Abstract: Disclosed is a polarizing plate including a polarizing film and a protective film provided on the polarizing film, and a display device having the same.

Abstract: An apparatus for measuring a mask error and a method for measuring a mask error are provided. The apparatus for measuring a mask error includes a stage configured to accommodate a reference mask having a reference pattern, and a target mask adjacent to the reference mask such that a mask pattern of the target mask faces the reference pattern, a light source configured to irradiate the first beam onto the reference mask and the target mask, a light receiving unit including an image sensor, and the image sensor configured to receive a composite image including a first image generated from the reference pattern and a second image generated from the mask pattern, and generate a third image from the first image and the second image, and a measuring unit configured to measure an error of the mask pattern from the third image.

Abstract: Provided are a polarizing plate including a polarizing film and protective films provided on both sides of the polarizing film and a display device including the same.

Abstract: A method for measuring a critical dimension of a mask pattern, including generating a mask pattern using an optically proximity-corrected (OPC) mask design including at least one block; measuring a first critical dimension of a target-region of interest (target-ROI) including neighboring blocks having a same critical dimension (CD), in the mask pattern; determining a group region of interest including the target-ROI and at least one neighboring block adjacent to the target-ROI; measuring second CDs of the neighboring blocks of the group region of interest; and correcting a measuring value of the first CD using a measuring value of the second CDs.

Abstract: An apparatus for measuring a mask error and a method for measuring a mask error are provided. The apparatus for measuring a mask error includes a stage configured to accommodate a reference mask having a reference pattern, and a target mask adjacent to the reference mask such that a mask pattern of the target mask faces the reference pattern, a light source configured to irradiate the first beam onto the reference mask and the target mask, a light receiving unit including an image sensor, and the image sensor configured to receive a composite image including a first image generated from the reference pattern and a second image generated from the mask pattern, and generate a third image from the first image and the second image, and a measuring unit configured to measure an error of the mask pattern from the third image.

Abstract: A method for measuring a critical dimension of a mask pattern, including generating a mask pattern using an optically proximity-corrected (OPC) mask design including at least one block; measuring a first critical dimension of a target-region of interest (target-ROI) including neighboring blocks having a same critical dimension (CD), in the mask pattern; determining a group region of interest including the target-ROI and at least one neighboring block adjacent to the target-ROI; measuring second CDs of the neighboring blocks of the group region of interest; and correcting a measuring value of the first CD using a measuring value of the second CDs.

Abstract: Provided are a polarizing plate including a polarizing film and protective films provided on both sides of the polarizing film and a display device including the same.

Abstract: Disclosed is a polarizing plate including a polarizing film and a protective film provided on the polarizing film, and a display device having the same.

Abstract: A tissue interface module has an applicator chamber on a proximal side of the tissue interface module and a tissue acquisition chamber on a distal side of the tissue interface module. The applicator chamber may include: an opening adapted to receive the applicator; an attachment mechanism positioned in the applicator chamber and adapted to attach the tissue interface module to the applicator; a sealing member positioned at a proximal side of the applicator chamber; and a vacuum interface positioned at a proximal side of the applicator chamber and adapted to receive a vacuum inlet positioned on a distal end of the applicator. The invention also includes corresponding methods.

Abstract: In a method of inspecting a mask, an image of a first die in a corrected mask may be obtained. The corrected mask may be corrected using correction data that may include deformation factors related to an exposure process. The first image may be reversely corrected based on correction data. The reversely corrected first image may be compared with a reference image to determine whether the first die may be properly implemented or not.

Abstract: Methods of measuring a mean-to-target (MTT) based on pattern area measurements are provided including providing a design pattern. A plurality of design pattern measurements are measured for calculating an area of the design pattern based on a shape of the design pattern. A series of calculation measurements are calculated by continuously substituting a same variation into the design pattern measurements, and calculating a series of calculation areas corresponding respectively to the calculation measurements to generate a database including the calculation measurements and the calculation areas. An actual pattern is formed using the design pattern and an area of the actual pattern is measured. A calculation area corresponding to the area of the actual pattern is selected from the database and calculation measurements corresponding to the calculation area are selected. A difference between the design pattern measurements and the calculation measurements is calculated and the difference is set as an MTT.

Abstract: An array substrate includes a base substrate and a plurality of pixels on the base substrate. Each pixel includes a data line, first and second gate lines, first to third switching devices, and first and second pixel electrodes. The first and second gate lines cross the data line, and the second gate line is spaced apart from the first gate line. The first switching device is electrically connected to an adjacent gate line corresponding to an adjacent pixel. The second switching device is electrically connected to the data line and the first gate line. The third switching device is electrically connected to the data line and the second gate line. The first pixel electrode is electrically connected to the first and second switching devices, and the second pixel electrode is electrically connected to the first and third switching devices. The second pixel electrode is spaced apart from the first pixel electrode.

Abstract: A display device includes a gate line and a data line aligned on a substrate, wherein the gate line and the data line cross each other to define a pixel area on the substrate, a gate electrode branching from the gate line, a source electrode branching from the data line on the gate electrode, a drain electrode spaced apart from the source electrode, a reflective electrode extending from the drain electrode, wherein the reflective electrode is formed in the pixel area, and an insulating layer pattern formed on the reflective electrode, wherein a protrusion pattern is provided at a surface of the insulating layer pattern.

Abstract: Liquid crystal displays and fabrication methods thereof are provided. The liquid crystal display includes first substrate and second substrate facing the first substrate, and liquid crystal layer interposed therebetween. The first substrate includes a peripheral part spacer of which a surface includes a transparent conductive material, the peripheral part spacer being connected to a common voltage connector of the second substrate. A common voltage is applied to the first substrate through the common voltage connector and the peripheral part spacer. The peripheral part spacer is formed in the same process step with a display part spacer. To provide the peripheral part spacer with conductivity, the surface of the peripheral part spacer is covered with a transparent conductive material in the same process step in which the common electrode is formed on the first substrate.

Abstract: Methods of measuring a mean-to-target (MTT) based on pattern area measurements are provided including providing a design pattern. A plurality of design pattern measurements are measured for calculating an area of the design pattern based on a shape of the design pattern. A series of calculation measurements are calculated by continuously substituting a same variation into the design pattern measurements, and calculating a series of calculation areas corresponding respectively to the calculation measurements to generate a database including the calculation measurements and the calculation areas. An actual pattern is formed using the design pattern and an area of the actual pattern is measured. A calculation area corresponding to the area of the actual pattern is selected from the database and calculation measurements corresponding to the calculation area are selected. A difference between the design pattern measurements and the calculation measurements is calculated and the difference is set as an MTT.

Abstract: The invention provides a LCD including an insulating substrate; a plurality of first signal lines formed on the insulating substrate; a plurality of second signal lines crossing and insulated from the first signal lines; a plurality of thin film transistors (TFT) coupled with the first and second signal lines; and a plurality of pixels including a plurality of first sub-pixel electrodes coupled with the TFTs and a plurality of second sub-pixel electrodes capacitively coupled with the first sub-pixel electrodes, wherein the pixels include a red (R) pixel, a green (G) pixel, and a blue (B) pixel and a voltage ratio or an area ratio of the second sub-pixel electrode with respect to the first sub-pixel electrode is different among the R, G, and B pixels to improve a brightness ratio of R, G, and B components at a lateral position.

Abstract: A photo mask which enhances contrast and a method of fabricating the same are provided. The photo mask includes a transparent substrate and a light shielding layer pattern formed on the transparent substrate. The light shielding layer pattern includes apertures through which the transparent substrate is exposed. Depressions aligned with these apertures extend into the transparent substrate. Light exposed at an angle through the transparent layer would then pass into the depressions and reflect or diffuse from the sidewalls of the depressions and out through the apertures. The etching depth of the depressions is preferably equal to or less than a depth at which threshold intensity of the exposure light is saturated as the etching depth is increased. In another embodiment, the etching depth of the depressions is less than the wavelength of the exposure light.

Abstract: A mask and a method of forming the mask obviate optical proximity effects. The mask includes a light-shielding layer on a transparent substrate. The light-shielding layer is patterned to form a main pattern and a phantom pattern. The main and phantom patterns each have a light shielding portion and a light-transmitting portion. The pitch of the features constituting the phantom pattern is identical to the pitch of the features constituting the main pattern. The shape of the light-transmitting features of the phantom pattern region is identical to the shape of the light-transmitting features of the main pattern region.

Abstract: In an embodiment, a mask inspection apparatus for detecting defects in a semiconductor pattern on a mask includes optics for combining light transmitted through or reflected from the mask with a reference beam. The two light beams are transmitted through a second-order non-linear optical system. Mask defects affect the transmitted/reflected light and may be detected by analyzing the transmitted light intensity. The second-order non-linear optical system amplifies selected elements of the combined beam, thus improving detection.

Abstract: A polarizer includes a polarizing element, a first protective layer and a second protective layer and a surface treatment layer. The first and the second protective layer are formed on opposing sides of the polarizing element. The surface treatment layer is formed on the first protective layer and includes at least two kinds of scattering materials having different refraction indexes from each other. An inside haze value by the scattering materials is in a range of about 25% to about 50%. An outside haze value at the surface of the surface treatment layer is in a range of about 0.1% to about 1%.