Patents by Inventor Eijiro IWASE

Eijiro IWASE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210175449
    Abstract: Provided are an organic thin film transistor having high bendability and high stability in air and a method of manufacturing the organic thin film transistor. The organic thin film transistor includes: a gas barrier layer consisting of a resin layer and an inorganic layer; a transistor element that is formed on one main surface side of the gas barrier layer and includes a gate electrode, an insulating film, an organic semiconductor layer, a source electrode, and a drain electrode; and a sealing layer that is laminated on a side of the transistor element opposite to the gas barrier layer through an adhesive layer, in which a thickness of the resin layer in the gas barrier layer is less than a thickness ranging from the inorganic layer to the sealing layer in the gas barrier layer.
    Type: Application
    Filed: February 23, 2021
    Publication date: June 10, 2021
    Applicant: FUJIFILM Corporation
    Inventor: Eijiro IWASE
  • Patent number: 10988631
    Abstract: A gas barrier film includes on one surface of a transparent base material, a gas barrier layer having, combination of an inorganic layer and a base organic layer, and an overcoat layer including an organic compound and provided on a surface of the inorganic layer, which is most distant from the base material; and on a surface of the base material opposite to the surface on being provided the gas barrier layer, a hardcoat layer in which particles are dispersed in an organic compound, in which a diameter of the particles is smaller than a thickness of the overcoat layer, a pencil hardness of the hardcoat layer is equal to or higher than a pencil hardness of the overcoat layer, the pencil hardness of the overcoat layer is HB to 3H, and a difference of the pencil hardness between the overcoat layer and the hardcoat layer is within 2 grades.
    Type: Grant
    Filed: May 22, 2019
    Date of Patent: April 27, 2021
    Assignee: FUJIFILM Corporation
    Inventor: Eijiro Iwase
  • Publication number: 20200343484
    Abstract: A gas barrier film includes a substrate, a peeling resin layer from which the substrate can be peeled off, one or more inorganic layers, and an adhesive layer provided on an inorganic layer most spaced from the substrate, in which an inorganic layer is provided on a surface of the peeling resin layer, the peeling resin layer is a resin layer including a phenyl group, and the adhesive layer is solid at normal temperature and has fluidity by heating, thereby exhibiting adhesiveness.
    Type: Application
    Filed: July 13, 2020
    Publication date: October 29, 2020
    Applicant: FUJIFILM Corporation
    Inventor: Eijiro IWASE
  • Patent number: 10712476
    Abstract: A gas barrier film has a support, an inorganic layer and an organic layer on one surface of the support, and a light diffusion layer containing a binder and a light diffusion agent on the other surface of the support. The binder has a graft copolymer which has an acryl polymer as a main chain and a urethane polymer or a urethane oligomer having an acryloyl group terminal as a side chain, an acryl polymer which has methacrylate as a side chain, and a graft copolymer which has an acryl polymer as a main chain and a urethane polymer or a urethane oligomer having a polycarbonate group terminal as a side chain.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: July 14, 2020
    Assignee: FUJIFILM Corporation
    Inventor: Eijiro Iwase
  • Publication number: 20200180285
    Abstract: A gas barrier film has, in sequence, a support, an inorganic layer, and a resin film, the inorganic layer and the resin film being supported on the support. The resin film has a hydroxy group. The inorganic layer and the resin film are directly joined to each other with separate portions that are partially present at an interface between the inorganic layer and the resin film. The gas barrier film has one or more sets of a combination of the inorganic layer and the resin film. A method for producing the gas barrier film includes forming an inorganic layer by a gas-phase deposition method, subsequently laminating a resin film having a hydroxy group with the inorganic layer, and heating the resulting film laminate.
    Type: Application
    Filed: February 18, 2020
    Publication date: June 11, 2020
    Applicant: FUJIFILM Corporation
    Inventor: Eijiro IWASE
  • Patent number: 10665738
    Abstract: An object of the present invention is to provide a gas barrier film which can prevent the damage of an inorganic layer even in a case where the gas barrier film is used in a product which undergoes a step of applying pressure, heat, and the like, a solar cell using the gas barrier film, and a manufacturing method of the gas barrier film.
    Type: Grant
    Filed: January 11, 2019
    Date of Patent: May 26, 2020
    Assignee: FUJIFILM Corporation
    Inventor: Eijiro Iwase
  • Patent number: 10647097
    Abstract: A gas barrier film includes a support, a gas barrier layer provided on one surface of the support and including an inorganic layer, and a deformation inhibition layer provided on a surface of the support opposite to a surface on which the gas barrier layer is provided and including a bifunctional or higher (meth)acrylate, in which the support has a thermal expansion coefficient of 30×10?6/° C. or greater, and the (meth)acrylate of the deformation inhibition layer has a volume shrinkage rate of 3% to 20%.
    Type: Grant
    Filed: September 11, 2018
    Date of Patent: May 12, 2020
    Assignee: FUJIFILM Corporation
    Inventor: Eijiro Iwase
  • Patent number: 10603885
    Abstract: Provided are a functional composite film having one or more combinations of an inorganic layer and an underlying organic layer on one surface thereof, and having a light diffusion layer on the opposite surface, in which the light diffusion layer is formed by dispersing a light diffusing agent in a binder formed using a graft copolymer having a molecular weight of 10,000 to 3,000,000 and an acryl equivalent of 500 g/mol or more, which has an acrylic polymer as the main chain and at least one of a urethane polymer with an acryloyl group at a terminal or a urethane oligomer with an acryloyl group at a terminal in the side chain; and a wavelength conversion film using the same. Using these, a functional composite film and a wavelength conversion film, having good light diffusion performance and light transmittance are provided.
    Type: Grant
    Filed: July 24, 2017
    Date of Patent: March 31, 2020
    Assignee: FUJIFILM Corporation
    Inventor: Eijiro Iwase
  • Publication number: 20200048419
    Abstract: A gas barrier film has, in sequence, a support, an inorganic layer disposed on one surface side of the support, an adhesive layer disposed on a surface of the inorganic layer, and a resin layer disposed on a surface of the adhesive layer in which the adhesive layer has a thickness of 15 ?m or less, and the adhesion strength between the inorganic layer and the adhesive layer is 21 N/25 mm or more and 60 N/25 mm or less. A method for producing a gas barrier film includes an inorganic layer deposition step and a bonding step in a vacuum.
    Type: Application
    Filed: October 21, 2019
    Publication date: February 13, 2020
    Applicant: FUJIFILM Corporation
    Inventor: Eijiro IWASE
  • Publication number: 20190338158
    Abstract: A gas barrier film includes on one surface of a transparent base material, a gas barrier layer having, combination of an inorganic layer and a base organic layer, and an overcoat layer including an organic compound and provided on a surface of the inorganic layer, which is most distant from the base material; and on a surface of the base material opposite to the surface on being provided the gas barrier layer, a hardcoat layer in which particles are dispersed in an organic compound, in which a diameter of the particles is smaller than a thickness of the overcoat layer, a pencil hardness of the hardcoat layer is equal to or higher than a pencil hardness of the overcoat layer, the pencil hardness of the overcoat layer is HB to 3H, and a difference of the pencil hardness between the overcoat layer and the hardcoat layer is within 2 grades.
    Type: Application
    Filed: May 22, 2019
    Publication date: November 7, 2019
    Applicant: FUJIFILM Corporation
    Inventor: Eijiro IWASE
  • Patent number: 10427392
    Abstract: A functional composite film includes one or more combinations of an inorganic layer and an organic layer as underlying base of the inorganic layer on a support, and having the outermost surface with an organic layer thereon, where the organic layer on the outermost surface is formed using an ultraviolet-curable urethane polymer having a weight-average molecular weight of 5,000 to 30,000 and a double bond equivalent of 300 g/mol or more, which has a urethane polymer as the main chain and a side chain having a (meth)acryloyl group at a terminal; a curable urethane polyester; and at least one phosphoric acid compound containing two or less (meth)acryloyl groups and/or a silane coupling agent containing one (meth)acryloyl group, and a quantum dot film using the same. High adhesiveness is obtained between the organic layer and the inorganic layer, and when a quantum dot layer or the like is laminated thereon.
    Type: Grant
    Filed: July 24, 2017
    Date of Patent: October 1, 2019
    Assignee: FUJIFILM Corporation
    Inventor: Eijiro Iwase
  • Patent number: 10377113
    Abstract: Provided is a functional laminated film having a functional layer formed by dispersing functional materials in a binder, in which the functional laminated film can inhibit generation of bubbles in the functional layer, and can prevent the functional material from being deteriorated by water or oxygen. The functional layer is formed by dispersing functional materials in a binder, and the binder is formed by polymerizing monomers. The monomers include 50% by mass or more of monomers X having a molecular weight of 100 to 1,500 with respect to the total mass of the monomers, and the gas barrier performance of a gas barrier film is 0.005 [g/(m2·day)] to 0.8 [g/(m2·day)].
    Type: Grant
    Filed: May 2, 2017
    Date of Patent: August 13, 2019
    Assignee: FUJIFILM Corporation
    Inventor: Eijiro Iwase
  • Publication number: 20190168492
    Abstract: The present invention provides a gas barrier film of an organic-inorganic lamination type having good adhesiveness between an organic layer disposed between inorganic layers and a lower inorganic layer thereof, and a method of producing the gas barrier film. A gas barrier film having two or more combinations of an organic layer and an inorganic layer on one surface of a support, in which a surface of the support is the organic layer, an organic layer on the surface of the support is an underlying organic layer, an organic layer between the inorganic layers is an intermediate organic layer, a thickness of the intermediate organic layer is 0.05 to 0.5 ?m, a ratio between the thickness of the intermediate organic layer and a thickness of the underlying organic layer is 0.1 or less, and the intermediate organic layer includes a polymer of (meth)acrylate represented by Formula (1).
    Type: Application
    Filed: January 24, 2019
    Publication date: June 6, 2019
    Applicant: FUJIFILM Corporation
    Inventor: Eijiro IWASE
  • Publication number: 20190148575
    Abstract: An object of the present invention is to provide a gas barrier film which can prevent the damage of an inorganic layer even in a case where the gas barrier film is used in a product which undergoes a step of applying pressure, heat, and the like, a solar cell using the gas barrier film, and a manufacturing method of the gas barrier film.
    Type: Application
    Filed: January 11, 2019
    Publication date: May 16, 2019
    Applicant: FUJIFILM Corporation
    Inventor: Eijiro Iwase
  • Patent number: 10274782
    Abstract: Provided is a backlight unit, including: a light source allowing light having a light emission center wavelength of ? nm to exit; and a wavelength conversion member positioned on an optical path of the light exiting from the light source, in which the wavelength conversion member includes a wavelength conversion layer containing a fluorescent material which is excited by exciting light and emits fluorescent light, and a light scattering layer containing particles having a particle size of greater than or equal to 0.1 ?m in a matrix, an average refractive index n1 of the wavelength conversion layer satisfies a relationship of n1<n2 with respect to an average refractive index n2 of the matrix of the light scattering layer, and a light absorptivity of the light scattering layer at a wavelength of ? nm is less than or equal to 8.0%.
    Type: Grant
    Filed: March 28, 2017
    Date of Patent: April 30, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Takashi Yonemoto, Eijiro Iwase, Koichi Sato
  • Publication number: 20190001646
    Abstract: A gas barrier film includes a support, a gas barrier layer provided on one surface of the support and including an inorganic layer, and a deformation inhibition layer provided on a surface of the support opposite to a surface on which the gas barrier layer is provided and including a bifunctional or higher (meth)acrylate, in which the support has a thermal expansion coefficient of 30×10?6/° C. or greater, and the (meth)acrylate of the deformation inhibition layer has a volume shrinkage rate of 3% to 20%.
    Type: Application
    Filed: September 11, 2018
    Publication date: January 3, 2019
    Applicant: FUJIFILM Corporation
    Inventor: Eijiro IWASE
  • Publication number: 20180364398
    Abstract: A gas barrier film has a support, an inorganic layer and an organic layer on one surface of the support, and a light diffusion layer containing a binder and a light diffusion agent on the other surface of the support. The binder has a graft copolymer which has an acryl polymer as a main chain and a urethane polymer or a urethane oligomer having an acryloyl group terminal as a side chain, an acryl polymer which has methacrylate as a side chain, and a graft copolymer which has an acryl polymer as a main chain and a urethane polymer or a urethane oligomer having a polycarbonate group terminal as a side chain.
    Type: Application
    Filed: August 21, 2018
    Publication date: December 20, 2018
    Applicant: FUJIFILM Corporation
    Inventor: Eijiro IWASE
  • Patent number: 10040946
    Abstract: A functional film manufacturing method, in manufacturing a functional film having an organic layer on a support and an inorganic layer on the organic layer, comprises steps of preparing a coating material containing an organic compound which has a glass transition temperature of 100° C. or higher and is to be the organic layer, and an organic solvent; coating a support surface with 5 cc/m2 or more of the coating material such that the organic layer thickness becomes 0.05 to 3 ?m; forming the organic layer by drying the coating material on the support surface such that the coating material has a viscosity of 20 cP or higher and a surface tension of 34 mN/m or less in a decreasing-rate-of-drying state, and curing the organic compound; and forming the inorganic layer on the organic layer surface by a vapor phase deposition method accompanied by generation of plasma.
    Type: Grant
    Filed: March 21, 2016
    Date of Patent: August 7, 2018
    Assignee: FUJIFILM Corporation
    Inventor: Eijiro Iwase
  • Patent number: 10012789
    Abstract: A laminate film includes a gas barrier film having a barrier layer and a support which supports the barrier layer stacked on one surface of an optical functional layer, in which the gas barrier film and the optical functional layer satisfy the following adhesion force conditions: an adhesion force between the support and the barrier layer is smaller than an adhesion force between the optical functional layer and the barrier layer, and an adhesion force between the support and the barrier layer is an adhesion force enabling peeling.
    Type: Grant
    Filed: September 29, 2015
    Date of Patent: July 3, 2018
    Assignee: FUJIFILM CORPORATION
    Inventors: Kyohisa Uchiumi, Eijiro Iwase
  • Publication number: 20180022881
    Abstract: A functional film including a substrate, a first functional layer having one or more combinations of an inorganic layer and an organic layer serving as a base substrate of the inorganic layer, formed on one surface of the substrate, a functional layer-side surface layer formed on the surface of the first functional layer, with the surface being on the side opposite to the substrate, a light diffusion layer formed on the surface of the substrate, with the surface being on the side opposite to the surface on which a first functional layer is formed, and a diffusion layer-side surface layer having a support and an adhesive layer, formed on the surface of the light diffusion layer; and a method for producing the same are provided. Thus, a functional film which has a light diffusion layer and is suitably used for a quantum dot film or the like is provided.
    Type: Application
    Filed: September 25, 2017
    Publication date: January 25, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Tomokazu SEKI, Eijiro IWASE