Patents by Inventor Eiji Suzuki
Eiji Suzuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180008133Abstract: The endoscope includes an imaging device that is provided in a tip portion of an insertion part capable of being inserted into a body cavity. The imaging device includes an image sensor that photoelectrically converts imaging light incident on an image receiving surface thereof through an imaging lens provided in a lens barrel, and a circuit substrate including a connecting surface facing a terminal face that is a surface opposite to the image receiving surface of the image sensor. A plurality of terminals are uniformly arranged longitudinally and laterally in a two-dimensional matrix form on the terminal face of the image sensor, and the connecting surface of the circuit substrate and the terminal face of the image sensor are connected to each other through the plurality of terminals. The total area of the plurality of terminals on the terminal face occupies 10% or more of the area of an imaging area of the image receiving surface.Type: ApplicationFiled: June 6, 2017Publication date: January 11, 2018Applicant: FUJIFILM CorporationInventors: Ryo KITANO, Shinichiro SONODA, Takashi YANO, Eiji SUZUKI
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Patent number: 9847180Abstract: The exemplary embodiment has an object to provide a nonaqueous electrolyte solution having a flame retardancy over a long period and having a good capacity maintenance rate. The exemplary embodiment is a nonaqueous electrolyte solution containing a lithium salt, at least one oxo-acid ester derivative of phosphorus selected from compounds represented by a predetermined formula, and at least one disulfonate ester selected from a cyclic disulfonate ester and a linear disulfonate ester represented by the predetermined formulae.Type: GrantFiled: December 22, 2015Date of Patent: December 19, 2017Assignee: NEC ENERGY DEVICES, LTD.Inventors: Shinako Kaneko, Hitoshi Ishikawa, Yoko Hashizume, Eiji Suzuki
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Patent number: 9827495Abstract: First control means of a simulation device simulates motions of a plurality of virtual players that are placed in a virtual world and other than an operation target of a user. Determining means determines whether a situation of a game being simulated in the virtual world is similar to a situation indicated in data. In a case where it is determined that the situation of the game in the virtual world is similar to the situation indicated in the data, second control means controls, in place of the first control means, the virtual players other than the operation target of the user based on a motion associated with the situation.Type: GrantFiled: June 23, 2014Date of Patent: November 28, 2017Assignee: KONAMI DIGITAL ENTERTAINMENT CO., LTD.Inventors: Iskander Umarov, Eiji Suzuki
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Publication number: 20170323796Abstract: Disclosed is a method of etching a silicon layer by removing an oxide film formed on a workpiece which includes the silicon layer and a mask provided on the silicon layer. The method includes: (a) forming a denatured region by generating plasma of a first processing gas containing hydrogen, nitrogen, and fluorine within a processing container accommodating the workpiece therein to denature an oxide film formed on a surface of the workpiece; (b1) removing the denatured region by generating plasma of a rare gas within the processing container; and (c) etching the silicon layer by generating plasma of a second processing gas within the processing container.Type: ApplicationFiled: July 20, 2017Publication date: November 9, 2017Applicant: TOKYO ELECTRON LIMITEDInventors: Akinori KITAMURA, Eiji SUZUKI
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Patent number: 9779954Abstract: Disclosed is a method of etching a silicon layer by removing an oxide film formed on a workpiece which includes the silicon layer and a mask provided on the silicon layer. The method includes: (a) forming a denatured region by generating plasma of a first processing gas containing hydrogen, nitrogen, and fluorine within a processing container accommodating the workpiece therein to denature an oxide film formed on a surface of the workpiece; (b1) removing the denatured region by generating plasma of a rare gas within the processing container; and (c) etching the silicon layer by generating plasma of a second processing gas within the processing container.Type: GrantFiled: December 2, 2014Date of Patent: October 3, 2017Assignee: TOKYO ELECTRON LIMITEDInventors: Akinori Kitamura, Eiji Suzuki
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Patent number: 9759399Abstract: There are instances of vehicular lighting in prior art where a significant amount of effectively distributed light radiating from a projection lens is lost. The invention is provided with a semiconductor-type light source (2) and a projection lens (3). The projection lens (3) has an optically active portion (32) transmitting light from the semiconductor-type light source (2), and an optically inactive portion (33). The optically inactive portion (33) of the projection lens (3) is provided with a trimmed portion (33U, 33D) resulting from cutting away a portion of a base shape. As a result, the invention allows the amount of loss in the effectively distributed light radiating from the projection lens (3) to be as small as possible.Type: GrantFiled: August 28, 2014Date of Patent: September 12, 2017Assignee: ICHIKOH INDUSTRIES, LTD.Inventors: Eiji Suzuki, Takuji Harao
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Patent number: 9762182Abstract: A magnetoresistive effect oscillator executes a first step of applying a current, which has a first current density larger than a critical current density JO for oscillation, to a magnetoresistive effect element for a time TP, and then executes a second step of applying a current, which has a second current density JS smaller than the first current density and not smaller than the critical current density JO for oscillation, to the magnetoresistive effect element. The following formulae (1), (2) and (3), or the following formulae (1) and (4) are satisfied on an assumption that an average value of the first current density during the time TP in the first step is JP, a critical current density for magnetization reversal of the magnetoresistive effect element is JR, and a magnetization reversal time of the magnetoresistive effect element is TR: 0.1 × T R ? ( J R - J O ) J p - J S < T p < 0.Type: GrantFiled: April 14, 2016Date of Patent: September 12, 2017Assignee: TDK CORPORATIONInventors: Tsuyoshi Suzuki, Eiji Suzuki
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Patent number: 9737946Abstract: It is an object to provide a small-hole electrical discharge machining device to discharge the machining debris efficiently and to drill a small hole by electrical discharge machining at a high speed.Type: GrantFiled: September 1, 2011Date of Patent: August 22, 2017Assignee: ASTEC CO., LTD.Inventors: Eiji Suzuki, Yuta Shimoda
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Publication number: 20170143893Abstract: A packaging body comprises a container comprising: a housing space configured to house a liquid injection device that comprises a syringe and a cap, an opening configured to allow removal of the liquid injection device from the housing space, and an engaging part configured to engage with a step part of the syringe so as to be usable to assist in removal of the cap from the liquid injection device. The container is configured to be attached to a sealing member for sealing the opening.Type: ApplicationFiled: February 3, 2017Publication date: May 25, 2017Applicant: TERUMO KABUSHIKI KAISHAInventors: Kiyoaki HASUMI, Eiji SUZUKI
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Patent number: 9597922Abstract: Disclosed are an activation method and a liquid pressure transfer technique, where a transfer film is supplied to the surface of a transfer liquid and then is activated, capable of continuously performing a precise transfer. In forming an appropriate transfer pattern on the surface of an object by pressing the object from the upper side of a transfer tank, in the transfer tank, a pre-activation guide mechanism that holds both sides of the film, which is supplied with the center position matching the center of the transfer tank, at horizontally equivalent positions of the transfer tank and guides the film to an activation area is disposed. Accordingly, the film is urged to swell up in the thickness direction, and, in the activation area, the film is coated with an activating agent in a state in which the guide action of the film using the pre-activation guide mechanism is cancelled.Type: GrantFiled: December 8, 2011Date of Patent: March 21, 2017Assignee: TAICA CORPORATIONInventors: Eiji Suzuki, Youichiro Yoshii, Katsumi Iyanagi, Sakae Ushiwata
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Publication number: 20170074480Abstract: This vehicle lamp is provided with the following: a first light source; a second light source provided further on the outer side of a vehicle than the first light source; a heatsink having a base part on which the first light source and the second light source are mounted; and a through hole that penetrates the base part and that is formed at a position on a straight line connecting the first light source and the second light source in top view in which the base part is viewed from the upper side of the vehicle.Type: ApplicationFiled: April 10, 2015Publication date: March 16, 2017Applicant: ICHIKOH INDUSTRIES, LTD.Inventors: Shinobu TOMITA, Eiji SUZUKI
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Patent number: 9595916Abstract: A magnetoresistive effect oscillator is provided which can realize a rise or a fall of oscillation at a higher speed. In the magnetoresistive effect oscillator, at the rise, a current having a first current density, which is larger than a critical current density for oscillation, is applied, and thereafter a current having a second current density, which is less than the current density corresponding to the first current density and not less than the critical current density for oscillation, is applied such that the magnetoresistive effect element oscillates at a predetermined frequency. In the magnetoresistive effect oscillator, at the fall, starting from the state where a first current density is applied to hold the magnetoresistive effect element in an oscillating condition, a current having a second current density and having polarity reversed to that of the first current density is applied such that the oscillation disappears.Type: GrantFiled: October 16, 2014Date of Patent: March 14, 2017Assignee: TDK CorporationInventors: Tsuyoshi Suzuki, Eiji Suzuki
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Patent number: 9502537Abstract: Provided is a method of selectively removing a first region from a workpiece which includes the first region formed of silicon oxide and a second region formed of silicon. The method performs a plurality of sequences. Each sequence includes: forming a denatured region by generating plasma of a processing gas that contains hydrogen, nitrogen, and fluorine within a processing container that accommodates the workpiece so as to denature a portion of the first region, and removing the denatured region within the processing container. In addition, a sequence subsequent to a predetermined number of sequences after a first sequence among the plurality of sequences further includes exposing the workpiece to plasma of a reducing gas which is generated within the processing container, prior to the forming of the denatured region.Type: GrantFiled: August 27, 2014Date of Patent: November 22, 2016Assignee: TOKYO ELECTRON LIMITEDInventors: Akinori Kitamura, Hiroto Ohtake, Eiji Suzuki
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Publication number: 20160322937Abstract: A magnetoresistive effect oscillator executes a first step of applying a current, which has a first current density larger than a critical current density JO for oscillation, to a magnetoresistive effect element for a time TP, and then executes a second step of applying a current, which has a second current density JS smaller than the first current density and not smaller than the critical current density JO for oscillation, to the magnetoresistive effect element. The following formulae (1), (2) and (3), or the following formulae (1) and (4) are satisfied on an assumption that an average value of the first current density during the time TP in the first step is JP, a critical current density for magnetization reversal of the magnetoresistive effect element is JR, and a magnetization reversal time of the magnetoresistive effect element is TR: 0.1 × T R ? ( J R - J O ) J p - J S < T p < 0.Type: ApplicationFiled: April 14, 2016Publication date: November 3, 2016Applicant: TDK CORPORATIONInventors: Tsuyoshi SUZUKI, Eiji SUZUKI
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Patent number: 9412607Abstract: An isotropic etching process can be performed with high uniformity. A plasma etching method of etching an etching target layer containing silicon includes preparing a processing target object having the etching target layer in a processing chamber; removing an oxide film on a surface of the etching target layer by generating plasma of a first processing gas that contains a fluorocarbon gas or a fluorohydrocarbon gas but does not contain oxygen; removing a carbon-based reaction product generated when the removing of the oxide film by generating plasma of a second processing gas that does not contain oxygen; and etching the etching target layer without applying a high frequency bias power to a lower electrode serving as a mounting table configured to mount the processing target object thereon by generating plasma of a third processing gas containing a fluorocarbon gas or a fluorohydrocarbon gas with a microwave.Type: GrantFiled: May 7, 2014Date of Patent: August 9, 2016Assignee: TOKYO ELECTRON LIMITEDInventors: Tomiko Kamada, Akinori Kitamura, Hiroto Ohtake, Yutaka Osada, Yuji Otsuka, Masayuki Kohno, Yusuke Takino, Eiji Suzuki
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Publication number: 20160220906Abstract: First control means of a simulation device simulates motions of a plurality of virtual players that are placed in a virtual world and other than an operation target of a user. Determining means determines whether a situation of a game being simulated in the virtual world is similar to a situation indicated in data. In a case where it is determined that the situation of the game in the virtual world is similar to the situation indicated in the data, second control means controls, in place of the first control means, the virtual players other than the operation target of the user based on a motion associated with the situation.Type: ApplicationFiled: June 23, 2014Publication date: August 4, 2016Inventors: Iskander UMAROV, Eiji SUZUKI
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Publication number: 20160215945Abstract: There are instances of vehicular lighting in prior art where a significant amount of effectively distributed light radiating from a projection lens is lost. The invention is provided with a semiconductor-type light source (2) and a projection lens (3). The projection lens (3) has an optically active portion (32) transmitting light from the semiconductor-type light source (2), and an optically inactive portion (33). The optically inactive portion (33) of the projection lens (3) is provided with a trimmed portion (33U, 33D) resulting from cutting away a portion of a base shape. As a result, the invention allows the amount of loss in the effectively distributed light radiating from the projection lens (3) to be as small as possible.Type: ApplicationFiled: August 28, 2014Publication date: July 28, 2016Applicant: ICHIKOH INDUSTRIES, LTD.Inventors: Eiji SUZUKI, Takuji HARAO
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Patent number: 9373520Abstract: In one embodiment of the present invention, there is provided a method for etching a multilayer film formed by laminating a plurality of alternating layers of a first layer having a first dielectric constant and a second layer having a second dielectric constant. This method includes (a) a multilayer film etching step, in which an etchant gas is supplied into a processing chamber and a microwave is supplied into the processing chamber to excite a plasma of the etchant gas; and (b) a resist mask reducing step in which an oxygen-containing gas and a fluorocarbon-based gas are supplied to the processing chamber and a microwave is supplied into the processing chamber to excite a plasma of the oxygen-containing gas and the fluorocarbon-based gas. In this method, the steps (a) and (b) are alternately repeated.Type: GrantFiled: January 23, 2015Date of Patent: June 21, 2016Assignee: TOKYO ELECTRON LIMITEDInventors: Shota Yoshimura, Eiji Suzuki, Tomiko Kamada, Hiroto Ohtake
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Patent number: 9352609Abstract: A method for collecting a liquid surface residual film floating on the surface of the liquid after transfer, and a transfer tank that includes a film holding mechanism, provided at inner sides of both right and left side walls, for holding both sides of the transfer film and conveying the transfer film to an immersion area. When a film that is no longer needed after the transfer is collected, dividing means divides the liquid surface residual film so as to split the liquid surface residual film in a longitudinal direction of the transfer tank before the object is removed from the transfer liquid, and the divided films are moved closer to the both side walls of the transfer tank. At the side wall portions, the film holding mechanism is canceled, and from this canceled portion, the divided liquid surface residual films are discharged out of the tank.Type: GrantFiled: October 27, 2010Date of Patent: May 31, 2016Assignee: TAICA CORPORATIONInventors: Youichiro Yoshii, Eiji Suzuki, Sakae Ushiwata
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Publication number: 20160125584Abstract: An image processing apparatus includes: a calculation unit configured to calculate deformation information of an object deformed from a first deformation state to a second deformation state; a degree-of-deviation calculation unit configured to calculate a degree of deviation of the deformation information with respect to a deformation model representing a deformation state of the object; and a display control unit configured to display the calculated degree of deviation.Type: ApplicationFiled: October 29, 2015Publication date: May 5, 2016Inventors: Eiji Suzuki, Itaru Otomaru, Kiyohide Satoh