Abstract: In an assembly system of an aircraft including a fuselage and a wing, the aircraft assembly system may include: a jig unit coupled to the wing to move integrally with the wing; a transfer unit connected to the jig unit and transferring the wing toward the fuselage; a position adjusting unit detachably connected to the jig unit and adjusting a position of the jig unit; and a measuring unit configured for measuring positions of the fuselage and the wing, wherein the fuselage may be relatively fixed to the movement of the wing, wherein the measuring unit may be configured to set a fuselage coordinate system and a wing coordinate system for the fuselage and the wing, respectively, wherein the position adjusting unit may be configured to move the jig unit so that the wing coordinate system coincides with the fuselage coordinate system.

Abstract: A method of manufacturing a semiconductor device having a semiconductor die within an extended substrate and a bottom substrate may include bonding a bottom surface of a semiconductor die to a top surface of a bottom substrate, forming an adhering member to a top surface of the semiconductor die, bonding an extended substrate to the semiconductor die and to the top surface of the bottom substrate utilizing the adhering member and a conductive bump on a bottom surface of the extended substrate and a conductive bump on the bottom substrate. The semiconductor die and the conductive bumps may be encapsulated utilizing a mold member. The conductive bump on the bottom surface of the extended substrate may be electrically connected to a terminal on the top surface of the extended substrate. The adhering member may include a laminate film, a non-conductive film adhesive, or a thermal hardening liquid adhesive.

Abstract: The present embodiments provide a stacked memory apparatus and a repairing method thereof which store information about a spare resource in a pre-bond process, check a spare resource available in a post-bond process, correct an error through an error correction code, and variably use the same number of spare resources to additionally ensure a number of spare resources in the post-bond process, thereby improving a yield.

Abstract: An augmented reality (AR) service clustering a plurality of markers for mapping an AR object by a device into at least one group and determining a representative marker of the clustered group, and preferentially searching for markers included in a cluster of the representative marker when a scene recognized by the device corresponds to the representative marker, is provided. An AR service generating an AR object based on data received from a user while a scene recognized by a device is displayed on a screen of the device and determining the recognized scene as a marker of the AR object is also provided. An AR service clustering a previously obtained plurality of pieces of content based on a predetermined reference and generating an AR object based on the plurality of clustered pieces of content is further provided.

Abstract: The present embodiments provide a stacked memory apparatus and a repairing method thereof which store information about a spare resource in a pre-bond process, check a spare resource available in a post-bond process, correct an error through an error correction code, and variably use the same number of spare resources to additionally ensure a number of spare resources in the post-bond process, thereby improving a yield.

Abstract: Disclosed are a stacked memory device and a method of repairing the same, in which spare cells for a post-bond test and repair process are disposed in a base die and the spare cells are used in each memory layer as many as the number desired, a repair result after the test is permanently stored, and the spare cell of the base die and the memory layer are simultaneously approached and meaningful data is selected, so that it is not necessary to newly perform a test even though power of a memory is blocked, it is possible to solve time wasted during an approach to a memory layer after a spare memory performs determination, and it is possible to secure a high repair rate.

Abstract: Disclosed are a stacked memory device and a method of repairing the same, in which spare cells for a post-bond test and repair process are disposed in a base die and the spare cells are used in each memory layer as many as the number desired, a repair result after the test is permanently stored, and the spare cell of the base die and the memory layer are simultaneously approached and meaningful data is selected, so that it is not necessary to newly perform a test even though power of a memory is blocked, it is possible to solve time wasted during an approach to a memory layer after a spare memory performs determination, and it is possible to secure a high repair rate.

Abstract: An augmented reality (AR) service clustering a plurality of markers for mapping an AR object by a device into at least one group and determining a representative marker of the clustered group, and preferentially searching for markers included in a cluster of the representative marker when a scene recognized by the device corresponds to the representative marker, is provided. An AR service generating an AR object based on data received from a user while a scene recognized by a device is displayed on a screen of the device and determining the recognized scene as a marker of the AR object is also provided. An AR service clustering a previously obtained plurality of pieces of content based on a predetermined reference and generating an AR object based on the plurality of clustered pieces of content is further provided.

Abstract: A method of fabricating a semiconductor device includes providing a substrate having first areas and second areas, forming first metal wires on the first areas of the substrate, forming second metal wires on the second areas of the substrate, forming an interlayer insulation layer to cover the first and second metal wires, forming pad patterns on the first metal wires, forming a passivation layer to cover the pad patterns on the interlayer insulation layer, and forming a wrapping layer on the passivation layer. The wrapping layer includes first openings that are vertically aligned with the pad patterns, and second openings that are disposed on the second areas and that horizontally connect the first openings with each other.

Abstract: The semiconductor device includes a process monitoring pattern and an input/output (I/O) pad array area, the process monitoring pattern including a lower layer having a peripheral area surrounding a first internal area, the first internal area exposed by an internal open area, an external structure on the peripheral area of the lower layer, and a first dam disposed in the peripheral area spaced apart from the external structure by an external open area, the first dam defining the first internal area. The peripheral area overlaps the input/output (I/O) pad array area of the semiconductor device.

Abstract: The semiconductor device includes a process monitoring pattern and an input/output (I/O) pad array area, the process monitoring pattern including a lower layer having a peripheral area surrounding a first internal area, the first internal area exposed by an internal open area, an external structure on the peripheral area of the lower layer, and a first dam disposed in the peripheral area spaced apart from the external structure by an external open area, the first dam defining the first internal area. The peripheral area overlaps the input/output (I/O) pad array area of the semiconductor device.

Abstract: The semiconductor device includes a process monitoring pattern and an input/output (I/O) pad array area, the process monitoring pattern including a lower layer having a peripheral area surrounding a first internal area, the first internal area exposed by an internal open area, an external structure on the peripheral area of the lower layer, and a first dam disposed in the peripheral area spaced apart from the external structure by an external open area, the first dam defining the first internal area. The peripheral area overlaps the input/output (I/O) pad array area of the semiconductor device.

Abstract: A semiconductor wafer includes semiconductor chip areas on a semiconductor substrate, the semiconductor chip areas having thereon semiconductor circuit patterns and inner guard ring patterns surrounding the semiconductor circuit patterns; and scribe lanes on the semiconductor substrate between the semiconductor chip areas, the scribe lanes having thereon outer guard ring patterns surrounding the inner guard ring patterns and a process monitoring pattern between the outer guard ring patterns, the outer guard ring patterns and the process monitoring pattern being merged with each other.

Abstract: A semiconductor device including a plurality of decoupling capacitors formed on a semiconductor substrate, and a plurality of decoupling capacitor contact plugs disposed between the semiconductor substrate and the plurality of decoupling capacitors, the plurality of decoupling capacitor contact plugs being electrically connected to the plurality of decoupling capacitors and including an array of first decoupling capacitor contact plugs and second decoupling capacitor contact plugs.

Abstract: A semiconductor device includes a process monitoring pattern overlapping with an input/output (I/O) pad. The semiconductor device may include a semiconductor substrate having a cell array region and a peripheral circuit array region, and a plurality of process monitoring patterns disposed in the peripheral circuit array region. The semiconductor device may further include a plurality of input/output (I/O) pads, where each I/O pad is disposed on a corresponding process monitoring pattern.

Abstract: The semiconductor device includes a process monitoring pattern and an input/output (I/O) pad array area, the process monitoring pattern including a lower layer having a peripheral area surrounding a first internal area, the first internal area exposed by an internal open area, an external structure on the peripheral area of the lower layer, and a first dam disposed in the peripheral area spaced apart from the external structure by an external open area, the first dam defining the first internal area. The peripheral area overlaps the input/output (I/O) pad array area of the semiconductor device.

Abstract: A photomask includes a first region, a second region and a third region. The first and second regions are spaced apart by the third region. A first photomask type is disposed in the first region and a second photomask type, different from the first photomask type, is disposed in the second region. A dummy photomask pattern is disposed in the third region and is structured to form a dummy wafer pattern on a wafer.

Abstract: A semiconductor device including a plurality of decoupling capacitors formed on a semiconductor substrate, and a plurality of decoupling capacitor contact plugs disposed between the semiconductor substrate and the plurality of decoupling capacitors, the plurality of decoupling capacitor contact plugs being electrically connected to the plurality of decoupling capacitors and including an array of first decoupling capacitor contact plugs and second decoupling capacitor contact plugs.

Abstract: In a method of detecting an abnormal semiconductor device, a pattern on a semiconductor substrate may be irradiated by a light. A reflected light from the pattern may be detected. Spectrum data of the reflected light may be compared with a predetermined reference spectrum data that is obtained from a test pattern of a reference sample. Whether the pattern is normal or not may be determined based on comparison results. Thus, the abnormal semiconductor device may be recognized in the processes for manufacturing the semiconductor device to prevent the subsequent processes from being performed on the abnormal semiconductor device. As a result, the yield of normal or non-defective semiconductor devices may be improved.

Abstract: A semiconductor wafer includes semiconductor chip areas on a semiconductor substrate, the semiconductor chip areas having thereon semiconductor circuit patterns and inner guard ring patterns surrounding the semiconductor circuit patterns; and scribe lanes on the semiconductor substrate between the semiconductor chip areas, the scribe lanes having thereon outer guard ring patterns surrounding the inner guard ring patterns and a process monitoring pattern between the outer guard ring patterns, the outer guard ring patterns and the process monitoring pattern being merged with each other.