Abstract: The invention relates to a process for manufacturing multilayer systems for mirrors in the extreme ultraviolet and x-ray wavelength range, whereby at least one layer, in particular made of Mo, Si, Ru, C., B, Rb, Sr, Y, Cr, Sc or components thereof, is at least partly deposited with ion-beam assistance. In order to improve the surface properties of multilayer systems and to achieve the highest possible reflectivity the ion energy of the ion-beam is selected as an energy equivalent to or below the layer's sputtering threshold.

Abstract: Multi-layer mirror for radiation with a wavelength in the wavelength range between 0.1 nm and 30 nm (the so-called XUV range), comprising a stack of thin films substantially comprising scattering particles which scatter the radiation, which thin films are separated by separating layers with a thickness in the order of magnitude of the wavelength of the radiation, which separating layers substantially comprise non-scattering particles which do not scatter the radiation, wherein the non-scattering particles are substantially particles of lithium (Li), and method for manufacturing such a mirror.

Abstract: A multilayer system and its production. Multilayer systems, such as those used as mirrors in the extreme ultraviolet wavelength range, suffer contamination or oxidation during storage in air and in long-time operation, i.e. when exposed to EUV radiation in a vacuum environment with certain partial pressures of water or oxygen, which causes a serious reduction in reflectivity. The multilayer system according to the invention will have a long life with constantly high reflectivity. Their reflectivity can be enhanced by barrier layers. The multilayer systems according to the invention have protective layers comprising iridium. The multilayer systems according to the invention are produced by direct, ion-beam-supported growth of the respective layer. The multilayer systems according to the invention are not only resistant to contamination and oxidation, but can also be cleaned if necessary, without losing reflectivity.

Abstract: When coating substrates it is frequently desired that the layer thickness should be a certain function of the position on the substrate to be coated. To control the layer thickness a mask is conventionally arranged between the coating particle source and the substrate. This leads to undesirable shadow effects. In addition, is has so far only been possible to obtain rotationally symmetrical thickness distributions. It is now proposed that masks should be used having apertures aligned according to a regular grid on the mask surface. Such a mask with a mask holder comprising a base frame (2), an intermediate frame (3) and a mask frame (4) which are joined one to the other by means of double hinges (5a, a′, b, b′), is moved arbitrarily in the mask plane. By this means arbitrary thickness distributions can be achieved when coating substrates at reasonable cost.

Abstract: A method for encapsulating electrical traces on a flexible circuit or TAB circuit and electrical connections between the flexible circuit or TAB circuit and a printhead substrate to inhibit ink corrosion thereof. The method includes applying a first adhesive to a first surface of the flexible circuit or TAB circuit. A second adhesive is applied to first surface of the flexible circuit or TAB circuit whereby the first and second adhesives effectively coat exposed portions of the traces and connections. The first and second adhesives are thermally curable epoxy compositions that are miscible with each other and the first adhesive has a first viscosity and first thixotropy index that is lower than a second viscosity second thixotropy index of the second adhesive. After applying the adhesive, the first and second adhesives are cured.

Abstract: Multilayer systems, such as those used as mirrors in the extreme ultraviolet wavelength range, suffer contamination or oxidation during storage in air and in long-time operation, i.e. when exposed to EUV radiation in a vacuum environment with certain partial pressures of water or oxygen, which causes a serious reduction in reflectivity. The multilayer system according to the invention will have a long life with constantly high reflectivity. The multilayer systems according to the invention have protective layers made from ruthenium, aluminium oxide, silicon carbide, molybdenum carbide, carbon, titanium nitride or titanium dioxide. The multilayer systems according to the invention are produced by direct, ion-beam-supported growth of the protective layer or, except in the case of ruthenium, by mixing aluminium or titanium with oxygen or nitrogen at atomic level, with ion-beam support, to product an outermost protective layer with ion-beam support.

Abstract: A method for the production of multi-layer systems with N layers having predetermined thickness, especially for the production of multi-layer systems for wavelength ranges in the extreme ultraviolet and soft X-ray wavelength range is described, in which N layers are deposited and if need be one or more layers are partially removed after deposited and in wich at the same time as deposition and/or removal of layers, the layers' reflectivity dependent on layer thickness is measured. The method includes the following steps: Calculation of a reflectivity-time curve of the multi-layer system to be produced Determination of points in time ti (i=1, 2, . . . , N), at which the deposition of the i-th layer is to be stopped; and if need be determination of points in time ti′ (i=1, 2, . . .

Abstract: 1. Multilayer system and its production.

Abstract: A method for the production of multi-layer systems with N layers having predetermined thickness, especially for the production of multi-layer systems for wavelength ranges in the extreme ultraviolet and soft X-ray wavelength range is described, in which N layers are deposited and if need be one or more layers are partially removed after deposited and in wich at the same time as deposition and/or removal of layers, the layers' reflectivity dependent on layer thickness is measured.

Abstract: A system and apparatus for collecting response data. A response unit is provided having a dial, keypad, and a biconditional response mechanism. The response unit operates in two modes, a dial mode and a keypad mode. Mode is determined by the power supplied to the response unit. If the power supply supplies a first voltage, the response unit will be in one mode, and if the power supply supplies a second voltage, the response unit will be in a second mode. In dial mode, the keypad is inactive. The response unit sources a voltage along a continuum based on the positioning of the dial. The biconditional response mechanism may also be active and when activated, causes the response unit to source an analog voltage outside the dial's continuum. In keypad mode, the dial is inactive, and each key of the keypad is associated with a unique voltage within a voltage range such that pressing a key causes the associated voltage to be sourced by the response unit.

Abstract: A hermetically sealed housing (10) includes a dielectric end portion (118) which provides a transmission-line feedthrough between a printed-circuit such as HDI and exterior connections. A first transmission line (1) on the PC board (30) transitions to a 3-via transmission line (4), which transitions to a third coplanar, microstrip, or stripline transmission line (3). The third transmission line (3) transitions to a second 3-via transmission line (5), which ends at a coplanar transmission line (2) which is outside the housing.

Abstract: A broadband horn-like, linearly polarized antenna element is driven from a microstrip line and a balun. The horn is skeletonized, and has no sides, and consequently operates in TEM mode for broad frequency bandwidth. In another embodiment, two or more baluns feed the horn-like antenna element, thereby allowing a plurality of amplifiers or other sources to be combined at the antenna, for power summation or for multiplexing. An array of such elements, arranged for both vertical and horizontal polarization, makes a structure which presents mostly metallic surfaces, and is therefore rugged, and overpressure resistant.