Patents by Inventor Edward Ng

Edward Ng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11372523
    Abstract: A method of interactively navigating a user through a path of menu choices on a user interface may include displaying a current menu of choices on a first portion of a user interface display. The user interface allows for selecting of a menu item from the current menu of choices and to drill down through levels of menu choices based on selecting a menu item from a prior level of menu choices. A second portion of the user interface display presents past selected and past unselected menu items of the drilled-down levels. The past unselected menu items are displayed as selectable options. The user interface allows for jumping to a different path of menu choices by selecting a past unselected menu item from a previously navigated menu level displayed on the second portion of the user interface display.
    Type: Grant
    Filed: February 26, 2021
    Date of Patent: June 28, 2022
    Assignee: MESO SCALE TECHNOLOGIES, LLC.
    Inventors: Jacob N. Wohlstadter, George Sigal, Edward J. S. Roques, Louis W. Pang, Pankaj Oberoi, Kin Ng, Michael Vock
  • Patent number: 11018036
    Abstract: Methods, apparatus, and assemblies are provided for a substrate carrier adapter insert including an adapter frame including a support rail adapted to support one or more substrates in a substrate carrier, a frame extension coupled to, or integral with, the adapter frame, and a mapping feature formed on the frame extension and disposed to be detected by a sensor for determining whether an adapter insert is present or absent in a substrate carrier. Numerous additional features are disclosed.
    Type: Grant
    Filed: August 13, 2018
    Date of Patent: May 25, 2021
    Assignee: Applied Materials, Inc.
    Inventors: John J. Mazzocco, Edward Ng, Douglas MacLeod, David Phillips, Ayan Majumdar, Jeffrey C. Hudgens
  • Patent number: 10796935
    Abstract: An electronic device manufacturing system may include a loadlock. The loadlock may include a plurality of gas line heaters for providing a heated gas to the loadlock to heat a processed substrate therein. Heating a processed substrate may reduce corrosion in the loadlock and subsequent contamination of substrates therein. The loadlock may also include a plurality of embedded heaters in the loadlock housing to reduce moisture therein, further reducing corrosion and contamination. Methods of heating a substrate in a loadlock are also provided, as are other aspects.
    Type: Grant
    Filed: March 17, 2017
    Date of Patent: October 6, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Adam J. Wyatt, Edward Ng, Andrew Nguyen
  • Publication number: 20200126826
    Abstract: A load lock apparatus may include a body portion including one or more surfaces. A first groove may extend into and along a first surface of the one or more surfaces. A first tube may be received in the first groove, wherein the first tube may be configured to transport a liquid (e.g., to thermally control the body portion). Other apparatus and methods of manufacturing load lock apparatus in accordance with these and other embodiments are disclosed.
    Type: Application
    Filed: October 18, 2018
    Publication date: April 23, 2020
    Inventors: Ram Dayal Malviya, Travis Morey, Theodossios V. Costuros, Michael C. Kuchar, Pandu Maddherla, Richard Giljum, Edward Ng
  • Patent number: 10199256
    Abstract: In some embodiments, methods and systems are provided for improved handling of lithography masks including loading a mask via a first load port from a first carrier; inverting the mask using a first contact pad; cleaning the mask; inverting the mask using a second contact pad; and unloading the mask via a second load port into a second carrier. Numerous other aspects are provided.
    Type: Grant
    Filed: September 27, 2014
    Date of Patent: February 5, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Edward Ng, Jeffrey C. Hudgens, Ayan Majumdar, Sushant S. Koshti
  • Publication number: 20180350637
    Abstract: Methods, apparatus, and assemblies are provided for a substrate carrier adapter insert including an adapter frame including a support rail adapted to support one or more substrates in a substrate carrier, a frame extension coupled to, or integral with, the adapter frame, and a mapping feature formed on the frame extension and disposed to be detected by a sensor for determining whether an adapter insert is present or absent in a substrate carrier. Numerous additional features are disclosed.
    Type: Application
    Filed: August 13, 2018
    Publication date: December 6, 2018
    Inventors: John J. Mazzocco, Edward Ng, Douglas MacLeod, David Phillips, Ayan Majumdar, Jeffrey C. Hudgens
  • Patent number: 10115616
    Abstract: Methods, apparatus, and assemblies are provided for an adapter insert including an adapter frame including a support rail adapted to support one or more substrates in a substrate carrier, a frame extension coupled to, or integral with, the adapter frame, and a mapping feature formed on the frame extension and disposed to be detected by a sensor for determining whether an adapter insert is present or absent in a substrate carrier. Numerous additional features are disclosed.
    Type: Grant
    Filed: July 16, 2014
    Date of Patent: October 30, 2018
    Assignee: Applied Materials, Inc.
    Inventors: John J. Mazzocco, Edward Ng, Douglas MacLeod, David Phillips, Ayan Majumdar, Jeffrey C. Hudgens
  • Publication number: 20180270910
    Abstract: An electronic device manufacturing system may include a loadlock. The loadlock may include a plurality of gas line heaters for providing a heated gas to the loadlock to heat a processed substrate therein. Heating a processed substrate may reduce corrosion in the loadlock and subsequent contamination of substrates therein. The loadlock may also include a plurality of embedded heaters in the loadlock housing to reduce moisture therein, further reducing corrosion and contamination. Methods of heating a substrate in a loadlock are also provided, as are other aspects.
    Type: Application
    Filed: March 17, 2017
    Publication date: September 20, 2018
    Inventors: Adam J. Wyatt, Edward Ng, Andrew Nguyen
  • Publication number: 20170316967
    Abstract: In some embodiments, apparatus and methods are provided for improved handling of lithography masks including a mask inverter that includes a first contact pad dedicated to inverting masks that have not been cleaned; a second contact pad dedicated to inverting masks that have been cleaned; an actuator coupled to the first and second contact pads and operable to invert the first and second contact pads; and a controller coupled to the actuator and operative to control the actuator. Numerous other aspects are provided.
    Type: Application
    Filed: July 19, 2017
    Publication date: November 2, 2017
    Inventors: Edward Ng, Jeffrey C. Hudgens, Ayan Majumdar, Sushant S. Koshti
  • Patent number: 9441792
    Abstract: Transfer chamber gas purge apparatus are disclosed. The transfer chamber gas purge apparatus has a transfer chamber adapted to contain at least a portion of a transfer robot, the transfer chamber including side walls, a chamber lid, and a chamber floor, wherein the chamber lid has a plurality of distributed chamber inlets. The plurality of distributed chamber inlets may include diffusing elements. Laminar purge gas flow may be provided above the substrate. Systems and methods including a plurality of distributed chamber inlets are disclosed, as are numerous other aspects.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: September 13, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Edward Ng, Eric A. Englhardt, Travis Morey, Ayan Majumdar, Steve S. Hongkham
  • Publication number: 20150090294
    Abstract: In some embodiments, methods and systems are provided for improved handling of lithography masks including loading a mask via a first load port from a first carrier; inverting the mask using a first contact pad; cleaning the mask; inverting the mask using a second contact pad; and unloading the mask via a second load port into a second carrier. Numerous other aspects are provided.
    Type: Application
    Filed: September 27, 2014
    Publication date: April 2, 2015
    Inventors: Edward Ng, Jeffrey C. Hudgens, Ayan Majumdar, Sushant S. Koshti
  • Publication number: 20150090341
    Abstract: Transfer chamber gas purge apparatus are disclosed. The transfer chamber gas purge apparatus has a transfer chamber adapted to contain at least a portion of a transfer robot, the transfer chamber including side walls, a chamber lid, and a chamber floor, wherein the chamber lid has a plurality of distributed chamber inlets. The plurality of distributed chamber inlets may include diffusing elements. Laminar purge gas flow may be provided above the substrate. Systems and methods including a plurality of distributed chamber inlets are disclosed, as are numerous other aspects.
    Type: Application
    Filed: September 26, 2014
    Publication date: April 2, 2015
    Inventors: Edward Ng, Eric A. Englhardt, Travis Morey, Ayan Majumdar, Steve S. Hongkham
  • Publication number: 20150090295
    Abstract: In some embodiments, apparatus and methods are provided for improved handling of lithography masks including a mask inverter that includes a first contact pad dedicated to inverting masks that have not been cleaned; a second contact pad dedicated to inverting masks that have been cleaned; an actuator coupled to the first and second contact pads and operable to invert the first and second contact pads; and a controller coupled to the actuator and operative to control the actuator. Numerous other aspects are provided.
    Type: Application
    Filed: September 27, 2014
    Publication date: April 2, 2015
    Inventors: Edward Ng, Jeffrey C. Hudgens, Ayan Majumdar, Sushant S. Koshti
  • Publication number: 20150022821
    Abstract: Methods, apparatus, and assemblies are provided for an adapter insert including an adapter frame including a support rail adapted to support one or more substrates in a substrate carrier, a frame extension coupled to, or integral with, the adapter frame, and a mapping feature formed on the frame extension and disposed to be detected by a sensor for determining whether an adapter insert is present or absent in a substrate carrier. Numerous additional features are disclosed.
    Type: Application
    Filed: July 16, 2014
    Publication date: January 22, 2015
    Inventors: John J. Mazzocco, Edward Ng, Douglas MacLeod, David Phillips, Ayan Majumdar, Jeffrey C. Hudgens
  • Patent number: 8632948
    Abstract: The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.
    Type: Grant
    Filed: September 30, 2009
    Date of Patent: January 21, 2014
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Munirathna Padmanaban, Srinivasan Chakrapani, Francis M. Houlihan, Shinji Miyazaki, Edward Ng, Mark O. Neisser
  • Patent number: 8623589
    Abstract: The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.
    Type: Grant
    Filed: June 6, 2011
    Date of Patent: January 7, 2014
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Takanori Kudo, Alberto Dioses, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban
  • Patent number: 8363356
    Abstract: A base layer for a suspension. The base layer includes a structure. The structure has a slider end portion and a tail portion. The structure includes an opening in the tail portion. The opening provides access to a conductive assembly coupleable there with. The structure also includes a strengthening member integrated within said opening.
    Type: Grant
    Filed: July 28, 2008
    Date of Patent: January 29, 2013
    Assignee: HGST, Netherlands B.V.
    Inventors: George A. Dunn, Edward Ng
  • Publication number: 20120308939
    Abstract: The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.
    Type: Application
    Filed: June 6, 2011
    Publication date: December 6, 2012
    Applicant: AZ ELECTRONIC MATERIALS USA CORP.
    Inventors: Takanori Kudo, Alberto Dioses, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban
  • Publication number: 20120122029
    Abstract: The present invention relates to a photoimageable underlayer composition comprising a polymer, a crosslinker comprising a vinyl ether group, and a thermal acid generator comprising a salt of a mono or polycarboxylic acid and an amine, where the amine has a boiling point of at least 150° C. The invention also relates to a process for forming an image in the underlayer comprising the novel composition.
    Type: Application
    Filed: November 11, 2010
    Publication date: May 17, 2012
    Inventors: Takanori Kudo, Alberto Dioses, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban
  • Publication number: 20110076626
    Abstract: The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.
    Type: Application
    Filed: September 30, 2009
    Publication date: March 31, 2011
    Inventors: Munirathna Padmanaban, Srinivasan Chakrapani, Francis M. Houlihan, Shinji Miyazaki, Edward Ng, Mark O. Neisser