Patents by Inventor Dong-Sil Park
Dong-Sil Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20100119847Abstract: A seal structure is provided for an energy storage device. The seal structure includes a sealing glass joining an ion-conducting first ceramic to an electrically insulating second ceramic. The sealing glass has a composition that includes about 48 weight percent silica, about 20 weight percent to about 25 weight percent boria, about 20 weight percent to about 24 weight percent alumina, and about 8 weight percent to about 12 weight percent sodium oxide based on the total weight of the sealing glass composition. A method for making the seal structure is provided. An article comprising the seal structure is also provided.Type: ApplicationFiled: November 13, 2008Publication date: May 13, 2010Applicant: GENERAL ELECTRIC COMPANYInventors: Jian Wu, Dong-Sil Park, Craig Stringer, Sundeep Kumar
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Publication number: 20100120602Abstract: A sealing glass for an energy storage device is provided. The sealing glass includes silicon dioxide, boron oxide, aluminum oxide, sodium oxide and zirconium oxide. Methods for preparing the sealing glass and the energy storage device incorporating the sealing glass are also provided.Type: ApplicationFiled: November 13, 2008Publication date: May 13, 2010Inventors: Dong-Sil Park, Jian Wu, Mamatha Nagesh, Sundeep Kumar, Craig Stringer, Digamber Porob, Vinayak Hassan Vishwanath
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Patent number: 7642122Abstract: A method for growing a nitride crystal and a crystalline composition selected from one of AlN, InGaN, AlGaInN, InGaN, and AlGaNInN is provided. The composition comprises a true single crystal, grown from a single nucleus, at least 1 mm in diameter, free of lateral strain and tilt boundaries, with a dislocation density less than about 104 cm?2.Type: GrantFiled: October 5, 2007Date of Patent: January 5, 2010Assignee: Momentive Performance Materials Inc.Inventors: Steven Alfred Tysoe, Dong-Sil Park, John Thomas Leman, Mark Philip D'Evelyn, Kristi Jean Narang, Huicong Hong
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Patent number: 7638815Abstract: A crystalline composition is provided. The crystalline composition may include gallium and nitrogen; and the crystalline composition may have an infrared absorption peak at about 3175 cm?1, with an absorbance per unit thickness of greater than about 0.01 cm?1.Type: GrantFiled: January 9, 2007Date of Patent: December 29, 2009Assignee: Momentive Performance Materials Inc.Inventors: Mark Philip D'Evelyn, Dong-Sil Park, Steven Francis LeBoeuf, Larry Burton Rowland, Kristi Jean Narang, Huicong Hong, Stephen Daley Arthur, Peter Micah Sandvik
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Patent number: 7582498Abstract: A method may produce a resonant cavity light emitting device. A seed gallium nitride crystal and a source material in a nitrogen-containing superheated fluid may provide a medium for mass transport of gallium nitride precursors therebetween. A seed crystal surface may be prepared by applying a first thermal profile between the seed gallium nitride crystal and the source material. Gallium nitride material may be grown on the prepared surface of the seed gallium nitride crystal by applying a second thermal profile between the seed gallium nitride crystal and the source material while the seed gallium nitride crystal and the source material are in the nitrogen-containing superheated fluid. A stack of group III-nitride layers may be deposited on the single-crystal gallium nitride substrate. The stack may include a first mirror sub-stack and an active region adaptable for fabrication into one or more resonant cavity light emitting devices.Type: GrantFiled: December 6, 2005Date of Patent: September 1, 2009Assignee: Momentive Performance Materials Inc.Inventors: Mark Philip D'Evelyn, Xian-An Cao, Anping Zhang, Steven Francis LeBoeuf, Huicong Hong, Dong-Sil Park, Kristi Jean Narang
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Patent number: 7390534Abstract: A process capable of depositing a diffusion coating of uniform thickness on localized surface regions of a component. The process makes use of an adhesive mixture containing a binding agent that is consumed as part of the deposition process so as not to negatively affect the quality and uniformity of the resulting coating. The process entails mixing a particulate donor material containing a coating element, a dissolved activator, and a particulate filler to form an adhesive mixture having a formable, malleable consistency. The adhesive mixture is applied to a surface of the component, and the component is heated to a temperature sufficient to vaporize and react the activator with the coating element of the donor material, thereby forming a reactive vapor of the coating element. The reactive vapor reacts at the surface of the component to form a diffusion coating containing the coating element.Type: GrantFiled: October 31, 2003Date of Patent: June 24, 2008Assignee: General Electric CompanyInventors: Dong-Sil Park, James Anthony Ruud, Jeffrey Allan Pfaendtner
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Patent number: 7368015Abstract: An apparatus including a crucible, an energy source, and a controller is provided. The crucible may be sealed to a nitrogen-containing gas, and may be chemically inert to at least ammonia at a temperature in a range of about 400 degrees Celsius to about 2500 degrees Celsius. The energy source may supply thermal energy to the crucible. The controller may control the energy source to selectively direct sufficient thermal energy to a predefined first volume within the crucible to attain and maintain a temperature in the first volume to be in a range of from about 400 degrees Celsius to about 2500 degrees Celsius. The thermal energy may be sufficient to initiate, sustain, or both initiate and sustain growth of a crystal in the first volume. The first temperature in the first volume may be controllable separately from a second temperature in another volume within the crucible. The first temperature and the second temperature differ from each other. Associated methods are provided.Type: GrantFiled: October 13, 2005Date of Patent: May 6, 2008Assignee: Momentive Performance Materials Inc.Inventors: Mark Philip D'Evelyn, Dong-Sil Park, Victor Lienkong Lou, Thomas Francis McNulty, Huicong Hong
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Publication number: 20080087919Abstract: A method for growing a nitride crystal and a crystalline composition selected from one of AlN, InGaN, AlGaInN, InGaN, and AlGaNInN is provided. The composition comprises a true single crystal, grown from a single nucleus, at least 1 mm in diameter, free of lateral strain and tilt boundaries, with a dislocation density less than about 104 cm?2.Type: ApplicationFiled: October 5, 2007Publication date: April 17, 2008Inventors: Steven Tysoe, Dong-Sil Park, John Leman, Mark D'Evelyn, Kristi Narang, Huicong Hong
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Publication number: 20080008855Abstract: A crystalline composition is provided. The crystalline composition may include gallium and nitrogen; and the crystalline composition may have an infrared absorption peak at about 3175 cm?1, with an absorbance per unit thickness of greater than about 0.01 cm?1.Type: ApplicationFiled: January 9, 2007Publication date: January 10, 2008Applicant: General Electric CompanyInventors: Mark D'Evelyn, Dong-Sil Park, Steven LeBoeuf, Larry Rowland, Kristi Narang, Huicong Hong, Stephen Arthur, Peter Sandvik
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Publication number: 20080006844Abstract: A crystalline composition is provided that includes gallium and nitrogen. The crystalline composition may have an amount of oxygen present in a concentration of less than about 3×1018 per cubic centimeter, and may be free of two-dimensional planar boundary defects in a determined volume of the crystalline composition. The volume may have at least one dimension that is about 2.75 millimeters or greater, and the volume may have a one-dimensional linear defect dislocation density of less than about 10,000 per square centimeter.Type: ApplicationFiled: January 9, 2007Publication date: January 10, 2008Applicant: General Electric CompanyInventors: Mark D'Evelyn, Dong-Sil Park, Steven LeBoeuf, Larry Rowland, Kristi Narang, Huicong Hong, Stephen Arthur, Peter Sandvik
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Patent number: 7316746Abstract: A method for a growing solid-state, spectrometer grade II-VI crystal using a high-pressure hydrothermal process including the following steps: positioning seed crystals in a growth zone of a reactor chamber; positioning crystal nutrient material in the nutrient zone of the chamber; filling the reactor with a solvent fluid; heating and pressuring the chamber until at least a portion of the nutrient material dissolves in the solvent and the solvent becomes supercritical in the nutrient zone; transporting supercritical from the nutrient zone to the growth zone, and growing the seed crystals as nutrients from the supercritical fluid deposit on the crystals.Type: GrantFiled: March 18, 2005Date of Patent: January 8, 2008Assignee: General Electric CompanyInventors: Mark Philip D'Evelyn, Dong-Sil Park, John Thomas Leman
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Publication number: 20070215887Abstract: There is provided a GaN single crystal at least about 2.75 millimeters in diameter, with a dislocation density less than about 104 cm?1, and having substantially no tilt boundaries. A method of forming a GaN single crystal is also disclosed. The method includes providing a nucleation center, a GaN source material, and a GaN solvent in a chamber. The chamber is pressurized. First and second temperature distributions are generated in the chamber such that the solvent is supersaturated in the nucleation region of the chamber. The first and second temperature distributions have different temperature gradients within the chamber.Type: ApplicationFiled: October 26, 2006Publication date: September 20, 2007Applicant: General Electric CompanyInventors: Mark Philip D'Evelyn, Dong-Sil Park, Steven Francis LeBoeuf, Larry Burton Rowland, Kristi Jean Narang, Huicong Hong, Peter Micah Sandvik
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Publication number: 20070181056Abstract: A method for a growing solid-state, spectrometer grade II-VI crystal using a high-pressure hydrothermal process including the following steps: positioning seed crystals in a growth zone of a reactor chamber; positioning crystal nutrient material in the nutrient zone of the chamber; filling the reactor with a solvent fluid; heating and pressuring the chamber until at least a portion of the nutrient material dissolves in the solvent and the solvent becomes supercritical in the nutrient zone; transporting supercritical from the nutrient zone to the growth zone, and growing the seed crystals as nutrients from the supercritical fluid deposit on the crystals.Type: ApplicationFiled: April 11, 2007Publication date: August 9, 2007Applicant: GENERAL ELECTRIC COMPANYInventors: Mark D'Evelyn, Dong-Sil Park, John Leman
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Publication number: 20070178039Abstract: A method for a growing solid-state, spectrometer grade II-VI crystal using a high-pressure hydrothermal process including the following steps: positioning seed crystals in a growth zone of a reactor chamber; positioning crystal nutrient material in the nutrient zone of the chamber; filling the reactor with a solvent fluid; heating and pressuring the chamber until at least a portion of the nutrient material dissolves in the solvent and the solvent becomes supercritical in the nutrient zone; transporting supercritical from the nutrient zone to the growth zone, and growing the seed crystals as nutrients from the supercritical fluid deposit on the crystals.Type: ApplicationFiled: April 11, 2007Publication date: August 2, 2007Applicant: GENERAL ELECTRIC COMPANYInventors: Mark D'Evelyn, Dong-Sil Park, John Leman
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Publication number: 20070158785Abstract: A crystal comprising gallium nitride is disclosed. The crystal has at least one grain having at least one dimension greater than 2.75 mm, a dislocation density less than about 104 cm?2, and is substantially free of tilt boundaries.Type: ApplicationFiled: November 13, 2006Publication date: July 12, 2007Applicant: General Electric CompanyInventors: Mark D'Evelyn, Dong-Sil Park, Steven LeBoeuf, Larry Rowland, Kristi Narang, Huicong Hong, Stephen Arthur, Peter Sandvik
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Publication number: 20070151509Abstract: A composition including a polycrystalline metal nitride having a number of grains is provided. These grains have a columnar structure with one or more properties such as, an average grain size, a tilt angle, an impurity content, a porosity, a density, and an atomic fraction of the metal in the metal nitride. An apparatus for preparing a metal nitride is provided. The apparatus may include a housing having an interior surface that defines a chamber and an energy source to supply energy to the chamber. A first inlet may be provided to flow a nitrogen-containing gas into the chamber. Raw materials may be introduced into the chamber through a raw material inlet. A second inlet may be provided to flow in a halide-containing gas in the chamber. The apparatus may further include a controller, which communicates with the various components of the apparatus such as, sensors, valves, and energy source, and may optimize and control the reaction.Type: ApplicationFiled: December 20, 2005Publication date: July 5, 2007Applicant: General Electric CompanyInventors: Dong-Sil Park, Mark D'Evelyn, Myles Peterson, John Leman, Joell Hibshman, Fred Sharifi
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Publication number: 20070141819Abstract: A method of making a metal nitride is provided. The method may include introducing a metal in a chamber. A nitrogen-containing material may be flowed into the chamber. Further, a hydrogen halide may be introduced. The nitrogen-containing material may react with the metal in the chamber to form the metal nitride.Type: ApplicationFiled: December 20, 2005Publication date: June 21, 2007Applicant: General Electric CompanyInventors: Dong-Sil Park, Mark D'Evelyn, Myles Peterson, John Leman, Joell Hibshman, Fred Sharifi
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Publication number: 20070142204Abstract: A composition including a polycrystalline metal nitride having a number of grains is provided. These grains have a columnar structure with one or more properties such as, an average grain size, a tilt angle, an impurity content, a porosity, a density, and an atomic fraction of the metal in the metal nitride.Type: ApplicationFiled: December 20, 2005Publication date: June 21, 2007Applicant: General Electric CompanyInventors: Dong-Sil Park, Mark D'Evelyn, Myles Peterson, John Leman, Fred Sharifi
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Publication number: 20070040181Abstract: A crystalline composition is provided that includes gallium and nitrogen. The crystalline composition may have an amount of oxygen present in a concentration of less than about 3×1018 per cubic centimeter, and may be free of two-dimensional planar boundary defects in a determined volume of the crystalline composition. The volume may have at least one dimension that is about 2.75 millimeters or greater, and the volume may have a one-dimensional linear defect dislocation density of less than about 10,000 per square centimeter.Type: ApplicationFiled: March 15, 2006Publication date: February 22, 2007Applicant: General Electric CompanyInventors: Mark D'Evelyn, Dong-Sil Park, Steven LeBoeuf, Larry Rowland, Kristi Narang, Huicong Hong, Stephen Arthur, Peter Sandvik
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Publication number: 20070023142Abstract: An airfoil refurbishment system is disclosed. The airfoil refurbishment system includes an environmentally safe stripper system and an aluminiding system. The environmentally safe stripper system includes a transportable environmentally safe compound that is capable of partially removing an aluminide coating from an airfoil. The aluminiding system is capable of restoring the aluminide coating to the airfoil.Type: ApplicationFiled: September 28, 2006Publication date: February 1, 2007Inventors: John LaGraff, James Ruud, Dong-Sil Park, Leo MacDonald, John Bottoms, Claudino Koakowski