Abstract: A focused ion beam device is described comprising a gas field ion source with an analyzer for analyzing and classifying the structure of a specimen, a controller for controlling and/or modifying the structure of the specimen according to the analysis of the analyzer, an emitter tip, the emitter tip has a base tip comprising a first material and a supertip comprising a material different from the first material, wherein the supertip is a single atom tip and the base tip is a single crystal base tip. Furthermore, the focused ion beam device has a probe current control and a sample charge control. A method of operating a focused ion beam device is provided comprising applying a voltage between a single emission center of the supertip and an electrode, supplying gas to the emitter tip, analyzing and classifying the structure of a specimen, and controlling the structure of the specimen.

Abstract: A method of operating a focused ion beam device having a gas field ion source is described. According to some embodiments, the method includes emitting an ion beam from a gas field ion source, providing an ion beam column ion beam energy in the ion beam column which is higher than the final beam energy, decelerating the ion beam for providing a final beam energy on impingement of the ion beam on the specimen of 1 keV to 4 keV, and imaging the specimen.

Abstract: A secondary charged particle detection device for detection of a signal beam is described. The device includes a detector arrangement having at least two detection elements with active detection areas, wherein the active detection areas are separated by a gap (G), a particle optics configured for separating the signal beam into a first portion of the signal beam and into at least one second portion of the signal beam, and configured for focusing the first portion of the signal beam and the at least one second portion of the signal beam. The particle optics includes an aperture plate and at least a first inner aperture openings in the aperture plate, and at least one second radially outer aperture opening in the aperture plate, wherein the aperture plate is configured to be biased to one potential surrounding the first inner aperture opening and the at least one outer aperture opening.

Abstract: A shielding member for a charged particle beam apparatus includes a conductive substrate; and a through hole extending through the conductive substrate. The conductive substrate is comprised of a material having a specific electrical resistivity in a range from about 106 ?cm to about 1012 ?cm.

Abstract: A secondary charged particle detection device for detection of a signal beam is described. The device includes a detector arrangement having at least two detection elements with active detection areas, wherein the active detection areas are separated by a gap (G), a particle optics configured for separating the signal beam into a first portion of the signal beam and into at least one second portion of the signal beam, and configured for focusing the first portion of the signal beam and the at least one second portion of the signal beam. The particle optics includes an aperture plate and at least a first inner aperture openings in the aperture plate, and at least one second radially outer aperture opening in the aperture plate, wherein the aperture plate is configured to be biased to one potential surrounding the first inner aperture opening and the at least one outer aperture opening.

Abstract: A retarding field scanning electron microscope is described. The microscope includes a scanning deflection assembly configured for scanning an electron beam over a specimen, one or more controllers in communication with the scanning deflection assembly for controlling the electron beam scanning pattern, and a combined magnetic-electrostatic objective lens configured for focusing the electron beam including an electrostatic lens portion. The electrostatic lens portion includes a first electrode with a high potential bias, and a second electrode disposed between the first electrode and the specimen plane with a potential bias lower than the first electrode, wherein the second electrode is configured for providing a retarding field. The microscope further includes a voltage supply connected to the second electrode for biasing the second electrode and being in communication with the controllers, wherein the controllers synchronize a variation of the potential of the second electrode with the scanning pattern.

Abstract: A shielding member for a charged particle beam apparatus includes a conductive substrate; and a through hole extending through the conductive substrate. The conductive substrate is comprised of a material having a specific electrical resistivity in a range from about 106 ?cm to about 1012 ?cm.

Abstract: A charged particle beam device is described. The device includes an emitter unit including an emitter tip; a voltage supply unit adapted for providing a stable voltage to generate a stable extraction field at the emitter tip; a pulsed voltage supply member adapted for providing a pulsed voltage to generate a pulsed extraction field on top of the stable extraction field; a measuring unit for measuring an emitter characteristic; and a control unit adapted for receiving a signal from the measuring unit and for control of the pulsed voltage supply member.

Abstract: Process for the production of ethylene for chemical use starting with a hydrocarbon source according to which: a) the hydrocarbon source is subjected to a first cracking step, namely a pyrolysis step carried out in a cracking oven, thus producing a mixture of cracking products; b) the mixture of cracking products is subjected to a succession of treatment steps, including a compression step, which makes it possible to obtain a purified crude gas stream; c) the purified crude gas stream is then cooled to a temperature where hydrocarbons with 6 and more carbon atoms condense so that they can be removed from the purified crude gas stream; d) the resulting purified gas stream is afterwards supplied to one separating column, where a fraction A containing hydrogen, methane and ethylene is separated at the head of the column and a heavy fraction C is separated at the bottom of the column; e) a part of the reflux of this column is supplied to a refrigeration cycle leading to a fraction B enriched with ethylene; and f)

Abstract: An ion beam apparatus and a method for providing an energy-filtered primary ion beam are described. Therein, a primary ion beam having an asymmetric first energy distribution is generated by means of an ion source. The primary ion beam is energy filtered using, for example, a retarding lens.

Abstract: A method of operating a focused ion beam device for emitting during operation a focused ion beam including ions of a gas generated at a first partial pressure, comprising cleaning an emitter tip positioned in an emitter tip region of the focused ion beam device, the cleaning comprises introducing the gas into the emitter tip region such that the gas has a second partial pressure of at least two times the first pressure. Further, a focused ion beam device is provided, comprising a gas field emitter tip (13) in an emitter tip region emitting an ion beam including ions of a gas, a gas inlet for supplying a gas with different pressures (110), a gas outlet (120), a pressure measurement device for measuring the pressure in the emitter tip region and a control unit (130) for controlling switching between an operation mode and a cleaning mode, further controlling the pressures in the emitter tip region and being connected to the pressure measurement device.

Abstract: Apparatus for combustion of a fuel-oxidizer mixture in a combustion chamber of a turbogroup, in particular of a power plant wherein total oxidizer flow is divided into a main oxidizer flow and a secondary oxidizer flow. The main oxidizer flow is lean mixed with a main fuel flow in a premix burner, and the mixture is fully oxidized in the combustion chamber. The secondary oxidizer flow is divided into a pilot oxidizer flow and a heat-exchanging oxidizer flow. The pilot oxidizer flow is rich mixed with a pilot fuel flow, and the mixture is partially oxidized in a catalyst, with hydrogen being formed. Downstream of the catalyst, the partially oxidized pilot fuel-oxidizer mixture and the heat-exchanging oxidizer flow are together introduced into at least one zone which is suitable for stabilizing the combustion of the main fuel-oxidizer mixture.

Abstract: A gas field ion source is described. The gas field ion source includes an emitter module. The emitter module includes an emitter holder, an emitter structure, a detachably connectable electrical connection assembly of the emitter module, and a detachably connectable gas supply connection assembly of the emitter module. The gas field ion source further includes a supply module, wherein the supply module includes an electrical conductor for providing voltage and/or current, a gas supply conduit, a thermal conductor, a detachably connectable electrical connection assembly of the supply module, and a detachably connectable gas supply connection assembly of the supply module. The emitter module and the supply module are detachably connectable by the detachably connectable connection assemblies of the emitter module and the detachably connectable connection assemblies of the supply module.

Abstract: A gas field ion source is described for a charged particle beam device having a charged particle beam column. The gas field ion source includes an emitter unit, a cooling unit, and a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit is adapted for reduction of vibration transfer from the cooling unit to the emitter unit.

Abstract: A gas field ion source is described for a charged particle beam device having a charged particle beam column. The gas field ion source includes an emitter unit, a cooling unit, and a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit is adapted for reduction of vibration transfer from the cooling unit to the emitter unit.

Abstract: A focused ion beam device is provided, including: an ion beam column adapted to house a gas field ion source emitter with an emitter tip and an emitter area for generating ions, a heating means adapted to heat the emitter tip, one or more gas inlets adapted to introduce a first gas and at least one second gas to the emitter area, an objective lens adapted to focus the ion beam generated from the first gas or the second gas, and a controller adapted to switch between a first emitter tip temperature and a second emitter tip temperature for generating an ion beam of ions of the first gas or an ion beam of ions of the at least one second gas.

Abstract: Process for the production of ethylene for chemical use starting with a hydrocarbon source according to which: a) the hydrocarbon source is subjected to a first cracking step, namely a pyrolysis step carried out in a cracking oven, thus producing a mixture of cracking products; b) the mixture of cracking products is subjected to a succession of treatment steps, including a compression step, which makes it possible to obtain a purified crude gas stream; c) the purified crude gas stream is then cooled to a temperature where hydrocarbons with 6 and more carbon atoms condense so that they can be removed from the purified crude gas stream; d) the resulting purified gas stream is afterwards supplied to one separating column, where a fraction A containing hydrogen, methane and ethylene is separated at the head of the column and a heavy fraction C is separated at the bottom of the column; e) a part of the reflux of this column is supplied to a refrigeration cycle leading to a fraction B enriched with ethylene; and f)

Abstract: Process for the manufacture of at least one ethylene derivative compound starting with a hydrocarbon source according to which: a) the hydrocarbon source is subjected to a simplified cracking which produces a mixture of products containing ethylene and other constituents; b) the mixture of products is fractionated in one fractionation step into one fraction containing almost all the ethylene (fraction A), optionally into one individual fraction of ethane and into one heavy fraction (fraction C); and c) the fraction A is conveyed to the manufacture of at least one ethylene derivative compound.

Abstract: A method for operating a turbogroup, especially of a power generating plant, is provided. The turbogroup includes a compressor for compressing combustion air, a combustion chamber with at least one burner for producing a hot gas, and a turbine for expanding the hot gas, performing work. The method includes feeding combustion air to a compressor, where it is compressed, and fed to at least one burner and feeding a fuel to the at least one burner. The method also includes injecting water into the combustion air upstream of the burner where it is evaporated, mixing the fuel in the burner with the combustion air-water vapor mixture, combusting the fuel-combustion air-water vapor mixture in the combustion chamber, and feeding the hot gas which is produced in the combustion chamber to the turbine where it is expanded and performs work.

Abstract: A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting, or correcting an aberration of, an electron beam passing through the electrodes. A voltage can be applied to the central ring electrode independently of the voltages applied to the upper and lower electrodes to focus the electron beam on a substrate.