Patents by Inventor Erik Kieft

Erik Kieft has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Time-gated detection, dual-layer SPAD-based electron detection
    Patent number: 11551906
    Abstract: Electron beam modulation in response to optical pump pulses applied to a sample is measured using SPAD elements. Individual detection events are used to form histograms of numbers of events in time bins associated with pump pulse timing. The histograms can be produced at a SPAD array, simplifying data transfer. In some examples, two SPAD arrays are stacked and a coincidence circuit discriminates signal events from noise events by determining corresponding events are detected within a predetermined time window.
    Type: Grant
    Filed: June 30, 2021
    Date of Patent: January 10, 2023
    Assignee: FEI Company
    Inventors: Bart Jozef Janssen, Gerard van Veen, Erik Kieft
  • TIME-GATED DETECTION, DUAL-LAYER SPAD-BASED ELECTRON DETECTION
    Publication number: 20230005705
    Abstract: Electron beam modulation in response to optical pump pulses applied to a sample is measured using SPAD elements. Individual detection events are used to form histograms of numbers of events in time bins associated with pump pulse timing. The histograms can be produced at a SPAD array, simplifying data transfer. In some examples, two SPAD arrays are stacked and a coincidence circuit discriminates signal events from noise events by determining corresponding events are detected withing a predetermined time window.
    Type: Application
    Filed: June 30, 2021
    Publication date: January 5, 2023
    Applicant: FEI Company
    Inventors: Bart Jozef Janssen, Gerard van Veen, Erik Kieft
  • Pulsed CFE electron source with fast blanker for ultrafast TEM applications
    Patent number: 11114272
    Abstract: Charged particle beams (CPBs) are modulated using a beam blanker/deflector and an electrically pulsed extraction electrode in conjunction with a field emitter and a gun lens. With such modulation, CPBs can provide both pulsed and continuous mode operation as required for a particular application, while average CPB current is maintained within predetermined levels, such as levels that promote X-ray safe operation. Either the extraction electrode or the beam blanker/deflector can define CPB pulse width, CPB on/off ratio, or both.
    Type: Grant
    Filed: September 25, 2019
    Date of Patent: September 7, 2021
    Assignee: FEI Company
    Inventors: Kun Liu, Erik Kieft
  • PULSED CFE ELECTRON SOURCE WITH FAST BLANKER FOR ULTRAFAST TEM APPLICATIONS
    Publication number: 20210090846
    Abstract: Charged particle beams (CPBs) are modulated using a beam blanker/deflector and an electrically pulsed extraction electrode in conjunction with a field emitter and a gun lens. With such modulation, CPBs can provide both pulsed and continuous mode operation as required for a particular application, while average CPB current is maintained within predetermined levels, such as levels that promote X-ray safe operation. Either the extraction electrode or the beam blanker/deflector can define CPB pulse width, CPB on/off ratio, or both.
    Type: Application
    Filed: September 25, 2019
    Publication date: March 25, 2021
    Applicant: FEI Company
    Inventors: Kun Liu, Erik Kieft