Patents by Inventor Dongwan Kim

Dongwan Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11912610
    Abstract: A coating composition, coating glass and a method for preparation thereof, and a cooking appliance including the coating class are described. The coating composition includes a coating material and a heat conductive oxide nano powder that is 5 to 10 wt % with respect to a weight of the coating material. The coating composition provides an excellent infrared reflective function, a high transmittance, and an excellent cleaning performance.
    Type: Grant
    Filed: July 31, 2020
    Date of Patent: February 27, 2024
    Assignees: LG Electronics Inc., KONGJU NATIONAL UNIVERSITY INDUSTRY-UNIVERSITY COOPERATION FOUNDATION
    Inventors: Taeho Kim, Dongwan Seo, Yongsoo Lee, Taehee Kim, Ju Hyeong Kim, Woon-Jin Chung, Hansol Lee, In-Gun Kim
  • Publication number: 20240009159
    Abstract: The present invention relates to an antiviral composition for Betacoronavirus comprising rhein and meclofenamic acid as active components. When the antiviral composition of the present invention is used, an antiviral effect is demonstrated whereby the viral RNA level of SARS-CoV-2 and HCoV-OC43 is suppressed, and thus it is possible to treat or prevent COVID-19 or a cold.
    Type: Application
    Filed: February 1, 2021
    Publication date: January 11, 2024
    Inventors: V. Narry KIM, Dongwan KIM, Hyunjoon KIM
  • Patent number: 11774846
    Abstract: Phase shift masks for an extreme ultraviolet lithography process includes a substrate, a reflection layer on the substrate, a capping layer on the reflection layer, and phase shift patterns on the capping layer. Each of the phase shift patterns may include a lower absorption pattern on the capping layer and an upper absorption pattern on the lower absorption pattern. A refractive index of the upper absorption pattern may be higher than a refractive index of the lower absorption pattern, and a thickness of the upper absorption pattern is smaller than a thickness of the lower absorption pattern.
    Type: Grant
    Filed: September 21, 2022
    Date of Patent: October 3, 2023
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Seongsue Kim, Dongwan Kim, Hwanseok Seo
  • Publication number: 20230186031
    Abstract: An electronic device including an input device, a processor, and a memory that stores instructions are provided. The instructions, when executed by the processor, cause the electronic device to obtain a natural language input by using the input device, to convert the natural language input into first input data, to identify data corresponding to at least part of the natural language input in a specified type of data included in the memory, to generate second input data based on the identification result, and to determine at least one task according to the natural language input based on the first input data and the second input data.
    Type: Application
    Filed: December 12, 2022
    Publication date: June 15, 2023
    Inventors: Juwhan KIM, Kibeom KIM, Dasom KIM, Dongwan KIM, Sangmin PARK, Hyejung SON, Yoonju LEE
  • Publication number: 20230186938
    Abstract: An audio signal processing method including obtaining a first audio signal by generating a pattern in association with the first audio signal to be output, outputting the first audio signal, receiving, through an external voice input device while the external voice input device is communicatively connected to the audio signal processing device, a second audio signal including the output first audio signal, detecting the pattern from the second audio signal, and synchronizing the second audio signal with the first audio signal based on the pattern detected from the second audio signal and the pattern included in the first audio signal.
    Type: Application
    Filed: February 2, 2023
    Publication date: June 15, 2023
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kyuhyun CHO, Youngin PARK, Myungjae KIM, Dongwan KIM, Heeseok JEONG
  • Publication number: 20230145476
    Abstract: A chuck assembly includes a chuck base including a lower base and an upper base that is on the lower base, a ceramic plate on the upper base, an isolator ring enclosing an outer sidewall of the lower base, a focus ring on an edge portion of the lower base and the isolator ring, the focus ring enclosing an outer sidewall of the upper base, and a pad that is between the edge portion of the lower base and the focus ring. The pad may contain a nonmetal conductive material.
    Type: Application
    Filed: June 6, 2022
    Publication date: May 11, 2023
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Seongha JEONG, Kyung-Sun KIM, Dongwan KIM, Donghyeon NA, Dougyong SUNG, Myeongsoo SHIN, Ungyo JUNG
  • Publication number: 20230108547
    Abstract: A semiconductor device including a substrate including a trench; an isolation structure including an inner wall oxide layer pattern, a liner pattern, and a filling insulation pattern stacked in the trench; and a gate structure on the substrate and the isolation structure, wherein the inner wall oxide layer pattern and the liner pattern are conformally formed on a surface of the trench, a top surface of the inner wall oxide layer pattern is lower than an upper surface of the substrate, and a boundary between an upper surface of the inner wall oxide layer pattern and an upper surface of the liner pattern has no step difference.
    Type: Application
    Filed: July 7, 2022
    Publication date: April 6, 2023
    Inventors: Jihoon CHANG, Sooho SHIN, Dongwan KIM, Dongsik PARK, Chansic YOON, Hyeonwoo JANG
  • Publication number: 20230081831
    Abstract: Insulation structures, insulated piping devices including the same, and methods of fabricating the same are disclosed. The insulation structure includes a first insulation layer on an outer surface of a pipe, a second insulation layer on an outer surface of the first insulation layer that includes a material different from a material of the first insulation layer, and a third insulation layer on an outer surface of the second insulation layer that includes a material different from the material of the second insulation layer. A thickness of the second insulation layer is greater than a thickness of the first insulation layer and a thickness of the third insulation layer. The second insulation layer includes a porous foam.
    Type: Application
    Filed: July 13, 2022
    Publication date: March 16, 2023
    Applicant: Technical Coating Solution LINE-X Co., Ltd.
    Inventors: Dongwan Kim, Jeong-Hyun Kim, Seung-Hyeok An, Saya Lee, Yoong Chung, Jiho Jeon, Yongjun Cho, Injun Choi
  • Publication number: 20230081558
    Abstract: An electronic device receives a voice input, and determines whether the voice input is matched with a natural language understanding (NLU) model for determining the presence or absence of a verb. The electronic device further identifies a display context object associated with the voice input based on the voice input being matched with the NLU model. The electronic device calculates a similarity value between the voice input and the display context object, and update a user interface (UI) depending on the calculated the similarity values.
    Type: Application
    Filed: September 14, 2022
    Publication date: March 16, 2023
    Inventors: Yoonju LEE, Dongwan KIM, Juwhan KIM, Yoonjae PARK
  • Patent number: 11600275
    Abstract: An electronic device performing voice recognition on user utterance based on first voice assistance. The electronic device may receive information on recognition characteristic of second voice assistance for user utterance from an external device and adjust recognition characteristic of the first voice assistance based on the information on the recognition characteristic of the second voice assistance.
    Type: Grant
    Filed: November 24, 2020
    Date of Patent: March 7, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventor: Dongwan Kim
  • Publication number: 20230018819
    Abstract: Phase shift masks for an extreme ultraviolet lithography process includes a substrate, a reflection layer on the substrate, a capping layer on the reflection layer, and phase shift patterns on the capping layer. Each of the phase shift patterns may include a lower absorption pattern on the capping layer and an upper absorption pattern on the lower absorption pattern. A refractive index of the upper absorption pattern may be higher than a refractive index of the lower absorption pattern, and a thickness of the upper absorption pattern is smaller than a thickness of the lower absorption pattern.
    Type: Application
    Filed: September 21, 2022
    Publication date: January 19, 2023
    Inventors: Seongsue Kim, Dongwan Kim, Hwanseok Seo
  • Patent number: 11527247
    Abstract: Provided are a computing device and a method of operating the same. The computing device may include a memory storing one or more instructions, and a processor configured to execute the one or more instructions stored in the memory to recognize a trigger word for another voice assistant, and analyze a response of the other voice assistant to a speech given to the other voice assistant. The computing device simulates an operation performed to correspond to the speech, and performs a subsequent operation, based on a result of the simulating and a result of the analyzing of the response of the other voice assistant.
    Type: Grant
    Filed: December 16, 2020
    Date of Patent: December 13, 2022
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventor: Dongwan Kim
  • Patent number: 11487197
    Abstract: Phase shift masks for an extreme ultraviolet lithography process includes a substrate, a reflection layer on the substrate, a capping layer on the reflection layer, and phase shift patterns on the capping layer. Each of the phase shift patterns may include a lower absorption pattern on the capping layer and an upper absorption pattern on the lower absorption pattern. A refractive index of the upper absorption pattern may be higher than a refractive index of the lower absorption pattern, and a thickness of the upper absorption pattern is smaller than a thickness of the lower absorption pattern.
    Type: Grant
    Filed: December 14, 2020
    Date of Patent: November 1, 2022
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Seongsue Kim, Dongwan Kim, Hwanseok Seo
  • Publication number: 20220220483
    Abstract: The present invention relates to a technology for preventing or treating virus infection and infectious disease by inducing a mixed tailing regarding an RNA virus.
    Type: Application
    Filed: June 1, 2020
    Publication date: July 14, 2022
    Inventors: V. Narry KIM, Jinah YEO, Dongwan KIM, Young-Suk LEE, Soo-Jin JUNG
  • Publication number: 20220148189
    Abstract: Methods and systems for training a model include combining data from multiple datasets, the datasets having different respective label spaces. Relationships between labels in the different label spaces are identified. A unified neural network model is trained, using the combined data and the identified relationships to generate a unified model, with a class relational binary cross-entropy loss.
    Type: Application
    Filed: November 5, 2021
    Publication date: May 12, 2022
    Inventors: Yi-Hsuan Tsai, Masoud Faraki, Yumin Suh, Sparsh Garg, Manmohan Chandraker, Dongwan Kim
  • Publication number: 20210318608
    Abstract: Phase shift masks for an extreme ultraviolet lithography process includes a substrate, a reflection layer on the substrate, a capping layer on the reflection layer, and phase shift patterns on the capping layer. Each of the phase shift patterns may include a lower absorption pattern on the capping layer and an upper absorption pattern on the lower absorption pattern. A refractive index of the upper absorption pattern may be higher than a refractive index of the lower absorption pattern, and a thickness of the upper absorption pattern is smaller than a thickness of the lower absorption pattern.
    Type: Application
    Filed: December 14, 2020
    Publication date: October 14, 2021
    Inventors: SEONGSUE KIM, DONGWAN KIM, HWANSEOK SEO
  • Publication number: 20210193142
    Abstract: Provided are a computing device and a method of operating the same. The computing device may include a memory storing one or more instructions, and a processor configured to execute the one or more instructions stored in the memory to recognize a trigger word for another voice assistant, and analyze a response of the other voice assistant to a speech given to the other voice assistant. The computing device simulates an operation performed to correspond to the speech, and performs a subsequent operation, based on a result of the simulating and a result of the analyzing of the response of the other voice assistant.
    Type: Application
    Filed: December 16, 2020
    Publication date: June 24, 2021
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventor: Dongwan KIM
  • Publication number: 20210158819
    Abstract: Disclosed is an electronic device performing voice recognition on user utterance based on first voice assistance. The electronic device may receive information on recognition characteristic of second voice assistance for user utterance from an external device and adjust recognition characteristic of the first voice assistance based on the information on the recognition characteristic of the second voice assistance.
    Type: Application
    Filed: November 24, 2020
    Publication date: May 27, 2021
    Applicant: Samsung Electronics Co., Ltd.
    Inventor: Dongwan KIM
  • Patent number: 9782469
    Abstract: The present invention relates to an anti-inflammatory, skin-regenerative, whitening, antioxidant, or wound-healing composition containing a culture medium of adipose-derived stem cell-T (ADSC-T) cells as an active ingredient, in which T-antigen is introduced into an adipose-derived stem cell. The culture medium of ADSC-T cells, according to the present invention, has remarkable effects for treating or inhibiting inflammation by alleviating atopic dermatitis, which is an autoimmune disease, and inhibiting NF-?B activities through an increase of an I?b? expression. Additionally, the culture medium, according to the present invention, exhibits: excellent skin regenerative effects by having effects of enhancing skin collagen elasticity and reducing wounds, in a collagen culture; excellent skin whitening effects by inhibiting tyrosinase activities and melanin production; and excellent anti-oxidation effects by inhibiting DPPH radical activities.
    Type: Grant
    Filed: August 29, 2013
    Date of Patent: October 10, 2017
    Assignee: CHANGWON NATIONAL UNIVERSITY INDUSTRY ACADEMY COOPERATION CORPS
    Inventors: Dongwan Kim, Han Na Park, Gyu Bin Kim
  • Publication number: 20160074499
    Abstract: The present invention relates to an anti-inflammatory, skin-regenerative, whitening, antioxidant, or wound-healing composition containing a culture medium of adipose-derived stem cell-T (ADSC-T) cells as an active ingredient, in which T-antigen is introduced into an adipose-derived stem cell. The culture medium of ADSC-T cells, according to the present invention, has remarkable effects for treating or inhibiting inflammation by alleviating atopic dermatitis, which is an autoimmune disease, and inhibiting NF-?B activities through an increase of an I?b? expression. Additionally, the culture medium, according to the present invention, exhibits: excellent skin regenerative effects by having effects of enhancing skin collagen elasticity and reducing wounds, in a collagen culture; excellent skin whitening effects by inhibiting tyrosinase activities and melanin production; and excellent anti-oxidation effects by inhibiting DPPH radical activities.
    Type: Application
    Filed: August 29, 2013
    Publication date: March 17, 2016
    Applicant: Changwon National University Industry Academy Cooperation Corps
    Inventors: Dongwan KIM, Han N. PARK, Gyu B. KIM