Abstract: A method for manufacturing a preferably asymmetrical lens element (5a) from a tempered blank (1) is characterized by: producing the lens element (5a) from a first partial volume (1a) of the tempered blank (1), whose thickness d is less than approximately 70%, preferably less than approximately 60%, particularly preferably less than approximately 50% of the thickness D of the tempered blank (1). Preferably, from a second partial volume (1b) of the tempered blank (1) at least a further lens element (5a?) is produced, wherein before the lens elements (5a, 5a?) are produced the tempered blank (1) is divided into the first and second partial volume (1a, 1b).

Abstract: A method for determining the absorption of a blank (2) for producing an optical element (3), including: radiating a heating light ray (8) through the blank (2) for the purpose of heating the blank (2), and determining the absorption in the blank (2) by measuring at least one property of a measurement light ray (10) influenced by the heating of the blank (2). In the method, either the heating light ray (8) and the measurement light ray (10) or the heating light ray and a further heating light ray are oriented to enter into the blank (2) through a first polished surface (2a) or a second polished surface (2b), situated opposite the first surface, and meet one another exclusively in the interior of the blank (2), preferably in a volume (12) used for the production of the optical element (3). An associated measuring apparatus (1), optical element (3), and optical arrangement are also disclosed.

Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

Abstract: A method for manufacturing a preferably asymmetrical lens element (5a) from a tempered blank (1) is characterized by: producing the lens element (5a) from a first partial volume (1a) of the tempered blank (1), whose thickness d is less than approximately 70%, preferably less than approximately 60%, particularly preferably less than approximately 50% of the thickness D of the tempered blank (1). Preferably, from a second partial volume (1b) of the tempered blank (1) at least a further lens element (5a?) is produced, wherein before the lens elements (5a, 5a?) are produced the tempered blank (1) is divided into the first and second partial volume (1a, 1b).

Abstract: How can one be sure that marketing ads displayed on a PC are seen by the end user and not blocked by any internet pop-up blocker? How can one distribute prompt messages across an enterprise network without using email or internet explorer pop-ups? The desktop ads and messages display process concerns displaying ads of messages on the end user's desktop, detecting end user activity, and responding the various local events on the PC. The process will allow marketing ads to run on a computer without using internet pop-up windows. It will also allow display ads based on contextual information, like specific time of day or a specific PC end user action.

Abstract: A method for manufacturing a preferably asymmetrical lens element (5a) from a tempered blank (1) is characterized by: producing the lens element (5a) from a first partial volume (1a) of the tempered blank (1), whose thickness d is less than approximately 70%, preferably less than approximately 60%, particularly preferably less than approximately 50% of the thickness D of the tempered blank (1). Preferably, from a second partial volume (1b) of the tempered blank (1) at least a further lens element (5a?) is produced, wherein before the lens elements (5a, 5a?) are produced the tempered blank (1) is divided into the first and second partial volume (1a, 1b).

Abstract: A method for manufacturing at least one lens of synthetic quartz glass with increased H2 content for an optical system with an operating wavelength of less than 250 nm.

Abstract: The invention relates to a method for the manufacture of a lens of synthetic quartz glass with increased H2 content, in particular for a lens for an optical system with an operating wavelength of less than 250 nm, in particular less than 200 nm, with the steps: providing a precursor product of synthetic quartz glass, in particular with a first H2 content of less than 2·1015 molecules/cm3, with a circumferential border surface and two base surfaces lying on opposite sides, wherein at least one partial surface of at least one of said base surfaces has a curvature, and treating the precursor product in an H2-containing atmosphere in order to produce a precursor product of synthetic quartz glass with a second H2 content that is increased in relation to the first H2 content, in particular with a second H2 content of more than 1016 molecules/cm3, and measuring at least one optical property of said precursor product with said second H2 content.

Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

Abstract: An optical composite material comprises an amorphous optical material (6) with a first refractive index (na), into which crystalline nanoparticles (7) having a second, higher refractive index (nn) are embedded, wherein the amorphous material (6) and the nanoparticles (7) are resistant to UV radiation. A microlithography projection exposure apparatus comprises a projection objective (2) with at least one optical element (3) which is, in particular, operated in transmission and consists of an optical composite material of this type. In a method for producing the optical composite material, crystalline nanoparticles are introduced into the amorphous optical material during flame deposition in a soot or direct process.

Abstract: A method for manufacturing a preferably asymmetrical lens element (5a) from a tempered blank (1) is characterized by: producing the lens element (5a) from a first partial volume (1a) of the tempered blank (1), whose thickness d is less than approximately 70%, preferably less than approximately 60%, particularly preferably less than approximately 50% of the thickness D of the tempered blank (1). Preferably, from a second partial volume (1b) of the tempered blank (1) at least a further lens element (5a?) is produced, wherein before the lens elements (5a, 5a?) are produced the tempered blank (1) is divided into the first and second partial volume (1a, 1b).

Abstract: A method for manufacturing a preferably asymmetrical lens element (5a) from a tempered blank (1) is characterized by: producing the lens element (5a) from a first partial volume (1a) of the tempered blank (1), whose thickness d is less than approximately 70%, preferably less than approximately 60%, particularly preferably less than approximately 50% of the thickness D of the tempered blank (1). Preferably, from a second partial volume (1b) of the tempered blank (1) at least a further lens element (5a?) is produced, wherein before the lens elements (5a, 5a?) are produced the tempered blank (1) is divided into the first and second partial volume (1a, 1b).

Abstract: The invention relates to a projection lens (5) for microlithography, in particular, for immersion lithography, designed to operate at a wavelength of more than 190 nm and comprising an optical element made from quartz glass with an OH content of less than 50 ppm, in particular between 10 ppm and 50 ppm, and a water content of between 1.5×1016 and 2×1018 molecules/cm3, preferably between 2×1016 and 1×1018 molecules/cm3, in particular between 5×1016 and 2×1017 molecules/cm3. The optical element is preferably a terminal element (14) for the projection lens (5) in a microlithography projection illumination unit (1) for immersion lithography.

Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

Abstract: An optical composite material comprises an amorphous optical material (6) with a first refractive index (na), into which crystalline nanoparticles (7) having a second, higher refractive index (nn) are embedded, wherein the amorphous material (6) and the nanoparticles (7) are resistant to UV radiation. A microlithography projection exposure apparatus comprises a projection objective (2) with at least one optical element (3) which is, in particular, operated in transmission and consists of an optical composite material of this type. In a method for producing the optical composite material, crystalline nanoparticles are introduced into the amorphous optical material during flame deposition in a soot or direct process.

Abstract: Method and apparatus for setting optical imaging properties using radiation treatment, specifically a method and an apparatus for setting the imaging properties of an optical system with radiation treatment of at least one optical element of the optical system in the installed state, and a method for setting the imaging properties of an internal optical element with radiation treatment. A measurement is carried out on the optical system in order to determine one or more aberrations in a spatially resolved fashion, a correction that changes the shape and/or refractive index of the internal optical element is calculated in order to reduce the measured aberration or aberrations, and the optical element is irradiated with the aid of a processing radiation that changes the shape and/or refractive index, in accordance with the calculated correction.

Abstract: A method for manufacturing a preferably asymmetrical lens element (5a) from a tempered blank (1) is characterized by: producing the lens element (5a) from a first partial volume (1a) of the tempered blank (1), whose thickness d is less than approximately 70%, preferably less than approximately 60%, particularly preferably less than approximately 50% of the thickness D of the tempered blank (1). Preferably, from a second partial volume (1b) of the tempered blank (1) at least a further lens element (5a?) is produced, wherein before the lens elements (5a, 5a?) are produced the tempered blank (1) is divided into the first and second partial volume (1a, 1b).

Abstract: The invention relates to a method for the manufacture of a lens of synthetic quartz glass with increased H2 content, in particular for a lens for an optical system with an operating wavelength of less than 250 nm, in particular less than 200 nm, with the steps: providing a precursor product of synthetic quartz glass, in particular with a first H2 content of less than 2·1015 molecules/cm3, with a circumferential border surface and two base surfaces lying on opposite sides, wherein at least one partial surface of at least one of said base surfaces has a curvature, and treating the precursor product in an H2-containing atmosphere in order to produce a precursor product of synthetic quartz glass with a second H2 content that is increased in relation to the first H2 content, in particular with a second H2 content of more than 1016 molecules/cm3, and measuring at least one optical property of said precursor product with said second H2 content.

Abstract: A projection lens for microlithography is provided comprising transparent optical elements not having direct contact and being spaced apart at most half of the wavelength the lens is designed for by a separator. Thus the corresponding gap is optically almost equivalent to a direct contact.

Abstract: An attenuating filter provides a prescribed attenuation of the intensity of transmitted, short-wavelength, ultraviolet light, in particular, at wavelengths below 200 nm, that is governed by a predefinable spatial distribution of its spectral transmittance. The filter has a transparent substrate (3), e.g. fabricated from crystalline calcium fluoride. A filter coating (5) fabricated from a dielectric material that absorbs over a predefined wavelength range is applied to at least one surface (4) of the substrate. In the case of operating wavelengths of about 193 nm, the filter coating consists largely of tantalum pentoxide. Filters of the type, which may be inexpensively fabricated with high yields, are noted for their high abilities to withstand laser radiation and may be effectively antireflection coated employing simply designed antireflection coatings.