Patents by Inventor Eric Peng

Eric Peng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250095015
    Abstract: In an illustrative embodiment, methods and systems for modeling health care affordability across a population includes segmenting the population by demography and/or geography, determining chronic condition distribution across the population segments, modeling, across the population segments, medical service utilization distribution for a set of medical services, and calculating, using unit costs for each of the set of medical services, utilization costs for each population segment. The methods and systems may include calculating relative affordability metrics based on the utilization costs.
    Type: Application
    Filed: September 13, 2024
    Publication date: March 20, 2025
    Applicant: Aon Global Operations SE, Singapore Branch
    Inventors: Ronald J. Ozminkowski, Yifei Dai, Geoffrey Kuhn, Xiang Ying Ho, Jonathan Bowen, Todor Penev, Weiyee Lee, Leanne Metcalfe, Andy Rallis, Eric Peng
  • Publication number: 20230387304
    Abstract: A device including a gate stack over a semiconductor substrate having a pair of spacers abutting sidewalls of the gate stack. A recess is formed in the semiconductor substrate adjacent the gate stack. The recess has a first profile having substantially vertical sidewalls and a second profile contiguous with and below the first profile. The first and second profiles provide a bottle-neck shaped profile of the recess in the semiconductor substrate, the second profile having a greater width within the semiconductor substrate than the first profile. The recess is filled with a semiconductor material. A pair of spacers are disposed overly the semiconductor substrate adjacent the recess.
    Type: Application
    Filed: August 9, 2023
    Publication date: November 30, 2023
    Inventors: Eric PENG, Chao-Cheng CHEN, Chii-Horng LI, Ming-Hua YU, Shih-Hao LO, Syun-Ming JANG, Tze-Liang LEE, Ying-Hao HSIEH
  • Patent number: 11824120
    Abstract: A device including a gate stack over a semiconductor substrate having a pair of spacers abutting sidewalls of the gate stack. A recess is formed in the semiconductor substrate adjacent the gate stack. The recess has a first profile having substantially vertical sidewalls and a second profile contiguous with and below the first profile. The first and second profiles provide a bottle-neck shaped profile of the recess in the semiconductor substrate, the second profile having a greater width within the semiconductor substrate than the first profile. The recess is filled with a semiconductor material. A pair of spacers are disposed overly the semiconductor substrate adjacent the recess.
    Type: Grant
    Filed: August 27, 2021
    Date of Patent: November 21, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Eric Peng, Chao-Cheng Chen, Chii-Horng Li, Ming-Hua Yu, Shih-Hao Lo, Syun-Ming Jang, Tze-Liang Lee, Ying-Hao Hsieh
  • Publication number: 20210391465
    Abstract: A device including a gate stack over a semiconductor substrate having a pair of spacers abutting sidewalls of the gate stack. A recess is formed in the semiconductor substrate adjacent the gate stack. The recess has a first profile having substantially vertical sidewalls and a second profile contiguous with and below the first profile. The first and second profiles provide a bottle-neck shaped profile of the recess in the semiconductor substrate, the second profile having a greater width within the semiconductor substrate than the first profile. The recess is filled with a semiconductor material. A pair of spacers are disposed overly the semiconductor substrate adjacent the recess.
    Type: Application
    Filed: August 27, 2021
    Publication date: December 16, 2021
    Inventors: Eric PENG, Chao-Cheng CHEN, Chii-Horng LI, Ming-Hua YU, Shih-Hao LO, Syun-Ming JANG, Tze-Liang LEE, Ying-Hao HSIEH
  • Patent number: 11107921
    Abstract: A device including a gate stack over a semiconductor substrate having a pair of spacers abutting sidewalls of the gate stack. A recess is formed in the semiconductor substrate adjacent the gate stack. The recess has a first profile having substantially vertical sidewalls and a second profile contiguous with and below the first profile. The first and second profiles provide a bottle-neck shaped profile of the recess in the semiconductor substrate, the second profile having a greater width within the semiconductor substrate than the first profile. The recess is filled with a semiconductor material. A pair of spacers are disposed overly the semiconductor substrate adjacent the recess.
    Type: Grant
    Filed: November 26, 2019
    Date of Patent: August 31, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Eric Peng, Chao-Cheng Chen, Chii-Horng Li, Ming-Hua Yu, Shih-Hao Lo, Syun-Ming Jang, Tze-Liang Lee, Ying Hao Hsieh
  • Patent number: 10784375
    Abstract: A device including a gate stack over a semiconductor substrate having a pair of spacers abutting sidewalls of the gate stack. A recess is formed in the semiconductor substrate adjacent the gate stack. The recess has a first profile having substantially vertical sidewalls and a second profile contiguous with and below the first profile. The first and second profiles provide a bottle-neck shaped profile of the recess in the semiconductor substrate, the second profile having a greater width within the semiconductor substrate than the first profile. The recess is filled with a semiconductor material. A pair of spacers are disposed overly the semiconductor substrate adjacent the recess.
    Type: Grant
    Filed: July 9, 2018
    Date of Patent: September 22, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Eric Peng, Chao-Cheng Chen, Chii-Horng Li, Ming-Hua Yu, Shih-Hao Lo, Syun-Ming Jang, Tze-Liang Lee, Ying Hao Hsieh
  • Publication number: 20200098919
    Abstract: A device including a gate stack over a semiconductor substrate having a pair of spacers abutting sidewalls of the gate stack. A recess is formed in the semiconductor substrate adjacent the gate stack. The recess has a first profile having substantially vertical sidewalls and a second profile contiguous with and below the first profile. The first and second profiles provide a bottle-neck shaped profile of the recess in the semiconductor substrate, the second profile having a greater width within the semiconductor substrate than the first profile. The recess is filled with a semiconductor material. A pair of spacers are disposed overly the semiconductor substrate adjacent the recess.
    Type: Application
    Filed: November 26, 2019
    Publication date: March 26, 2020
    Inventors: Eric PENG, Chao-Cheng CHEN, Chii-Horng LI, Ming-Hua YU, Shih-Hao LO, Syun-Ming JANG, Tze-Liang LEE, Ying Hao HSIEH
  • Publication number: 20180315855
    Abstract: A device including a gate stack over a semiconductor substrate having a pair of spacers abutting sidewalls of the gate stack. A recess is formed in the semiconductor substrate adjacent the gate stack. The recess has a first profile having substantially vertical sidewalls and a second profile contiguous with and below the first profile. The first and second profiles provide a bottle-neck shaped profile of the recess in the semiconductor substrate, the second profile having a greater width within the semiconductor substrate than the first profile. The recess is filled with a semiconductor material. A pair of spacers are disposed overly the semiconductor substrate adjacent the recess.
    Type: Application
    Filed: July 9, 2018
    Publication date: November 1, 2018
    Inventors: Eric PENG, Chao-Cheng CHEN, Chii-Horng LI, Ming-Hua YU, Shih-Hao LO, Syun-Ming JANG, Tze-Liang LEE, Ying Hao HSIEH
  • Patent number: 10020397
    Abstract: A device including a gate stack over a semiconductor substrate having a pair of spacers abutting sidewalls of the gate stack. A recess is formed in the semiconductor substrate adjacent the gate stack. The recess has a first profile having substantially vertical sidewalls and a second profile contiguous with and below the first profile. The first and second profiles provide a bottle-neck shaped profile of the recess in the semiconductor substrate, the second profile having a greater width within the semiconductor substrate than the first profile. The recess is filled with a semiconductor material. A pair of spacers are disposed overly the semiconductor substrate adjacent the recess.
    Type: Grant
    Filed: June 5, 2015
    Date of Patent: July 10, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Eric Peng, Chao-Cheng Chen, Chii-Horng Li, Ming-Hua Yu, Shih-Hao Lo, Syun-Ming Jang, Tze-Liang Lee, Ying Hao Hsieh
  • Publication number: 20170138576
    Abstract: A fire-resistant, recessed lighting unit that obviates the need for a separate junction box and a separate incandescent “can”. Other embodiments are also described and claimed.
    Type: Application
    Filed: November 16, 2015
    Publication date: May 18, 2017
    Inventors: Eric Peng, Michael D. Danesh
  • Publication number: 20150270397
    Abstract: A device including a gate stack over a semiconductor substrate having a pair of spacers abutting sidewalls of the gate stack. A recess is formed in the semiconductor substrate adjacent the gate stack. The recess has a first profile having substantially vertical sidewalls and a second profile contiguous with and below the first profile. The first and second profiles provide a bottle-neck shaped profile of the recess in the semiconductor substrate, the second profile having a greater width within the semiconductor substrate than the first profile. The recess is filled with a semiconductor material. A pair of spacers are disposed overly the semiconductor substrate adjacent the recess.
    Type: Application
    Filed: June 5, 2015
    Publication date: September 24, 2015
    Inventors: Eric Peng, Chao-Cheng Chen, Chii-Horng Li, Ming-Hua Yu, Shih-Hao Lo, Syun-Ming Jang, Tze-Liang Lee, Hsieh-Ying Hao
  • Patent number: D866775
    Type: Grant
    Filed: April 27, 2018
    Date of Patent: November 12, 2019
    Assignee: SHENZHEN KEAN SILICONE PRODUCT CO., LTD
    Inventor: Eric Peng
  • Patent number: D870902
    Type: Grant
    Filed: April 27, 2018
    Date of Patent: December 24, 2019
    Assignee: SHENZHEN KEAN SILICONE PRODUCT CO., LTD
    Inventor: Eric Peng
  • Patent number: D878755
    Type: Grant
    Filed: April 20, 2018
    Date of Patent: March 24, 2020
    Assignee: SHENZHEN KEAN SILICONE PRODUCT CO., LTD
    Inventor: Eric Peng
  • Patent number: D882648
    Type: Grant
    Filed: April 9, 2018
    Date of Patent: April 28, 2020
    Assignee: SHENZHEN KEAN SILICONE PRODUCT CO., LTD
    Inventor: Eric Peng
  • Patent number: D883717
    Type: Grant
    Filed: April 4, 2018
    Date of Patent: May 12, 2020
    Assignee: SHENZHEN KEAN SILICONE PRODUCT CO., LTD
    Inventor: Eric Peng
  • Patent number: D884343
    Type: Grant
    Filed: April 27, 2018
    Date of Patent: May 19, 2020
    Assignee: SHENZHEN KEAN SILICONE PRODUCT CO., LTD
    Inventor: Eric Peng
  • Patent number: D878042
    Type: Grant
    Filed: April 6, 2018
    Date of Patent: March 17, 2020
    Assignee: SHENZHEN KEAN SILICONE PRODUCT CO., LTD
    Inventor: Eric Peng
  • Patent number: D878043
    Type: Grant
    Filed: April 9, 2018
    Date of Patent: March 17, 2020
    Assignee: SHENZHEN KEAN SILICONE PRODUCT CO., LTD
    Inventor: Eric Peng
  • Patent number: D878044
    Type: Grant
    Filed: April 26, 2018
    Date of Patent: March 17, 2020
    Assignee: SHENZHEN KEAN SILICONE PRODUCT CO., LTD
    Inventor: Eric Peng