Abstract: A method for providing position control information for controlling an impingement position of a laser beam for treatment of a chip die in a chip manufacturing process, comprises the steps of a) receiving a specification of positions (x,y) of a electrically conductive elements in the chip die, the positions having a first coordinate along a first direction (x) and a second coordinate (y) along a second direction in a plane defined by the chip die, said first and second direction being mutually transverse to each other, b) selecting a cluster of positions that is within a predetermined two-dimensional spatial range, wherein each pair of positions in the cluster at least has a first minimum difference in their first coordinates or a second minimum difference in their second coordinates and removing the next position from the ordered set, c) update the positions of the set of positions in accordance with an expected time needed to carry out the treatment for said cluster and a speed of a wafer comprising the chi

Abstract: A method for providing position control information for controlling an impingement position of a laser beam for treatment of a chip die in a chip manufacturing process, comprises the steps of a) receiving a specification of positions (x,y) of a electrically conductive elements in the chip die, the positions having a first coordinate along a first direction (x) and a second coordinate (y) along a second direction in a plane defined by the chip die, said first and second direction being mutually transverse to each other, b) selecting a cluster of positions that is within a predetermined two-dimensional spatial range, wherein each pair of positions in the cluster at least has a first minimum difference in their first coordinates or a second minimum difference in their second coordinates and removing the next position from the ordered set, c) update the positions of the set of positions in accordance with an expected time needed to carry out the treatment for said cluster and a speed of a wafer comprising the chi

Abstract: Method and system for inspecting the inside of a small channel, e.g. a flexible tube or hose, particularly for medical use, e.g. included in an endoscope, for the presence of inside contaminations on the wall of the tube, comprising providing the inside of the channel with a liquid having a refractive index which is higher than the refractive index of the channel wall, transmitting a signal into one end of the channel having a wavelength w, comparing the spectrum of the signal received at the other end of the channel with the wavelength w of the transmitted signal and determining, e.g. by a spectrum analyzer, whether the latter signal contains any wavelength w? which is unequal to the wavelength w of the transmitted signal, and indicating that, when not any wavelength w? is determined unequal to w, the channel is not contaminated or that, when any wavelength w? is determined unequal to w, the channel is contaminated.

Abstract: A lithographic apparatus includes a vessel that encloses a component with a test surface to be probed for contamination control; and an optical probe configured to transmit and receive an optical probing beam. The vessel includes a first optical port configured to transfer the optical probing beam towards the test surface, and a second optical port configured to receive a reflected optical probing beam. The optical probe includes a light source configured to provide the optical probing beam, a polarization conditioner configured to provide a predefined polarization state to the probing beam, and a spectral analyzer. The polarization conditioner is preset to provide a minimal transmission for a minimal transmission wavelength, and the spectral analyzer is arranged to detect a wavelength shift of the minimal transmission wavelength in response to a polarization change due to the presence of contamination.

Abstract: Method and system for inspecting the inside of a small channel, e.g. a flexible tube or hose, particularly for medical use, e.g. included in an endoscope, for the presence of inside contaminations on the wall of the tube, comprising providing the inside of the channel with a liquid having a refractive index which is higher than the refractive index of the channel wall, transmitting a signal into one end of the channel having a wavelength w, comparing the spectrum of the signal received at the other end of the channel with the wavelength w of the transmitted signal and determining, e.g. by a spectrum analyzer, whether the latter signal contains any wavelength w? which is unequal to the wavelength w of the transmitted signal, and indicating that, when not any wavelength w? is determined unequal to w, the channel is not contaminated or that, when any wavelength w? is determined unequal to w, the channel is contaminated.

Abstract: The invention relates to an inspection apparatus and a method for inspecting a sample, such as a lithographic patterning device or mask, for anomalies, such as contamination particles or defects. The inspection apparatus includes a support structure constructed and arranged to support the sample, and a radiation system constructed and arranged to radiate a sample with a radiation beam. The radiation system is provided with a first polarizer. The apparatus also includes a detection system constructed and arranged to detect radiation that is reflected from the sample with a detector. The detection system is provided with a second polarizer.

Abstract: A lithographic apparatus includes a vessel that encloses a component with a test surface to be probed for contamination control; and an optical probe configured to transmit and receive an optical probing beam. The vessel includes a first optical port configured to transfer the optical probing beam towards the test surface, and a second optical port configured to receive a reflected optical probing beam. The optical probe includes a light source configured to provide the optical probing beam, a polarization conditioner configured to provide a predefined polarization state to the probing beam, and a spectral analyzer. The polarization conditioner is preset to provide a minimal transmission for a minimal transmission wavelength, and the spectral analyzer is arranged to detect a wavelength shift of the minimal transmission wavelength in response to a polarization change due to the presence of contamination.