Patents by Inventor Eric Eva

Eric Eva has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210116616
    Abstract: In order to reduce the degree of relaxation after an optical substrate has been compacted, in particular after a longer period, substrates (51) or reflective optical elements (50), in particular for EUV lithography, with substrates (51) of this type, are proposed. These substrates (51), which have a surface region (511) with a reflective coating (54), are characterised in that, at least near to the surface region (511), the titanium-doped quartz glass has a proportion of Si—O—O—Si bonds of at least 1*1016/cm3 and/or a proportion of Si—Si bonds of at least 1*1016/cm3 or, along a notional line (513) perpendicular to the surface region (511), over a length (517) of 500 nm or more, a hydrogen content of more than 5×1018 molecules/cm3.
    Type: Application
    Filed: December 29, 2020
    Publication date: April 22, 2021
    Inventor: Eric EVA
  • Patent number: 10976667
    Abstract: An optical manipulator (MAN) includes an optical element (OE), in particular composed of fused silica, and an actuating device (DR) that reversibly changes the surface form (SF) of the optical element (OE). The actuating device (DR) has a plurality of actuators (AK) that mechanically act on the optical element (OE) at a plurality of contact areas. The optical element (OE) at least at action regions in vicinities of the contact areas of the actuators (AK) is prestressed to an compressive stress of more than 1 MPa, preferably of more than 100 MPa, particularly preferably of more than 500 MPa. Also disclosed are a projection lens provided with at least one such optical manipulator (MAN), a projection exposure apparatus having such a projection lens, and a method for producing such an optical manipulator (MAN).
    Type: Grant
    Filed: December 30, 2016
    Date of Patent: April 13, 2021
    Assignee: CARL ZEISS SMT GMBH
    Inventor: Eric Eva
  • Patent number: 10649340
    Abstract: In order to prevent delamination of a reflective coating from the substrate under the influence of reactive hydrogen, a reflective optical element (50) for EUV lithography is provided, which has a substrate (51) and a reflective coating (54) for reflecting radiation in the wavelength range of 5 nm to 20 nm. A functional layer (60) is arranged between the reflective coating (54) and the substrate (51). With the functional layer, the concentration of hydrogen in atom % at the side of the substrate facing the reflective coating is reduced by at least a factor of 2.
    Type: Grant
    Filed: January 25, 2019
    Date of Patent: May 12, 2020
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Dirk Heinrich Ehm, Vitaliy Shklover, Irene Ament, Stefan-Wolfgang Schmidt, Moritz Becker, Stefan Wiesner, Diana Urich, Robert Meier, Ralf Winter, Christof Jalics, Holger Kierey, Eric Eva
  • Publication number: 20190302628
    Abstract: A cost-effective method for repairing reflective optical elements for EUV lithography. These optical elements (60) have a substrate (61) and a coating (62) that reflects at a working wavelength in the range between 5 nm and 20 nm and is damaged as a result of formation of hydrogen bubbles. The method includes: localizing a damaged area (63, 64, 65, 66) in the coating (62) and covering the damaged area (63, 64, 65, 66) with one or more materials having low hydrogen permeability by applying a cover element to the damaged area. The cover element is formed of a surface structure, a convex or concave surface, or a coating corresponding to the coating of the reflective optical element, or a combination thereof. The method is particularly suitable for collector mirrors (70) for EUV lithography. After the repair, the optical elements have cover elements (71, 72, 73).
    Type: Application
    Filed: June 6, 2019
    Publication date: October 3, 2019
    Inventors: Robert MEIER, Holger KIEREY, Christof JALICS, Eric EVA, Ralf WINTER, Arno SCHMITTNER, Alexey KUZNETSOV, Vitaliy SHKLOVER, Christoph NOTTBOHM, Wolfgang MERKEL
  • Patent number: 10427965
    Abstract: A method for loading a blank composed of fused silica with hydrogen, including loading the blank at a first temperature (T1) and a first hydrogen partial pressure (p1), and further loading the blank at a second temperature (T2) which is different from the first temperature and at a second hydrogen partial pressure (p2) which is different from the first hydrogen partial pressure. The first and second temperatures (T1, T2) are lower than a limit temperature (TL) at which a thermal formation of silane in the fused silica of the blank commences. Also disclosed are a lens element produced from such a blank and a projection lens that includes at least one such lens element.
    Type: Grant
    Filed: February 2, 2016
    Date of Patent: October 1, 2019
    Assignee: CARL ZEISS SMT GMBH
    Inventor: Eric Eva
  • Publication number: 20190212654
    Abstract: A component for a mirror array for EUV lithography, particularly for use in faceted mirrors in illumination systems of EUV lithography devices. A component (500) for a mirror array for EUV lithography is proposed which is at least partially made from a composite material including matrix material (502) that contains copper and/or aluminium, and reinforcing material in the form of fibers (504). The composite material also includes particles (508) that consist of one or more of the materials from the group: graphite, adamantine carbon, and ceramic.
    Type: Application
    Filed: March 15, 2019
    Publication date: July 11, 2019
    Inventor: Eric EVA
  • Publication number: 20190171108
    Abstract: In order to prevent delamination of a reflective coating from the substrate under the influence of reactive hydrogen, a reflective optical element (50) for EUV lithography is provided, which has a substrate (51) and a reflective coating (54) for reflecting radiation in the wavelength range of 5 nm to 20 nm. A functional layer (60) is arranged between the reflective coating (54) and the substrate (51). With the functional layer, the concentration of hydrogen in atom % at the side of the substrate facing the reflective coating is reduced by at least a factor of 2.
    Type: Application
    Filed: January 25, 2019
    Publication date: June 6, 2019
    Inventors: Dirk Heinrich EHM, Vitaliy SHKLOVER, Irene AMENT, Stefan-Wolfgang SCHMIDT, Moritz BECKER, Stefan WIESNER, Diana URICH, Robert MEIER, Ralf WINTER, Christof JALICS, Holger KIEREY, Eric EVA
  • Publication number: 20170108780
    Abstract: An optical manipulator (MAN) includes an optical element (OE), in particular composed of fused silica, and an actuating device (DR) that reversibly changes the surface form (SF) of the optical element (OE). The actuating device (DR) has a plurality of actuators (AK) that mechanically act on the optical element (OE) at a plurality of contact areas. The optical element (OE) at least at action regions in vicinities of the contact areas of the actuators (AK) is prestressed to an compressive stress of more than 1 MPa, preferably of more than 100 MPa, particularly preferably of more than 500 MPa. Also disclosed are a projection lens provided with at least one such optical manipulator (MAN), a projection exposure apparatus having such a projection lens, and a method for producing such an optical manipulator (MAN).
    Type: Application
    Filed: December 30, 2016
    Publication date: April 20, 2017
    Inventor: Eric EVA
  • Publication number: 20160145137
    Abstract: A method for loading a blank composed of fused silica with hydrogen, including loading the blank at a first temperature (T1) and a first hydrogen partial pressure (p1), and further loading the blank at a second temperature (T2) which is different from the first temperature and at a second hydrogen partial pressure (p2) which is different from the first hydrogen partial pressure. The first and second temperatures (T1, T2) are lower than a limit temperature (TL) at which a thermal formation of silane in the fused silica of the blank commences. Also disclosed are a lens element produced from such a blank and a projection lens that includes at least one such lens element.
    Type: Application
    Filed: February 2, 2016
    Publication date: May 26, 2016
    Inventor: Eric EVA
  • Patent number: 9036152
    Abstract: A method for determining the absorption of a blank (2) for producing an optical element (3), including: radiating a heating light ray (8) through the blank (2) for the purpose of heating the blank (2), and determining the absorption in the blank (2) by measuring at least one property of a measurement light ray (10) influenced by the heating of the blank (2). In the method, either the heating light ray (8) and the measurement light ray (10) or the heating light ray and a further heating light ray are oriented to enter into the blank (2) through a first polished surface (2a) or a second polished surface (2b), situated opposite the first surface, and meet one another exclusively in the interior of the blank (2), preferably in a volume (12) used for the production of the optical element (3). An associated measuring apparatus (1), optical element (3), and optical arrangement are also disclosed.
    Type: Grant
    Filed: January 8, 2014
    Date of Patent: May 19, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Eric Eva
  • Patent number: 8891172
    Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
    Type: Grant
    Filed: March 11, 2009
    Date of Patent: November 18, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner
  • Patent number: 8780448
    Abstract: A method for manufacturing a preferably asymmetrical lens element (5a) from a tempered blank (1) is characterized by: producing the lens element (5a) from a first partial volume (1a) of the tempered blank (1), whose thickness d is less than approximately 70%, preferably less than approximately 60%, particularly preferably less than approximately 50% of the thickness D of the tempered blank (1). Preferably, from a second partial volume (1b) of the tempered blank (1) at least a further lens element (5a?) is produced, wherein before the lens elements (5a, 5a?) are produced the tempered blank (1) is divided into the first and second partial volume (1a, 1b).
    Type: Grant
    Filed: May 7, 2012
    Date of Patent: July 15, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Eric Eva
  • Publication number: 20140192344
    Abstract: A method for determining the absorption of a blank (2) for producing an optical element (3), including: radiating a heating light ray (8) through the blank (2) for the purpose of heating the blank (2), and determining the absorption in the blank (2) by measuring at least one property of a measurement light ray (10) influenced by the heating of the blank (2). In the method, either the heating light ray (8) and the measurement light ray (10) or the heating light ray and a further heating light ray are oriented to enter into the blank (2) through a first polished surface (2a) or a second polished surface (2b), situated opposite the first surface, and meet one another exclusively in the interior of the blank (2), preferably in a volume (12) used for the production of the optical element (3). An associated measuring apparatus (1), optical element (3), and optical arrangement are also disclosed.
    Type: Application
    Filed: January 8, 2014
    Publication date: July 10, 2014
    Applicant: CARL ZEISS SMT GmbH
    Inventor: Eric EVA
  • Patent number: 8508854
    Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
    Type: Grant
    Filed: December 13, 2010
    Date of Patent: August 13, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner
  • Publication number: 20120218643
    Abstract: A method for manufacturing a preferably asymmetrical lens element (5a) from a tempered blank (1) is characterized by: producing the lens element (5a) from a first partial volume (1a) of the tempered blank (1), whose thickness d is less than approximately 70%, preferably less than approximately 60%, particularly preferably less than approximately 50% of the thickness D of the tempered blank (1). Preferably, from a second partial volume (1b) of the tempered blank (1) at least a further lens element (5a?) is produced, wherein before the lens elements (5a, 5a?) are produced the tempered blank (1) is divided into the first and second partial volume (1a, 1b).
    Type: Application
    Filed: May 7, 2012
    Publication date: August 30, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventor: Eric EVA
  • Publication number: 20120209693
    Abstract: How can one be sure that marketing ads displayed on a PC are seen by the end user and not blocked by any internet pop-up blocker? How can one distribute prompt messages across an enterprise network without using email or internet explorer pop-ups? The desktop ads and messages display process concerns displaying ads of messages on the end user's desktop, detecting end user activity, and responding the various local events on the PC. The process will allow marketing ads to run on a computer without using internet pop-up windows. It will also allow display ads based on contextual information, like specific time of day or a specific PC end user action.
    Type: Application
    Filed: December 15, 2011
    Publication date: August 16, 2012
    Inventors: Marc Duthoit, Helene Duthoit, Eric Eva-Candela
  • Patent number: 8174771
    Abstract: A method for manufacturing a preferably asymmetrical lens element (5a) from a tempered blank (1) is characterized by: producing the lens element (5a) from a first partial volume (1a) of the tempered blank (1), whose thickness d is less than approximately 70%, preferably less than approximately 60%, particularly preferably less than approximately 50% of the thickness D of the tempered blank (1). Preferably, from a second partial volume (1b) of the tempered blank (1) at least a further lens element (5a?) is produced, wherein before the lens elements (5a, 5a?) are produced the tempered blank (1) is divided into the first and second partial volume (1a, 1b).
    Type: Grant
    Filed: August 5, 2010
    Date of Patent: May 8, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Eric Eva
  • Publication number: 20110203320
    Abstract: A method for manufacturing at least one lens of synthetic quartz glass with increased H2 content for an optical system with an operating wavelength of less than 250 nm.
    Type: Application
    Filed: May 2, 2011
    Publication date: August 25, 2011
    Applicant: CARL ZEISS SMT GMBH
    Inventor: Eric EVA
  • Patent number: 7934390
    Abstract: The invention relates to a method for the manufacture of a lens of synthetic quartz glass with increased H2 content, in particular for a lens for an optical system with an operating wavelength of less than 250 nm, in particular less than 200 nm, with the steps: providing a precursor product of synthetic quartz glass, in particular with a first H2 content of less than 2·1015 molecules/cm3, with a circumferential border surface and two base surfaces lying on opposite sides, wherein at least one partial surface of at least one of said base surfaces has a curvature, and treating the precursor product in an H2-containing atmosphere in order to produce a precursor product of synthetic quartz glass with a second H2 content that is increased in relation to the first H2 content, in particular with a second H2 content of more than 1016 molecules/cm3, and measuring at least one optical property of said precursor product with said second H2 content.
    Type: Grant
    Filed: May 14, 2007
    Date of Patent: May 3, 2011
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Eric Eva
  • Publication number: 20110080569
    Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
    Type: Application
    Filed: December 13, 2010
    Publication date: April 7, 2011
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner