Abstract: Within a layout of a first surface in a flip chip configuration, a bump restriction area is mapped according to a set of bump placement restrictions, wherein a first bump placement restriction specifies an allowed distance range between a bump and a qubit chip element in a layout of the first surface in the flip chip configuration. An electrically conductive material is deposited outside the bump restriction area, to form the bump, wherein the bump comprises an electrically conductive structure that electrically couples a signal from the first surface and is positioned according to the set of bump placement restrictions.

Abstract: Within a layout of a first surface in a flip chip configuration, a bump restriction area is mapped according to a set of bump placement restrictions, wherein a first bump placement restriction specifies an allowed distance range between a bump and a qubit chip element in a layout of the first surface in the flip chip configuration. An electrically conductive material is deposited outside the bump restriction area, to form the bump, wherein the bump comprises an electrically conductive structure that electrically couples a signal from the first surface and is positioned according to the set of bump placement restrictions.

Abstract: In an embodiment, a method includes forming a first chip having a first substrate and one or more qubits disposed on the first substrate, each of the one or more qubits having an associated resonance frequency. In an embodiment, the method includes forming a second chip having a second substrate and at least one conductive surface disposed on the second substrate opposite the one or more qubits, the at least one conductive surface having at least one dimension configured to adjust the resonance frequency associated with at least one of the one or more qubits to a determined frequency adjustment value.

Abstract: Systems and techniques that facilitate hybrid readout packaging for quantum multichip bonding are provided. In various embodiments, an interposer can have a first quantum chip and a second quantum chip. In various aspects, a readout resonator (e.g., input/output port) of one or more qubits on the first quantum chip can be routed to an inner portion of the interposer. In various instances, the inner portion can be located between the first quantum chip and the second quantum chip. In various aspects, routing the readout resonator to the inner portion can reduce a number of crossings and/or intersections between input/output lines on the interposer and connection buses between qubits on the interposer.

Abstract: In accordance with an embodiment of the present invention, a photolithographic mask is provided. The photolithographic mask includes at least one merged via pattern in the photolithographic mask for printing a merged via opening in a resist layer, wherein the at least one merged via pattern includes a compound shape having a first rectangular opening portion and a second rectangular opening portion that intersect at an angle.

Abstract: First lithography and etching are carried out on a semiconductor structure to provide a first intermediate semiconductor structure having a first set of surface features corresponding to a first portion of desired fin formation mandrels. Second lithography and etching are carried out on the first intermediate structure, using a second mask, to provide a second intermediate semiconductor structure having a second set of surface features corresponding to a second portion of the mandrels. The second set of surface features are unequally spaced from the first set of surface features and/or the features have different pitch. The fin formation mandrels are formed in the second intermediate semiconductor structure using the first and second sets of surface features; spacer material is deposited over the mandrels and is etched back to form a third intermediate semiconductor structure having a fin pattern. Etching is carried out on same to produce the fin pattern.

Abstract: A method forms an air gap metal tip structure for (ESD) protection. The method forms an air chamber, from an upper substrate and a lower substate disposed below the upper substrate, within which a first metal tip and a second metal tip are disposed. The first and second metal tips are disposed along at least one horizontal axis parallel to the upper and lower substrates. The chamber includes a portion between points of the metal tips, such that oxygen trapped in the chamber is converted into ozone responsive to an arc between the metal tips to dissipate the arc, and the ozone is decomposed back into the oxygen responsive to an arc absence between the metal tips to maintain the ESD protection for subsequent arcs. An under fill level is disposed between the lower and upper substrates, and above one or more layers having the first and second metal tips.

Abstract: A method is presented for incorporating skip vias in a place and route flow of an integrated circuit design. The method includes employing a place and route tool to add the skip vias, each skip via extending through a metallization layer to electrically connect a metal layer above the metallization layer to a metal layer below the metallization layer and, when a violation of a design rule is detected due to the addition of one or more of the skip vias, substituting skip vias that violate the design rule with a standard via.

Abstract: A system includes a first quantum circuit plane that includes a first qubit, a second qubit and a third qubit. A coupled-line bus is coupled between the first qubit and the second qubit. A second circuit plane is connected to the first quantum circuit plane, comprising a control line coupled to the third qubit. The control line and the coupled-line bus are on different planes and crossing over each other, and configured to mitigate cross-talk caused by the crossing during signal transmission.

Abstract: Systems and techniques that facilitate hybrid readout packaging for quantum multichip bonding are provided. In various embodiments, an interposer can have a first quantum chip and a second quantum chip. In various aspects, a readout resonator (e.g., input/output port) of one or more qubits on the first quantum chip can be routed to an inner portion of the interposer. In various instances, the inner portion can be located between the first quantum chip and the second quantum chip. In various aspects, routing the readout resonator to the inner portion can reduce a number of crossings and/or intersections between input/output lines on the interposer and connection buses between qubits on the interposer.

Abstract: An air gap metal tip structure is provided for (ESD) protection. The structure includes first and second metal tips disposed along at least one horizontal axis that is parallel to a upper substrate and a lower substrate. The structure includes an air chamber formed between the upper and lower substrate within which the first metal tip and the second metal tip are disposed. The air chamber includes a portion between points of the metal tips. The structure includes an under fill level disposed between the lower and upper substrates, and above one or more layers having the metal tips. Oxygen trapped in the air chamber is converted into ozone responsive to an arc between the metal tips to dissipate the arc, and the ozone is decomposed back into the oxygen responsive to an absence of the arc between the metal tips to maintain the ESD protection for subsequent arcs.

Abstract: A method of forming a semiconductor structure includes forming a dielectric layer, forming a plurality of mandrel lines over the dielectric layer, and forming a plurality of non-mandrel lines over the dielectric layer between adjacent ones of the mandrel lines utilizing self-aligned double patterning. The method also includes forming at least one spacer-merge region extending from a first portion of a first one of the mandrel lines to a second portion of a second one of the mandrel lines in a first direction and covering at least a portion of one or more of the non-mandrel lines between the first mandrel and the second mandrel in a second direction orthogonal to the first direction. The method further includes forming a plurality of trenches in the dielectric layer by transferring a pattern of (i) the mandrel lines and (ii) portions of the non-mandrel lines outside the at least one spacer-merge region.

Abstract: Aspects of the invention provide means for addressing layout retargeting shortfalls. Initially, an original design shape in the layout is allowed to be simulated by process simulation to form process simulation contours. A polygon is then fitted to the process simulation contours to form a fitted simulated shape. Subsequently, whether the fitted simulated shape differs from the original design shape is detected. The process simulation may reflect the changes to the layout that occur at a foundry as part of a retargeting process. Advantageously, addressing a layout for retargeting shortfalls in accordance with aspects of the invention is likely to result in manufactured semiconductor devices having higher yields and reliability than those produced from a like layout that is not addressed in this manner.

Abstract: First lithography and etching are carried out on a semiconductor structure to provide a first intermediate semiconductor structure having a first set of surface features corresponding to a first portion of desired fin formation mandrels. Second lithography and etching are carried out on the first intermediate structure, using a second mask, to provide a second intermediate semiconductor structure having a second set of surface features corresponding to a second portion of the mandrels. The second set of surface features are unequally spaced from the first set of surface features and/or the features have different pitch. The fin formation mandrels are formed in the second intermediate semiconductor structure using the first and second sets of surface features; spacer material is deposited over the mandrels and is etched back to form a third intermediate semiconductor structure having a fin pattern. Etching is carried out on same to produce the fin pattern.

Abstract: According to an embodiment of the present invention, a quantum processor includes a qubit chip. The qubit chip includes a substrate, and a plurality of qubits formed on a first surface of the substrate. The plurality of qubits are arranged in a pattern, wherein nearest-neighbor qubits in the pattern are connected. The quantum processor also includes a long-range connector configured to connect a first qubit of the plurality of qubits to a second qubit of the plurality of qubits, wherein the first and second qubits are separated by at least a third qubit in the pattern.

Abstract: Technical solutions are described for fabricating a semiconductor wafer. An example method includes generating a process assumption band for an element of the wafer. The process assumption band depicts a shape of the element based on a set of process variations in a photolithographic process used for fabricating the wafer. The method also includes generating a process variation band for the element of the wafer based on optical process correction simulation of the photolithographic process using design rules associated with the wafer. The method also includes determining a deviation between the process assumption band and the process variation band, and recalculating one or more design rules from the design rules associated with the wafer based on the deviation. The method also includes updating the design of the wafer in response to the process variation band not being changeable to match the process assumption band, after recalculating the design rules.

Abstract: A configuration of wirebonds for reducing cross-talk in a quantum computing chip includes a first wirebond coupling a first conductor of a quantum computing circuit with a first conductor of an external circuit. The embodiment further includes in the configuration a second wirebond coupling a second conductor of the quantum computing circuit with a second conductor of the external circuit, wherein the first wirebond and the second wirebond are separated by a first vertical distance in a direction of a length of the first conductor.

Abstract: A configuration of wirebonds for reducing cross-talk in a quantum computing chip includes a first wirebond coupling a first conductor of a quantum computing circuit with a first conductor of an external circuit. The embodiment further includes in the configuration a second wirebond coupling a second conductor of the quantum computing circuit with a second conductor of the external circuit, wherein the first wirebond and the second wirebond are separated by a first vertical distance in a direction of a length of the first conductor.

Abstract: A semiconductor structure includes a three-dimensional stacked transistor structure including first and second field-effect transistors of a first type at a first vertical level and third and fourth field-effect transistors of a second type at a second vertical level disposed over the first vertical level. The semiconductor structure also includes a first gate structure shared between the first and second field-effect transistors at the first vertical level, a second gate structure shared between the third and fourth field-effect transistors at the second vertical level, and a gate contact shared by the first and second gate structures. The wherein the first and second gate structures are vertically aligned with another in a layout of the three-dimensional stacked transistor structure between source drain/regions of the first, second, third and fourth field-effect transistors.

Abstract: A semiconductor structure includes a three-dimensional stacked transistor structure including first and second field-effect transistors of a first type at a first vertical level and third and fourth field-effect transistors of a second type at a second vertical level disposed over the first vertical level. The semiconductor structure also includes a first gate structure shared between the first and second field-effect transistors at the first vertical level, a second gate structure shared between the third and fourth field-effect transistors at the second vertical level, and a gate contact shared by the first and second gate structures. The wherein the first and second gate structures are vertically aligned with another in a layout of the three-dimensional stacked transistor structure between source drain/regions of the first, second, third and fourth field-effect transistors.