Patents by Inventor Emily Gallagher
Emily Gallagher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11599019Abstract: According to an aspect of the present disclosure there is provided a method for forming an EUVL pellicle, the method comprising: coating a carbon nanotube, CNT, membrane, and mounting the CNT membrane to a pellicle frame, wherein coating the CNT membrane comprises: pre-coating CNTs of the membrane with a seed material, and forming an outer coating on the pre-coated CNTs, the outer coating covering the pre-coated CNTs, the forming of the outer coating comprising depositing a coating material on the pre-coated CNTs by atomic layer deposition.Type: GrantFiled: December 22, 2020Date of Patent: March 7, 2023Assignee: IMEC VZWInventors: Marina Timmermans, Cedric Huyghebaert, Ivan Pollentier, Elie Schapmans, Emily Gallagher
-
Patent number: 11360380Abstract: The present disclosure relates to an extreme ultraviolet lithography, EUVL, device comprising: a reticle comprising a lithographic pattern to be imaged on a target wafer; a light-transmissive pellicle membrane mounted in front of, and parallel to, the reticle, wherein the pellicle membrane scatters transmitted light along a scattering axis; and an extreme ultraviolet, EUV, illumination system configured to illuminate the reticle through the pellicle membrane, wherein an illumination distribution provided by the EUV illumination system is asymmetric as seen in a source-pupil plane of the EUV illumination system; wherein light reflected by the reticle and then transmitted through the pellicle membrane comprises a non-scattered fraction and a scattered fraction formed by light scattered by the pellicle membrane; the EUVL device further comprising: an imaging system having an acceptance cone configured to capture a portion of the light reflected by the reticle and then transmitted through the pellicle membrane.Type: GrantFiled: July 10, 2020Date of Patent: June 14, 2022Assignee: IMEC VZWInventors: Joern-Holger Franke, Emily Gallagher
-
Patent number: 11181818Abstract: The present disclosure relates to a lithography scanner including: a light source configured to emit extreme ultra-violet (EUV) light; a pellicle including an EUV transmissive membrane that is configured to scatter the EUV light into an elliptical scattering pattern having a first major axis; a reticle configured to reflect the scattered EUV light through the pellicle; and an imaging system configured to project a portion of the reflected light that enters an acceptance cone of the imaging system onto a target wafer, wherein a cross section of the acceptance cone has a second major axis, and wherein the pellicle is arranged such that the first major axis is oriented at an angle relative to the second major axis.Type: GrantFiled: July 31, 2019Date of Patent: November 23, 2021Assignees: IMEC VZW, KATHOLIEKE UNIVERSITEIT LEUVEN, KU LEUVEN R&DInventors: Emily Gallagher, Joern-Holger Franke, Ivan Pollentier, Marina Timmermans, Marina Mariano Juste
-
Patent number: 11163229Abstract: A method for protecting a photomask comprises: (i) providing the photomask, (ii) providing a border, (iii) depositing at least two electrical contacts on the border, (iv) mounting a film comprising carbon nanotubes on the border such that the film comprises a free-standing part, wherein after the mounting and depositing steps, the electrical contacts are in contact with the film, (v) inducing a current through the free-standing part of the film by biasing at least one pair of the electrical contacts, and (vi) mounting the border on at least one side of the photomask with the free-standing part of the film above the photomask.Type: GrantFiled: November 5, 2019Date of Patent: November 2, 2021Assignees: IMEC VZW, KATHOLIEKE UNIVERSITEIT LEUVEN, KU LEUVEN R&DInventors: Marina Mariano Juste, Marina Timmermans, Ivan Pollentier, Cedric Huyghebaert, Emily Gallagher
-
Patent number: 11092886Abstract: The present disclosure relates to a method for forming a pellicle for extreme ultraviolet lithography, the method comprising: forming a coating of a first material on a peripheral region of a main surface of a carbon nanotube pellicle membrane, the membrane including a carbon nanotube film, arranging the carbon nanotube pellicle membrane on a pellicle frame with the peripheral region facing a support surface of the pellicle frame, wherein the support surface of the pellicle frame is formed by a second material, and bonding together the coating of the carbon nanotube pellicle membrane and the pellicle support surface by pressing the carbon nanotube pellicle membrane and the pellicle support surface against each other. The present disclosure relates also relates to a method for forming a reticle system for extreme ultraviolet lithography.Type: GrantFiled: May 15, 2018Date of Patent: August 17, 2021Assignees: IMEC VZW, Imec USA Nanoelectronics Design CenterInventors: Marina Timmermans, Emily Gallagher, Ivan Pollentier, Hanns Christoph Adelmann, Cedric Huyghebaert, Jae Uk Lee
-
Publication number: 20210191255Abstract: According to an aspect of the present disclosure there is provided a method for forming an EUVL pellicle, the method comprising: coating a carbon nanotube, CNT, membrane, and mounting the CNT membrane to a pellicle frame, wherein coating the CNT membrane comprises: pre-coating CNTs of the membrane with a seed material, and forming an outer coating on the pre-coated CNTs, the outer coating covering the pre-coated CNTs, the forming of the outer coating comprising depositing a coating material on the pre-coated CNTs by atomic layer deposition.Type: ApplicationFiled: December 22, 2020Publication date: June 24, 2021Inventors: Marina Timmermans, Cedric Huyghebaert, Ivan Pollentier, Elie Schapmans, Emily Gallagher
-
Publication number: 20210011370Abstract: The present disclosure relates to an extreme ultraviolet lithography, EUVL, device comprising: a reticle comprising a lithographic pattern to be imaged on a target wafer; a light-transmissive pellicle membrane mounted in front of, and parallel to, the reticle, wherein the pellicle membrane scatters transmitted light along a scattering axis; and an extreme ultraviolet, EUV, illumination system configured to illuminate the reticle through the pellicle membrane, wherein an illumination distribution provided by the EUV illumination system is asymmetric as seen in a source-pupil plane of the EUV illumination system; wherein light reflected by the reticle and then transmitted through the pellicle membrane comprises a non-scattered fraction and a scattered fraction formed by light scattered by the pellicle membrane; the EUVL device further comprising: an imaging system having an acceptance cone configured to capture a portion of the light reflected by the reticle and then transmitted through the pellicle membrane.Type: ApplicationFiled: July 10, 2020Publication date: January 14, 2021Inventors: Joern-Holger Franke, Emily Gallagher
-
Patent number: 10720336Abstract: A mask structure and a method for manufacturing a mask structure for a lithography process is provided. The method includes providing a substrate covered with an absorber layer on a side thereof; providing a patterned layer over the absorber layer, the patterned layer comprising at least one opening; and forming at least one assist mask feature in the at least one opening, wherein the at least one assist mask feature is formed by performing a directed self-assembly (DSA) patterning process comprising providing a BCP material in the at least one opening and inducing phase separation of a BCP material into a first component and a second component, the first component being the at least one assist mask feature and being periodically distributed with respect to the second component.Type: GrantFiled: August 30, 2018Date of Patent: July 21, 2020Assignees: IMEC VZW, Katholieke Universiteit Leuven, KU LEUVEN R&DInventors: Emily Gallagher, Roel Gronheid, Jan Doise, Iacopo Mochi
-
Patent number: 10712659Abstract: The present disclosure relates to a method for forming a carbon nanotube pellicle membrane for an extreme ultraviolet lithography reticle, the method comprising: bonding together overlapping carbon nanotubes of at least one carbon nanotube film by pressing the at least one carbon nanotube film between a first pressing surface and a second pressing surface, thereby forming a free-standing carbon nanotube pellicle membrane. The present disclosure also relates to a method for forming a pellicle for extreme ultraviolet lithography and for forming a reticle system for extreme ultraviolet lithography respectively.Type: GrantFiled: May 15, 2018Date of Patent: July 14, 2020Assignees: IMEC VZW, Imec USA Nanoelectronics Design CenterInventors: Emily Gallagher, Cedric Huyghebaert, Ivan Pollentier, Hanns Christoph Adelmann, Marina Timmermans, Jae Uk Lee
-
Publication number: 20200209737Abstract: The present disclosure relates to a lithography scanner including: a light source configured to emit extreme ultra-violet (EUV) light; a pellicle including an EUV transmissive membrane that is configured to scatter the EUV light into an elliptical scattering pattern having a first major axis; a reticle configured to reflect the scattered EUV light through the pellicle; and an imaging system configured to project a portion of the reflected light that enters an acceptance cone of the imaging system onto a target wafer, wherein a cross section of the acceptance cone has a second major axis, and wherein the pellicle is arranged such that the first major axis is oriented at an angle relative to the second major axis.Type: ApplicationFiled: July 31, 2019Publication date: July 2, 2020Inventors: Emily Gallagher, Joern-Holger Franke, Ivan Pollentier, Marina Timmermans, Marina Mariano Juste
-
Publication number: 20200201169Abstract: A method for protecting a photomask comprises: (i) providing the photomask, (ii) providing a border, (iii) depositing at least two electrical contacts on the border, (iv) mounting a film comprising carbon nanotubes on the border such that the film comprises a free-standing part, wherein after the mounting and depositing steps, the electrical contacts are in contact with the film, (v) inducing a current through the free-standing part of the film by biasing at least one pair of the electrical contacts, and (vi) mounting the border on at least one side of the photomask with the free-standing part of the film above the photomask.Type: ApplicationFiled: November 5, 2019Publication date: June 25, 2020Inventors: Marina Mariano Juste, Marina Timmermans, Ivan Pollentier, Cedric Huyghebaert, Emily Gallagher
-
Patent number: 10353284Abstract: The present disclosure provides a lithographic reticle system comprising a reticle, a first pellicle membrane mounted in front of the reticle, and a second pellicle membrane mounted in front of the first pellicle membrane, wherein the first pellicle membrane is arranged between the reticle and the second pellicle membrane, and wherein the second pellicle membrane is releasably mounted in relation to the first pellicle membrane and the reticle.Type: GrantFiled: May 15, 2018Date of Patent: July 16, 2019Assignees: IMEC VZW, IMEC USA NANOELECTRONICS DESIGN CENTERInventors: Rik Jonckheere, Cedric Huyghebaert, Emily Gallagher
-
Publication number: 20190074186Abstract: A mask structure and a method for manufacturing a mask structure for a lithography process is provided. The method includes providing a substrate covered with an absorber layer on a side thereof; providing a patterned layer over the absorber layer, the patterned layer comprising at least one opening; and forming at least one assist mask feature in the at least one opening, wherein the at least one assist mask feature is formed by performing a directed self-assembly (DSA) patterning process comprising providing a BCP material in the at least one opening and inducing phase separation of a BCP material into a first component and a second component, the first component being the at least one assist mask feature and being periodically distributed with respect to the second component.Type: ApplicationFiled: August 30, 2018Publication date: March 7, 2019Applicants: IMEC VZW, Katholieke Universiteit Leuven, KU LEUVEN R&DInventors: Emily Gallagher, Roel Gronheid, Jan Doise, Iacopo Mochi
-
Publication number: 20180329290Abstract: The present disclosure provides a lithographic reticle system comprising a reticle, a first pellicle membrane mounted in front of the reticle, and a second pellicle membrane mounted in front of the first pellicle membrane, wherein the first pellicle membrane is arranged between the reticle and the second pellicle membrane, and wherein the second pellicle membrane is releasably mounted in relation to the first pellicle membrane and the reticle.Type: ApplicationFiled: May 15, 2018Publication date: November 15, 2018Applicants: IMEC VZW, Imec USA Nanoelectronics Design CenterInventors: Rik Jonckheere, Cedric Huyghebaert, Emily Gallagher
-
Publication number: 20180329289Abstract: The present disclosure relates to a method for forming a carbon nanotube pellicle membrane for an extreme ultraviolet lithography reticle, the method comprising: bonding together overlapping carbon nanotubes of at least one carbon nanotube film by pressing the at least one carbon nanotube film between a first pressing surface and a second pressing surface, thereby forming a free-standing carbon nanotube pellicle membrane. The present disclosure also relates to a method for forming a pellicle for extreme ultraviolet lithography and for forming a reticle system for extreme ultraviolet lithography respectively.Type: ApplicationFiled: May 15, 2018Publication date: November 15, 2018Applicants: IMEC VZW, Imec USA Nanoelectronics Design CenterInventors: Emily Gallagher, Cedric Huyghebaert, Ivan Pollentier, Hanns Christoph Adelmann, Marina Timmermans, Jae Uk Lee
-
Publication number: 20180329291Abstract: The present disclosure relates to a method for forming a pellicle for extreme ultraviolet lithography, the method comprising: forming a coating of a first material on a peripheral region of a main surface of a carbon nanotube pellicle membrane, the membrane including a carbon nanotube film, arranging the carbon nanotube pellicle membrane on a pellicle frame with the peripheral region facing a support surface of the pellicle frame, wherein the support surface of the pellicle frame is formed by a second material, and bonding together the coating of the carbon nanotube pellicle membrane and the pellicle support surface by pressing the carbon nanotube pellicle membrane and the pellicle support surface against each other. The present disclosure relates also relates to a method for forming a reticle system for extreme ultraviolet lithography.Type: ApplicationFiled: May 15, 2018Publication date: November 15, 2018Applicants: IMEC VZW, Imec USA Nanoelectronics Design CenterInventors: Marina Timmermans, Emily Gallagher, Ivan Pollentier, Hanns Christoph Adelmann, Cedric Huyghebaert, Jae Uk Lee
-
Patent number: 9449350Abstract: Computer-readable media, systems, and methods are provided for prompting a customer of a service to submit digital content to the service in order to generate an online compilation. Input from the customer may be received in response to communications from the service. Temporal preference information may then be extracted from the input by determining time periods at which the customer most commonly provides the input in response to the communications. Based on the time periods at which the customer most commonly provides input, a prompting scheme may be derived, where the prompting scheme governs scheduling an automatic distribution of subsequent communications to the customer at the time periods at which the customer most commonly provides the input. The subsequent communications may then be distributed to the customer in accordance with the prompting scheme.Type: GrantFiled: August 22, 2014Date of Patent: September 20, 2016Assignee: HALLMARK CARDS, INCORPORATEDInventors: Emily Gallagher Brough, Eddy Dywayne Johnson, Kevin John Bridges, Jason Blake Penrod, Kirby Bouas McDaniel
-
Publication number: 20150012450Abstract: Computer-readable media, systems, and methods are provided for prompting a customer of a service to submit digital content to the service in order to generate an online compilation. Input from the customer may be received in response to communications from the service. Temporal preference information may then be extracted from the input by determining time periods at which the customer most commonly provides the input in response to the communications. Based on the time periods at which the customer most commonly provides input, a prompting scheme may be derived, where the prompting scheme governs scheduling an automatic distribution of subsequent communications to the customer at the time periods at which the customer most commonly provides the input. The subsequent communications may then be distributed to the customer in accordance with the prompting scheme.Type: ApplicationFiled: August 22, 2014Publication date: January 8, 2015Inventors: EMILY GALLAGHER BROUGH, EDDY DYWAYNE JOHNSON, KEVIN JOHN BRIDGES, JASON BLAKE PENROD, KIRBY BOUAS MCDANIEL
-
Patent number: 8819169Abstract: Computer-readable media, computer systems, and computing methods are provided for establishing and updating a prompting scheme for soliciting feedback from a customer. Initially, the customer provides a type of occasion to monitor and temporal criteria for receiving communications from a service. The service generates a prompting scheme based on the type of occasion in order to properly compose solicitations for feedback from the customer. Also, the service uses the temporal criteria for establishing the prompting scheme, which influences the scheduling of communications bearing the solicitations, respectively. Upon delivering the communications, interaction between the customer and the service is monitored and evaluated in order to update the prompting scheme.Type: GrantFiled: May 20, 2011Date of Patent: August 26, 2014Assignee: Hallmark Cards, IncorporatedInventors: Emily Gallagher Kinder, Eddy Dywayne Johnson, Kevin John Bridges, Jason Blake Penrod, Kirby Bouas McDaniel
-
Publication number: 20120297018Abstract: Computer-readable media, computer systems, and computing methods are provided for establishing and updating a prompting scheme for soliciting feedback from a customer. Initially, the customer provides a type of occasion to monitor and temporal criteria for receiving communications from a service. The service generates a prompting scheme based on the type of occasion in order to properly compose solicitations for feedback from the customer. Also, the service uses the temporal criteria for establishing the prompting scheme, which influences the scheduling of communications bearing the solicitations, respectively. Upon delivering the communications, interaction between the customer and the service is monitored and evaluated in order to update the prompting scheme.Type: ApplicationFiled: May 20, 2011Publication date: November 22, 2012Inventors: EMILY GALLAGHER KINDER, EDDY DYWAYNE JOHNSON, KEVIN JOHN BRIDGES, JASON BLAKE PENROD, KIRBY BOUAS MCDANIEL