Patents by Inventor Eiji Suzuki

Eiji Suzuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180008133
    Abstract: The endoscope includes an imaging device that is provided in a tip portion of an insertion part capable of being inserted into a body cavity. The imaging device includes an image sensor that photoelectrically converts imaging light incident on an image receiving surface thereof through an imaging lens provided in a lens barrel, and a circuit substrate including a connecting surface facing a terminal face that is a surface opposite to the image receiving surface of the image sensor. A plurality of terminals are uniformly arranged longitudinally and laterally in a two-dimensional matrix form on the terminal face of the image sensor, and the connecting surface of the circuit substrate and the terminal face of the image sensor are connected to each other through the plurality of terminals. The total area of the plurality of terminals on the terminal face occupies 10% or more of the area of an imaging area of the image receiving surface.
    Type: Application
    Filed: June 6, 2017
    Publication date: January 11, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Ryo KITANO, Shinichiro SONODA, Takashi YANO, Eiji SUZUKI
  • Patent number: 9847180
    Abstract: The exemplary embodiment has an object to provide a nonaqueous electrolyte solution having a flame retardancy over a long period and having a good capacity maintenance rate. The exemplary embodiment is a nonaqueous electrolyte solution containing a lithium salt, at least one oxo-acid ester derivative of phosphorus selected from compounds represented by a predetermined formula, and at least one disulfonate ester selected from a cyclic disulfonate ester and a linear disulfonate ester represented by the predetermined formulae.
    Type: Grant
    Filed: December 22, 2015
    Date of Patent: December 19, 2017
    Assignee: NEC ENERGY DEVICES, LTD.
    Inventors: Shinako Kaneko, Hitoshi Ishikawa, Yoko Hashizume, Eiji Suzuki
  • Patent number: 9827495
    Abstract: First control means of a simulation device simulates motions of a plurality of virtual players that are placed in a virtual world and other than an operation target of a user. Determining means determines whether a situation of a game being simulated in the virtual world is similar to a situation indicated in data. In a case where it is determined that the situation of the game in the virtual world is similar to the situation indicated in the data, second control means controls, in place of the first control means, the virtual players other than the operation target of the user based on a motion associated with the situation.
    Type: Grant
    Filed: June 23, 2014
    Date of Patent: November 28, 2017
    Assignee: KONAMI DIGITAL ENTERTAINMENT CO., LTD.
    Inventors: Iskander Umarov, Eiji Suzuki
  • Publication number: 20170323796
    Abstract: Disclosed is a method of etching a silicon layer by removing an oxide film formed on a workpiece which includes the silicon layer and a mask provided on the silicon layer. The method includes: (a) forming a denatured region by generating plasma of a first processing gas containing hydrogen, nitrogen, and fluorine within a processing container accommodating the workpiece therein to denature an oxide film formed on a surface of the workpiece; (b1) removing the denatured region by generating plasma of a rare gas within the processing container; and (c) etching the silicon layer by generating plasma of a second processing gas within the processing container.
    Type: Application
    Filed: July 20, 2017
    Publication date: November 9, 2017
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Akinori KITAMURA, Eiji SUZUKI
  • Patent number: 9779954
    Abstract: Disclosed is a method of etching a silicon layer by removing an oxide film formed on a workpiece which includes the silicon layer and a mask provided on the silicon layer. The method includes: (a) forming a denatured region by generating plasma of a first processing gas containing hydrogen, nitrogen, and fluorine within a processing container accommodating the workpiece therein to denature an oxide film formed on a surface of the workpiece; (b1) removing the denatured region by generating plasma of a rare gas within the processing container; and (c) etching the silicon layer by generating plasma of a second processing gas within the processing container.
    Type: Grant
    Filed: December 2, 2014
    Date of Patent: October 3, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Akinori Kitamura, Eiji Suzuki
  • Patent number: 9759399
    Abstract: There are instances of vehicular lighting in prior art where a significant amount of effectively distributed light radiating from a projection lens is lost. The invention is provided with a semiconductor-type light source (2) and a projection lens (3). The projection lens (3) has an optically active portion (32) transmitting light from the semiconductor-type light source (2), and an optically inactive portion (33). The optically inactive portion (33) of the projection lens (3) is provided with a trimmed portion (33U, 33D) resulting from cutting away a portion of a base shape. As a result, the invention allows the amount of loss in the effectively distributed light radiating from the projection lens (3) to be as small as possible.
    Type: Grant
    Filed: August 28, 2014
    Date of Patent: September 12, 2017
    Assignee: ICHIKOH INDUSTRIES, LTD.
    Inventors: Eiji Suzuki, Takuji Harao
  • Patent number: 9762182
    Abstract: A magnetoresistive effect oscillator executes a first step of applying a current, which has a first current density larger than a critical current density JO for oscillation, to a magnetoresistive effect element for a time TP, and then executes a second step of applying a current, which has a second current density JS smaller than the first current density and not smaller than the critical current density JO for oscillation, to the magnetoresistive effect element. The following formulae (1), (2) and (3), or the following formulae (1) and (4) are satisfied on an assumption that an average value of the first current density during the time TP in the first step is JP, a critical current density for magnetization reversal of the magnetoresistive effect element is JR, and a magnetization reversal time of the magnetoresistive effect element is TR: 0.1 × T R ? ( J R - J O ) J p - J S < T p < 0.
    Type: Grant
    Filed: April 14, 2016
    Date of Patent: September 12, 2017
    Assignee: TDK CORPORATION
    Inventors: Tsuyoshi Suzuki, Eiji Suzuki
  • Patent number: 9737946
    Abstract: It is an object to provide a small-hole electrical discharge machining device to discharge the machining debris efficiently and to drill a small hole by electrical discharge machining at a high speed.
    Type: Grant
    Filed: September 1, 2011
    Date of Patent: August 22, 2017
    Assignee: ASTEC CO., LTD.
    Inventors: Eiji Suzuki, Yuta Shimoda
  • Publication number: 20170143893
    Abstract: A packaging body comprises a container comprising: a housing space configured to house a liquid injection device that comprises a syringe and a cap, an opening configured to allow removal of the liquid injection device from the housing space, and an engaging part configured to engage with a step part of the syringe so as to be usable to assist in removal of the cap from the liquid injection device. The container is configured to be attached to a sealing member for sealing the opening.
    Type: Application
    Filed: February 3, 2017
    Publication date: May 25, 2017
    Applicant: TERUMO KABUSHIKI KAISHA
    Inventors: Kiyoaki HASUMI, Eiji SUZUKI
  • Patent number: 9597922
    Abstract: Disclosed are an activation method and a liquid pressure transfer technique, where a transfer film is supplied to the surface of a transfer liquid and then is activated, capable of continuously performing a precise transfer. In forming an appropriate transfer pattern on the surface of an object by pressing the object from the upper side of a transfer tank, in the transfer tank, a pre-activation guide mechanism that holds both sides of the film, which is supplied with the center position matching the center of the transfer tank, at horizontally equivalent positions of the transfer tank and guides the film to an activation area is disposed. Accordingly, the film is urged to swell up in the thickness direction, and, in the activation area, the film is coated with an activating agent in a state in which the guide action of the film using the pre-activation guide mechanism is cancelled.
    Type: Grant
    Filed: December 8, 2011
    Date of Patent: March 21, 2017
    Assignee: TAICA CORPORATION
    Inventors: Eiji Suzuki, Youichiro Yoshii, Katsumi Iyanagi, Sakae Ushiwata
  • Publication number: 20170074480
    Abstract: This vehicle lamp is provided with the following: a first light source; a second light source provided further on the outer side of a vehicle than the first light source; a heatsink having a base part on which the first light source and the second light source are mounted; and a through hole that penetrates the base part and that is formed at a position on a straight line connecting the first light source and the second light source in top view in which the base part is viewed from the upper side of the vehicle.
    Type: Application
    Filed: April 10, 2015
    Publication date: March 16, 2017
    Applicant: ICHIKOH INDUSTRIES, LTD.
    Inventors: Shinobu TOMITA, Eiji SUZUKI
  • Patent number: 9595916
    Abstract: A magnetoresistive effect oscillator is provided which can realize a rise or a fall of oscillation at a higher speed. In the magnetoresistive effect oscillator, at the rise, a current having a first current density, which is larger than a critical current density for oscillation, is applied, and thereafter a current having a second current density, which is less than the current density corresponding to the first current density and not less than the critical current density for oscillation, is applied such that the magnetoresistive effect element oscillates at a predetermined frequency. In the magnetoresistive effect oscillator, at the fall, starting from the state where a first current density is applied to hold the magnetoresistive effect element in an oscillating condition, a current having a second current density and having polarity reversed to that of the first current density is applied such that the oscillation disappears.
    Type: Grant
    Filed: October 16, 2014
    Date of Patent: March 14, 2017
    Assignee: TDK Corporation
    Inventors: Tsuyoshi Suzuki, Eiji Suzuki
  • Patent number: 9502537
    Abstract: Provided is a method of selectively removing a first region from a workpiece which includes the first region formed of silicon oxide and a second region formed of silicon. The method performs a plurality of sequences. Each sequence includes: forming a denatured region by generating plasma of a processing gas that contains hydrogen, nitrogen, and fluorine within a processing container that accommodates the workpiece so as to denature a portion of the first region, and removing the denatured region within the processing container. In addition, a sequence subsequent to a predetermined number of sequences after a first sequence among the plurality of sequences further includes exposing the workpiece to plasma of a reducing gas which is generated within the processing container, prior to the forming of the denatured region.
    Type: Grant
    Filed: August 27, 2014
    Date of Patent: November 22, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Akinori Kitamura, Hiroto Ohtake, Eiji Suzuki
  • Publication number: 20160322937
    Abstract: A magnetoresistive effect oscillator executes a first step of applying a current, which has a first current density larger than a critical current density JO for oscillation, to a magnetoresistive effect element for a time TP, and then executes a second step of applying a current, which has a second current density JS smaller than the first current density and not smaller than the critical current density JO for oscillation, to the magnetoresistive effect element. The following formulae (1), (2) and (3), or the following formulae (1) and (4) are satisfied on an assumption that an average value of the first current density during the time TP in the first step is JP, a critical current density for magnetization reversal of the magnetoresistive effect element is JR, and a magnetization reversal time of the magnetoresistive effect element is TR: 0.1 × T R ? ( J R - J O ) J p - J S < T p < 0.
    Type: Application
    Filed: April 14, 2016
    Publication date: November 3, 2016
    Applicant: TDK CORPORATION
    Inventors: Tsuyoshi SUZUKI, Eiji SUZUKI
  • Patent number: 9412607
    Abstract: An isotropic etching process can be performed with high uniformity. A plasma etching method of etching an etching target layer containing silicon includes preparing a processing target object having the etching target layer in a processing chamber; removing an oxide film on a surface of the etching target layer by generating plasma of a first processing gas that contains a fluorocarbon gas or a fluorohydrocarbon gas but does not contain oxygen; removing a carbon-based reaction product generated when the removing of the oxide film by generating plasma of a second processing gas that does not contain oxygen; and etching the etching target layer without applying a high frequency bias power to a lower electrode serving as a mounting table configured to mount the processing target object thereon by generating plasma of a third processing gas containing a fluorocarbon gas or a fluorohydrocarbon gas with a microwave.
    Type: Grant
    Filed: May 7, 2014
    Date of Patent: August 9, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Tomiko Kamada, Akinori Kitamura, Hiroto Ohtake, Yutaka Osada, Yuji Otsuka, Masayuki Kohno, Yusuke Takino, Eiji Suzuki
  • Publication number: 20160220906
    Abstract: First control means of a simulation device simulates motions of a plurality of virtual players that are placed in a virtual world and other than an operation target of a user. Determining means determines whether a situation of a game being simulated in the virtual world is similar to a situation indicated in data. In a case where it is determined that the situation of the game in the virtual world is similar to the situation indicated in the data, second control means controls, in place of the first control means, the virtual players other than the operation target of the user based on a motion associated with the situation.
    Type: Application
    Filed: June 23, 2014
    Publication date: August 4, 2016
    Inventors: Iskander UMAROV, Eiji SUZUKI
  • Publication number: 20160215945
    Abstract: There are instances of vehicular lighting in prior art where a significant amount of effectively distributed light radiating from a projection lens is lost. The invention is provided with a semiconductor-type light source (2) and a projection lens (3). The projection lens (3) has an optically active portion (32) transmitting light from the semiconductor-type light source (2), and an optically inactive portion (33). The optically inactive portion (33) of the projection lens (3) is provided with a trimmed portion (33U, 33D) resulting from cutting away a portion of a base shape. As a result, the invention allows the amount of loss in the effectively distributed light radiating from the projection lens (3) to be as small as possible.
    Type: Application
    Filed: August 28, 2014
    Publication date: July 28, 2016
    Applicant: ICHIKOH INDUSTRIES, LTD.
    Inventors: Eiji SUZUKI, Takuji HARAO
  • Patent number: 9373520
    Abstract: In one embodiment of the present invention, there is provided a method for etching a multilayer film formed by laminating a plurality of alternating layers of a first layer having a first dielectric constant and a second layer having a second dielectric constant. This method includes (a) a multilayer film etching step, in which an etchant gas is supplied into a processing chamber and a microwave is supplied into the processing chamber to excite a plasma of the etchant gas; and (b) a resist mask reducing step in which an oxygen-containing gas and a fluorocarbon-based gas are supplied to the processing chamber and a microwave is supplied into the processing chamber to excite a plasma of the oxygen-containing gas and the fluorocarbon-based gas. In this method, the steps (a) and (b) are alternately repeated.
    Type: Grant
    Filed: January 23, 2015
    Date of Patent: June 21, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Shota Yoshimura, Eiji Suzuki, Tomiko Kamada, Hiroto Ohtake
  • Patent number: 9352609
    Abstract: A method for collecting a liquid surface residual film floating on the surface of the liquid after transfer, and a transfer tank that includes a film holding mechanism, provided at inner sides of both right and left side walls, for holding both sides of the transfer film and conveying the transfer film to an immersion area. When a film that is no longer needed after the transfer is collected, dividing means divides the liquid surface residual film so as to split the liquid surface residual film in a longitudinal direction of the transfer tank before the object is removed from the transfer liquid, and the divided films are moved closer to the both side walls of the transfer tank. At the side wall portions, the film holding mechanism is canceled, and from this canceled portion, the divided liquid surface residual films are discharged out of the tank.
    Type: Grant
    Filed: October 27, 2010
    Date of Patent: May 31, 2016
    Assignee: TAICA CORPORATION
    Inventors: Youichiro Yoshii, Eiji Suzuki, Sakae Ushiwata
  • Publication number: 20160125584
    Abstract: An image processing apparatus includes: a calculation unit configured to calculate deformation information of an object deformed from a first deformation state to a second deformation state; a degree-of-deviation calculation unit configured to calculate a degree of deviation of the deformation information with respect to a deformation model representing a deformation state of the object; and a display control unit configured to display the calculated degree of deviation.
    Type: Application
    Filed: October 29, 2015
    Publication date: May 5, 2016
    Inventors: Eiji Suzuki, Itaru Otomaru, Kiyohide Satoh