Patents by Inventor Dietrich Seybold

Dietrich Seybold has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for the thermal oxidation of silicon with added chlorine
    Patent number: T954009
    Abstract: the dry thermal oxidation of silicon semiconductor material to produce an oxide layer, such as the gate oxide of a field effect transistor, is carried out by flowing oxygen over the surface of the semiconductor at an elevated temperature to form a layer of silicon oxide. The electrical properties of the layer are improved by adding chlorine to the oxygen in the form of between 0.2 and 5.0 mol % of carbon tetrachloride in order to introduce chlorine into the growing oxide layer.
    Type: Grant
    Filed: July 16, 1975
    Date of Patent: January 4, 1977
    Assignee: International Business Machines Corporation
    Inventors: Konrad Malin, Dietrich Seybold