Abstract: A stage assembly (10) for moving and positioning a device (26) includes a device table (20), a device holder (24) that retains the device (26), and a stage mover assembly (14). The stage assembly (10) includes one or more features that can isolate the device holder 24 and the device (26) from deformation. In some embodiments, the stage assembly (10) allows precise rotation of the device (26) between a first position (42) and a second position (44) without influencing the flatness of the device (26) and without deflecting and distorting the device (26). For example, the stage assembly (10) can include a carrier (60) and a holder connector assembly (62). The carrier (60) is supported above the device table (20) and rotates relative to the device table (20). The holder connector assembly (62) connects the device holder (24) to the carrier (60). Further, the stage assembly (10) can include a holder mover (120) that rotates the device holder (24) relative to the device table (20).

Abstract: Adaptive optical elements for use in high precision lithography exposure are provided with an array of discrete actuators to provide highly stable and repeatable correction of the shape of an optical element to an accuracy of a small fraction of a very short wavelength of light in the EUV range of 1 to 50 nanometers, responsive to a metrology source and sensor arrangement. The actuators are matched to the deformation characteristics of the adaptive optical elements. Preferably, the actuators provide both positive and negative force for outward and/or inward deflection continuously over the surface of the mirror. The surface of the optical element may thus be accurately, controllably and repeatably deformed to within an allowable deformation limit to optimize optical performance of an optical system for high precision lithography exposure.

Abstract: A kinematic lens mount for kinematically mounting an optical element has a holder structure and three clamping units, each affixed to the holder structure and kinematically clamping a peripheral portion of the optical element. Each of these clamping units includes a flexure mount affixed to the holder structure and a spring assembly including a resilient member contacting the optical element. A lens seat is formed integrally with or attached to the flexure mount for supporting the peripheral portion of the optical element thereon. The flexure mount includes a pair of flexure devices. One end of each of these flexure devices is affixed to the holder structure. Each of these flexure devices may be of a pivot type, having an axis along which it is stiff and the axes of this pair of flexure devices intersect each other inside the peripheral portion of the optical element.

Abstract: An apparatus and method for supporting and precisely positioning a table or stage with respect to a frame. The table is supported by at least one flexible member which is flexible in a plurality of degrees of freedom. The flexible member is mounted on a base which is movable in an additional degree of freedom. In the context of lithographic semiconductor processing, a wafer stage can thereby be precisely positioned with respect to a frame or reticle in six degrees of freedom.

Abstract: A combination of active and passive force actuators provide adjustments to the shape of an optical element to reduce or compensate for aberrations in an optical system. Passive actuators at a high spatial frequency are capable of correcting higher order steady state components of shape error while dynamic corrections of higher frequency, operationally dependent is provided allowing the number of active actuators and the power supplied to each active actuator to be reduced; reducing heating of the optical element by the active actuators and increasing stability of the system. Compound actuators including a combination of an active actuator portion with a passive actuator portion (which provides a mechanical force bias to the active actuator portion) allows increased spatial flexibility of application of forces to the optical element and other advantages.

Abstract: A deformable mirror arrangement has a plurality of constraint mechanisms contacting a deformable mirror at specified contact positions. At least three of these constraint mechanisms are rigid body servo control mechanisms such as high-bandwidth servo control mechanisms, each including a force actuator contacting the mirror at a corresponding one of the contact positions, a position sensor assisting to measure position of the mirror and a servo control unit for controlling the force actuator.

Abstract: A stage assembly (224) for moving and positioning a device (200) relative to a mounting base (232) includes a stage base (202), a stage (206), a stage mover assembly (204), and a reaction frame assembly (230). The stage mover assembly (204) moves the stage (206) along an X axis, along a Y axis and about a Z axis. The reaction frame assembly (230) is coupled to the stage mover assembly (204) and reduces the magnitude of the reaction forces created by the stage mover assembly (204) that are transferred to the stage (206) and the mounting base (232). In one embodiment, the reaction frame assembly (230) includes a first mass assembly (256) and a first mass support assembly (258). In this embodiment, the first mass assembly (256) is coupled to the stage mover assembly (204), and the first mass support assembly (258) supports the first mass assembly (256) relative to the mounting base (232) and allows the first mass assembly (256) to move relative to the mounting base (232) along the Z axis.

Abstract: A stage assembly (10) for independently moving and positioning a first device (26A) and a second device (26A) in an operation area (25) is provided herein. The stage assembly (10) includes a stage base (12), a first stage (14), a first mover assembly (15), a second stage (16), and a second mover assembly (18). The first mover assembly (15) moves the first stage (14) and the first device (26A) into the operational area (25) and the second mover assembly (18) moves the second stage (16) and the second device (26B) into the operational area (25). The present stage assembly (10) reduces and minimizes the amount of reaction forces and disturbances that are transferred between the stages (14), (16). This improves the positioning performance of the stage assembly (10). Further, for an exposure apparatus (30), this allows for more accurate positioning of two semiconductor wafers (28) relative to a reticle (32) or some other reference.

Abstract: A simplified reticle removal system used with an electron beam system. The simplified reticle removal system includes a reticle chamber having an angled opening and a maintenance panel removably or pivotably attached thereto. The angled opening provides access to a reticle stage housed within the reticle chamber. The angled opening further permits removal of the reticle stage from the reticle chamber without having to disassemble and remove the optics system of the electron beam system. This reduces maintenance and repair costs, as well as reduces down time of the electron beam system.

Abstract: Methods and apparatus for adjusting the lateral stiffness of a bellows are disclosed. According to one aspect of the present invention, a bellows assembly that supports a load includes a first bellows that has an adjustable length. The first bellows also has a first end and a second end, with the first end being substantially coupled to the load. The bellows assembly, which is coupled to the second end of the first bellows, also includes a mechanism that adjusts the length of the first bellows.

Abstract: A stage assembly (10) for moving and positioning a device (26) includes a guide base (12), a stage (14), a stage bearing assembly (18), a control system (22), and a Y mover (68). The stage (14) retains the device (26). The stage bearing assembly (18) supports the stage (14) spaced apart from the guide base (12). More specifically, the stage bearing assembly (18) generates an electrostatic force that urges the stage (14) towards the guide base (12). The housing mover (68) moves the stage (14) relative to the guide base (12). The Y mover (68) includes a plurality of magnets and a conductor. The magnets have a magnet length (86) and the conductors have a conductor length (88). Preferably, the magnet length (86) is at least as long as the conductor length (88) plus an X stroke (87) of the stage assembly (10). This design allows the Y mover (68) to provide a force along the Y axis over the range of the positions of the Y mover (68).

Abstract: An exposure apparatus (10) that includes a support frame (12), a base frame (14), a first stage assembly (16), a second stage assembly (18), an optical frame (20), an optical device (22), and a measurement system (24) is provided herein. The exposure apparatus (10) is typically mounted to a mounting base (30). As provided herein, the optical frame (20), the optical device (22), and a portion of the measurement system (24) can be assembled as an optical assembly (36) that is isolated from the base frame (14) with an optical isolation system (42). Further, the base frame (14), at least a portion of the first stage assembly (16) and the second stage assembly (18) can be assembled as a base assembly (38) that is isolated from the support frame (12) with a base isolation system (40). With this design, the base assembly (38) is isolated from the support frame (12) with the base isolation system (40) and the optical assembly (36) is isolated from the base assembly (38) with the optical isolation system (42).

Abstract: Devices are disclosed for attenuating vibration transmission between a first mass and a second mass. An embodiment includes a housing defining a chamber configured to be pressurized with a fluid, at least one first pivot element coupled to the housing and the first mass, and at least one second pivot element coupled to the housing and the second mass. Lateral motion of the second mass relative to the first mass results in movement of the housing. Each of the pivot elements can be a diaphragm.

Abstract: The invention comprises methods and apparatus for cooling electrical leads in an electron beam lithography system. In one embodiment the invention comprises an electron beam projection system including at least one process chamber, containing therein, at least one movable stage and at least one electric stage motor for moving the stage, wherein the electrical stage motor includes magnetic coils encased in a coolant jacket which encloses the coils and encloses a coolant material. The coolant jacket includes coolant input lines for supplying coolant to the coolant jacket and includes coolant return lines for allowing the coolant to flow out of the coolant jacket. The process chamber includes electrical leads for supplying electrical current to systems contained within the process chamber and the electrical leads are cooled by passing them through the coolant lines.

Abstract: In order to provide a static pressure air bearing having two axes usable in a vacuum environment in which the connection of the supporting air exhaust pipe does not adversely affect the motion of the bearing mechanism, air exhaust pipes are connected only with the fixed part(s) of the lower axis. Air exhaust from the upper axis is conducted through inner air exhaust piping (passages) formed within the fixed parts of the upper and lower axes, so that the exhaust pipes need not be connected with the movable parts.

Abstract: A chamber seal device is provided to seal a wafer stage chamber assembly to isolate semiconductor substrates, a wafer stage device, and the process of making semiconductor wafers from an atmospheric condition, so that the resulted wafers have an improved quality and meet certain wafer manufacturing specifications. The wafer stage chamber assembly includes a wafer stage chamber, a top wall and a base frame. The wafer stage chamber assembly is supported by an apparatus frame of an exposure apparatus via a plurality of body supports. The chamber seal device includes one or more o-ring seals positioned in between and surrounding the perimeter of the wafer stage chamber and the top wall, or the wafer stage chamber and the base frame to seal the wafer stage chamber assembly.

Abstract: A fluid mount (10) for an exposure apparatus (32) includes a first subsystem (12) and a second subsystem (14). The first subsystem (12) includes a first cylinder (18) and a first piston (20). The first piston (20) moves within the first cylinder (18) along a first axis (26). The second subsystem (14) includes a second cylinder (22) and a second piston (24). The second piston (24) moves within the second cylinder (22) along a second axis (28). Importantly, (i) the second subsystem (14) is stacked on top of the first subsystem (12), (ii) the second axis (28) is substantially coaxial with the first axis (26), and (iii) the first piston (20) is connected to the second piston (24) with a piston connector (16). The resulting fluid mount (10) has a relatively high load carrying capacity and a relatively small footprint.

Abstract: A vibration isolator (200) for isolating a first assembly (202) from vibration from a second assembly (204) includes a housing (206) that is secured to the second assembly (204) and a pendulum assembly (208). The pendulum assembly (208) includes one or more pistons (226) and a connector assembly (224). The piston (226) is coupled to the first assembly (202). The connector assembly (224) couples the piston (226) to the housing (206) and allows the piston (226) to swing laterally relative to the housing (206). The vibration isolator (200) can also include a pendulum support (264) and/or a mover (580) that moves the piston (226) and assists in supporting the load of the first assembly (202).

Abstract: Adaptive optical elements for use in high precision lithography exposure are provided with an array of discrete actuators to provide highly stable and repeatable correction of the shape of an optical element to an accuracy of a small fraction of a very short wavelength of light in the EUV range of 1 to 50 nanometers, responsive to a metrology source and sensor arrangement. The actuators are matched to the deformation characteristics of the adaptive optical elements. Preferably, the actuators provide both positive and negative force for outward and/or inward deflection continuously over the surface of the mirror. The surface of the optical element may thus be accurately, controllably and repeatably deformed to within an allowable deformation limit to optimize optical performance of an optical system for high precision lithography exposure.

Abstract: A combination of active and passive force actuators provide adjustments to the shape of an optical element to reduce or compensate for aberrations in an optical system. Passive actuators at a high spatial frequency are capable of correcting higher order steady state components of shape error while dynamic corrections of higher frequency, operationally dependent is provided allowing the number of active actuators and the power supplied to each active actuator to be reduced; reducing heating of the optical element by the active actuators and increasing stability of the system. Compound actuators including a combination of an active actuator portion with a passive actuator portion (which provides a mechanical force bias to the active actuator portion) allows increased spatial flexibility of application of forces to the optical element and other advantages.