Abstract: A memory device includes a first signal line, a second signal line, a first memory cell and a plurality of second memory cells. The first memory cell is coupled to the first signal line. Each of the second memory cells has a first terminal coupled to the first signal line through the first memory cell and a second terminal coupled to the second signal line.

Abstract: A memory integrated circuit is provided. The memory integrated circuit includes a first memory array, a second memory array and a driving circuit. The first and second memory arrays are laterally spaced apart, and respectively include: memory cells, each including an access transistor and a storage capacitor coupled to the access transistor; bit lines, respectively coupled to a row of the memory cells; and word lines, respectively coupled to a column of the memory cells. The driving circuit is disposed below the first and second memory arrays, and includes sense amplifiers. Each of the bit lines in the first memory array and one of the bit lines in the second memory array are routed to input lines of one of the sense amplifiers.

Abstract: A memory circuit includes first and second circuits. The first circuit includes a DRAM array including a plurality of bit lines, and the second circuit includes a computation circuit including a sense amplifier circuit. A boundary layer is positioned between the first and second circuits, and the boundary layer includes a plurality of via structures configured to electrically connect the plurality of bit lines to the sense amplifier circuit.

Abstract: A memory device includes a first memory block. The first memory block includes a first memory sub-array and a first interface portion disposed next to the first memory sub-array. The first interface portion has a plurality of first control structures formed as a first staircase profile. The first memory block further includes a plurality of first interconnect structures landing on a corresponding one of the plurality of first control structures, and a plurality of second interconnect structures configured to electrically couple a corresponding one of the plurality of first interconnect structures to a first transistor. The memory device further includes a first test structure and a second test structure disposed next to the first memory block, each configured to simulate electrical connections of the plurality of second interconnect structures. The first and second test structures are electrically coupled to each other and are electrically isolated form the first memory block.

Abstract: A method for fabricating an integrated circuit is provided. The method includes etching a first recess in a semiconductor structure; forming a first doped epitaxial feature in the first recess; and forming a second doped epitaxial feature over the first doped epitaxial feature, wherein the second doped epitaxial feature has a conductive type opposite to a conductive type of the first doped epitaxial feature.

Abstract: A device includes a multiplication unit and a configurable summing unit. The multiplication unit is configured to receive data and weights for an Nth layer, where N is a positive integer. The multiplication unit is configured to multiply the data by the weights to provide multiplication results. The configurable summing unit is configured by Nth layer values to receive an Nth layer number of inputs and perform an Nth layer number of additions, and to sum the multiplication results and provide a configurable summing unit output.

Abstract: In some embodiments, an integrated circuit (IC) device includes an active semiconductor layer, a circuitry formed within the active semiconductor layer, a region including conductive layers formed above the active semiconductor layer, and a memory module formed in the region. The memory device includes a three-dimensional array of memory cells, each adapted to store a weight value, and adapted to generate at each memory cell a signal indicative of a product between the stored weight value and an input signal applied to the memory cell. The memory module is further adapted to transmit the product signals from the memory cell simultaneously in the direction of the active semiconductor layer.

Abstract: A memory device including a memory array configured to store data, a sense amplifier circuit coupled to the memory array, and a read circuit coupled to the sense amplifier circuit, wherein the read circuit includes a first input that receives a read column select signal for activating the read circuit to read the data out of the memory array through the read circuit during a read operation.

Abstract: A semiconductor die comprises a first set of semiconductor devices disposed at a first location of the semiconductor die and a second set of semiconductor devices disposed at a second location of the semiconductor die different from the first location. Each of the first set of semiconductor devices have a first workfunction to cause each of the first set of semiconductor devices to store memory for a first time period. Moreover, each of the second set of semiconductor devices have a second workfunction that is higher greater than the first workfunction to cause each of the second set of semiconductor devices to store memory for a second time period greater than the first time period.

Abstract: A memory cell is disclosed. The memory cell includes a first transistor. The first transistor includes a first conduction channel collectively constituted by one or more first nanostructures spaced apart from one another along a vertical direction. The memory cell includes a second transistor electrically coupled to the first transistor in series. The second transistor includes a second conduction channel collectively constituted by one or more second nanostructures spaced apart from one another along the vertical direction. At least one of the one or more first nanostructures is applied with first stress by a first metal structure extending, along the vertical direction, into a first drain/source region of the first transistor.

Abstract: A memory device includes a first transistor. The first transistor includes one or more first semiconductor nanostructures spaced apart from one another along a first direction. Each of the one or more first semiconductor nanostructures has a first width along a second direction perpendicular to the first direction. The memory device also includes a second transistor coupled to the first transistor in series. The second transistor includes one or more second semiconductor nanostructures spaced apart from one another along the first direction. Each of the one or more second semiconductor nanostructures has a second, different width along the second direction.

Abstract: A semiconductor device includes a lower silicon layer comprising a first area and a second area. The lower silicon layer in the first area includes a first silicon oxide layer, a first upper silicon layer disposed above the first silicon oxide layer, and a first metal gate disposed above the first upper silicon layer. The lower silicon layer in the second area includes a second silicon oxide layer, a plurality of first doped silicon gates disposed above the second silicon oxide layer, and a plurality of portions of a second doped silicon gate disposed above the second silicon oxide layer. The plurality of first doped silicon gates and the plurality of portions of the second doped silicon gate are alternatively arranged with each other. The lower silicon layer in the second area also includes a plurality of second metal gates disposed directly above the plurality of first doped silicon gates, respectively.

Abstract: The present disclosure is directed to methods for the formation of high-voltage nano-sheet transistors and low-voltage gate-all-around transistors on a common substrate. The method includes forming a fin structure with first and second nano-sheet layers on the substrate. The method also includes forming a gate structure having a first dielectric and a first gate electrode on the fin structure and removing portions of the fin structure not covered by the gate structure. The method further includes partially etching exposed surfaces of the first nano-sheet layers to form recessed portions of the first nano-sheet layers in the fin structure and forming a spacer structure on the recessed portions. In addition, the method includes replacing the first gate electrode with a second dielectric and a second gate electrode, and forming an epitaxial structure abutting the fin structure.

Abstract: A semiconductor device includes a first memory cell that includes: a first conductor structure extending along a first lateral direction; a first portion of a first memory film wrapping around a first portion of the first conductor structure; a first semiconductor film wrapping around the first portion of the first memory film; a second conductor structure extending along a vertical direction and coupled to a first sidewall of the first semiconductor film, wherein the first sidewall faces toward or away from a second lateral direction perpendicular to the first lateral direction; and a third conductor structure extending along the vertical direction and coupled to a second sidewall of the first semiconductor film, wherein the second sidewall faces toward or away from the second lateral direction.

Abstract: A system includes: a high bandwidth memory (HBM) including a first sensing unit configured to generate one or more first environmental signals corresponding to a first transistor in a first memory cell, and a second sensing unit configured to generate one or more second environmental signals corresponding to a second transistor in a second memory cell; and a differentiated dynamic voltage and frequency scaling (DDVFS) device configured to perform the following (1) for a first set of the memory cells which includes the first memory cell, controlling temperature by adjusting one or more first transistor-temperature-affecting (TTA) parameters of the first set based on the one or more first environmental signals, and (2) for a second set of the memory cells which includes the second memory cell, controlling temperature by adjusting one or more second TTA parameters of the second set based on the one or more second environmental signals.

Abstract: A semiconductor device includes a first memory array which includes a first memory string including a plurality of first memory cells arranged in a vertical direction. The first memory array further includes a first conductive structure operatively coupled to the first memory string that extends through the first memory array in the vertical direction. The semiconductor device further includes a second memory array including a second memory string including a plurality of second memory cells arranged in the vertical direction. The second memory array further includes a second conductive structure operatively coupled to the second memory string that extends through the second memory array in the vertical direction. The semiconductor device further includes a bowl-shaped conductive structure interposed between the first and second memory arrays, and configured to operatively couple the first conductive structure to the second conductive structure.

Abstract: A semiconductor device includes a substrate having a first area and a second area. The semiconductor device in the first area includes a first memory layer and a first semiconductor channel coupled to a portion of the first memory layer. The semiconductor device in the first area further includes a first conductive structure and a second conductive structure coupled to end portions of the first semiconductor channel. The semiconductor device in the second area includes a third conductive structure and a second memory layer. The semiconductor device in the second area includes a second semiconductor channel that comprises: (i) a first vertical portion coupled to a portion of the second memory layer; and (ii) a lateral portion coupled to a top surface of the third conductive structure. The semiconductor device in the second area includes a fourth conductive structure coupled to an end portion of the second semiconductor channel.

Abstract: A ferroelectric field-effect transistor (FeFET) configured as a multi-bit storage device, the FeFET including: a semiconductor substrate that has a source region in the semiconductor substrate, and a drain region in the semiconductor substrate; a gate stack over the semiconductor substrate, with the source region and the drain region extending to opposite sides of the gate stack, the gate stack including a ferroelectric layer over the semiconductor substrate, and a gate region over the ferroelectric layer. The transistor also includes first and second ends of the ferroelectric layer which are proximal correspondingly to the source and drain regions. The ferroelectric layer includes dipoles. A first set of dipoles at the first end of the ferroelectric layer has a first polarization. A second set of dipoles at the second end of the ferroelectric layer has a second polarization, the second polarization being substantially opposite of the first polarization.

Abstract: A memory device is provided. The memory device includes a plurality of memory cells arranged in a matrix of a plurality of rows and a plurality of columns. A first column of the plurality of columns of the matrix includes a first plurality of memory cells of the plurality of memory cells, a first pair of bit lines connected to each of the first plurality of bit cells, and a second pair of bit lines connectable to the first pair of bit lines through a plurality of switches.

Abstract: A memory device includes a substrate, a semiconductor fin over the substrate and extending in a first direction, and a first gate electrode and a second gate electrode over the substrate and extending in a second direction. The semiconductor fin extends through the second gate electrode and terminates on the first gate electrode at one end. The memory device further includes a first conductive via over and electrically coupled to the first gate electrode. The one end of the semiconductor fin is surrounded by the first gate electrode.