Abstract: The present invention relates generally to methods for producing renewable detergent compounds. More specifically, the invention relates to methods for producing detergent intermediates, including bio-linear alkylbenzene (LAB), bio-alcohols, and long chain bio-paraffins, from natural oils.

Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

Abstract: A measurement apparatus including an optical system to provide illumination radiation into a spot on a periodic structure and to receive radiation redirected by the periodic structure, the optical system including a first stop to block zero order radiation from the periodic structure and allow non-zero order radiation to pass, and a second stop to block zero order radiation passing the first stop and to allow the non-zero order radiation to pass, and a radiation detector, downstream of the optical system, to receive the non-zero order radiation.

Abstract: A monument mounted airbag system includes an airbag assembly including at least an airbag mounted directly forward of a passenger, and configured to deploy away from the passenger along an intercepting course with a predetermined path of travel of the passenger. Additionally, the airbag may be configured to substantially conform to a monument disposed in proximity thereto, and may include side support, lower support, and active vents.

Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

Abstract: A measurement apparatus including an optical system to provide illumination radiation into a spot on a periodic structure and to receive radiation redirected by the periodic structure, the optical system including a first stop to block zero order radiation from the periodic structure and allow non-zero order radiation to pass, and a second stop to block zero order radiation passing the first stop and to allow the non-zero order radiation to pass, and a radiation detector, downstream of the optical system, to receive the non-zero order radiation.

Abstract: A base plate apparatus that fits on a skid steer arms, teleboom or digger derrick boom system used to extract pole or pilings set deeply in the earth. Allows one person without the need for someone to hook chains or straps to extract the pole or piling. Greatly increases safety. It has a unique mounting system allowing the apparatus to be used on numerous types of equipment. The addition of a drop in tool allows the pulling of ground support anchors.

Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

Abstract: In one aspect of the present disclosure, an airfoil for a rotor blade of a gas turbine includes a normalized pressure side wall portion thickness, a normalized suction side wall portion thickness, a normalized leading edge wall thickness, and a normalized trailing edge wall thickness. The values of theses thicknesses define the pressure side wall portion thickness, the suction side wall portion thickness, the leading edge wall thickness, and the trailing edge wall thickness, which improve heat transfer, flow distribution, and mechanical load transfer.

Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.

Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.

Abstract: The present invention relates generally to methods for producing detergent compounds from waste plastic feedstocks. More specifically, the invention relates to methods for producing detergent intermediates, including alkylbenzenes, paraffins, olefins, oxo alcohols, and surfactant derivatives thereof from waste plastic feedstock.

Abstract: Light emitting devices include an LED that includes an n-type semiconductor layer and a p-type semiconductor layer that is stacked on top of the n-type semiconductor layer. A p-contact metallization stack is on top of the p-type semiconductor layer. An opening extends through the p-type semiconductor layer and the p-contact metallization stack that has a first region that penetrates the p-type semiconductor layer to expose the n-type semiconductor layer and a second region that penetrates the p-contact metallization stack. A bond metal stack is on top of the p-contact metallization stack, and a metal spacer layer is provided between the bond metal stack and the stacked semiconductor layers. The metal spacer layer fills the first region and at least partly fills the second region of the opening so that a lower surface of the bond metal stack is above a top surface of the p-type semiconductor layer.

Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.

Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.

Abstract: The present invention relates generally to methods for producing renewable detergent compounds. More specifically, the invention relates to methods for producing detergent intermediates, including bio-linear alkylbenzene (LAB), bio-alcohols, and long chain bio-paraffins, from natural oils.

Abstract: The present invention relates generally to methods for producing renewable detergent compounds. More specifically, the invention relates to methods for producing detergent intermediates, including bio-linear alkylbenzene (LAB), bio-alcohols, and long chain bio-paraffins, from natural oils.

Abstract: Systems and methods are disclosed for controlling the heating of a reticle. In one embodiment, a plurality of radiation sources generates a plurality of radiation beams (206) and delivers them to a patterning device (210) that absorbs a portion of the radiation from the beams and develops a spatially dependent heating profile. In a further embodiment, a plurality of resistive heating sources (906) generates heat in response to an applied voltage or current. The generated heat is absorbed by the patterning device from the resistive heating sources and leads to the development of a spatially dependent heating profile. Thermal stresses, strains, and deformations can be controlled by controlling the spatially dependent heating profile.

Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a cooling system and a heating system. The cooling system is configured to direct a gas flow along a first direction across a surface of the patterning device to remove heat from the patterning device prior to exposing the patterning device or during exposure of the patterning device. The heating system is configured to selectively heat areas on the surface of the patterning device prior to exposing the patterning device or during exposure of the patterning device. The selective heating and the heat removal achieve a substantially uniform temperature distribution in the patterning.