Patents by Inventor Eiji Ideta

Eiji Ideta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8137787
    Abstract: The object of the present invention is to form a chromium-oxide film, excellent in corrosion resistance, without containing an oxide film of other metal onto the metallic material. The chromium-oxide passivation film, excellent in corrosion resistance, without containing the oxide film of other metal can be formed inexpensively and in a short time, and a fluid supplying system for safely supplying fluid with hard corrosivity is able to be provided. One step of forming the passivation film consisting of a chromium oxide layer by giving heat treatment, in an oxidizing atmosphere, after coating chromium on the metallic material having a surface roughness (Ra) not more than 1.5 ?m.
    Type: Grant
    Filed: January 13, 2000
    Date of Patent: March 20, 2012
    Assignees: Fujikin, Inc.
    Inventors: Tadahiro Ohmi, Yasuyuki Shirai, Nobukazu Ikeda, Eiji Ideta, Akihiro Morimoto, Tetsutaro Ogushi, Takehisa Konishi
  • Patent number: 7935385
    Abstract: The object of the present invention is to form a chromium-oxide film excellent in corrosion resistance without containing an oxide film of other metal onto the optional metallic material. The chromium-oxide passivation film excellent in corrosion resistance without containing the oxide film of other metal can be formed inexpensively and in a short time, and a fluid supplying system for supplying fluid hard in corrosivity in safety is able to be provided. This invention comprises a step of forming the passivation film consisting of a chromium oxide by giving heat treatment in an oxidizing atmosphere after coating chromium on metallic material of which surface roughness (Ra) of a coat surface is not more than 1.
    Type: Grant
    Filed: August 21, 2003
    Date of Patent: May 3, 2011
    Assignees: Fujikin, Inc.
    Inventors: Tadahiro Ohmi, Yasuyuki Shirai, Nobukazu Ikeda, Eiji Ideta, Akihiro Morimoto, Tetsutaro Ogushi, Takehisa Konishi
  • Patent number: 7497482
    Abstract: A pipe joint comprises a first joint member of synthetic resin having an annular recessed portion in an end face thereof, and a second joint member of synthetic resin having an annular ridge on an end face thereof. The ridge is fitted in the opening of the recessed portion, with a synthetic resin gasket fitted in the recessed portion. When the pipe joint is properly tightened up, the outer surface of the ridge of the second joint member is pressed against the inner surface of the recessed portion of the first joint member with the gasket interposed therebetween in intimate contact with the surfaces approximately over the entire areas thereof.
    Type: Grant
    Filed: March 19, 2003
    Date of Patent: March 3, 2009
    Assignee: Fujikin Incorporated
    Inventors: Kazuhiko Sugiyama, Keiko Hada, Eiji Ideta, Nobukazu Ikeda, Naofumi Yasumoto, Michio Yamaji
  • Publication number: 20080003441
    Abstract: The object of the present invention is to form a chromium-oxide film excellent in corrosion resistance without containing an oxide film of other metal onto the optional metallic material. The chromium-oxide passivation film excellent in corrosion resistance without containing the oxide film of other metal can be formed inexpensively and in a short time, and a fluid supplying system for supplying fluid hard in corrosivity in safety is able to be provided. This invention comprises a step of forming the passivation film consisting of a chromium oxide by giving heat treatment in an oxidizing atmosphere after coating chromium on metallic material of which surface roughness (Ra) of a coat surface is not more than 1.
    Type: Application
    Filed: July 30, 2007
    Publication date: January 3, 2008
    Applicant: TADAHIRO OHMI
    Inventors: Tadahiro Ohmi, Yasuyuki Shirai, Nobukazu Ikeda, Eiji Ideta, Akihiro Morimoto, Tetsutaro Ogushi, Takehisa Konishi
  • Patent number: 7150444
    Abstract: A valve with an integral orifice for use in gas feeding equipment provided with a pressure-type flow volume control device to be employed for manufacturing of semi-conductors and chemical goods. The valve with an integral orifice has the excellent flow rate control characteristics by improving the processing accuracy of the orifice and preventing the distortion of the orifice at the time of assembling. The orifice is formed in a stainless steel made orifice disc. The metal-made orifice disc with the orifice formed by separate processing and the synthetic-resin-made valve seat body are removably assembled, wherein the orifice disc and the synthetic resin made valve seat body are fixed airtight to the valve main body by pressing the valve seat body via a metal inner disc.
    Type: Grant
    Filed: December 15, 2004
    Date of Patent: December 19, 2006
    Assignees: Fujikin Incorporated
    Inventors: Tadahiro Ohmi, Kouji Nishino, Nobukazu Ikeda, Michio Yamaji, Ryousuke Dohi, Eiji Ideta, Takashi Hirose
  • Publication number: 20060174977
    Abstract: The object of the present invention is to form a chromium-oxide film excellent in corrosion resistance without containing an oxide film of other metal onto the optional metallic material. The chromium-oxide passivation film excellent in corrosion resistance without containing the oxide film of other metal can be formed inexpensively and in a short time, and a fluid supplying system for supplying fluid hard in corrosivity in safety is able to be provided. This invention comprises a step of forming the passivation film consisting of a chromium oxide by giving heat treatment in an oxidizing atmosphere after coating chromium on metallic material of which surface roughness (Ra) of a coat surface is not more than 1.
    Type: Application
    Filed: August 21, 2003
    Publication date: August 10, 2006
    Inventors: Tadahiro Ohmi, Yasuyuki Shirai, Nobukazu Ikeda, Eiji Ideta, Akihiro Morimoto, Tetsutaro Ogushi, Takehisa Konishi
  • Publication number: 20050179259
    Abstract: A pipe joint 1 comprises a first joint member 2 of synthetic resin having an annular recessed portion 7 in an end face thereof, and a second joint member 3 of synthetic resin having an annular ridge 8 on an end face thereof. The ridge 8 is fitted in the opening of the recessed portion 7, with a synthetic resin gasket 4 fitted in the recessed portion 7.
    Type: Application
    Filed: March 19, 2003
    Publication date: August 18, 2005
    Inventors: Kazuhiko Sugiyama, Keiko Hada, Eiji Ideta, Nobukazu Ikeda, Naofumi Yasumoto, Michio Yamaji
  • Publication number: 20050109967
    Abstract: A valve with an integral orifice for use in gas feeding equipment provided with a pressure-type flow volume control device to be employed for manufacturing of semi-conductors and chemical goods. The valve with an integral orifice has the excellent flow rate control characteristics by improving the processing accuracy of the orifice and preventing the distortion of the orifice at the time of assembling. The orifice is formed in a stainless steel made orifice disc. The metal-made orifice disc with the orifice formed by separate processing and the synthetic-resin-made valve seat body are removably assembled, wherein the orifice disc and the synthetic resin made valve seat body are fixed airtight to the valve main body by pressing the valve seat body via a metal inner disc.
    Type: Application
    Filed: December 15, 2004
    Publication date: May 26, 2005
    Applicant: FUJIKIN INCORPORATED
    Inventors: Tadahiro Ohmi, Kouji Nishino, Nobukazu Ikeda, Michio Yamaji, Ryousuke Dohi, Eiji Ideta, Takashi Hirose
  • Patent number: 6871803
    Abstract: A valve with an integral orifice for use in gas feeding equipment provided with a pressure-type flow volume control device to be employed for manufacturing of semi-conductors and chemical goods. The valve with an integral orifice has the excellent flow rate control characteristics by improving the processing accuracy of the orifice and preventing the distortion of the orifice at the time of assembling. The orifice is formed in a stainless steel made orifice disc. The metal-made orifice disc with the orifice formed by separate processing and the synthetic-resin-made valve seat body are removably assembled, wherein the orifice disc and the synthetic resin made valve seat body are fixed airtight to the valve main body by pressing the valve seat body via a metal inner disc.
    Type: Grant
    Filed: June 5, 2000
    Date of Patent: March 29, 2005
    Assignees: Fujikin Incorporated
    Inventors: Tadahiro Ohmi, Kouji Nishino, Nobukazu Ikeda, Michio Yamaji, Ryousuke Dohi, Eiji Ideta, Takashi Hirose
  • Patent number: 6848470
    Abstract: A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time ?t from the starting point. The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.
    Type: Grant
    Filed: February 11, 2004
    Date of Patent: February 1, 2005
    Assignees: Fujikin Incorporated, Tokyo Electron Ltd.
    Inventors: Tadahiro Ohmi, Satoshi Kagatsume, Kazuhiko Sugiyama, Yukio Minami, Kouji Nishino, Ryousuke Dohi, Katsunori Yonehana, Nobukazu Ikeda, Michio Yamaji, Jun Hirose, Kazuo Fukazawa, Hiroshi Koizumi, Hideki Nagaoka, Akihiro Morimoto, Tomio Uno, Eiji Ideta, Atsushi Matsumoto, Toyomi Uenoyama, Takashi Hirose
  • Patent number: 6820632
    Abstract: A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time At from the starting point. The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.
    Type: Grant
    Filed: June 6, 2002
    Date of Patent: November 23, 2004
    Assignees: Fujikin Incorporated, Tokyo Electron Ltd.
    Inventors: Tadahiro Ohmi, Satoshi Kagatsume, Kazuhiko Sugiyama, Yukio Minami, Kouji Nishino, Ryousuke Dohi, Katsunori Yonehana, Nobukazu Ikeda, Michio Yamaji, Jun Hirose, Kazuo Fukazawa, Hiroshi Koizumi, Hideki Nagaoka, Akihiro Morimoto, Tomio Uno, Eiji Ideta, Atsushi Matsumoto, Toyomi Uenoyama, Takashi Hirose
  • Publication number: 20040154664
    Abstract: A fluid supply apparatus with a plurality of flow lines branching out from one regulator for adjustment of pressure, the flow lines being arranged in parallel, wherein a measure is taken that the operation, that is, opening or closing of one flow passage will have no transient effect on the steady flow of the other flow passages. For this purpose, each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time &Dgr;t from the starting point.
    Type: Application
    Filed: February 11, 2004
    Publication date: August 12, 2004
    Applicants: Fujikin Incorporated, Tokyo Electron Ltd.
    Inventors: Tadahiro Ohmi, Satoshi Kagatsume, Kazuhiko Sugiyama, Yukio Minami, Kouji Nishino, Ryousuke Dohi, Katsunori Yonehana, Nobukazu Ikeda, Michio Yamaji, Jun Hirose, Kazuo Fukazawa, Hiroshi Koizumi, Hideki Nagaoka, Akihiro Morimoto, Tomio Uno, Eiji Ideta, Atsushi Matsumoto, Toyomi Uenoyama, Takashi Hirose
  • Patent number: 6606912
    Abstract: A construction for mounting a pressure detector prevents the detector diaphragm from being strained by stress applied to the pressure detector as the detector is mounted in a fixture main body provided in a pipe line or the like, thereby keeping the output characteristics and temperature characteristics of the detector from greatly differing before and after the mounting. The pressure detector is constructed by combining and fastening together a diaphragm base having a diaphragm and a sensor base having a sensor element therein that is activated by displacement of the diaphragm base. The pressure detector, with a gasket placed thereunder, is disposed in a mounting hole of a fixture main body that is mounted in a pipe line. The pressure detector is air-tightly pressed and fastened by a presser member inserted from above in the mounting hole.
    Type: Grant
    Filed: April 4, 2001
    Date of Patent: August 19, 2003
    Assignees: Fujikin Incorporated, Tokyo Electron Ltd
    Inventors: Tadahiro Ohmi, Takashi Hirose, Eiji Ideta, Nobukazu Ikeda, Ryousuke Dohi, Kouji Nishino, Kazuhiro Yoshikawa, Satoshi Kagatsume, Jun Hirose, Kazuo Fukasawa, Hiroshi Koizumi, Hideki Nagaoka
  • Publication number: 20020179149
    Abstract: A fluid supply apparatus with a plurality of flow lines branching out from one regulator for adjustment of pressure, the flow lines being arranged in parallel, wherein a measure is taken that the operation, that is, opening or closing of one flow passage will have no transient effect on the steady flow of the other flow passages. For this purpose, each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time &Dgr;t from the starting point.
    Type: Application
    Filed: June 6, 2002
    Publication date: December 5, 2002
    Inventors: Tadahiro Ohmi, Satoshi Kagatsume, Kazuhiko Sugiyama, Yukio Minami, Kouji Nishino, Ryousuke Dohi, Katsunori Yonehana, Nobukazu Ikeda, Michio Yamaji, Jun Hirose, Kazuo Fukazawa, Hiroshi Koizumi, Hideki Nagaoka, Akihiro Morimoto, Tomio Uno, Eiji Ideta, Atsushi Matsumoto, Toyomi Uenoyama, Takashi Hirose
  • Patent number: 6450190
    Abstract: A method of detecting abnormalities in flow rate in pressure-type flow controller. The method checks the flow rate for abnormalities while controlling the flow rate of fluid in a pressure-type flow controller FCS using an orifice—the pressure-type flow controller wherein with the upstream pressure P1 maintained about two or more times higher than the downstream pressure P2, the downstream flow rate QC is calculated by the equation QC=KP1 (K: constant) and wherein the control valve CV is controlled on the basis of the difference signal QY between the calculated flow rate QC and the set flow rate QS.
    Type: Grant
    Filed: April 6, 2001
    Date of Patent: September 17, 2002
    Assignees: Tokyo Electron Ltd., Fujikin Incorporated
    Inventors: Tadahiro Ohmi, Seiichi Iida, Satoshi Kagatsume, Jun Hirose, Kazuo Fukasawa, Hiroshi Koizumi, Hideki Nagaoka, Tomio Uno, Kouji Nishino, Nobukazu Ikeda, Ryousuke Dohi, Eiji Ideta
  • Patent number: 6422264
    Abstract: A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time &Dgr;t from the starting point. The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.
    Type: Grant
    Filed: December 13, 2000
    Date of Patent: July 23, 2002
    Assignees: Fujikin Incorporated, OHMI, Tadahiro, Tokyo Electron Ltd.
    Inventors: Tadahiro Ohmi, Satoshi Kagatsume, Kazuhiko Sugiyama, Yukio Minami, Kouji Nishino, Ryousuke Dohi, Katsunori Yonehana, Nobukazu Ikeda, Michio Yamaji, Jun Hirose, Kazuo Fukazawa, Hiroshi Koizumi, Hideki Nagaoka, Akihiro Morimoto, Tomio Uno, Eiji Ideta, Atsushi Matsumoto, Toyomi Uenoyama, Takashi Hirose
  • Publication number: 20020005785
    Abstract: A method checks the flow rate for abnormalities while controlling the flow rate of fluid in a pressure-type flow controller FCS using an orifice—the pressure-type flow controller wherein with the upstream pressure P1 maintained about two or more times higher than the downstream pressure P2, the downstream flow rate QC is calculated by the equation QC=KP1 (K: constant) and wherein the control valve CV is controlled on the basis of the difference signal QY between the calculated flow rate QC and the set flow rate QS.
    Type: Application
    Filed: April 6, 2001
    Publication date: January 17, 2002
    Inventors: Tadahiro Ohmi, Seiichi Iida, Satoshi Kagatsume, Jun Hirose, Kazuo Fukasawa, Hiroshi Koizumi, Hideki Nagaoka, Tomio Uno, Kouji Nishino, Nobukazu Ikeda, Ryousuke Dohi, Eiji Ideta
  • Publication number: 20010035052
    Abstract: A construction for mounting a pressure detector prevents the detector diaphragm from being strained by stress applied to the pressure detector as the detector is mounted in a fixture main body provided in a pipe line or the like, thereby keeping the output characteristics and temperature characteristics of the detector from greatly differing before and after the mounting. The pressure detector is constructed by combining and fastening together a diaphragm base having a diaphragm and a sensor base having a sensor element therein that is activated by displacement of the diaphragm base. The pressure detector, with a gasket placed thereunder, is disposed in a mounting hole of a fixture main body that is mounted in a pipe line. The pressure detector is air-tightly pressed and fastened by a presser member inserted from above in the mounting hole.
    Type: Application
    Filed: April 4, 2001
    Publication date: November 1, 2001
    Inventors: Tadahiro Ohmi, Takashi Hirose, Eiji Ideta, Nobukazu Ikeda, Ryousuke Dohi, Kouji Nishino, Kazuhiro Yoshikawa, Satoshi Kagatsume, Jun Hirose, Kazuo Fukasawa, Hiroshi Koizumi, Hideki Nagaoka
  • Patent number: 6302130
    Abstract: A method and apparatus for detection of clogging of an orifice by measuring the upstream side pressure without breaking up the piping system in a flow rate control unit using an orifice, so as to extend the life of the flow rate control unit and enhance its safety. The apparatus of detecting clogging of an orifice in a pressure-type flow rate controller has a control valve (CV), an orifice (2), a pressure detector (14) for measuring the upstream pressure P1 therebetween, and a flow rate setting circuit (32) wherein, with the upstream pressure P1 maintained about two or more times higher than the downstream pressure P2, the downstream flow rate QC is calculated with the equation QC=KP1 (K=constant) and wherein the control valve (CV) is controlled by the difference signal QY between the calculated flow rate QC and the set flow rate QS.
    Type: Grant
    Filed: July 18, 2000
    Date of Patent: October 16, 2001
    Assignees: Fujikin Incorporated, Tokyo Electron Ltd.
    Inventors: Tadahiro Ohmi, Seiichi Iida, Satoshi Kagatsume, Jun Hirose, Kouji Nishino, Nobukazu Ikeda, Michio Yamaji, Ryousuke Dohi, Kazuhiro Yoshikawa, Mutsunori Koyomogi, Tomio Uno, Eiji Ideta, Takashi Hirose
  • Patent number: 6289923
    Abstract: An improved and reduced-size and low-cost gas supply system equipped with a pressure-type flow rate control unit, to be used, for instance, in semiconductor manufacturing facilities is disclosed. Transient flow rate characteristics are improved to prevent the gas from overshooting when the gas supply is started, and to raise the flow rate control accuracy and reliability of facilities. That eliminates non-uniformity of products or semiconductors and raises the production efficiency.
    Type: Grant
    Filed: June 2, 2000
    Date of Patent: September 18, 2001
    Assignees: Fujikin Incorporated, Tokyo Electron Ltd.
    Inventors: Tadahiro Ohmi, Satoshi Kagatsume, Nobukazu Ikeda, Kouji Nishino, Kazuhiro Yoshikawa, Eiji Ideta, Ryousuke Dohi, Tomio Uno, Michio Yamaji