Abstract: Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a method of real-time alignment of a wafer situated on a stage of an e-beam tool involves collecting backscattered electrons from an underlying patterned feature of the wafer while an e-beam column of the e-beam tool writes during scanning of the stage. The collecting is performed by an electron detector placed at the e-beam column bottom. The method also involves performing linear corrections of an alignment of the stage relative to the e-beam column based on the collecting.

Abstract: A method including forming a plurality of first interconnects and a plurality of second interconnects on opposite sides of an integrated circuit device layer including a plurality of circuit devices, wherein forming ones of the plurality of first interconnects and a plurality of second interconnects includes embedding memory devices therein. An apparatus including a substrate including a plurality of first interconnects and a plurality of second interconnects on opposite sides of an integrated circuit device layer including a plurality of circuit devices, wherein ones of the plurality of first interconnects and a plurality of second interconnects includes memory devices embedded therein.

Abstract: Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool is described. The BAA includes three distinct aperture arrays of different pitch.

Abstract: Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a layout for a metallization layer of an integrated circuit includes a first region having a plurality of unidirectional lines of a first width and a first pitch and parallel with a first direction. The layout also includes a second region having a plurality of unidirectional lines of a second width and a second pitch and parallel with the first direction, the second width and the second pitch different than the first width and the first pitch, respectively. The layout also includes a third region having a plurality of unidirectional lines of a third width and a third pitch and parallel with the first direction, the third width and the third pitch different than the first and second widths and different than the first and second pitches.

Abstract: Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool is described. The BAA is a non-universal cutter.

Abstract: A method including forming a plurality of first devices and a plurality of first interconnects on a substrate; coupling a second device layer including a plurality of second devices to ones of the plurality of first interconnects, and forming a plurality of second interconnects on the second device layer. An apparatus including a first device layer including a plurality of first circuit devices disposed between a plurality of first interconnects and a plurality of second interconnects and a second device layer including a plurality of second devices juxtaposed and coupled to one of the plurality of first interconnects and the plurality of second interconnects, wherein one of the plurality of first devices and the plurality of second devices include devices having a higher voltage range than the other of the plurality of first devices and the plurality of second devices.

Abstract: Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a method of data compression or data reduction for e-beam tool simplification involves providing an amount of data to write a column field and to adjust the column field for field edge placement error on a wafer, wherein the amount of data is limited to data for patterning approximately 10% or less of the column field. The method also involves performing e-beam writing on the wafer using the amount of data.

Abstract: A method including forming a first substrate including an integrated circuit device layer disposed between a plurality of first interconnects and a plurality of second interconnects; coupling a second substrate including a memory device layer to the first substrate so that the memory device layer is juxtaposed to one of the plurality of first interconnects and the plurality of second interconnects; and removing a portion of the first substrate. An apparatus including a device layer including a plurality of circuit devices disposed between a plurality of first interconnects and a plurality of second interconnects on a substrate; a memory device layer including a plurality of memory devices juxtaposed and coupled to one of the plurality of first interconnects and the plurality of second interconnects; and contacts points coupled to one of ones of the first plurality of interconnects and ones of the second plurality of interconnects.

Abstract: Monolithic 3D ICs employing one or more local inter-level interconnect integrated intimately with at least one structure of at least one transistor on at least one transistor level within the 3D IC. In certain embodiments the local inter-level interconnect intersects a gate electrode or a source/drain region of at least one transistor and extends through at least one inter-level dielectric layer disposed between a first and second transistor level in the 3D IC. Local inter-level interconnects may advantageously make a direct vertical connection between transistors in different levels of the 3D IC without being routed laterally around the footprint (i.e., lateral, or planar, area) of either the overlying or underlying transistor level that is interconnected.

Abstract: An apparatus for scratching and disposing a scratch-off coating that conceals information on a paper is provided. The apparatus includes a panel, one or more scratch tools, a brush and a debris unit. The panel includes a base and a plurality of walls. The plurality of walls is configured along a periphery of the base to form an enclosed area therebetween for accommodating the paper. The paper is accommodated within the enclosed area, and the scratch-off coating is scratched using the one or more scratch tools. The one or more scratch tools are capable of being contained within the panel. Scratching the scratch-off coating forms debris. The debris formed is swept using a brush. The brush is capable of being contained within the panel. The swept debris is received and contained in the debris unit that is coupled to a first wall of the plurality of walls.

Abstract: An apparatus for scratching and disposing a scratch-off coating that conceals information on a paper is provided. The apparatus includes a panel, one or more scratch tools, a brush and a debris unit. The panel includes a base and a plurality of walls. The plurality of walls is configured along a periphery of the base to form an enclosed area therebetween for accommodating the paper. The paper is accommodated within the enclosed area, and the scratch-off coating is scratched using the one or more scratch tools. The one or more scratch tools are capable of being contained within the panel. Scratching the scratch-off coating forms debris. The debris formed is swept using a brush. The brush is capable of being contained within the panel. The swept debris is received and contained in the debris unit that is coupled to a first wall of the plurality of walls.

Abstract: A rheometer for determining the viscoelasticity of a liquid from the mechanical impedance which the liquid presents to an oscillating surface. The incremental power required to maintain a fixed amplitude of oscillation of the surface upon immersion in the liquid is determined. The differential shift in oscillation frequency due to immersion in the liquid is also determined. By relating (i) the incremental oscillation power to mechanical resistance presented by the liquid to the oscillating surface, and (ii) the differential shift in a oscillation frequency to the mechanical reactance presented by the liquid to the oscillating surface, the viscoelasticity of the liquid is determined. Applications include laboratory measurements and process control.

Abstract: A torsional mode rotational vibratory viscometer having an elastic hollow metal sheath extending below a support plate and secured to the plate by a weld. A rigid rod is disposed within the sheath and welded to the lower end of the sheath. An immersible tip is also secured to the lower end of the sheath. The free upper end of the rod extends above the support plate. A crossbar with ends of magnetically permeable material is secured to the free end of the rod and is caused to oscillate by a magnetic drive coil adjacent one end of the crossbar. Prior to mounting of the crossbar, the assembly is subjected to a specific heat treating schedule. A magnetic detector coil adjacent the other end of the crossbar detects the angular oscillation of the rod. Circuitry connected to the coils maintains the amplitude of oscillation of the rod constant. When the tip is immersed in a fluid, the power supplied to the drive coil is determined by the circuit and is a measure of the viscosity-density product of the fluid.

Abstract: A rotational vibratory viscometer-densitometer for in-line process control and similar applications, having an elastic hollow metal tube extending between two clamps, and a relatively rigid transverse yoke secured to the tube at a point midway between the clamps. The yoke has magnetically permeable ends and a magnetically permeable center portion. Electromagnets adjacent one end of the yoke and the center portion thereof interact with the yoke to cause the tube to oscillate simultaneously in torsion and in flexure at the natural frequency of the tube in combination with the fluid within it. The amplitude of torsional oscillation is maintained constant by a torsional detector and control circuit, and the power required to maintain said amplitude is determined, said power being a measure of the viscosity of the fluid flowing through the tube.

Abstract: A torsional mode rotational vibratory viscometer having an elastic hollow metal sheath extending below a support plate and secured to the plate by a weld. A rigid rod is disposed within the sheath and welded to the lower end of the sheath. An immersible tip is also secured to the lower end of the sheath. The free upper end of the rod extends above the support plate. A crossbar with ends of magnetically permeable material is secured to the free end of the rod and is caused to oscillate by a magnetic drive coil adjacent one end of the crossbar. Prior to mounting of the crossbar, the assembly is subjected to a specific heat treating schedule. A magnetic detector coil adjacent the other end of the crossbar detects the angular oscillation of the rod. Circuitry connected to the coils maintains the amplitude of oscillation of the rod constant. When the tip is immersed in a fluid, the power supplied to the drive coil is determined by the circuit and is a measure of the viscosity-density product of the fluid.

Abstract: A rotary viscometer of the type which measures the viscous torque to which a rotating spindle is subjected, by measuring the current drawn by the electric motor driving the spindle. True viscosity, i.e. the slope of the torque-spindle rotation speed curve, is approximated by varying the spindle speed stepwise in sets of speed measurements having a fixed speed difference, and obtaining the difference between the corresponding torque values for each set. By repeating this process throughout the desired speed range, an approximate derivative of the torque-speed curve is obtained, corresponding to an approximation of the true viscosity of the fluid being characterized.

Abstract: A control system for video tape equipment operable to present video tape audio and visual testimony. The control system has a court monitor and a jury monitor connected to a video tape recorder. A control unit interposed in the cables between the video tape recorder and the monitors is operable by a video tape recoder operator to withhold both the audio and visual signals from the monitors. The control unit has a two-position switch having a first position wherein the court monitor and jury monitor simultaneously present the video tape testimony to the court and jury. The switch has a second position wherein the video tape recorder remains activated and both the audio and visual signals are withheld from the court and jury.