Patents by Inventor Dong-kwan Won

Dong-kwan Won has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11486035
    Abstract: A graphene synthesis chamber includes: a chamber case in which a substrate including a metal thin film is placed; a gas supply unit which supplies at least one gas comprising a carbon gas into an inner space of the chamber case; a main heating unit which emits at least one light to the inner space to heat the substrate; and at least one auxiliary heating unit which absorbs the at least one light and emits radiant heat toward the substrate.
    Type: Grant
    Filed: August 14, 2019
    Date of Patent: November 1, 2022
    Assignee: Versarien PLC
    Inventors: Dong-kwan Won, Won-Sik Nam
  • Publication number: 20200123658
    Abstract: A graphene synthesis chamber includes: a chamber case in which a substrate including a metal thin film is placed; a gas supply unit which supplies at least one gas comprising a carbon gas into an inner space of the chamber case; a main heating unit which emits at least one light to the inner space to heat the substrate; and at least one auxiliary heating unit which absorbs the at least one light and emits radiant heat toward the substrate.
    Type: Application
    Filed: December 19, 2019
    Publication date: April 23, 2020
    Applicants: HANWHA AEROSPACE CO., LTD., NPS Corporation
    Inventors: Dong-kwan WON, Won-Sik NAM
  • Publication number: 20190368042
    Abstract: A graphene synthesis chamber includes: a chamber case in which a substrate including a metal thin film is placed; a gas supply unit which supplies at least one gas comprising a carbon gas into an inner space of the chamber case; a main heating unit which emits at least one light to the inner space to heat the substrate; and at least one auxiliary heating unit which absorbs the at least one light and emits radiant heat toward the substrate.
    Type: Application
    Filed: August 14, 2019
    Publication date: December 5, 2019
    Applicants: HANWHA AEROSPACE CO., LTD., NPS Corporation
    Inventors: Dong-kwan WON, Won-Sik NAM
  • Publication number: 20190368043
    Abstract: A graphene synthesis chamber includes: a chamber case in which a substrate including a metal thin film is placed; a gas supply unit which supplies at least one gas comprising a carbon gas into an inner space of the chamber case; a main heating unit which emits at least one light to the inner space to heat the substrate; and at least one auxiliary heating unit which absorbs the at least one light and emits radiant heat toward the substrate.
    Type: Application
    Filed: August 14, 2019
    Publication date: December 5, 2019
    Applicants: HANWHA AEROSPACE CO., LTD., NPS Corporation
    Inventors: Dong-kwan WON, Won-Sik NAM
  • Patent number: 10480075
    Abstract: A graphene synthesis chamber includes: a chamber case in which a substrate including a metal thin film is placed; a gas supply unit which supplies at least one gas comprising a carbon gas into an inner space of the chamber case; a main heating unit which emits at least one light to the inner space to heat the substrate; and at least one auxiliary heating unit which absorbs the at least one light and emits radiant heat toward the substrate.
    Type: Grant
    Filed: June 1, 2017
    Date of Patent: November 19, 2019
    Assignees: NPS Corporation, HANWHA AEROSPACE CO., LTD.
    Inventors: Dong-kwan Won, Won-Sik Nam
  • Patent number: 10040683
    Abstract: A method of fabricating multi-layered graphene includes disposing a first graphene layer on a carrier; disposing at least one second graphene layer on the first graphene layer to form a graphene sheet disposed on the carrier; and transferring the graphene sheet disposed on the carrier onto a substrate, wherein each of the graphene layers which constitute the graphene sheet has at least one damaged region, and the at least one damaged region of each of the graphene layers contacts at least one of non-damaged regions of a graphene layer or graphene layers, of the graphene layers, contacting the each of the graphene layers.
    Type: Grant
    Filed: November 17, 2011
    Date of Patent: August 7, 2018
    Assignees: SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION, Hanwha Techwin Co., Ltd.
    Inventors: Jong-hyuk Yoon, Duk-hwa Na, Young-il Song, Dong-kwan Won, Byung-hee Hong, Na-young Kim
  • Publication number: 20170268108
    Abstract: A graphene synthesis chamber includes: a chamber case in which a substrate including a metal thin film is placed; a gas supply unit which supplies at least one gas comprising a carbon gas into an inner space of the chamber case; a main heating unit which emits at least one light to the inner space to heat the substrate; and at least one auxiliary heating unit which absorbs the at least one light and emits radiant heat toward the substrate.
    Type: Application
    Filed: June 1, 2017
    Publication date: September 21, 2017
    Applicants: NPS Corporation, Hanwha Techwin Co., Ltd.
    Inventors: Dong-kwan WON, Won-Sik NAM
  • Publication number: 20160319431
    Abstract: A graphene synthesis chamber includes: a chamber case in which a substrate including a metal thin film is placed; a gas supply unit which supplies at least one gas comprising a carbon gas into an inner space of the chamber case; a main heating unit which emits at least one light to the inner space to heat the substrate; and at least one auxiliary heating unit which absorbs the at least one light and emits radiant heat toward the substrate.
    Type: Application
    Filed: July 7, 2016
    Publication date: November 3, 2016
    Applicants: NPS Corporation, Hanwha Techwin Co., Ltd.
    Inventors: Dong-kwan WON, Won-Sik NAM
  • Patent number: 9315001
    Abstract: Provided are method and apparatus for transferring graphene. The graphene transferring method includes: a graphene synthesizing operation comprising forming at least one layer of graphene on at least one surface of a catalyst metal film; a substrate film attaching operation comprising contacting an adhesive first surface of the substrate film to the at least one layer of graphene and compressing the catalyst metal film and the substrate film by using a first roller; and a substrate film separating operation comprising separating the substrate film from the catalyst metal film such that the at least one layer of graphene is separated from the catalyst metal film together with the substrate film.
    Type: Grant
    Filed: November 17, 2011
    Date of Patent: April 19, 2016
    Assignee: Hanwha Techwin Co., Ltd.
    Inventors: Duk-Hwa Na, Jong-Hyuk Yoon, Young-Il Song, Dong-Kwan Won
  • Publication number: 20150353362
    Abstract: A graphene manufacturing apparatus includes a gas supplying unit supplying a gas including carbon; a gas heating unit heating the gas supplied from the gas supplying unit; a deposition chamber in which a substrate having a catalyst layer is disposed; and an inlet pipe introducing the gas of the gas heating unit into the deposition chamber. A temperature of the deposition chamber is set at a temperature lower than a temperature of the gas heating unit so that a selection range with respect to a catalyst metal to be used in the catalyst layer may be expanded, and damage of the substrate due to a high temperature heat may be minimized.
    Type: Application
    Filed: August 20, 2015
    Publication date: December 10, 2015
    Applicant: Hanwha Techwin Co., Ltd.
    Inventors: Dong-kwan WON, Seung-min CHO
  • Patent number: 9136112
    Abstract: Provided is a method of post treating graphene including providing graphene on a metal thin film, providing a carrier on the graphene, hardening the carrier, and removing the metal thin film from the graphene.
    Type: Grant
    Filed: August 5, 2011
    Date of Patent: September 15, 2015
    Assignee: Hanwha Techwin Co., Ltd.
    Inventors: Dong-Kwan Won, Seung-Min Cho, Jong-Hyuk Yoon, Doc-Hwa Na
  • Patent number: 9128050
    Abstract: An apparatus and method for inspecting a graphene board. The graphene board inspecting apparatus for inspecting a graphene board on which at least one graphene layer is formed includes: a light processing unit which emits at least one light on the graphene board, receives the at least one light penetrating the graphene board and converts the received at least one light to an output signal; a transmittance detecting unit which receives the output signal from the light processing unit to inspect a transmittance of the at least one light penetrating the graphene board; and a determination unit which is connected to the transmittance detecting unit and receives the detected transmittance to determine a state of the graphene board by analyzing the detected transmittance.
    Type: Grant
    Filed: November 30, 2012
    Date of Patent: September 8, 2015
    Assignee: Hanwha Techwin Co., Ltd.
    Inventor: Dong-kwan Won
  • Publication number: 20130265567
    Abstract: An apparatus and method for inspecting a graphene board. The graphene board inspecting apparatus for inspecting a graphene board on which at least one graphene layer is formed includes: a light processing unit which emits at least one light on the graphene board, receives the at least one light penetrating the graphene board and converts the received at least one light to an output signal; a transmittance detecting unit which receives the output signal from the light processing unit to inspect a transmittance of the at least one light penetrating the graphene board; and a determination unit which is connected to the transmittance detecting unit and receives the detected transmittance to determine a state of the graphene board by analyzing the detected transmittance.
    Type: Application
    Filed: November 30, 2012
    Publication date: October 10, 2013
    Applicant: Samsung Techwin Co., Ltd.
    Inventor: Dong-kwan WON
  • Publication number: 20130233480
    Abstract: Provided are method and apparatus for transferring graphene. The graphene transferring method includes: a graphene synthesizing operation comprising forming at least one layer of graphene on at least one surface of a catalyst metal film; a substrate film attaching operation comprising contacting an adhesive first surface of the substrate film to the at least one layer of graphene and compressing the catalyst metal film and the substrate film by using a first roller; and a substrate film separating operation comprising separating the substrate film from the catalyst metal film such that the at least one layer of graphene is separated from the catalyst metal film together with the substrate film.
    Type: Application
    Filed: November 17, 2011
    Publication date: September 12, 2013
    Applicant: SAMSUNG TECHWIN CO., LTD.
    Inventors: Duk-Hwa Na, Jong-Hyuk Yoon, Young-Il Song, Dong-Kwan Won
  • Publication number: 20130134384
    Abstract: Provided is a method of post treating graphene including providing graphene on a metal thin film, providing a carrier on the graphene, hardening the carrier, and removing the metal thin film from the graphene.
    Type: Application
    Filed: August 5, 2011
    Publication date: May 30, 2013
    Applicant: SAMSUNG TECHWIN CO., LTD.
    Inventors: Dong-Kwan Won, Seung-Min Cho, Jong-Hyuk Yoon, Doc-Hwa Na
  • Publication number: 20130122220
    Abstract: A graphene manufacturing apparatus includes a gas supplying unit supplying a gas including carbon; a gas heating unit heating the gas supplied from the gas supplying unit; a deposition chamber in which a substrate having a catalyst layer is disposed; and an inlet pipe introducing the gas of the gas heating unit into the deposition chamber. A temperature of the deposition chamber is set at a temperature lower than a temperature of the gas heating unit so that a selection range with respect to a catalyst metal to be used in the catalyst layer may be expanded, and damage of the substrate due to a high temperature heat may be minimized.
    Type: Application
    Filed: June 22, 2011
    Publication date: May 16, 2013
    Applicant: SAMSUNG TECHWIN CO., LTD.
    Inventors: Dong-Kwan Won, Seung-Min Cho
  • Patent number: 8419880
    Abstract: A method of transferring graphene, the method including: preparing a graphene forming structure including a base member, an oxide layer that is hydrophilic and is formed on the base member, a metal catalyst layer that is hydrophobic and is formed on the oxide layer, and graphene that is formed on the metal catalyst layer; attaching the graphene forming structure on a surface of a first carrier; separating the oxide layer from the metal catalyst layer by applying steam to the graphene forming structure; and removing the metal catalyst layer.
    Type: Grant
    Filed: June 17, 2011
    Date of Patent: April 16, 2013
    Assignee: Samsung Techwin Co., Ltd.
    Inventors: Se-hoon Cho, Dong-kwan Won
  • Publication number: 20120234240
    Abstract: A graphene synthesis chamber includes: a chamber case in which a substrate including a metal thin film is placed; a gas supply unit which supplies at least one gas comprising a carbon gas into an inner space of the chamber case; a main heating unit which emits at least one light to the inner space to heat the substrate; and at least one auxiliary heating unit which absorbs the at least one light and emits radiant heat toward the substrate.
    Type: Application
    Filed: March 9, 2012
    Publication date: September 20, 2012
    Applicants: NPS CORPORATION, SAMSUNG TECHWIN CO., LTD.
    Inventors: Dong-Kwan WON, Won-Sik NAM
  • Publication number: 20120128983
    Abstract: A method of fabricating multi-layered graphene includes disposing a first graphene layer on a carrier; disposing at least one second graphene layer on the first graphene layer to form a graphene sheet disposed on the carrier; and transferring the graphene sheet disposed on the carrier onto a substrate, wherein each of the graphene layers which constitute the graphene sheet has at least one damaged region, and the at least one damaged region of each of the graphene layers contacts at least one of non-damaged regions of a graphene layer or graphene layers, of the graphene layers, contacting the each of the graphene layers.
    Type: Application
    Filed: November 17, 2011
    Publication date: May 24, 2012
    Applicants: SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION, SAMSUNG TECHWIN CO., LTD.
    Inventors: Jong-hyuk YOON, Duk-hwa NA, Young-il SONG, Dong-kwan WON, Byung-hee HONG, Na-young KIM
  • Publication number: 20120025413
    Abstract: Provided are a method and apparatus of manufacturing high quality large area graphene in large quantities. The method includes placing a supporting belt, on which a catalyst layer is loaded, into a chamber; increasing a temperature of the catalyst layer by injecting a carbon source into the chamber; forming graphene on the catalyst layer by cooling the catalyst layer; and taking out the supporting belt, on which the catalyst layer, on which the graphene is formed, is loaded, from the chamber to an outside, wherein a ratio between a melting point of the supporting belt and a maximum temperature Tmax of the catalyst metal layer that the catalyst layer is heated in the chamber is equal to or less than 0.6.
    Type: Application
    Filed: July 27, 2011
    Publication date: February 2, 2012
    Applicant: SAMSUNG TECHWIN CO., LTD.
    Inventors: Seung-min CHO, Dong-kwan WON, Se-hoon CHO