Patents by Inventor Duck-Hwan Kim

Duck-Hwan Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12241641
    Abstract: Disclosed is an air heating apparatus including a burner configured to cause a combustion reaction, a main passage, through which water flows while circulating, a heat exchanging device configured to receive heat from combustion gas generated by the combustion reaction and heat the water flowing along the main passage, a heating heat exchanger configured to receive the water heated by the heat exchanging device and exchange heat with the air for heating, a fan configured to send the air to the heating heat exchanger, and a hot water discharge port connected to the main passage such that the water heated by the heat exchanging device is discharged to an outside of the main passage.
    Type: Grant
    Filed: November 18, 2021
    Date of Patent: March 4, 2025
    Assignee: KYUNGDONG NAVIEN CO., LTD.
    Inventors: Jun Kyu Park, Duck Sik Park, Dong Hwan Kim, Seong Sik Moon
  • Patent number: 12184265
    Abstract: A resonator package and a method of manufacturing the same are provided. The method of manufacturing a resonator package involves etching a lower electrode with a hardmask, in which only a portion of a thickness of the lower electrode is etched to shape the lower electrode.
    Type: Grant
    Filed: March 5, 2019
    Date of Patent: December 31, 2024
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Tae Yoon Kim, Yeong Gyu Lee, Moon Chul Lee, Jae Chang Lee, Duck Hwan Kim
  • Patent number: 12028048
    Abstract: A resonance apparatus that processes an electrical loss using a conductive material and a method of manufacturing the resonance apparatus are provided. The resonance apparatus includes a lower electrode formed at a predetermined distance from a substrate, and a piezoelectric layer formed on the lower electrode. The resonance apparatus further includes an upper electrode formed on the piezoelectric layer, and a conductive layer formed on the upper electrode or the lower electrode.
    Type: Grant
    Filed: April 30, 2021
    Date of Patent: July 2, 2024
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hosoo Park, Duck Hwan Kim, Chul Soo Kim, Sang Uk Son, In Sang Song, Jeashik Shin, Moonchul Lee
  • Patent number: 11894833
    Abstract: Disclosed is a bulk acoustic wave resonator (BAWR). The BAWR includes a bulk acoustic wave resonance unit with a first electrode, a second electrode, and a piezoelectric layer. The piezoelectric layer is disposed between the first electrode and the second electrode. An air edge is formed at a distance from a center of the bulk acoustic wave resonance unit.
    Type: Grant
    Filed: April 17, 2020
    Date of Patent: February 6, 2024
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jea Shik Shin, Duck Hwan Kim, Chul Soo Kim, Sang Uk Son, In Sang Song, Moon Chul Lee
  • Publication number: 20210250014
    Abstract: A resonance apparatus that processes an electrical loss using a conductive material and a method of manufacturing the resonance apparatus are provided. The resonance apparatus includes a lower electrode formed at a predetermined distance from a substrate, and a piezoelectric layer formed on the lower electrode. The resonance apparatus further includes an upper electrode formed on the piezoelectric layer, and a conductive layer formed on the upper electrode or the lower electrode.
    Type: Application
    Filed: April 30, 2021
    Publication date: August 12, 2021
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hosoo PARK, Duck Hwan KIM, Chul Soo KIM, Sang Uk SON, In Sang SONG, Jeashik SHIN, Moonchul LEE
  • Patent number: 11025225
    Abstract: A resonance apparatus that processes an electrical loss using a conductive material and a method of manufacturing the resonance apparatus are provided. The resonance apparatus includes a lower electrode formed at a predetermined distance from a substrate, and a piezoelectric layer formed on the lower electrode. The resonance apparatus further includes an upper electrode formed on the piezoelectric layer, and a conductive layer formed on the upper electrode or the lower electrode.
    Type: Grant
    Filed: May 11, 2020
    Date of Patent: June 1, 2021
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hosoo Park, Duck Hwan Kim, Chul Soo Kim, Sang Uk Son, In Sang Song, Jeashik Shin, Moonchul Lee
  • Patent number: 10991872
    Abstract: Provided is a bulk acoustic wave resonator (BAWR). The BAWR may include an air cavity disposed on a substrate, a bulk acoustic wave resonant unit including a piezoelectric layer, and a reflective layer to reflect a wave of a resonant frequency that is generated from the piezoelectric layer.
    Type: Grant
    Filed: November 30, 2017
    Date of Patent: April 27, 2021
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jea Shik Shin, Duck Hwan Kim, Chul Soo Kim, Ho Soo Park, Sang Uk Son, In Sang Song, Moon Chul Lee, Cui Jing
  • Patent number: 10868514
    Abstract: A resonance apparatus that processes an electrical loss using a conductive material and a method of manufacturing the resonance apparatus are provided. The resonance apparatus includes a lower electrode formed at a predetermined distance from a substrate, and a piezoelectric layer formed on the lower electrode. The resonance apparatus further includes an upper electrode formed on the piezoelectric layer, and a conductive layer formed on the upper electrode or the lower electrode.
    Type: Grant
    Filed: November 27, 2017
    Date of Patent: December 15, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hosoo Park, Duck Hwan Kim, Chul Soo Kim, Sang Uk Son, In Sang Song, Jeashik Shin, Moonchul Lee
  • Publication number: 20200274521
    Abstract: A resonance apparatus that processes an electrical loss using a conductive material and a method of manufacturing the resonance apparatus are provided. The resonance apparatus includes a lower electrode formed at a predetermined distance from a substrate, and a piezoelectric layer formed on the lower electrode. The resonance apparatus further includes an upper electrode formed on the piezoelectric layer, and a conductive layer formed on the upper electrode or the lower electrode.
    Type: Application
    Filed: May 11, 2020
    Publication date: August 27, 2020
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hosoo PARK, Duck Hwan KIM, Chul Soo KIM, Sang Uk SON, In Sang SONG, Jeashik SHIN, Moonchul LEE
  • Publication number: 20200244249
    Abstract: Disclosed is a bulk acoustic wave resonator (BAWR). The BAWR includes a bulk acoustic wave resonance unit with a first electrode, a second electrode, and a piezoelectric layer. The piezoelectric layer is disposed between the first electrode and the second electrode. An air edge is formed at a distance from a center of the bulk acoustic wave resonance unit.
    Type: Application
    Filed: April 17, 2020
    Publication date: July 30, 2020
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Jea Shik SHIN, Duck Hwan KIM, Chul Soo KIM, Sang Uk SON, In Sang SONG, Moon Chul LEE
  • Publication number: 20200195221
    Abstract: A piezoelectric thin film resonator includes: a wafer; a lower electrode positioned on top of the wafer; a piezoelectric layer positioned on top of the lower electrode; and an upper electrode positioned on top of the piezoelectric layer, wherein the upper electrode has concavo-convex patterns formed on top thereof in such a manner as to surround a resonance area formed thereon.
    Type: Application
    Filed: December 6, 2019
    Publication date: June 18, 2020
    Inventors: Yong Hun KO, Duck Hwan KIM, Jong Hyeon PARK
  • Patent number: 10686426
    Abstract: A resonance apparatus that processes an electrical loss using a conductive material and a method of manufacturing the resonance apparatus are provided. The resonance apparatus includes a lower electrode formed at a predetermined distance from a substrate, and a piezoelectric layer formed on the lower electrode. The resonance apparatus further includes an upper electrode formed on the piezoelectric layer, and a conductive layer formed on the upper electrode or the lower electrode.
    Type: Grant
    Filed: November 27, 2017
    Date of Patent: June 16, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hosoo Park, Duck Hwan Kim, Chul Soo Kim, Sang Uk Son, In Sang Song, Jeashik Shin, Moonchul Lee
  • Patent number: 10666224
    Abstract: Disclosed is a bulk acoustic wave resonator (BAWR). The BAWR includes a bulk acoustic wave resonance unit with a first electrode, a second electrode, and a piezoelectric layer. The piezoelectric layer is disposed between the first electrode and the second electrode. An air edge is formed at a distance from a center of the bulk acoustic wave resonance unit.
    Type: Grant
    Filed: April 24, 2017
    Date of Patent: May 26, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jea Shik Shin, Duck Hwan Kim, Chul Soo Kim, Sang Uk Son, In Sang Song, Moon Chul Lee
  • Patent number: 10511281
    Abstract: An acoustic wave resonator includes a substrate; a resonating part disposed on a first surface of the substrate and including a first electrode, a piezoelectric layer, and a second electrode; and a cap disposed on the first surface of the substrate and including an accommodating part accommodating the resonating part. The resonating part is configured to be operated by either one or both of a signal output from a first device substrate disposed facing a second surface of the substrate on an opposite side of the substrate from the first surface of the substrate and a signal output from a second device substrate disposed on the cap.
    Type: Grant
    Filed: August 9, 2016
    Date of Patent: December 17, 2019
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Ho Soo Park, Jea Shik Shin, Sang Uk Son, Yeong Gyu Lee, Moon Chul Lee, Duck Hwan Kim, Chul Soo Kim
  • Patent number: 10367471
    Abstract: A resonator package and a method of manufacturing the same are provided. The method of manufacturing a resonator package involves etching a lower electrode with a hardmask, in which only a portion of a thickness of the lower electrode is etched to shape the lower electrode.
    Type: Grant
    Filed: March 2, 2016
    Date of Patent: July 30, 2019
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Tae Yoon Kim, Yeong Gyu Lee, Moon Chul Lee, Jae Chang Lee, Duck Hwan Kim
  • Publication number: 20190199319
    Abstract: A resonator package and a method of manufacturing the same are provided. The method of manufacturing a resonator package involves etching a lower electrode with a hardmask, in which only a portion of a thickness of the lower electrode is etched to shape the lower electrode.
    Type: Application
    Filed: March 5, 2019
    Publication date: June 27, 2019
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Tae Yoon KIM, Yeong Gyu LEE, Moon Chul LEE, Jae Chang LEE, Duck Hwan KIM
  • Patent number: 10329142
    Abstract: A wafer level package includes a wafer member having inner cavities in which circuit elements are disposed, element wall members disposed on an internal surface of the wafer member and enclosing element sections in which the circuit elements are disposed, and clearance wall members disposed on external surfaces of the element wall members and dividing a space between the element sections into clearance sections.
    Type: Grant
    Filed: April 5, 2016
    Date of Patent: June 25, 2019
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Moon Chul Lee, Duck Hwan Kim, Yeong Gyu Lee, Jae Chang Lee, Tae Yoon Kim, Kyong Bok Min
  • Patent number: 10277196
    Abstract: In examples, there is provided a bulk acoustic wave resonator including a substrate; a resonating part including a first electrode, a piezoelectric layer, and a second electrode, laminated on an upper surface of the substrate, a cap bonded to the substrate by a bonding agent; and a sealing layer formed on an externally exposed surface of the bonding agent. This structure provides for a bulk acoustic wave resonator with improved reliability.
    Type: Grant
    Filed: January 13, 2016
    Date of Patent: April 30, 2019
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Khudoyberdiyev Khurshidjon, Duck Hwan Kim, Yeong Gyu Lee, Ho Joon Park, Moon Chul Lee
  • Patent number: 10263598
    Abstract: An acoustic resonator and a method of manufacturing the same are provided. The acoustic resonator includes a resonance part including a first electrode, a second electrode, and a piezoelectric layer disposed between the first and second electrodes; and a substrate disposed below the resonance part. The piezoelectric layer is disposed on a flat surface of the first electrode.
    Type: Grant
    Filed: October 28, 2015
    Date of Patent: April 16, 2019
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Jea Shik Shin, Sang Uk Son, Yeong Gyu Lee, Moon Chul Lee, Ho Soo Park, Duck Hwan Kim, Chul Soo Kim
  • Patent number: 10110197
    Abstract: A bulk acoustic wave resonator and a filter in which partial thicknesses of protection layers or reflection layers thereof are differently formed are provided. The bulk acoustic wave resonator includes a bulk acoustic wave resonating part comprising a piezoelectric layer, and a reflection layer configured to reflect waves of a resonance frequency generated by the piezoelectric layer based on a signal applied to the bulk acoustic wave resonating part. A thickness of a portion of the reflection layer is different from a thickness of a remaining portion thereof.
    Type: Grant
    Filed: November 6, 2015
    Date of Patent: October 23, 2018
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Jea Shik Shin, Sang Uk Son, Duck Hwan Kim