rotational axis (3), whereby the pole direction (2) of the second permanent magnet (12) is rotatable relative to the pole direction (1) of the first permanent magnet (11).

Abstract: A sealing device seals a first component part of a lithography apparatus vis-à-vis a multiplicity of second component parts of the lithography apparatus. The sealing device includes a multiplicity of sealing rings and a multiplicity of connection locations. The sealing rings are connected to one another with the aid of the connection locations.

Abstract: Method and device for producing an adhesive bond between a first component and a second component (optical element) for microlithography. The method involves: introducing the first and second components into a positioning device for changing the relative position between the first and second components, calibrating a first relative position, in which a distance between the first and second components has a first value defining a predefined adhesive gap, calibrating a second relative position, in which a distance between the first and second components has a second value greater than the first value, applying adhesive to the first component while the first and second components are at a distance greater than the first value, and setting the first relative position while forming the adhesive bond between the first and second components. Calibrating the first and second relative positions are carried out before the adhesive is applied to the first component.

Abstract: A sealing device seals a first component part of a lithography apparatus vis-à-vis a multiplicity of second component parts of the lithography apparatus. The sealing device includes a multiplicity of sealing rings and a multiplicity of connection locations. The sealing rings are connected to one another with the aid of the connection locations.

Abstract: The invention relates to a magnetic holding device (10), in particular a clamping device, comprising a holding surface (9) and at least one first permanent magnet (11), characterized in that the holding device (10) comprises at least one second permanent magnet (12) which is rotatably mounted relative to the at least one first permanent magnet (11) about a rotational axis (3), whereby the pole direction (2) of the second permanent magnet (12) is rotatable relative to the pole direction (1) of the first permanent magnet (11).

Abstract: The invention relates to a method for structuring a press belt (5) made of metal, which has surface areas having three-dimensional embossed structures (6) to be transferred to decorative panels, and a coating is applied to an outer face of the press belt (5) and the embossed structures (6) are then produced by abrading material from or applying material to uncoated regions of the press belt (5), and the application of the coating is carried out by means of a digitally controlled printing method in which the coating is applied in droplet form, wherein before the press belts (5) are structured, the length and width of the embossed structures (6) are determined, taking into account an anticipated elongation of the press belt (5) in an operative state.

Abstract: An illumination system of a microlithographic projection exposure apparatus includes a light source configured to produce projection light that propagates along a light path. The illumination system also includes a beam deflection array of reflective or transmissive beam deflection elements. Each beam deflection element is configured to deflect an impinging light beam by a deflection angle that is variable in response to a control signal. The beam deflection array is used in a first mode of operation to determine an irradiance distribution in the system pupil surface. The system further includes an optical raster element, in particular a diffractive optical element, which is used in a second mode of operation to determine the irradiance distribution in the system pupil surface. An exchange unit is configured to hold the optical raster element in the second mode of operation such that it is inserted into the light path.

Abstract: The invention relates to a method for structuring a press belt (5) made of metal, which has surface areas having three-dimensional embossed structures (6) to be transferred to decorative panels, and a coating is applied to an outer face of the press belt (5) and the embossed structures (6) are then produced by abrading material from or applying material to uncoated regions of the press belt (5), and the application of the coating is carried out by means of a digitally controlled printing method in which the coating is applied in droplet form, wherein before the press belts (5) are structured, the length and width of the embossed structures (6) are determined, taking into account an anticipated elongation of the press belt (5) in an operative state.

Abstract: An illumination system of a microlithographic projection exposure apparatus includes a light source configured to produce projection light that propagates along a light path. The illumination system also includes a beam deflection array of reflective or transmissive beam deflection elements. Each beam deflection element is configured to deflect an impinging light beam by a deflection angle that is variable in response to a control signal. The beam deflection array is used in a first mode of operation to determine an irradiance distribution in the system pupil surface. The system further includes an optical raster element, in particular a diffractive optical element, which is used in a second mode of operation to determine the irradiance distribution in the system pupil surface. An exchange unit is configured to hold the optical raster element in the second mode of operation such that it is inserted into the light path.

Abstract: A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA>0.85 and a demagnifying imaging scale where |b|<0.05, and the planar image field having a minimum image field diameter suitable for microlithography of more than 1 mm.

Abstract: A refractive optical imaging system for imaging an object field arranged in an object surface of the imaging system into an image field arranged in an image surface of the imaging system on a demagnifying imaging scale has a multiplicity of optical elements which are configured and arranged such that a defined finite field curvature of the imaging system is set such that an object surface concavely curved relative to the imaging system is imaged into a flat image surface.

Abstract: Collectors are disclosed. The collectors can be for illumination systems with a wavelength ?193 nm, including ?126 nm, and the EUV range. The collectors can serve to receive the light rays emitted from a light source and to illuminate an area in a plane. The collectors can include at least a first mirror shell or a first shell segment as well as a second mirror shell or a second shell segment receiving the light and providing a first illumination and a second illumination in a plane which is located in the light path downstream of the collector. An illumination systems are also disclosed. The illumination systems can be equipped with a collector. Projection exposure apparatuses are also disclosed. The projection exposure apparatuses can include an illumination system. Methods for the manufacture of microstructures by photographic exposure are also disclosed.

Abstract: A method for removing contaminations from optical elements or parts thereof, especially from at least one surface of at least one optical element, with UV light. At least one semiconductor light source is used for removing the contaminations, wherein the semiconductor light source is arranged in and/or on a support of the optical element and/or close to the optical element such that a light of the semiconductor light source impinges onto the surface of the optical element.

Abstract: A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA>0.85 and a demagnifying imaging scale where |b|<0.05, and the planar image field having a minimum image field diameter suitable for microlithography of more than 1 mm.

Abstract: An illumination system (12) of a microlithographic exposure system comprises a plurality of light emitting elements (24) that have light exit facets that are positioned in or in close proximity to a field plane (OP) or a pupil plane and are configured to be individually activated. Light collecting elements, for example microlenses of a fly-eye lens or arrays of cylinder lenses, may be used to collect the light bundles emitted by the light emitting elements (24). Homogenizing means, for example a rod integrator or an optical raster element (40), may be provided for improving the intensity uniformity in a reticle plane (RP).

Abstract: The invention relates to a method for structuring endless belts (1), particularly steel belts, for presses, e.g. double belt presses. According to the invention, a coating is applied to an outer surface of the belt after which metal is removed from and/or applied to the belt. The coating is formed by individual drops, which are projected against the outer surface of the belt and remain thereupon and/or, as done in the prior art, a surface-covering coating is applied, which is degraded and/or removed, e.g. oxidized, in a preferably point-by-point manner by the action of thermally active beams, particularly laser beams, whereupon metal is removed from and/or applied to the uncoated area.

Abstract: A refractive optical imaging system for imaging an object field arranged in an object surface of the imaging system into an image field arranged in an image surface of the imaging system on a demagnifying imaging scale has a multiplicity of optical elements which are configured and arranged such that a defined finite field curvature of the imaging system is set such that an object surface concavely curved relative to the imaging system is imaged into a flat image surface.

Abstract: An optical apparatus for illuminating an object, for example an illumination system of a microlithographic exposure system, comprises a light source that generates a plurality of individual bundles that constitute an illumination bundle. A control device controls the light source in such a way that a desired form of the illumination bundle is determined by selecting an appropriate set of individual bundles.