Abstract: A rotary position measuring system having a housing connected with a scanning unit having a light source that emits beams of light and a detector element. A reflection scanning graduation structure arranged directly on the housing opposite the scanning unit. A graduated disk is connected with a rotatable shaft and has a radial transmission measuring graduation structure, wherein the graduated disk is arranged so it is rotatable around an axis of symmetry in the housing so that the measuring graduation structure is located between the scanning unit and the scanning graduation structure. The beams of light emitted by the light source first reach the measuring graduation structure where they are split into a first set of diffracted partial beams of different orders and the diffracted partial beams impinge on the scanning graduation structure.

Abstract: A measuring system that includes a scale and a transparent substrate located opposite the scale. The transparent includes a graduation structure and a semiconductor layer arranged on a first side of the transparent substrate facing away from the scale, wherein a photodetector, a light source and an electronic circuit are integrated into the semiconductor layer.

Abstract: An optoelectronic component that includes a substrate having a first optoelectronic component, a second optoelectronic component arranged next to the first optoelectronic component and a contact point. A support of the substrate includes a second contact point, wherein the second contact point is located opposite to the first contact point and is in electrical connection with the first contact point. An underfiller in a space between the substrate and the support, the underfiller forms a border area between the substrate and the support toward a space free of underfiller, wherein the border area restricts the space free of underfiller of at least one of the first and second optoelectronic components.

Abstract: Electronic components of an optoelectronic sensor for a measuring system are arranged on the side of a semiconductor substrate that is facing away from a scale. The semiconductor substrate between electronic components and the scale is removed at those locations where the components emit or detect an electromagnetic beam. In this way, it is possible to arrange all of the electrical connections of the components and further electronic assemblies of the measuring system on a first side of the semiconductor substrate, and all optical components of the measuring system on a second side of the semiconductor substrate.

Abstract: A scale for opto-electrical linear or angular measuring systems. A gradation in the form of a phase grating is embodied on the scale and has alternating raised and stepped areas. A continuous compensating layer of chrome and on it a continuous highly reflective layer of titanium nitride are applied to one side of a step-like structured base body. The material and the layer thickness of the compensating layer is selected in such a way that it counteracts the mechanical stresses of the reflecting surface layer and thus, in the finished state of the scale, the deposited layers no longer exert stresses on the base body.

Abstract: An optical device, such as a position measuring instrument, having a source of light and a diffraction element for receiving the light, creating partial light beams which interfere with one another, and producing from the interfering partial light beams a first beam of light projecting along a first direction and producing a second beam of light projecting along a second direction. The optical device further includes a first optical projecting element positioned to receive the first beam of light and producing a first focused beam of light and a second optical projecting element positioned to receive the second beam of light and producing a second focused beam of light. Furthermore, the optical device has a first photodetector to receive and detect the first focused beam of light and a second photodetector to receive and detect the second focused beam of light.

Abstract: An absolute measuring interferometer having a measuring interferometer, a tunable laser emitting a laser beam and a control interferometer for adjusting the air wavelength of the laser beam. The control interferometer adjusts the air wavelength of the laser beam to a specific wavelength value at the ends of each measuring cycle. The wavelength of the tunable laser is continually tuned within the specific wavelength interval where the phase change of the interference signal is continually detected during the wavelength modulation process. An absolute measurement is determined by a simple mathematical relationship between the measured wavelength and phase changes.

Abstract: A measuring instrument having at least one phase transmission graduation formed on a carrier member in which the graduation is formed by grating structures in a graduation region of the carrier member, the graduation region of the carrier member having a continuous planar surface.

Abstract: An apparatus and method for measuring absolute measurements having two measuring interferometers and a tunable laser emitting a laser beam. The two measuring interometers each have their own measuring lines and are supplied with the beam from one and the same laser. A reference line is established from the arithmetic sum or difference of the two measuring lines and is maintained at a constant value.

Abstract: The interferometer comprises a light source, at least one beam splitting means, a beam combiner means, measuring and reference arms as well as wave guides for guiding the light to the beam splitting means and for guiding the light back to photodetectors. Beam splitting means and beam combiner means are formed by integrated optics elements on a substrate. The wave guides on the substrate form a measuring arm (7.sub.1) and two reference arms (6.sub.1, 8.sub.1) which have different optical path lengths for setting a phase difference. An evaluation electronics for determining correct as to signs, the change in optical path length in the measuring arm (7.sub.1) is connected to the photodetectors.

Abstract: A polarizing optical arrangement wherein a linearly polarized signal beam cluster is generated. The signal beam cluster is created from interfering partial beam clusters and is linearly polarized. The azimuth of oscillation of the linearly polarized signal beam cluster is dependent on the mutual phase relationship of the aforementioned partial beam clusters. A splitter grating splits the linearly polarized signal beam cluster into partial beam clusters that are analyzed by analyzers, detected by photoelectric transducers and phase-shifted electrically from one another.

Abstract: In an arrangement with at least one waveguide coupler, two photo beam bundles are supplied to both of the inputs of the waveguide coupler by two input grids and are brought to interference in the coupling area. A damping element is provided in the coupling area of the waveguide coupler for obtaining at the two outputs two signals having a mutual phase shift of other than 180.degree. by two detectors.

Abstract: In an integrated optical arrangement, such as a photoelectric position measuring arrangement, a diffraction grid is scanned by light beam diffraction by a scanning unit having a laser. A light beam bundle emanating from the laser is split by the diffraction grid into two diffraction beam bundles, which are inserted into the top input waveguides of a waveguide coupler by two coupling elements. The two diffraction beam bundles interfere in the waveguide coupler and impinge on three detectors located at three output waveguides of the waveguide coupler for obtaining measured values. For readjustment of the optimal emission wavelength of the laser, an additional diffraction beam bundle emanating from the diffraction grid is entered into said integrated optical sensor arrangement by an additional coupling element. The additional beam bundle triggers a detector for generating a control signal to control the optimal emission wavelength of the laser.

Abstract: A position measuring apparatus for measuring the position of a first object relatively movable with respect to a second object. The position measuring apparatus includes a first deflection element, a light source positioned to scan the first deflection element with a light beam, a second deflection element, and a reflection element. The second deflection element and the reflection element are adapted with respect to each other and with respect to the first deflection element so that partial beam bundles deflected from the first deflection element are deflected by the second deflection element and emerge converging from the second deflection element into the reflection element, are reflected by the reflection element, and emerge diverging from the reflection element, impinge again on a deflection element, are deflected again and are brought into interference.

Abstract: A position measuring arrangement is provided which presents a graduation carrier with graduation and reference mark fields to a scanning plate. A prism is allocated to one of the measuring graduation fields and reference mark fields. The prism provides an optical separation of the measuring graduation and reference mark fields transversely to the measuring direction.

Abstract: An interferometric type photoelectric measuring device is disclosed. The photoelectric angle measuring device includes a graduation carrier having a circular graduation and a scanning arrangement for the diametral scanning of the circular graduation. The scanning arrangement is constructed as an integrated optical circuit.

Abstract: A photoelectric measuring device for measuring the position of two objects which can be rotated relative to each other. The measuring device includes a grid graduation located on a graduation support to which the first object can be attached. The second object is attached to a scanning unit scan that scans the grid by means of light diffraction. A beam from the light source is diffracted into partial beam bundles in a first graduation zone of the grid graduation and brought into interference in a second graduation zone which is diametrically opposite of the first graduation zone on the grid graduation for measurement. In order to eliminate or compensate for eccentricity and to produce signals that are phase-displaced and interfere with sinusoidal intensity changes between interference fringes, only partial beam bundles of adjacent orders of diffraction are brought into interference in the second graduation zone.

Abstract: A photoelectric measuring system measures relative movements between a diffraction grid and a substrate. An integrated semiconductor laser is formed on the substrate and emits radiation that is conducted via an optical waveguide and a focusing grating coupler onto the diffraction grid. The diffraction grid diffracts the incident radiation and directs it back onto the substrate. Diffracted component beams are received by waveguide horns having waveguide corrugation coupling gratings and are conducted via optical waveguides to a coupler, where the component beams are brought into interference to form a combined beam. This combined beam is transmitted from the coupler via optical waveguides to detectors which transform the combined beams into electrical signals that are displaced in phase with respect to one another. The electrical signals generated by the detectors can be processed in an evaluating circuit which may also be formed as an integrated circuit on the substrate, and then displayed.

Abstract: Several photoelectric position measuring systems are described which utilize diffraction gratings to define the reference magnitude. Diffracted component beams are introduced by means of coupling-in gratings that have different grid constants from one another into optical waveguides to a coupler and there brought into interference. The interfering component beams are conducted from the outputs of the coupler via optical waveguides to detectors which transform them into electrical signals which are phase-shifted with respect to one another. Displacement of the diffraction grating is a measure for the position change to be measured of one machine component mounted for translation relative to another.

Abstract: A measuring device for measuring the relative position of two objects includes a graduation of a graduation support connected with one object and a scanning device connected with the other object. The scanning device scans the graduation with light. To eliminate measuring errors that arise due to irregularities in the graduation plane of the graduation support, a first scanning graduation of a first scanning plate is positioned at a first scanning distance from the graduation plane of the graduation support and a second scanning graduation of a second scanning plate is positioned at a second scanning distance from the graduation plane of the graduation support. The scanning graduation plates are located in the scanning unit and intersect light beams from a light source. The graduation planes of the scanning graduation plates are positioned parallel to the graduation plane of the graduation support. A photoelement is optically associated with each of the scanning graduations.