Patents by Inventor Dong Zhou

Dong Zhou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12295154
    Abstract: A wide bandgap semiconductor structure for an irradiation characteristic test includes a substrate with metal plates and a wide bandgap semiconductor part. The wide bandgap semiconductor part includes a gallium nitride layer, a barrier layer, P-type gallium nitride layers, source ohmic metal layers, and drain ohmic metal layers. The P-type gallium nitride layers are connected to a gate interconnection metal layer via gate metal layers and metal lead wires. A gate top metal layer is provided on the gate interconnection metal layer. Each source ohmic metal layer is provided with a source interconnection metal layer and source top metal layers. Each drain ohmic metal layer is provided with a drain interconnection metal layer and drain top metal layers. The wide bandgap semiconductor part is connected to the metal plates through the source top metal layers, the drain top metal layers, and the gate top metal layer.
    Type: Grant
    Filed: December 30, 2024
    Date of Patent: May 6, 2025
    Assignee: NANJING UNIVERSITY
    Inventors: Feng Zhou, Yu Rong, Hai Lu, Weizong Xu, Dong Zhou, Fangfang Ren
  • Patent number: 12287360
    Abstract: The present invention discloses a GaN HEMT device for irradiation damage detection which comprises a substrate layer, a gallium nitride layer, a barrier layer and a dielectric layer. A p-type gallium nitride layer is provided on the barrier layer. A drain and a source are respectively located at an inner side and an outer side of the p-type gallium nitride layer and provided on the gallium nitride layer. A Schottky metal layer is provided on the p-type gallium nitride layer. A first ohmic metal layer and a second ohmic metal layer are respectively located at an inner side and an outer side of the p-type gallium nitride layer and provided on the barrier layer. The second ohmic metal layer includes inner gear electrodes and outer gear electrodes, which are interdigital with each other.
    Type: Grant
    Filed: December 30, 2024
    Date of Patent: April 29, 2025
    Assignee: NANJING UNIVERSITY
    Inventors: Feng Zhou, Can Zou, Hai Lu, Weizong Xu, Dong Zhou, Fangfang Ren
  • Publication number: 20250126824
    Abstract: The present invention discloses a GaN HEMT transistor with impact energy release capability for use in aerospace irradiation environment and preparation method thereof. The transistor includes a substrate layer, a gallium nitride layer, a barrier layer, and a gate structure successively arranged from bottom to top. The gallium nitride layers on both sides of the barrier layer are respectively provided with a source electrode and a drain electrode on the top surface. The gate structure is located near the source electrode and includes a p-type gallium nitride layer, a dielectric layer, an Ohmic metal pillar, and a Schottky metal layer. The present invention solves the breakdown problem caused by the inability to release impact energy during the switching process by introducing an asymmetric multi-integrated gate structure.
    Type: Application
    Filed: April 26, 2024
    Publication date: April 17, 2025
    Inventors: FENG ZHOU, YU RONG, HAI LU, WEIZONG XU, DONG ZHOU, FANGFANG REN
  • Patent number: 12237433
    Abstract: Disclosed are a double-sided solar cell and a preparation method therefor. The double-sided solar cell comprises: a silicon wafer having a PN junction, and a front first silicon oxide layer, a front second silicon oxide layer, a front first nitrogen-containing silicon compound layer, a front second nitrogen-containing silicon compound layer, and a front third silicon oxide layer that are located on one side of an N-type layer of the silicon wafer and are sequentially stacked along a direction away from the silicon wafer; and a passivation layer, a back silicon oxide layer, a back first nitrogen-containing silicon compound layer, and a back second nitrogen-containing silicon compound layer that are located on one side of a P-type layer of the silicon wafer and are sequentially stacked along the direction away from the silicon wafer.
    Type: Grant
    Filed: April 19, 2021
    Date of Patent: February 25, 2025
    Assignee: HENGDIAN GROUP DMEGC MAGNETICS CO., LTD
    Inventors: Yong Ren, Yue He, Hailiang Ren, Shuai Guo, Lei Zhang, Dong Zhou, Deshuang Chen
  • Patent number: 12200144
    Abstract: A method for upgrading a certificate of a POS terminal, a server, a POS terminal and a terminal device are provided, this method includes: performing a mutual authentication with the POS terminal when receiving a certificate upgrading request sent from the POS terminal; and encapsulating the certificate to be upgraded in a preset proprietary protocol format to obtain update data, using a session key to encrypt the update data to obtain a ciphertext and sending the ciphertext to the POS terminal, after the mutual authentication is passed. According to the present application, a problem that it is inconvenient to use the existing certificate update methods, much time needs to be consumed, and transportation cost is increased may be solved.
    Type: Grant
    Filed: November 7, 2019
    Date of Patent: January 14, 2025
    Assignee: SHENZHEN ZOLON TECHNOLOGY CO., LTD.
    Inventors: Chuanxi Wang, Dong Zhou, Zhenwei Sun, Saifeng Deng
  • Publication number: 20240421919
    Abstract: A power measurement method and apparatus, and a storage medium and a program product are disclosed. The power measurement method may include: acquiring a signal power and a signal wavelength of a measurement signal transmitted by a base station under test; calculating an equivalent isotropic radiated power of the measurement signal according to the signal power and the signal wavelength; and calculating a total radiated power of a carrier signal of the base station under test according to the equivalent isotropic radiated power of the measurement signal, a preset target direction parameter and a preset power ratio factor.
    Type: Application
    Filed: November 24, 2022
    Publication date: December 19, 2024
    Applicant: ZTE Corporation
    Inventors: Jiangtao Chen, Dong Zhou, Longming Zhu, Liyuan Zhong, Dao Tian
  • Patent number: 12154290
    Abstract: A field wheat stem tillering number extraction method, including: acquiring field wheat point clouds by means of a LiDAR, and extracting any row of wheat point clouds in a research area; projecting a Y axis to a plane, and retaining an X and Z axis; applying adaptive layering to obtain number of clusters of the wheat row; applying hierarchical clustering analysis to obtain tillering number of each wheat cluster; and further obtaining stem tillering number of the whole wheat row, so as to extract a field wheat stem tillering number. The feasibility of an algorithm is verified by comparing the wheat stem tillering number extracted by means of the method with an actually measured field stem tillering number, and the method realizes rapid, accurate and nondestructive extraction of a large-field crop stem tillering number and provides theoretical basis and technical support for extraction of the field wheat stem tillering number.
    Type: Grant
    Filed: March 20, 2020
    Date of Patent: November 26, 2024
    Assignee: NANJING AGRICULTURAL UNIVERSITY
    Inventors: Xia Yao, Tai Guo, Xiaohu Zhang, Yan Zhu, Hengbiao Zheng, Tao Cheng, Yongchao Tian, Weixin Cao, Caili Guo, Yu Zhang, Jifeng Ma, Rui Huang, Jie Zhu, Hongxu Ai, Chongya Jiang, Dong Zhou
  • Patent number: 12146908
    Abstract: The present invention discloses an in-situ testing system for semiconductor device in aerospace irradiation environment. The present invention includes a static testing unit, a static testing channel, a dynamic testing unit, a dynamic testing channel, and a channel switching control unit; the static testing unit is connected to the device under test through the static testing channel, and is used to output static testing signals and display the static testing data of the device under test; the dynamic testing unit is connected to the device under test through the dynamic testing channel, and is used to output dynamic testing signals and display the dynamic testing data of the device under test; the channel switching control unit is connected to the static testing channel and the dynamic testing channel, respectively. This invention can achieve static, dynamic, and degradation testing of third-generation semiconductor device in aerospace irradiation environment.
    Type: Grant
    Filed: April 10, 2024
    Date of Patent: November 19, 2024
    Assignee: NANJING UNIVERSITY
    Inventors: Feng Zhou, Wenfeng Wang, Hai Lu, Weizong Xu, Dong Zhou, Fangfang Ren
  • Patent number: 12080821
    Abstract: The present invention discloses a novel silicon carbide-based lateral PN junction extreme ultraviolet detector with enhanced detection performance based on selective-area ion implantation, including an N-type ohmic contact lower electrode, an N-type substrate and a lightly-doped epitaxial layer which are connected sequentially from bottom to top, where the lightly-doped epitaxial layer is an N-type lightly-doped epitaxial layer or a P-type lightly-doped epitaxial layer; in a case that the lightly-doped epitaxial layer is an N-type or P-type lightly-doped epitaxial layer, a P-type or N-type well region is formed on the surface of the N-type or P-type lightly-doped epitaxial layer through the selective-area ion implantation, a P-type or N-type ohmic contact upper electrode is arranged on the P-type or N-type well region, and the P-type or N-type ohmic contact upper electrode is provided with a metal conductive electrode along its periphery.
    Type: Grant
    Filed: February 27, 2024
    Date of Patent: September 3, 2024
    Assignee: NANJING UNIVERSITY
    Inventors: Hai Lu, Dong Zhou, Weizong Xu
  • Publication number: 20240221279
    Abstract: A sliced graphics processing unit (GPU) architecture in processor-based devices is disclosed. In some aspects, a GPU based on a sliced GPU architecture includes multiple hardware slices. The GPU further includes a sliced low-resolution Z buffer (LRZ) that is communicatively coupled to each hardware slice of the plurality of hardware slices, and that comprises a plurality of LRZ regions. Each hardware slice is configured to store, in an LRZ region corresponding exclusively to the hardware slice among the plurality of LRZ regions, a pixel tile assigned to the hardware slice.
    Type: Application
    Filed: March 19, 2024
    Publication date: July 4, 2024
    Inventors: Xuefeng Tang, Jian Liang, Tao Wang, Dong Zhou
  • Publication number: 20240204126
    Abstract: The present invention discloses a novel silicon carbide-based lateral PN junction extreme ultraviolet detector with enhanced detection performance based on selective-area ion implantation, including an N-type ohmic contact lower electrode, an N-type substrate and a lightly-doped epitaxial layer which are connected sequentially from bottom to top, where the lightly-doped epitaxial layer is an N-type lightly-doped epitaxial layer or a P-type lightly-doped epitaxial layer; in a case that the lightly-doped epitaxial layer is an N-type or P-type lightly-doped epitaxial layer, a P-type or N-type well region is formed on the surface of the N-type or P-type lightly-doped epitaxial layer through the selective-area ion implantation, a P-type or N-type ohmic contact upper electrode is arranged on the P-type or N-type well region, and the P-type or N-type ohmic contact upper electrode is provided with a metal conductive electrode along its periphery.
    Type: Application
    Filed: February 27, 2024
    Publication date: June 20, 2024
    Applicant: NANJING UNIVERSITY
    Inventors: Hai LU, Dong ZHOU, Weizong XU
  • Publication number: 20240014340
    Abstract: Disclosed are a double-sided solar cell and a preparation method therefor. The double-sided solar cell comprises: a silicon wafer having a PN junction, and a front first silicon oxide layer, a front second silicon oxide layer, a front first nitrogen-containing silicon compound layer, a front second nitrogen-containing silicon compound layer, and a front third silicon oxide layer that are located on one side of an N-type layer of the silicon wafer and are sequentially stacked along a direction away from the silicon wafer; and a passivation layer, a back silicon oxide layer, a back first nitrogen-containing silicon compound layer, and a back second nitrogen-containing silicon compound layer that are located on one side of a P-type layer of the silicon wafer and are sequentially stacked along the direction away from the silicon wafer.
    Type: Application
    Filed: April 19, 2021
    Publication date: January 11, 2024
    Applicant: HENGDIAN GROUP DMEGC MAGNETICS CO., LTD
    Inventors: Yong Ren, Yue He, Hailiang Ren, Shuai Guo, Lei Zhang, Dong Zhou, Deshuang Chen
  • Publication number: 20230411901
    Abstract: An The integrated waterproof seal connector has a metal snap-fit member, a plastic support member, a rubber tube, and a supporting tube member. The rubber tube has a first hollow structure portion, connected to a second hollow structure portion through a connecting portion. The supporting member tube is detachably disposed in the first hollow structure portion. The metal snap-fit member is detachably disposed in the plastic support member, and a press type clamping structure portion is arranged on an end of the metal snap-fit member and can be stuck to a wall of the plastic support member. The plastic support member is disposed in the second hollow structure portion. A first end of the second hollow structure portion is provided with a seal structure for sealing a connecting port of a device. A stuck structure protrudes from the first end of the second hollow structure portion.
    Type: Application
    Filed: July 6, 2021
    Publication date: December 21, 2023
    Inventors: Bin SONG, Dong ZHOU, Dongdong ZHU
  • Publication number: 20230353390
    Abstract: A method for upgrading a certificate of a POS terminal, a server, a POS terminal and a terminal device are provided, this method includes: performing a mutual authentication with the POS terminal when receiving a certificate upgrading request sent from the POS terminal; and encapsulating the certificate to be upgraded in a preset proprietary protocol format to obtain update data, using a session key to encrypt the update data to obtain a ciphertext and sending the ciphertext to the POS terminal, after the mutual authentication is passed. According to the present application, a problem that it is inconvenient to use the existing certificate update methods, much time needs to be consumed, and transportation cost is increased may be solved.
    Type: Application
    Filed: November 7, 2019
    Publication date: November 2, 2023
    Inventors: Chuanxi WANG, Dong ZHOU, Zhenwei SUN, Saifeng DENG
  • Patent number: 11770905
    Abstract: Disclosed are a method, system and device for manufacturing a printed circuit board, and a computer storage medium. The method comprises: acquiring a printed circuit board to be manufactured which includes a via hole; acquiring shape information of the via hole; acquiring connection information of circuit layers in said printed circuit board; assembling preset conducting devices according to the connection information and the shape information, so as to obtain a target conducting device that matches the connection information and the shape information; guiding the target conducting device into the via hole to obtain a conducting printed circuit board; and connecting the conducting printed circuit board to obtain a target printed circuit board, wherein the types of the preset conducting devices comprise a metal conducting device, a non-metal conducting device and a semi-metal conducting device.
    Type: Grant
    Filed: February 23, 2021
    Date of Patent: September 26, 2023
    Assignee: INSPUR SUZHOU INTELLIGENT TECHNOLOGY CO., LTD.
    Inventor: Dong Zhou
  • Patent number: 11757087
    Abstract: Methods are provided for forming an electrode. The method can comprise thermally reducing GeO2 powders at a reducing temperature of 300° C. to 600° C. to produce Ge particles; mixing the Ge particles with an organic binder and a carbon source; and pressing the Ge particles with the binder and the carbon source to form the electrode. Electrodes are also provided that include a plurality of microparticles comprising Ge grains, an organic binder, and a carbon source, wherein the Ge grains comprise cubic Ge and are bonded together to form Ge particles, and wherein the Ge grains define nanopores within the electrode.
    Type: Grant
    Filed: February 3, 2021
    Date of Patent: September 12, 2023
    Assignee: University of South Carolina
    Inventors: Xiao-Dong Zhou, Kuber Mishra, Fu-Sheng Ke
  • Patent number: 11707538
    Abstract: Described herein are methods and devices that allow the generation of [F-18]triflyl fluoride and other [F-18] sulfonyl fluorides (such as [F-18]tosyl fluoride) in a manner that is suitable for radiosynthesis of F-18 labeled radiopharmaceuticals using currently available synthesis modules.
    Type: Grant
    Filed: January 15, 2021
    Date of Patent: July 25, 2023
    Assignee: Washington University
    Inventor: Dong Zhou
  • Patent number: 11704776
    Abstract: Depth information can be used to assist with image processing functionality, such as image stabilization and blur reduction. In at least some embodiments, depth information obtained from stereo imaging or distance sensing, for example, can be used to determine a foreground object and background object(s) for an image or frame of video. The foreground object then can be located in later frames of video or subsequent images. Small offsets of the foreground object can be determined, and the offset accounted for by adjusting the subsequent frames or images. Such an approach provides image stabilization for at least a foreground object, while providing simplified processing and reduce power consumption. Similarly processes can be used to reduce blur for an identified foreground object in a series of images, where the blur of the identified object is analyzed.
    Type: Grant
    Filed: December 10, 2021
    Date of Patent: July 18, 2023
    Assignee: Amazon Technologies, Inc.
    Inventor: Dong Zhou
  • Patent number: 11643379
    Abstract: A method includes: providing a mixture including at least one alkyl tosylate and a Grignard reagent; and reacting the at least one alkyl tosylate with the Grignard reagent in a C—C coupling reaction mechanism to form a branched aliphatic alcohol.
    Type: Grant
    Filed: March 23, 2021
    Date of Patent: May 9, 2023
    Assignee: CORNING INCORPORATED
    Inventors: Mingqian He, Yang Li, Jing Sun, Hongxiang Wang, Mong-dong Zhou
  • Publication number: 20230123173
    Abstract: Disclosed are a method, system and device for manufacturing a printed circuit board, and a computer storage medium. The method comprises: acquiring a printed circuit board to be manufactured which includes a via hole; acquiring shape information of the via hole; acquiring connection information of circuit layers in said printed circuit board; assembling preset conducting devices according to the connection information and the shape information, so as to obtain a target conducting device that matches the connection information and the shape information; guiding the target conducting device into the via hole to obtain a conducting printed circuit board; and connecting the conducting printed circuit board to obtain a target printed circuit board, wherein the types of the preset conducting devices comprise a metal conducting device, a non-metal conducting device and a semi-metal conducting device.
    Type: Application
    Filed: February 23, 2021
    Publication date: April 20, 2023
    Inventor: Dong ZHOU