Patents by Inventor Eijiro IWASE

Eijiro IWASE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11905598
    Abstract: An object is to coat a target position on a substrate with a dense film. In order to achieve the object, while a substrate on which a base containing a coating material is formed is transported, an auxiliary agent is applied to the substrate, and then a main agent containing a coating material is applied to the substrate to react the main agent with the auxiliary agent, so that a portion on the substrate where the base is formed is coated with the coating material.
    Type: Grant
    Filed: September 2, 2022
    Date of Patent: February 20, 2024
    Assignee: FUJIFILM Corporation
    Inventors: Eijiro Iwase, Keio Okano, Katsuyuki Nukui
  • Patent number: 11806741
    Abstract: An object of the present invention is to provide a spray device that can separately apply a coating liquid, and can form a dense organic substance film having high uniformity, and a spray coating method. To achieve the object, the spray device includes: a spray; an air flow forming unit that forms an air flow for restricting a flying space of a coating liquid sprayed by the spray; and a space heating unit that heats the flying space of the coating liquid from outside of the air flow formed by the air flow forming unit.
    Type: Grant
    Filed: January 25, 2022
    Date of Patent: November 7, 2023
    Assignee: FUJIFILM Corporation
    Inventors: Eijiro Iwase, Yasushi Kikuchi
  • Patent number: 11765917
    Abstract: Provided are an organic thin film transistor having high bendability and high stability in air and a method of manufacturing the organic thin film transistor. The organic thin film transistor includes: a gas barrier layer consisting of a resin layer and an inorganic layer; a transistor element that is formed on one main surface side of the gas barrier layer and includes a gate electrode, an insulating film, an organic semiconductor layer, a source electrode, and a drain electrode; and a sealing layer that is laminated on a side of the transistor element opposite to the gas barrier layer through an adhesive layer, in which a thickness of the resin layer in the gas barrier layer is less than a thickness ranging from the inorganic layer to the sealing layer in the gas barrier layer.
    Type: Grant
    Filed: February 23, 2021
    Date of Patent: September 19, 2023
    Assignee: FUJIFILM Corporation
    Inventor: Eijiro Iwase
  • Publication number: 20230166281
    Abstract: An object is to provide a spray coating device and a coating method, with which a uniform coating film can be formed by spray coating with two liquids having reactivity, and in which precipitation of a reaction product on a periphery can also be prevented. The object is achieved by providing a transporting unit for transporting a substrate downward; a first spray nozzle; a second spray nozzle disposed below the first spray nozzle; a holding plate for holding the first spray nozzle and the second spray nozzle such that an angle formed by center lines of the first spray nozzle and the second spray nozzle is 5° to 150°; and a liquid film forming unit for forming a liquid film which flows from above to below on a surface of the holding plate.
    Type: Application
    Filed: January 30, 2023
    Publication date: June 1, 2023
    Applicant: FUJIFILM Corporation
    Inventor: Eijiro IWASE
  • Patent number: 11605805
    Abstract: A method of manufacturing a formed body for an electrode includes: preparing an electrode material; placing a shape retaining member having an rectangular tubular shape with one opening portion L thereof facing down, and supplying the electrode material into the shape retaining member from the other opening portion M thereof; and discharging the electrode material onto a support from the opening portion L while relatively moving the opening portion L and the support, to form a film, a bulk density D1 of the electrode material in the first step and a bulk density D2 of the electrode material at the opening portion L satisfying a relationship of D2/D1=1.1 to 30, and a width T1 of the opening portion L in a short side direction and a distance T2 between the end portion X of the opening portion L and the support satisfying a relationship of width T1>distance T2.
    Type: Grant
    Filed: December 28, 2021
    Date of Patent: March 14, 2023
    Assignee: FUJIFILM CORPORATION
    Inventors: Eijiro Iwase, Akihito Fukunaga, Takehiko Nakayama, Koji Tonohara
  • Publication number: 20230028779
    Abstract: A metal pattern forming method has: producing a first base having a pattern of lyophilic portions which have lyophilic properties with respect to a liquid containing a metal component and liquid-repellent portions which have liquid-repellent properties with respect to the liquid containing a metal component; producing a second base which holds the liquid containing a metal component; and transferring the liquid containing a metal component from the second base to the lyophilic portions of the first base by bringing the first base and the second base into contact with each other. With the metal pattern forming method, it is possible to form a metal pattern with high accuracy in which the metal is prevented from adhering to an unnecessary position on the base.
    Type: Application
    Filed: September 23, 2022
    Publication date: January 26, 2023
    Applicant: FUJIFILM Corporation
    Inventors: Eijiro IWASE, Kenji ICHIKAWA
  • Publication number: 20230002907
    Abstract: An object is to coat a target position on a substrate with a dense film. In order to achieve the object, while a substrate on which a base containing a coating material is formed is transported, an auxiliary agent is applied to the substrate, and then a main agent containing a coating material is applied to the substrate to react the main agent with the auxiliary agent, so that a portion on the substrate where the base is formed is coated with the coating material.
    Type: Application
    Filed: September 2, 2022
    Publication date: January 5, 2023
    Applicant: FUJIFILM Corporation
    Inventors: Eijiro IWASE, Keio OKANO, Katsuyuki NUKUI
  • Patent number: 11450835
    Abstract: A gas barrier film includes a substrate, a peeling resin layer from which the substrate can be peeled off, one or more inorganic layers, and an adhesive layer provided on an inorganic layer most spaced from the substrate, in which an inorganic layer is provided on a surface of the peeling resin layer, the peeling resin layer is a resin layer including a phenyl group, and the adhesive layer is solid at normal temperature and has fluidity by heating, thereby exhibiting adhesiveness.
    Type: Grant
    Filed: July 13, 2020
    Date of Patent: September 20, 2022
    Assignee: FUJIFILM Corporation
    Inventor: Eijiro Iwase
  • Publication number: 20220173371
    Abstract: The present disclosure provides a method of manufacturing a formed body for an electrode including: a step of preparing an electrode material containing an electrode active material; a step of supplying the electrode material onto the support; and a step of pressurizing the electrode material on the support by sandwiching the support and the electrode material between a first roll that is brought into contact with the electrode material and a second roll that is brought into contact with the support, in which a temperature T1 of the first roll and a temperature T2 of the second roll satisfy a relationship T1>T2.
    Type: Application
    Filed: February 15, 2022
    Publication date: June 2, 2022
    Inventors: Akihito FUKUNAGA, Eijiro IWASE, Koji TONOHARA
  • Publication number: 20220158161
    Abstract: A method of manufacturing a formed body for an electrode includes a first step of dropping an electrode material containing an electrode active material into a gap between a pair of transport belts and introducing the electrode material between transport surfaces of the pair of transport belts; a second step of belt-transporting and pressurizing the introduced electrode material with the pair of transport belts; and a third step of transferring the electrode material after the belt transporting and the pressurization, on a deposition belt, in which a transport direction in a transport, passage through which the electrode material is transported, of the deposition belt intersects a transport direction in a transport passage, through which the electrode material is transported, of the pair of transport belts.
    Type: Application
    Filed: February 3, 2022
    Publication date: May 19, 2022
    Inventors: Eijiro IWASE, Akihito FUKUNAGA, Koji TONOHARA, Takehiko NAKAYAMA, Yasuhiro SEKIZAWA
  • Publication number: 20220143634
    Abstract: An object of the present invention is to provide a spray device that can separately apply a coating liquid, and can form a dense organic substance film having high uniformity, and a spray coating method. To achieve the object, the spray device includes: a spray; an air flow forming unit that forms an air flow for restricting a flying space of a coating liquid sprayed by the spray; and a space heating unit that heats the flying space of the coating liquid from outside of the air flow formed by the air flow forming unit.
    Type: Application
    Filed: January 25, 2022
    Publication date: May 12, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Eijiro IWASE, Yasushi KIKUCHI
  • Publication number: 20220131128
    Abstract: The present disclosure provides a method of manufacturing a formed body for an electrode including: a step of preparing an electrode material containing an electrode active material; a step of forming at least two projecting portions containing the electrode material and placed side by side on a support in a width direction of the support by supplying the electrode material onto the support; and a step of leveling the projecting portions on the support.
    Type: Application
    Filed: January 11, 2022
    Publication date: April 28, 2022
    Inventors: Akihito FUKUNAGA, Eijiro IWASE, Koji TONOHARA, Yasuhiro SEKIZAWA
  • Publication number: 20220123280
    Abstract: A method of manufacturing a formed body for an electrode including: a step of jetting an electrode material containing an electrode active material from an outlet toward a surface FA of a first support while relatively moving the outlet jetting the electrode material and the first support in a plane direction of the first support, in which in the step, a contact member having a contact surface FB that is brought into contact with the electrode material is used, and in a case where a wall friction angle between the contact surface FB of the contact member and the electrode material is denoted by ?1, and a wall friction angle between the surface FA of the first support and the electrode material is denoted by ?2, a relationship (1) 1°??1<15° and a relationship (2) 15°??2 are satisfied.
    Type: Application
    Filed: December 28, 2021
    Publication date: April 21, 2022
    Inventors: Akihito FUKUNAGA, Eijiro IWASE, Koji TONOHARA
  • Publication number: 20220123275
    Abstract: A method of manufacturing a formed body for an electrode includes: preparing an electrode material; placing a shape retaining member having an rectangular tubular shape with one opening portion L thereof facing down, and supplying the electrode material into the shape retaining member from the other opening portion M thereof, and discharging the electrode material onto a support from the opening portion L while relatively moving the opening portion L and the support, to form a film, a bulk density D1 of the electrode material in the first step and a bulk density D2 of the electrode material at the opening portion L satisfying a relationship of D2/D1=1.1 to 30, and a width T1 of the opening portion L in a short side direction and a distance T2 between the end portion X of the opening portion L and the support satisfying a relationship of width T1>distance T2.
    Type: Application
    Filed: December 28, 2021
    Publication date: April 21, 2022
    Inventors: Eijiro IWASE, Akihito FUKUNAGA, Takehiko NAKAYAMA, Koji TONOHARA
  • Publication number: 20220077447
    Abstract: The present disclosure provides a method of manufacturing a formed body for an electrode comprising in order: a step of preparing an electrode material containing an electrode active material; a step of supplying the electrode material to a forming mold which has a frame-shaped side wall portion defining a space portion accommodating the electrode material and has a first support placed on a bottom surface of the forming mold; a step of forming the electrode material along an internal shape of the forming mold; and a step of taking out the electrode material from the forming mold.
    Type: Application
    Filed: November 15, 2021
    Publication date: March 10, 2022
    Inventors: Eijiro IWASE, Akihito FUKUNAGA, Koji TONOHARA
  • Patent number: 11203180
    Abstract: A gas barrier film has, in sequence, a support, an inorganic layer disposed on one surface side of the support, an adhesive layer disposed on a surface of the inorganic layer, and a resin layer disposed on a surface of the adhesive layer in which the adhesive layer has a thickness of 15 ?m or less, and the adhesion strength between the inorganic layer and the adhesive layer is 21 N/25 mm or more and 60 N/25 mm or less. A method for producing a gas barrier film includes an inorganic layer deposition step and a bonding step in a vacuum.
    Type: Grant
    Filed: October 21, 2019
    Date of Patent: December 21, 2021
    Assignee: FUJIFILM Corporation
    Inventor: Eijiro Iwase
  • Publication number: 20210359212
    Abstract: An object of the present invention is to provide a film forming method for an organic semiconductor film, with which an organic semiconductor film having good uniformity and high mobility can be manufactured with good productivity. A coating liquid is prepared by dissolving an organic semiconductor material in a solvent, the coating liquid is sprayed by a spray unit, and the coating liquid is applied onto a temperature-controlled substrate while the coating liquid during the flight which has been sprayed by the spray unit is being heated, whereby problems are solved.
    Type: Application
    Filed: July 28, 2021
    Publication date: November 18, 2021
    Applicant: FUJIFILM Corporation
    Inventor: Eijiro IWASE
  • Patent number: 11167526
    Abstract: A gas barrier film has, in sequence, a support, an inorganic layer disposed on one surface side of the support, an adhesive layer disposed on a surface of the inorganic layer, and a resin layer disposed on a surface of the adhesive layer in which the adhesive layer has a thickness of 15 ?m or less, and the adhesion strength between the inorganic layer and the adhesive layer is 21 N/25 mm or more and 60 N/25 mm or less. A method for producing a gas barrier film includes an inorganic layer deposition step and a bonding step in a vacuum.
    Type: Grant
    Filed: October 21, 2019
    Date of Patent: November 9, 2021
    Assignee: FUJIFILM Corporation
    Inventor: Eijiro Iwase
  • Patent number: 11052642
    Abstract: A gas barrier film has, in sequence, a support, an inorganic layer, and a resin film, the inorganic layer and the resin film being supported on the support. The resin film has a hydroxy group. The inorganic layer and the resin film are directly joined to each other with separate portions that are partially present at an interface between the inorganic layer and the resin film. The gas barrier film has one or more sets of a combination of the inorganic layer and the resin film. A method for producing the gas barrier film includes forming an inorganic layer by a gas-phase deposition method, subsequently laminating a resin film having a hydroxy group with the inorganic layer, and heating the resulting film laminate.
    Type: Grant
    Filed: February 18, 2020
    Date of Patent: July 6, 2021
    Assignee: FUJIFILM Corporation
    Inventor: Eijiro Iwase
  • Publication number: 20210184142
    Abstract: Provided are an organic thin film transistor that has high bendability and can suppress a decrease in carrier mobility caused by a pinhole of an insulating film or leveling properties and a method of manufacturing the organic thin film transistor. The organic thin film transistor includes: a gate electrode; an insulating film that is formed to cover the gate electrode; an organic semiconductor layer that is formed on the insulating film, and a source electrode and a drain electrode that are formed on the organic semiconductor layer, in which the insulating film includes an inorganic film consisting of SiNH.
    Type: Application
    Filed: February 26, 2021
    Publication date: June 17, 2021
    Applicant: FUJIFILM CORPORATION
    Inventors: Eijiro IWASE, Koji TONOHARA, Hiroki SUGIURA