Patents by Inventor Donald J. Svetkoff

Donald J. Svetkoff has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7148447
    Abstract: A precision, laser-based method and system for high-speed, sequential processing of material of targets within a field are disclosed that control the irradiation distribution pattern of imaged spots. For each spot, a laser beam is incident on a first anamorphic optical device and a second anamorphic optical device so that the beam is controllably modified into an elliptical irradiance pattern. The modified beam is propagated through a scanning optical system with an objective lens to image a controlled elliptical spot on the target. In one embodiment, the relative orientations of the devices along an optical axis are controlled to modify the beam irradiance pattern to obtain an elliptical shape while the absolute orientation of the devices controls the orientation of the elliptical spot.
    Type: Grant
    Filed: January 16, 2006
    Date of Patent: December 12, 2006
    Assignee: GSI Group Corporation
    Inventors: Jonathan S. Ehrmann, James J. Cordingley, Donald V. Smart, Donald J. Svetkoff
  • Patent number: 6989508
    Abstract: A precision, laser-based method and system for high-speed, sequential processing of material of targets within a field are disclosed that control the irradiation distribution pattern of imaged spots. For each spot, a laser beam is incident on a first anamorphic optical device and a second anamorphic optical device so that the beam is controllably modified into an elliptical irradiance pattern. The modified beam is propagated through a scanning optical system with an objective lens to image a controlled elliptical spot on the target. In one embodiment, the relative orientations of the devices along an optical axis are controlled to modify the beam irradiance pattern to obtain an elliptical shape while the absolute orientation of the devices controls the orientation of the elliptical spot.
    Type: Grant
    Filed: July 30, 2004
    Date of Patent: January 24, 2006
    Assignee: GSI Group Corporation
    Inventors: Jonathan S. Ehrmann, James J. Cordingley, Donald V. Smart, Donald J. Svetkoff
  • Patent number: 6979798
    Abstract: Laser system and method for material processing with ultra fast lasers are provided. One aspect of the invention features the method which removes at least a portion of a target structure such as a memory link while avoiding undesirable damage to adjacent non-target structures. The method includes applying a single ultra short laser pulse to the target structure to remove the target structure with the single pulse.
    Type: Grant
    Filed: February 26, 2004
    Date of Patent: December 27, 2005
    Assignee: GSI Lumonics Corporation
    Inventors: Bo Gu, Donald J. Svetkoff, Kurt Pelsue
  • Patent number: 6972268
    Abstract: A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: December 6, 2005
    Assignee: GSI Lumonics Corporation
    Inventors: Jonathan S. Ehrmann, Joseph J. Griffiths, Donald V. Smart, Donald J. Svetkoff
  • Publication number: 20040226925
    Abstract: Laser system and method for material processing with ultra fast lasers are provided. One aspect of the invention features the method which removes at least a portion of a target structure such as a memory link while avoiding undesirable damage to adjacent non-target structures. The method includes applying a single ultra short laser pulse to the target structure to remove the target structure with the single pulse.
    Type: Application
    Filed: February 26, 2004
    Publication date: November 18, 2004
    Inventors: Bo Gu, Donald J. Svetkoff, Kurt Pelsue
  • Publication number: 20040179207
    Abstract: A system including confocal and triangulation-based scanners or subsystems provides data which is both acquired and processed under the control of a control algorithm to obtain information such as dimensional information about microscopic targets which may be “non-cooperative.” The “non-cooperative” targets are illuminated with a scanning beam of electromagnetic radiation such as laser light incident from a first direction. A confocal detector of the electromagnetic radiation is placed at a first location for receiving reflected radiation which is substantially optically collinear with the incident beam of electromagnetic radiation. The system includes a spatial filter for attenuating background energy. The triangulation-based subsystem also includes a detector of electromagnetic radiation which is placed at a second location which is non-collinear with respect to the incident beam. This detector has a position sensitive axis.
    Type: Application
    Filed: March 24, 2004
    Publication date: September 16, 2004
    Applicant: GSI Lumonics Corporation
    Inventors: Donald J. Svetkoff, Donald B. T. Kilgus, Warren Lin, Jonathan S. Ehrmann
  • Patent number: 6777645
    Abstract: A precision, laser-based method and system for high-speed, sequential processing of material of targets within a field are disclosed that control the irradiation distribution pattern of imaged spots. For each spot, a laser beam is incident on a first anamorphic optical device and a second anamorphic optical device so that the beam is controllably modified into an elliptical irradiance pattern. The modified beam is propagated through a scanning optical system with an objective lens to image a controlled elliptical spot on the target. In one embodiment, the relative orientations of the devices along an optical axis are controlled to modify the beam irradiance pattern to obtain an elliptical shape while the absolute orientation of the devices controls the orientation of the elliptical spot.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: August 17, 2004
    Assignee: GSI Lumonics Corporation
    Inventors: Jonathan S. Ehrmann, James J. Cordingley, Donald V. Smart, Donald J. Svetkoff
  • Publication number: 20040134896
    Abstract: A laser-based method of removing a target link structure of a circuit fabricated on a substrate includes generating a pulsed laser output at a pre-determined wavelength less than an absorption edge of the substrate. The laser output includes at least one pulse having a pulse duration in the range of about 10 picoseconds to less than 1 nanosecond, the pulse duration being within a thermal laser processing range. The method also includes delivering and focusing the laser output onto the target link structure. The focused laser output has sufficient power density at a location within the target structure to reduce the reflectivity of the target structure and efficiently couple the focused laser output into the target structure to remove the link without damaging the substrate.
    Type: Application
    Filed: October 10, 2003
    Publication date: July 15, 2004
    Inventors: Bo Gu, Donald V. Smart, James J. Cordingley, Joohan Lee, Donald J. Svetkoff, Shepard D. Johnson, Jonathan S. Ehrmann
  • Publication number: 20040134894
    Abstract: A laser-based system for processing target material within a microscopic region without causing undesirable changes in electrical or physical characteristics of at least one material surrounding the target material, the system includes a seed laser, an optical amplifier, and a beam delivery system. The seed laser for generating a sequence of laser pulses having a first pre-determined wavelength. The optical amplifier for amplifying at least a portion of the sequence of pulses to obtain an amplified sequence of output pulses. The beam delivery system for delivering and focusing at least one pulse of the amplified sequence of pulses onto the target material. The at least one output pulse having a pulse duration in the range of about 10 picoseconds to less than 1 nanosecond. The pulse duration being within a thermal processing range.
    Type: Application
    Filed: October 10, 2003
    Publication date: July 15, 2004
    Inventors: Bo Gu, Donald V. Smart, James J. Cordingley, Joohan Lee, Donald J. Svetkoff, Shepard D. Johnson, Jonathan S. Ehrmann
  • Patent number: 6750974
    Abstract: A system including confocal and triangulation-based scanners or subsystems provides data which is both acquired and processed under the control of a control algorithm to obtain information such as dimensional information about microscopic targets which may be “non-cooperative.” The “non-cooperative” targets are illuminated with a scanning beam of electromagnetic radiation such as laser light incident from a first direction. A confocal detector of the electromagnetic radiation is placed at a first location for receiving reflected radiation which is substantially optically collinear with the incident beam of electromagnetic radiation. The system includes a spatial filter for attenuating background energy. The triangulation-based subsystem also includes a detector of electromagnetic radiation which is placed at a second location which is non-collinear with respect to the incident beam. This detector has a position sensitive axis.
    Type: Grant
    Filed: September 16, 2002
    Date of Patent: June 15, 2004
    Assignee: GSI Lumonics Corporation
    Inventors: Donald J. Svetkoff, Donald B. T. Kilgus, Warren Lin, Jonathan S. Ehrmann
  • Publication number: 20040104202
    Abstract: A laser scanning method and system for marking articles is provided wherein control is provided by a single central controller. The system includes a conveyor for conveying the articles in a first direction at a marking station. A conveyor controller controls the conveyor in response to conveyor control signals. A laser and an optical subsystem are optically coupled to the laser for generating a focused laser beam in response to laser control signals. A scan head includes a laser beam deflector for steering the focused laser beam along two substantially orthogonal intersecting axes at the marking station to mark a first predetermined region on at least one of the articles in response to deflection control signals.
    Type: Application
    Filed: July 11, 2003
    Publication date: June 3, 2004
    Applicant: GSI Lumonics, Inc.
    Inventors: Joseph P. Downes, J. Miles Kane, Frank B. Hunt, Rainer Schramm, Donald J. Svetkoff
  • Patent number: 6703582
    Abstract: An energy-efficient method and system for processing target material such as microstructures in a microscopic region without causing undesirable changes in electrical and/or physical characteristics of material surrounding the target material is provided. The system includes a controller for generating a processing control signal and a signal generator for generating a modulated drive waveform based on the processing control signal. The waveform has a sub-nanosecond rise time. The system also includes a gain-switched, pulsed semiconductor seed laser having a first wavelength for generating a laser pulse train at a repetition rate. The drive waveform pumps the laser so that each pulse of the pulse train has a predetermined shape. Further, the system includes a fiber amplifier subsystem for optically amplifying the pulse train to obtain an amplified pulse train without significantly changing the predetermined shape of the pulses.
    Type: Grant
    Filed: January 22, 2002
    Date of Patent: March 9, 2004
    Assignee: GSI Lumonics Corporation
    Inventors: Donald V. Smart, Donald J. Svetkoff
  • Patent number: 6639177
    Abstract: A method and system for processing at least one microstructure which is part of a multi-material device containing a plurality of microstructures is provided. The at least one microstructure has a designated region for target material removal. The method includes generating a laser beam, modifying the laser beam to obtain a modified laser beam, and sequentially and relatively positioning the modified laser beam into at least one non-round spot having a predetermined non-round energy distribution on the designated region to remove the target material in the designated region. The predetermined non-round energy distribution covers an area of the designated region such that energy is more efficiently coupled into the designated region for the non-round energy distribution than energy coupled into the designated region for a round energy distribution covering the same area.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: October 28, 2003
    Assignee: GSI Lumonics Corporation
    Inventors: Jonathan S. Ehrmann, James J. Cordingley, Donald V. Smart, Donald J. Svetkoff
  • Publication number: 20030184764
    Abstract: A system including confocal and triangulation-based scanners or subsystems provides data which is both acquired and processed under the control of a control algorithm to obtain information such as dimensional information about microscopic targets which may be “non-cooperative.” The “non-cooperative” targets are illuminated with a scanning beam of electromagnetic radiation such as laser light incident from a first direction. A confocal detector of the electromagnetic radiation is placed at a first location for receiving reflected radiation which is substantially optically collinear with the incident beam of electromagnetic radiation. The system includes a spatial filter for attenuating background energy. The triangulation-based subsystem also includes a detector of electromagnetic radiation which is placed at a second location which is non-collinear with respect to the incident beam. This detector has a position sensitive axis.
    Type: Application
    Filed: September 16, 2002
    Publication date: October 2, 2003
    Applicant: General Scanning, Inc.
    Inventors: Donald J. Svetkoff, Donald B. T. Kilgus, Warren Lin, Jonathan S. Ehrmann
  • Publication number: 20030024913
    Abstract: A laser scanning method and system for marking articles is provided wherein control is provided by a single central controller. The system includes a conveyor for conveying the articles in a first direction at a marking station. A conveyor controller controls the conveyor in response to conveyor control signals. A laser and an optical subsystem are optically coupled to the laser for generating a focused laser beam in response to laser control signals. A scan head includes a laser beam deflector for steering the focused laser beam along two substantially orthogonal intersecting axes at the marking station to mark a first predetermined region on at least one of the articles in response to deflection control signals.
    Type: Application
    Filed: April 15, 2002
    Publication date: February 6, 2003
    Inventors: Joseph P. Downes, J Miles Kane, Frank B Hunt, Jr., Rainer Schramm, Donald J Svetkoff
  • Publication number: 20030016859
    Abstract: A method and system are provided for inspecting electronic components mounted on printed circuit boards utilizing both 3-D and 2-D data associated with the components and the background on which they are mounted on the printed circuit board. Preferably, a 3-D scanner in the form of a solid state dual detector laser images the components and solder paste on the printed circuit board to obtain the 3-D and 2-D data. Then, a high speed image processor processes the 3-D data to find the locations of the leads and the solder paste. Then, the high speed image processor processes the 2-D data together with the locations of the leads and the solder paste to distinguish the leads from the solder paste. The high speed image processor may calculate centroids of feet of the leads, average height of the feet and border violation percentage of the solder paste.
    Type: Application
    Filed: December 11, 2000
    Publication date: January 23, 2003
    Inventors: John J. Weisgerber, Donald J. Svetkoff, Donald K. Rohrer
  • Patent number: 6496270
    Abstract: A method and system for automatically generating reference height data for use in a 3D inspection system are provided wherein local reference areas on an object are initially determined and then the height of these local reference areas are determined to generate the reference height data. When the object is a printed circuit board, the local reference areas are located relative to predetermined interconnect sites where solder paste is to be deposited or components placed and from which the relative height of the solder paste or components is to be determined using the reference height data during the subsequent inspection process.
    Type: Grant
    Filed: February 17, 2000
    Date of Patent: December 17, 2002
    Assignee: GSI Lumonics, Inc.
    Inventors: Robert W. Kelley, Donald K. Rohrer, John J. Weisgerber, Donald J. Svetkoff
  • Publication number: 20020170898
    Abstract: A precision, laser-based method and system for high-speed, sequential processing of material of targets within a field are disclosed that control the irradiation distribution pattern of imaged spots. For each spot, a laser beam is incident on a first anamorphic optical device and a second anamorphic optical device so that the beam is controllably modified into an elliptical irradiance pattern. The modified beam is propagated through a scanning optical system with an objective lens to image a controlled elliptical spot on the target. In one embodiment, the relative orientations of the devices along an optical axis are controlled to modify the beam irradiance pattern to obtain an elliptical shape while the absolute orientation of the devices controls the orientation of the elliptical spot.
    Type: Application
    Filed: March 27, 2002
    Publication date: November 21, 2002
    Inventors: Jonathan S. Ehrmann, James J. Cordingley, Donald V. Smart, Donald J. Svetkoff
  • Publication number: 20020167581
    Abstract: A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.
    Type: Application
    Filed: March 27, 2002
    Publication date: November 14, 2002
    Inventors: James J. Cordingley, Jonathan S. Ehrmann, David M. Filgas, Shepard D. Johnson, Joohan Lee, Donald V. Smart, Donald J. Svetkoff
  • Publication number: 20020162973
    Abstract: A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.
    Type: Application
    Filed: March 27, 2002
    Publication date: November 7, 2002
    Inventors: James J. Cordingley, Roger D. Dowd, Jonathan S. Ehrmann, Joseph J. Griffiths, Joohan Lee, Donald V. Smart, Donald J. Svetkoff