Abstract: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a wick structure member through which a liquid is collected from a surface of an object opposite to the liquid collection member.

Abstract: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.

Abstract: A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.

Abstract: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a mesh member through which a liquid is collected from a surface of an object opposite to the liquid collection member.

Abstract: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system having a liquid collection member having a liquid-permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member.

Abstract: A photolithography tool for use in manufacturing semiconductor devices, includes a wafer stage, a lens, and a liquid dispensing assembly by which liquid is introduced between a surface of a semiconductor wafer disposed on the wafer stage and the lens, along a direction away from the semiconductor wafer at its edge.

Abstract: A stage assembly (220) that moves a work piece (200) along a first axis, along a second axis and along a third axis includes a first stage (238), a first mover assembly (242) that moves the first stage (238) along the first axis, a second stage (240) that retains the work piece (200), a second mover assembly (244), and a non-contact bearing (257). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) along the first axis, along the second axis, and along the third axis. The non-contact bearing (257) supports the mass of the second stage (240). Further, the non-contact bearing (257) allows the second stage (240) to move relative to the first stage (238) along the first axis and along the second axis. The second mover assembly (244) can move the second stage (240) with at least four degrees of movement.

Abstract: A stage assembly (220) that moves a work piece (200) along a first axis includes a stage base (236), a guide bar (238), a device table (240) that retains the work piece (200), a mover assembly (242), and a damper (225). The damper (225) can be a passive, electromagnetic damper that passively dampens movement of the guide bar (238) relative to the stage base (236) along a second axis that is orthogonal to the first axis. The damper (225) can include a magnet array (356) and a conductor (366) that is positioned in a magnetic field that surrounds the magnet array (356). With this design, relative movement between the guide bar (238) and the stage base (236) along the second axis induces the flow of current in the conductor (366) and eddy current damping. The damper (225) can include a first damper subassembly (252A) that is coupled to the guide bar (238) and a second damper subassembly (252B) that is coupled to the stage base (236).

Abstract: A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.

Abstract: A chamber assembly (226) for providing a sealed chamber (38) adjacent to a workpiece (28) includes a chamber housing (244), a chamber pressure source (246) and a seal assembly (250). The chamber housing (244) cooperates with the workpiece (28) to define at least a portion of the sealed chamber (38). The chamber pressure source (246) controls a chamber pressure within the sealed chamber (38) to be different than the environmental pressure. The seal assembly (250) seals the chamber housing (244) to the workpiece (28). The seal assembly (250) can include a first seal contact region (270) and a second seal contact region (272) that cooperate to define a seal gap (274) adjacent to at least one of the chamber housing (244) and the workpiece (28). The seal assembly (250) may further include a seal pressure source (276) for controlling a seal pressure within the seal gap (274) so that the seal pressure is different than the chamber pressure and the environmental pressure.

Abstract: An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. A method for transporting the reticle to an exposure position from a position outside an exposure chamber is disclosed, including a method for use of a load-lock chamber.

Abstract: Embodiments of the invention compensate for one or more effects of a stage motor in a precision stage device. A feedforward module receives an input signal corresponding to the effect of the motor and generates a feedforward control signal that can be used to modify a motor control signal to compensate for the effect of the motor. In some embodiments, a control system is provided to compensate for a back-electromotive force generated by a motor, while in other embodiments, a control system may compensate for an inductive effect of a motor. Embodiments of the invention may be useful in precision stage devices, for example, lithography devices such as steppers and scanners.

Abstract: Methods and apparatus for cooling a reticle are disclosed. According to one aspect of the present invention, an apparatus for providing top side cooling to a reticle includes a heat exchanger arrangement and an actuator. The heat exchanger arrangement includes a first surface arranged to facilitate heat transfer between the reticle and the heat exchanger arrangement. The heat transfer provides cooling to at least some portions of the reticle. The actuator positions the first surface of the heat exchanger arrangement at a distance over the reticle.

Abstract: According to one aspect of the present invention, a motor arrangement includes at least one coil, a cover plate, and a shield layer. The at least one coil has a first side and a second side. The cover plate is positioned substantially over the first side of the at least one coil at a distance from the at least one coil. The shield layer is positioned between the first side of the at least one coil and the cover plate, and has a top surface. The top surface contacts the cover plate, and includes a liquid and a gas that form a mixture and cause the top surface to have a substantially constant temperature.

Abstract: An immersion lithography system compensates for displacement of the final optical element of the optical assembly caused by the immersion fluid. The system includes an optical assembly to project an image defined by a reticle onto a wafer. The optical assembly includes a final optical element spaced from the wafer by a gap. An immersion element supplies an immersion fluid into the gap and recovers any immersion fluid that escapes the gap. A fluid compensation system applies a force to the final optical element of the optical assembly to compensate for pressure variations of the immersion fluid.

Abstract: A barrier assembly (58) for sealing an assembly gap (274) between a first assembly (266) and a second assembly (268) includes a first barrier (270) that seals the assembly gap (274) and a second barrier (272) that seals the assembly gap (274). The barriers (270) (272) can be spaced apart. Further, the first barrier(270) provides a flexible pressure barrier that seals the assembly gap (274) and the second barrier (272) provides a flexible barrier that inhibits the first barrier (270) from contaminating a chamber environment within the assemblies (266) (268). Additionally, the barrier assembly (58) includes a barrier source (62) that controls a barrier environment between the barriers (270) (272).

Abstract: An exposure method that uses a substrate (M) held by a holding member (28) to perform exposure processing, comprising a holding process, which holds a prescribed region (AR3) of the substrate as the holding region by means of the holding member, and a deformation process, which selectively deforms one side of the holding region of the substrate held by the holding process with respect to the other side. According to the present invention, a prescribed region of the substrate is held as a holding region by means of a holding member, and one side of the holding region of said held substrate is selectively deformed with respect to the other side, so it is possible to selectively eliminate the nonlinear deformation components attributable to holding of the substrate with respect to one side from among the two sides of the substrate using the holding region as a reference.

Abstract: Methods and apparatus for shielding a reticle within an illumination system are disclosed. According to one aspect of the present invention, a blind arrangement for shielding an object such as a reticle includes a coil assembly which has at least one coil, an air supply that supplies air, and a first blind portion. The first blind portion includes at least one magnet and is not in physical contact with the coil. The first blind portion is supported at a distance from the coil by the air, and the coil assembly cooperates with the magnet to cause the first blind portion to move. The first blind portion shields the object when the first blind portion is in a first position.

Abstract: An immersion lithography system that compensating for any displacement of the optical caused by the immersion fluid. The system includes an optical assembly (14) to project an image defined by the reticle (12) onto the wafer (20). The optical assembly includes a final optical element (16) spaced from the wafer by a gap (24). An immersion element (22) is provided to supply an immersion fluid into the gap and to recover any immersion fluid that escapes the gap. A fluid compensation system is provided for the force on the final optical element of the optical assembly caused by pressure variations of the immersion fluid. The resulting force created by the varying pressure may cause final optical element to become displaced. The fluid compensation system is configured to provide a substantially equal, but opposite force on the optical assembly, to prevent the displacement of the final optical element.

Abstract: Methods and apparatus for providing relatively long travel in a transverse direction for a magnetic levitation stage apparatus are disclosed. According to one aspect of the present invention, a linear actuator includes a first core, a second core, and at least one coil wrapped around the first core. The first core includes a body portion and a plurality of rails. The body portion has a first axis and a second axis, and the rails have longitudinal axes that are perpendicular to the first axis and parallel to the second axis. The dimensions of the rails along the longitudinal axes are substantially larger than a dimension of the body portion along the second axis. The second core has a third axis that is oriented perpendicularly to the longitudinal axes and to the second axis, and is levitated relative to the first core when a current is provided through the coil.