Patents by Inventor Eric A. Hudson

Eric A. Hudson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200243307
    Abstract: A plasma processing system includes a plasma chamber having a substrate support, and a multi-zone gas injection upper electrode disposed opposite the substrate support. An inner plasma region is defined between the upper electrode and the substrate support. The multi-zone gas injection upper electrode has a plurality of concentric gas injection zones. A confinement structure, which surrounds the inner plasma region, has an upper horizontal wall that interfaces with the outer electrode of the upper electrode. The confinement structure has a lower horizontal wall that interfaces with the substrate support, and includes a perforated confinement ring and a vertical wall that extends from the upper horizontal wall to the lower horizontal wall. The lower surface of the upper horizontal wall, an inner surface of the vertical wall, and an upper surface of the lower horizontal wall define a boundary of an outer plasma region, which surrounds the inner plasma region.
    Type: Application
    Filed: April 10, 2020
    Publication date: July 30, 2020
    Inventors: Ryan Bise, Rajinder Dhindsa, Alexei Marakhtanov, Lumin Li, Sang Ki Nam, Jim Rogers, Eric Hudson, Gerardo Delgadino, Andrew D. Bailey, III, Mike Kellogg, Anthony de la Llera, Darrell Ehrlich
  • Publication number: 20200227237
    Abstract: Embodiments for processing a substrate in a pulsed plasma chamber are provided. A processing apparatus with two chambers, separated by a plate fluidly connecting the chambers, includes a continuous wave (CW) controller, a pulse controller, and a system controller. The CW controller sets the voltage and the frequency for a first radio frequency (RF) power source coupled to a top electrode. The pulse controller is operable to set voltage, frequency, ON-period duration, and OFF-period duration for a pulsed RF signal generated by a second RF power source coupled to the bottom electrode. The system controller is operable to regulate the flow of species between the chambers to assist in the negative-ion etching, to neutralize excessive positive charge on the wafer surface during afterglow in the OFF-period, and to assist in the re-striking of the bottom plasma during the ON-period.
    Type: Application
    Filed: March 27, 2020
    Publication date: July 16, 2020
    Inventors: Alexei Marakhtanov, Rajinder Dhindsa, Eric Hudson, Andrew D. Bailey, III
  • Publication number: 20200225114
    Abstract: Techniques are described for inspecting optical devices, such as eyepieces, to determine whether they exhibit light leakage through an edge sealant that has been applied to the device. Embodiments provide an inspection apparatus that can be employed to detect the leakage of light through an edge sealant of an optical device, where the edge sealant is applied to prevent, or at least reduce, the leakage of light from the optical device. Light from a light source is projected into the optical device. The light can travel along one or more wave guides within the device, until reaching an edge of the device. Light that is able to leak through an edge sealant can be reflected, using mirror(s) in the apparatus, and detected by a camera. Image(s) captured by the camera can be analyzed to determine the performance of the optical device with respect to edge leakage.
    Type: Application
    Filed: March 31, 2020
    Publication date: July 16, 2020
    Inventors: Ming Yang, Wendong Xing, Eric C. Browy, William Hudson Welch, Thomas Mercier
  • Publication number: 20200209459
    Abstract: An artifact mitigation system includes a projector assembly and a set of imaging optics optically coupled to the projector assembly. The artifact mitigation system also includes an eyepiece optically coupled to the set of imaging optics. The eyepiece includes a diffractive incoupling interface. The artifact mitigation system further includes an artifact prevention element disposed between the set of imaging optics and the eyepiece. The artifact prevention element includes a linear polarizer, a first quarter waveplate disposed adjacent the linear polarizer, and a color select component disposed adjacent the first quarter waveplate.
    Type: Application
    Filed: February 21, 2020
    Publication date: July 2, 2020
    Applicant: Magic Leap, Inc.
    Inventors: Kevin Curtis, Hui-Chuan Cheng, Paul M. Greco, William Hudson Welch, Eric C. Browy, Miller Schuck, Bradley Jay Sissom
  • Publication number: 20200194234
    Abstract: An apparatus for processing substrates is provided. A chamber comprises a chamber top and a chamber bottom, wherein the chamber bottom is detachably connected to the chamber top. At least one substrate support supports at least one substrate in the chamber. A substrate port allows a substrate to move into or out of the chamber. A seal creates a vacuum seal when the chamber top is on the chamber bottom. A manipulation system for manipulating an interior of the chamber when the chamber top is spaced apart from the chamber bottom comprises 1) a sealing wall for creating a seal between the chamber top and chamber bottom when the chamber top is spaced apart from the chamber bottom and 2) a manipulation port in the sealing wall, wherein the manipulation port allows a mechanical force to be provided through the sealing wall inside the chamber.
    Type: Application
    Filed: December 17, 2018
    Publication date: June 18, 2020
    Inventors: Leonid BELAU, Eric HUDSON, John HOLLAND
  • Patent number: 10662779
    Abstract: A gas turbine engine component includes a passage and a wall adjacent the passage. The wall includes a first side bordering the passage and a second side opposite the first side. The second side includes an array of cells. The wall also includes an array of channels. Each of the channels is located proximate a corresponding one of the cells. A coating is disposed over the cells. When the coating degrades the channels open to permit impingement air flow through the channel onto sidewalls of the cells.
    Type: Grant
    Filed: November 17, 2016
    Date of Patent: May 26, 2020
    Assignee: RAYTHEON TECHNOLOGIES CORPORATION
    Inventors: Eric A. Hudson, Tracy A. Propheter-Hinckley
  • Publication number: 20200141255
    Abstract: Aspects of the disclosure are directed to a seal configured to interface with at least a first component and a second component of a gas turbine engine. A method for forming the seal includes obtaining an ingot of a fine grained, or a coarse grained, or a columnar grained or a single crystal material from a precipitation hardened nickel base superalloy containing at least 40% by volume of the precipitate of the form Ni3(Al, X), where X is a metallic or refractory element, and processing the ingot to generate a sheet of the material, where the sheet has a thickness within a range of 0.010 inches and 0.050 inches inclusive.
    Type: Application
    Filed: September 18, 2019
    Publication date: May 7, 2020
    Inventors: Alan D. Cetel, Dilip N. Shah, Eric A. Hudson, Raymond Surace
  • Patent number: 10641682
    Abstract: Techniques are described for inspecting optical devices, such as eyepieces, to determine whether they exhibit light leakage through an edge sealant that has been applied to the device. Embodiments provide an inspection apparatus that can be employed to detect the leakage of light through an edge sealant of an optical device, where the edge sealant is applied to prevent, or at least reduce, the leakage of light from the optical device. Light from a light source is projected into the optical device. The light can travel along one or more wave guides within the device, until reaching an edge of the device. Light that is able to leak through an edge sealant can be reflected, using mirror(s) in the apparatus, and detected by a camera. Image(s) captured by the camera can be analyzed to determine the performance of the optical device with respect to edge leakage.
    Type: Grant
    Filed: June 12, 2019
    Date of Patent: May 5, 2020
    Assignee: Magic Leap, Inc.
    Inventors: Ming Yang, Wendong Xing, Eric C. Browy, William Hudson Welch, Thomas Mercier
  • Patent number: 10627559
    Abstract: An artifact mitigation system includes a projector assembly, a set of imaging optics optically coupled to the projector assembly, and an eyepiece optically coupled to the set of imaging optics. The eyepiece includes an incoupling interface. The artifact mitigation system also includes an artifact prevention element disposed between the set of imaging optics and the eyepiece. The artifact prevention element includes a linear polarizer, a first quarter waveplate disposed adjacent the linear polarizer, and a color select component disposed adjacent the first quarter waveplate.
    Type: Grant
    Filed: August 22, 2017
    Date of Patent: April 21, 2020
    Assignee: Magic Leap, Inc.
    Inventors: Kevin Curtis, Hui-Chuan Cheng, Paul M. Greco, William Hudson Welch, Eric C. Browy, Miller Schuck, Bradley Jay Sissom
  • Patent number: 10622195
    Abstract: A system and method of plasma processing includes a plasma processing system including a plasma chamber and a controller coupled to the plasma chamber. The plasma chamber including a substrate support and an upper electrode opposite the substrate support, the upper electrode having a plurality of concentric gas injection zones.
    Type: Grant
    Filed: April 3, 2012
    Date of Patent: April 14, 2020
    Assignee: Lam Research Corporation
    Inventors: Ryan Bise, Rajinder Dhindsa, Alexei Marakhtanov, Lumin Li, Sang Ki Nam, Jim Rogers, Eric Hudson, Gerardo Delgadino, Andrew D. Bailey, III, Mike Kellogg, Anthony Dela Llera, Darrell Ehrlich
  • Publication number: 20200105508
    Abstract: A wafer is supported on a wafer support structure such that a lower peripheral open region exists between a peripheral portion of a bottom surface of the wafer and an edge ring structure. The edge ring structure is configured to circumscribe both the wafer support structure and the wafer. A plasma is generated above a top surface of the wafer. The plasma causes accumulation of byproduct material within the lower peripheral open region. A byproduct volatizing gas is supplied to the lower peripheral open region to control the accumulation of the byproduct material within the lower peripheral open region during generation of the plasma. Use of the byproduct volatizing gas to control the accumulation of the byproduct material within the lower peripheral open region serves to prevent electrical arcing and particle contamination.
    Type: Application
    Filed: September 28, 2018
    Publication date: April 2, 2020
    Inventors: Leonid Belau, Alexei Marakhtanov, Eric Hudson, John Patrick Holland
  • Publication number: 20200090948
    Abstract: Systems and methods for applying three or more states for achieving a high aspect ratio dielectric etch operation are described. In one of the methods, a middle state is introduced between a high state and a low state. The middle state is applied to both a source radio frequency (RF) generator and a bias radio frequency (RF) generator. During the middle state, RF power is maintained to be between a high amount of RF power associated with the high state and a low amount of RF power associated with the low state to achieve the high aspect ratio dielectric etch.
    Type: Application
    Filed: November 21, 2019
    Publication date: March 19, 2020
    Inventors: Takumi Yanagawa, Nikhil Dole, Ranadeep Bhowmick, Eric Hudson, Felix Leib Kozakevich, John Holland, Alexei Marakhtanov, Bradford J. Lyndaker
  • Publication number: 20200066540
    Abstract: A method of forming a feature in a stack comprising a dielectric material on a substrate is provided. An etch plasma is generated from an etch gas, exposing the stack to the etch plasma and partially etching the feature in the stack. The stack is primed. A protective film is deposited on sidewalls of the feature by repeating for a plurality of cycles the steps of exposing the stack to a first reactant, allowing the first reactant to adsorb onto the stack, and exposing the stack to a second reactant, wherein the first and second reactants react with one another to form the protective film over the stack. The etching, priming, and depositing a protective film are repeated until the feature is etched to a final depth.
    Type: Application
    Filed: August 21, 2018
    Publication date: February 27, 2020
    Inventors: Eric HUDSON, Kalman PELHOS
  • Publication number: 20200068685
    Abstract: A luminaire may include a universal translator and interface system. The universal translator and interface system may include one or more universal interfaces that are configured to removably and communicably couple one or more control devices and/or a building lighting control system to the luminaire. Further, the universal translator and interface system may include a universal translator engine that is communicably coupled to the one or more universal interfaces. The universal translator engine is configured to translate data in a first format associated with a first communication protocol to a second format associated with a second communication protocol to enable interoperability between the control devices, the building lighting control system, and the luminaire that may have different communication protocols that are incompatible with each other.
    Type: Application
    Filed: August 26, 2019
    Publication date: February 27, 2020
    Inventors: Eric DiFelice, William E. Getzinger, Derek Hudson, Chris M. Clary, Nicole M. Davis, J.T. Brlansky
  • Patent number: 10553399
    Abstract: Embodiments for processing a substrate in a pulsed plasma chamber are provided. A processing apparatus with two chambers, separated by a plate fluidly connecting the chambers, includes a continuous wave (CW) controller, a pulse controller, and a system controller. The CW controller sets the voltage and the frequency for a first radio frequency (RF) power source coupled to a top electrode. The pulse controller is operable to set voltage, frequency, ON-period duration, and OFF-period duration for a pulsed RF signal generated by a second RF power source coupled to the bottom electrode. The system controller is operable to set parameters to regulate the flow of species between the chambers to assist in the negative-ion etching, to neutralize excessive positive charge on the wafer surface during afterglow in the OFF period, and to assist in the re-striking of the bottom plasma during the ON period.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: February 4, 2020
    Assignee: Lam Research Corporation
    Inventors: Alexei Marakhtanov, Rajinder Dhindsa, Eric Hudson, Andrew D. Bailey, III
  • Publication number: 20200024970
    Abstract: An airfoil includes leading and trailing edges; first and second sides extending from the leading edge to the trailing edge, each side having an exterior surface; a core passage located between the first and second sides and the leading and trailing edges; and a wall structure located between the core passage and the exterior surface of the first side. The wall structure includes a plurality of cooling fluid inlets communicating with the core passage for receiving cooling fluid from the core passage, a plurality of cooling fluid outlets on the exterior surface of the first side for expelling cooling fluid and forming a cooling film along the exterior surface of the first side, and a plurality of cooling passages communicating with the plurality of cooling fluid inlets and the plurality of cooling fluid outlets. At least a portion of one cooling passage extends between adjacent cooling fluid outlets.
    Type: Application
    Filed: April 29, 2019
    Publication date: January 23, 2020
    Inventors: Eric A. Hudson, Tracy A. Propheter-Hinckley, San Quach, Matthew A. Devore
  • Publication number: 20200025027
    Abstract: A cooling scheme for a blade outer air seal includes a perimeter cooling arrangement configured to convectively cool a perimeter of the blade outer air seal, and a core cooling arrangement configured to cool a central portion of the blade outer air seal through impingement cooling and to provide film cooling to an inner diameter face of the blade outer air seal.
    Type: Application
    Filed: January 21, 2019
    Publication date: January 23, 2020
    Inventors: Susan M. Tholen, Dominic J. Mongillo, Paul M. Lutjen, James N. Knapp, Virginia L. Ross, Jonathan J. Earl, Eric A. Hudson
  • Publication number: 20200026348
    Abstract: Techniques are disclosed for performing localization of a handheld device with respect to a wearable device. At least one sensor mounted to the handheld device, such as an inertial measurement unit (IMU), may obtain handheld data indicative of movement of the handheld device with respect to the world. An imaging device mounted to either the handheld device or the wearable device may capture a fiducial image containing a number of fiducials affixed to the other device. The number of fiducials contained in the image are determined. Based on the number of fiducials, at least one of a position and an orientation of the handheld device with respect to the wearable device are updated based on the image and the handheld data in accordance with a first operating state, a second operating state, or a third operating state.
    Type: Application
    Filed: September 30, 2019
    Publication date: January 23, 2020
    Applicant: Magic Leap, Inc.
    Inventors: Zachary C. Nienstedt, Samuel A. Miller, Barak Freedman, Lionel Ernest Edwin, Eric C. Browy, William Hudson Welch, Ron Liraz Lidji
  • Patent number: 10541144
    Abstract: A method for etching features into a silicon containing layer comprising performing a plurality of cycles in a plasma processing chamber is provided. Each cycle comprises a deposition phase and an activation phase. The deposition phase comprises flowing a precursor into the plasma processing chamber to form a self-limiting monolayer, wherein the precursor comprises a head group component and a tail group component, wherein the tail group component comprises fluorine and carbon, and stopping the flow of the precursor into the plasma processing chamber. The activation phase comprises flowing an activation gas comprising an ion bombardment gas, into the plasma processing chamber, creating a plasma from the activation gas, providing an activation bias to cause ion bombardment of the self-limiting monolayer, wherein the ion bombardment activates the fluorine from the tail group component to etch the silicon containing layer, and stopping the flow of the activation gas.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: January 21, 2020
    Assignee: Lam Research Corporation
    Inventor: Eric Hudson
  • Publication number: 20200012044
    Abstract: An eyepiece waveguide for an augmented reality. The eyepiece waveguide can include a transparent substrate with an input coupler region, a first orthogonal pupil expander (OPE) region, and an exit pupil expander (EPE) region. The input coupler region can couple an input light beam that is externally incident on the input coupler region into at least a first guided light beam that propagates inside the substrate. The first OPE region can divide the first guided beam into a plurality of replicated, spaced-apart beams. The EPE region can re-direct the replicated beams from the first OPE region such that they exit the substrate. The EPE region can have an amount of optical power.
    Type: Application
    Filed: September 13, 2019
    Publication date: January 9, 2020
    Inventors: Michael Anthony Klug, Robert Dale Tekolste, William Hudson Welch, Eric Browy, Victor Kai Liu, Samarth Bhargava