Patents by Inventor Erik Loopstra
Erik Loopstra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20060060799Abstract: A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.Type: ApplicationFiled: November 1, 2005Publication date: March 23, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Dominicus Jacobus Franken, Erik Loopstra, Pertrus Bartray, Marc Van Der Wijst, Michael Jozefa Renkens, Gerard Van Schothorst, Johan Dries
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Publication number: 20060033898Abstract: A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.Type: ApplicationFiled: August 17, 2005Publication date: February 16, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Theodorus Cadee, Johannes Jacobs, Nicolaas Kate, Erik Loopstra, Aschwin Lodewijk Vermeer, Jeroen Maria Mertens, Christianus De Mol, Marcel Hubertus Muitjens, Antonius Van Der Net, Joost Ottens, Johannes Quaedackers, Maria Reuhman-Huisken, Marco Stavenga, Patricius Tinnemans, Martinus Verhagen, Jacobus Johannus Hendricus Verspay, Frederik De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Smeets, Bart Schoondermark, Franciscus Janssen, Michel Riepen
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Publication number: 20060023194Abstract: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system.Type: ApplicationFiled: July 27, 2004Publication date: February 2, 2006Applicant: ASML Netherlands B.V.Inventors: Erik Loopstra, Leon Levasier, Rene Oesterholt
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Publication number: 20060023178Abstract: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. Some of the optical encoders may be connected to the substrate table at different locations in the 3 dimensional coordinate system.Type: ApplicationFiled: July 13, 2005Publication date: February 2, 2006Applicant: ASML Netherlands B.V.Inventors: Erik Loopstra, Leon Levasier, Rene Oesterholt
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Publication number: 20060023189Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.Type: ApplicationFiled: September 30, 2005Publication date: February 2, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Antonius Theodorus Derksen, Christiaan Hoogendam, Aleksey Kolesnychenko, Erik Loopstra, Theodorus Modderman, Johannes Catharinus Mulkens, Roelof Aeilko Ritsema, Klaus Simon, Joannes De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Santen
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Publication number: 20060017894Abstract: A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.Type: ApplicationFiled: July 22, 2004Publication date: January 26, 2006Applicant: ASML NETHERLAND B.V.Inventors: Tjarko Adriaan Van Empel, Erik Loopstra, Antonius Van Der Net, Yuri Johannes Van De Vijver, Bernhard Gellrich, Bauke Jansen, Rens Sanderse
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Publication number: 20050264778Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.Type: ApplicationFiled: June 1, 2004Publication date: December 1, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Erik Bijlaart, Roelof Aeilko Ritsema, Frank Schaik, Timotheus Sengers, Klaus Simon, Joannes De Smit, Arie Den Boef, Hans Butler, Sjoerd Donders, Christiaan Hoogendam, Marcus Van De Kerkhof, Aleksey Kolesnychenko, Mark Kroon, Erik Loopstra, Hendricus Meijer, Jeroen Maria Mertens, Johannes Mulkens, Joost Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Publication number: 20050263068Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.Type: ApplicationFiled: October 18, 2004Publication date: December 1, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Christiaan Hoogendam, Bob Streefkerk, Johannes Catharinus Mulkens, Erik Theodorus Bijlaart, Aleksey Kolesnychenko, Erik Loopstra, Jeroen Johannes Sophia Mertens, Bernardus Slaghekke, Patricius Aloysius Tinnemans, Helmar Van Santen
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Publication number: 20050259232Abstract: A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.Type: ApplicationFiled: May 18, 2004Publication date: November 24, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Sjoerd Donders, Erik Loopstra, Johannes Mulkens
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Publication number: 20050243297Abstract: A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and distribution means which are arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distribution means in a first direction by a mirror surface. The distribution means further comprise a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.Type: ApplicationFiled: May 3, 2004Publication date: November 3, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Vadim Banine, Levinus Bakker, Jeroen Jonkers, Erik Loopstra
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Publication number: 20050231043Abstract: A coil assembly has at least two coils which are arranged in a common plane, and partially overlap in crossover sections of the coils. The crossover sections have a reduced height, which results in a reduced total height of the coil assembly. This leads to a more compact coil assembly, and hence to better dynamic characteristics of a positioning device in which the coil assembly is applied.Type: ApplicationFiled: April 16, 2004Publication date: October 20, 2005Applicant: ASML NETHEDRLANDS B.V.Inventors: Johannes Petrus Martinus Vermeulen, Henricus Wilhelmus Janssen, Erik Loopstra
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Publication number: 20050179877Abstract: An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.Type: ApplicationFiled: October 12, 2004Publication date: August 18, 2005Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AGInventors: Johannes Catharinus Hubertus Mulkens, Johannes Jacobus Matheus Baselmans, Paul Graupner, Erik Loopstra, Bob Streefkerk
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Publication number: 20050175776Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: ApplicationFiled: November 12, 2004Publication date: August 11, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Bod Streefkerk, Johannes Baselmans, Richard Bruls, Marcel Mathijs Dierichs, Sjoerd Donders, Christiaan Hoogendam, Hans Jansen, Erik Loopstra, Jeroen Johannes Mertens, Johannes Mulkens, Ronald Severijns, Sergei Shulepov, Herman Boom, Timotheus Sengers
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Publication number: 20050170296Abstract: A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.Type: ApplicationFiled: January 29, 2004Publication date: August 4, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Albert Johannes Jansen, Jan Kuit, Erik Loopstra, Raymond Laurentius Schrijver
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Publication number: 20050157285Abstract: A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.Type: ApplicationFiled: May 19, 2004Publication date: July 21, 2005Applicant: ASML Netherlands B.V.Inventors: Gerard Schothorst, Fransiscus Van Deuren, Jan Eijk, Erik Loopstra, Robert-Han Munnig Schmidt, Felix Peters
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Publication number: 20050157281Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.Type: ApplicationFiled: August 16, 2004Publication date: July 21, 2005Applicant: ASML Netherlands B.V.Inventors: Johannes Jasper, Erik Loopstra, Theodorus Modderman, Gerrit Nijmeijer, Nicholaas Van Asten, Frederik Heuts, Jacobus Gemen, Richard Du Croo De Jongh, Marcus Boonman, Jacob Klinkhamer, Thomas Castenmiller
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Publication number: 20050134820Abstract: A method using a lithographic apparatus comprising a reflective integrator is claimed that optimizes the exposure of features on a target area of a substrate, when the features make an angle between 5 and 85 degrees with respect to the target area. The method comprises rotating the reflective integrator with respect to the target area providing a rotated mirror-symmetric pupil shape, which is implemented by either rotating the substrate or rotating the reflective integrator with respect to the machine or the patterning device. The patterning device comprises a maximum usable area and a patterned area which are rotated with respect to each other if a rotated substrate is employed. The method can be used in single exposure or double exposure mode. A further advantage of the method of using a rotated wafer is that it can be used for exposing features on a substrate in any direction even when the projection system of the lithographic apparatus shows a preferred polarization direction.Type: ApplicationFiled: December 22, 2003Publication date: June 23, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Heine Mulder, Antonius Johannes Van Dijsseldonk, Erik Loopstra, Uwe Mickan, Johannes Catharinus Mulkens, Harm-Jan Voorma
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Publication number: 20050132914Abstract: A detector detects liquid in the path of a projection beam or alignment beam. A controller then determines which one or more of a plurality of compensating optical elements may be provided in the optical path of the projection beam or alignment beam in order to focus the projection beam or alignment beam on the surface of the substrate. The appropriate optical element may be placed in the path of the projection beam or alignment beam directly as a final element of the projection system or alignment system respectively.Type: ApplicationFiled: December 23, 2003Publication date: June 23, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Mulkens, Marinus Van Den Brink, Erik Loopstra
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Publication number: 20050128445Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.Type: ApplicationFiled: October 12, 2004Publication date: June 16, 2005Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AGInventors: Christiaan Hoogendam, Erik Loopstra, Bob Streefkerk, Bernard Gellrich, Andreas Wurmbrand
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Publication number: 20050110973Abstract: The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.Type: ApplicationFiled: November 24, 2003Publication date: May 26, 2005Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AGInventors: Bob Streefkerk, Johannes Baselmans, Paul Graupner, Jan Haisma, Nicodemus Hattu, Christiaan Hoogendam, Erik Loopstra, Johannes Hubertus Mulkens, Bernard Gellrich