Patents by Inventor Eric Louis

Eric Louis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100266382
    Abstract: The invention relates to a wind turbine comprising a rotor with a hub and turbine blades, and further comprising a boundary layer control system for the turbine blades. A plurality of pressure chambers is located in the blade distributed over the length of the blade. Each pressure chamber is in communication with the outside of the blade through one or more corresponding openings in the outer surface of the turbine blade. Furthermore a suction channel and a blow channel extend inside the blade for supplying an underpressure and an overpressure respectively to the pressure chamber, each pressure chamber being connected to at least one of said channels through an air passage in which an actively operable valve is located. The valve is connected to a control unit for selectively bringing the pressure chamber into communication with or close it off from said channel(s) so as to blow air out of the pressure chamber or suck air into the pressure chamber through the corresponding opening(s) in the blade surface.
    Type: Application
    Filed: October 21, 2008
    Publication date: October 21, 2010
    Applicant: ACTIFLOW B.V.
    Inventors: Roy Campe, Eric Louis Norbert Terry
  • Publication number: 20100027107
    Abstract: A reflective optical element exhibits an increase in the maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range. A first additional intermediate layer (23a, 23b) and a second additional intermediate layer (24a, 24b) are provided between the absorber layer (22) and the spacer layer (21), wherein the first additional intermediate layer increases the reflectivity and the second additional intermediate layer (24a,b) prevents chemical interaction between the first additional intermediate layer (23a,b) and the adjoining spacer layer (21) and/or the absorber layer (22).
    Type: Application
    Filed: August 5, 2009
    Publication date: February 4, 2010
    Applicant: Carl Zeiss SMT AG
    Inventors: Andrey E. Yakshin, Robbert W. E. Van De Kruijs, Fred Bijkerk, Eric Louis, Ileana Nedelcu
  • Publication number: 20100026633
    Abstract: Examples consistent with the invention include a reusable device for writing, displaying and deleting information with an electronic device on a support device having bistable liquid crystals. The reusable device includes a substrate onto which are successively applied and from the substrate: an electricity conducting coating; an optical coating that can absorb all or part of the surrounding light; a coating of a transparent substance in which a plurality of bistable liquid crystals are emulsioned; at least one electricity conducting element being electrically connected to the electricity conducting coating via an electrical voltage generator to form an electric circuit.
    Type: Application
    Filed: April 21, 2006
    Publication date: February 4, 2010
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Jean-Marie Baumlin, Jerome Emonot, Eric-Louis Fallet, Thierry Prigent
  • Patent number: 7612353
    Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.
    Type: Grant
    Filed: July 6, 2006
    Date of Patent: November 3, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Leonid Aizikovitch Sjmaenok, Vadim Yevgenyevich Banine, Josephus Jacobus Smits, Lambertus Adrianus Van Den Wildenberg, Alexander Alexandrovitch Schmidt, Arnoud Cornelis Wassink, Eric Louis Willem Verpalen, Antonius Johannes Van De Pas, Paul Peter Anna Antonius Brom
  • Patent number: 7536594
    Abstract: The invention relates to a stand-alone video recording, playback and Monitoring system. It has network switches, non-volatile storage devices, IP cameras, video servers, and NTSC cameras. The system uses communication channels that are WAN/LAN based and can be hard-wired or wireless and has a flexibly implemented watchdog to detect, for example, hardware and power failure as well as other failures in the system.
    Type: Grant
    Filed: March 22, 2006
    Date of Patent: May 19, 2009
    Assignee: Videogenix
    Inventors: Glen D. Schaff, Eric Louis
  • Publication number: 20080252099
    Abstract: The present invention provides an apparatus to increase stability of sports cars equipped with an underbody plate by means of active boundary layer suction applied to the car's underbody panelling (6). The apparatus of the invention comprises one suction device (4) to which ducts are connected coming from a structure of pressure chambers (9) attached to the underbody panelling of the car. The underbody panelling of the car comprises a special porous plastic material (8) to suck air from the boundary layer flowing under the car bottom plate.
    Type: Application
    Filed: August 4, 2006
    Publication date: October 16, 2008
    Applicant: ACTIFLOW B.V.
    Inventors: Eric Louis Norbert Terry, Roy Campe
  • Patent number: 7397056
    Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates are oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap is provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.
    Type: Grant
    Filed: July 6, 2005
    Date of Patent: July 8, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Leonid Aizikovitch Sjmaenok, Vadim Yevgenyevich Banine, Josephus Jacobus Smits, Lambertus Adrianus Van De Wildenberg, Alexander Alexandrovitch Schmidt, Arnoud Cornelis Wassink, Eric Louis Willem Verpalen, Antonius Johannes Van De Pas
  • Publication number: 20080027726
    Abstract: Apparati, methods, and computer-readable media for creation of a text to audio chronological mapping. Apparati, methods, and computer-readable media for animation of the text with the playing of the audio. A Mapper (10) takes as inputs text (12) and an audio recording (11) corresponding to that text (12), and with user assistance assigns beginning and ending times (14) to textual elements (15). A Player (50) takes the text (15), audio (17), and mapping (16) as inputs, and animates and displays the text (15) in synchrony with the playing of the audio (17). The invention can be useful to animate text during playback of an audio recording, to control audio playback as an alternative to traditional playback controls, to play and display annotations of recorded speech, and to implement characteristics of streaming audio without using an underlying streaming protocol.
    Type: Application
    Filed: July 28, 2006
    Publication date: January 31, 2008
    Inventors: Eric Louis Hansen, Reginald David Hody
  • Publication number: 20080005626
    Abstract: The invention relates to a stand-alone video recording, playback and Monitoring system. It has network switches, non-volatile storage devices, IP cameras, video servers, and NTSC cameras. The system uses communication channels that are WAN/LAN based and can be hard-wired or wireless and has a flexibly implemented watchdog to detect, for example, hardware and power failure as well as other failures in the system.
    Type: Application
    Filed: March 22, 2006
    Publication date: January 3, 2008
    Inventors: Glen Schaff, Eric Louis, David Ovadia
  • Publication number: 20070281109
    Abstract: A multilayer system and its production. Multilayer systems, such as those used as mirrors in the extreme ultraviolet wavelength range, suffer contamination or oxidation during storage in air and in long-time operation, i.e. when exposed to EUV radiation in a vacuum environment with certain partial pressures of water or oxygen, which causes a serious reduction in reflectivity. The multilayer system according to the invention will have a long life with constantly high reflectivity. Their reflectivity can be enhanced by barrier layers. The multilayer systems according to the invention have protective layers comprising iridium. The multilayer systems according to the invention are produced by direct, ion-beam-supported growth of the respective layer. The multilayer systems according to the invention are not only resistant to contamination and oxidation, but can also be cleaned if necessary, without losing reflectivity.
    Type: Application
    Filed: August 8, 2007
    Publication date: December 6, 2007
    Applicant: CARL ZEISS SMT AG
    Inventors: Frederik Bijkerk, Eric Louis, Andrey Yakshin, Peter Gorts, Sebastian Oestreich, Lambertus Gerhardus Alink, Jan Verhoeven, Robbert van de Kruijs
  • Patent number: 7261957
    Abstract: A multilayer system and its production. Multilayer systems, such as those used as mirrors in the extreme ultraviolet wavelength range, suffer contamination or oxidation during storage in air and in long-time operation, i.e. when exposed to EUV radiation in a vacuum environment with certain partial pressures of water or oxygen, which causes a serious reduction in reflectivity. The multilayer system according to the invention will have a long life with constantly high reflectivity. Their reflectivity can be enhanced by barrier layers. The multilayer systems according to the invention have protective layers comprising iridium. The multilayer systems according to the invention are produced by direct, ion-beam-supported growth of the respective layer. The multilayer systems according to the invention are not only resistant to contamination and oxidation, but can also be cleaned if necessary, without losing reflectivity.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: August 28, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Frederik Bijkerk, Eric Louis, Andrey E. Yakshin, Peter Cornelis Görts, Sebastian Oestreich, Lambertus Gerhardus Albertus Michael Alink, Jan Verhoeven, Robbert Wilhelmus Elisabeth van de Kruijs
  • Patent number: 7172788
    Abstract: In order to reduce contamination of optical elements which comprise a multilayer system on a substrate, it is proposed that the layer material and/or the layer thickness of at least one layer of the multilayer system are/is selected such that the standing wave which forms during reflection of the irradiated operating wavelength, forms a node of the electrical field intensity (node condition) in the area of the free interface of the multilayer system. Furthermore, a method for determining a design of a multilayer system, as well as a manufacturing process and a lithography apparatus are described.
    Type: Grant
    Filed: October 2, 2002
    Date of Patent: February 6, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Andrey E. Yakshin, Eric Louis, Frederik Bijkerk, Marco Wedowski, Roman Klein, Frank Stietz
  • Publication number: 20070023706
    Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates are oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap is provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.
    Type: Application
    Filed: July 6, 2005
    Publication date: February 1, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Leonid Sjmaenok, Vadim Banine, Josephus Smits, Lambertus Van De Wildenberg, Alexander Schmidt, Arnoud Wassink, Eric Louis Verpalen, Antonius Van De Pas
  • Publication number: 20070005759
    Abstract: A method of correcting a lockup error condition of a device includes a watchdog apparatus receiving an indication of activity from the device. The method also includes making a determination, from the indication of activity, whether the device is in a lockup condition. The method also includes interrupting power to the device with the watchdog apparatus if the determination is that the device is in the lockup condition. The watchdog apparatus includes a power input port for receiving power from a power source, a power output port for providing power to the device, and an activity port for receiving an indication of activity from the device. The watchdog apparatus makes a determination, from the indication of activity, whether the device is in a lockup condition, and interrupts the power provided to the device if the determination is that the device is in the lockup condition.
    Type: Application
    Filed: June 7, 2006
    Publication date: January 4, 2007
    Applicant: VideogeniX
    Inventors: Glen Schaff, Eric Louis
  • Publication number: 20050111083
    Abstract: A process for the production of optical broad band elements for the ultra violet to hard x-ray wavelength range, especially the extreme ultra violet wavelength range is described. A set from series of layers made of at least two materials in relation to the layer sequence is designed and numerical optimization of the the layer thicknesses and of the cap layer thickness is performed. The materials are chosen in such a way that two successive layers interact with each other as little as possible or controllably. The set can be formed from MO2C— and Si-layers. The numerical optimization takes into account interlayers of a certain thickness and composition.
    Type: Application
    Filed: September 27, 2004
    Publication date: May 26, 2005
    Inventors: Andrey Yakshin, Igor Kojevnikov, Frederik Bijkerk, Eric Louis
  • Patent number: 6834937
    Abstract: A method for encapsulating electrical traces on a flexible circuit or TAB circuit and electrical connections between the flexible circuit or TAB circuit and a printhead substrate to inhibit ink corrosion thereof. The method includes applying a first adhesive to a first surface of the flexible circuit or TAB circuit. A second adhesive is applied to first surface of the flexible circuit or TAB circuit whereby the first and second adhesives effectively coat exposed portions of the traces and connections. The first and second adhesives are thermally curable epoxy compositions that are miscible with each other and the first adhesive has a first viscosity and first thixotropy index that is lower than a second viscosity second thixotropy index of the second adhesive. After applying the adhesive, the first and second adhesives are cured.
    Type: Grant
    Filed: August 13, 2002
    Date of Patent: December 28, 2004
    Assignee: Lexmark International, Inc.
    Inventors: Eric Louis Killmeier, Paul Timothy Spivey, Sean Terrence Weaver, Gary Raymond Williams
  • Publication number: 20040253426
    Abstract: In order to reduce contamination of optical elements which comprise a multilayer system on a substrate, it is proposed that the layer material and/or the layer thickness of at least one layer of the multilayer system are/is selected such that the standing wave which forms during reflection of the irradiated operating wavelength, forms a node of the electrical field intensity (node condition) in the area of the free interface of the multilayer system. Furthermore, a method for determining a design of a multilayer system, as well as a manufacturing process and a lithography apparatus are described.
    Type: Application
    Filed: April 2, 2004
    Publication date: December 16, 2004
    Inventors: Andrey Yakshin, Eric Louis
  • Publication number: 20040245090
    Abstract: The invention relates to a process for manufacturing multilayer systems for mirrors in the extreme ultraviolet and x-ray wavelength range, whereby at least one layer, in particular made of Mo, Si, Ru, C., B, Rb, Sr, Y, Cr, Sc or components thereof, is at least partly deposited with ion-beam assistance. In order to improve the surface properties of multilayer systems and to achieve the highest possible reflectivity the ion energy of the ion-beam is selected as an energy equivalent to or below the layer's sputtering threshold.
    Type: Application
    Filed: April 22, 2004
    Publication date: December 9, 2004
    Inventors: Andrey E. Yakshin, Frederik Bijkerk, T.P.C. Klaver, Eric Louis
  • Publication number: 20040233519
    Abstract: Multi-layer mirror for radiation with a wavelength in the wavelength range between 0.1 nm and 30 nm (the so-called XUV range), comprising a stack of thin films substantially comprising scattering particles which scatter the radiation, which thin films are separated by separating layers with a thickness in the order of magnitude of the wavelength of the radiation, which separating layers substantially comprise non-scattering particles which do not scatter the radiation, wherein the non-scattering particles are substantially particles of lithium (Li), and method for manufacturing such a mirror.
    Type: Application
    Filed: May 21, 2004
    Publication date: November 25, 2004
    Inventors: Frederik Bijkerk, Eric Louis, Marcus Josef Henricus Kessels, Jan Verhoeven, Markus Johannes Harmen Den Hartog
  • Publication number: 20040121134
    Abstract: A multilayer system and its production. Multilayer systems, such as those used as mirrors in the extreme ultraviolet wavelength range, suffer contamination or oxidation during storage in air and in long-time operation, i.e. when exposed to EUV radiation in a vacuum environment with certain partial pressures of water or oxygen, which causes a serious reduction in reflectivity. The multilayer system according to the invention will have a long life with constantly high reflectivity. Their reflectivity can be enhanced by barrier layers. The multilayer systems according to the invention have protective layers comprising iridium. The multilayer systems according to the invention are produced by direct, ion-beam-supported growth of the respective layer. The multilayer systems according to the invention are not only resistant to contamination and oxidation, but can also be cleaned if necessary, without losing reflectivity.
    Type: Application
    Filed: November 12, 2003
    Publication date: June 24, 2004
    Inventors: Frederik Bijkerk, Eric Louis, Andrey E. Yakshin, Peter Cormelis Gorts, Sebastian Oestreich, Lambertus Gerhardus Albertus Michael Alink, Ir. Jan Verhoeven, Robbert Wilhelmus Elisabeth van de Kruijs