Patents by Inventor Erik Roelof Loopstra

Erik Roelof Loopstra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8896809
    Abstract: A lithographic apparatus and method is disclosed to reduce the exposure time that a substrate spends within a main lithographic apparatus by pre- (or post-) exposing one or more edge devices on the substrate. Because an edge device does not ultimately yield a useful device, it can be exposed with a lithographic apparatus that has a lower resolution than that used to expose one or more of the other, complete devices produced from the substrate. Therefore, the pre- (or post-) exposure of an edge device can be performed using a less complex, and less expensive, lithographic device.
    Type: Grant
    Filed: August 15, 2007
    Date of Patent: November 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Judocus Marie Dominicus Stoeldraijer, Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot, Diederik Jan Maas
  • Patent number: 8866111
    Abstract: A radiation source for generating EUV from a stream of molten fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel and at least one laser configured to vaporize at least some of the droplets of fuel, whereby radiation is generated. The fuel droplet generator has a nozzle, a feed chamber, and a reservoir, with a pumping device arranged to supply a flow of fuel in molten state from the reservoir through the feed chamber and out of the nozzle as a stream of droplets. The feed chamber has an outer face in contact with a drive cavity filled with a liquid, and the liquid is driven to oscillate by a vibrator with the oscillation transmissible to the molten fuel in the feed chamber from the outer face of the feed chamber through the liquid.
    Type: Grant
    Filed: July 4, 2012
    Date of Patent: October 21, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Johan Frederik Dijksman
  • Patent number: 8860922
    Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
    Type: Grant
    Filed: January 23, 2012
    Date of Patent: October 14, 2014
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernhard Gellrich, Andreas Wurmbrand
  • Patent number: 8860923
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Grant
    Filed: September 22, 2011
    Date of Patent: October 14, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
  • Publication number: 20140285785
    Abstract: The invention relates to intensity values for a plurality of beams used to irradiate a plurality of locations on a target are determined with reference to the position and/or rotation of the locations. Also provided is an associated lithographic or exposure apparatus, an associated device manufacturing method and an associated computer program.
    Type: Application
    Filed: November 6, 2012
    Publication date: September 25, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Arno Jan Bleeker, Erik Roelof Loopstra
  • Patent number: 8836913
    Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: September 16, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Steijaert, Wilhelmus Josephus Box, Emiel Jozef Eussen, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Albertus Adrianus Smits
  • Patent number: 8817229
    Abstract: A method of thermally conditioning an optical element operating in a vacuum environment. The optical element includes a first body having at least one optical surface and at least one heat transfer surface. The first body is dynamically controlled in position and/or orientation. The method includes controlling a temperature of a second body to a desired temperature, the second body including a second heat transfer surface; positioning the second body adjacent the first body and dynamically controlling the second body in position and/or orientation so as to maintain the first and second heat transfer surfaces in a substantially constant arrangement without contact between the bodies; and delivering a gas as a heat transfer medium into a heat transfer space defined by the first and second heat transfer surfaces, while controlling the pressure of the gas in the heat transfer space to between about 30 Pa and about 300 Pa.
    Type: Grant
    Filed: April 6, 2011
    Date of Patent: August 26, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Franciscus Johannes Joseph Janssen, Erik Roelof Loopstra
  • Publication number: 20140233004
    Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
    Type: Application
    Filed: April 30, 2014
    Publication date: August 21, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
  • Patent number: 8810771
    Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
    Type: Grant
    Filed: December 12, 2011
    Date of Patent: August 19, 2014
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernhard Gellrich, Andreas Wurmbrand
  • Publication number: 20140224173
    Abstract: A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.
    Type: Application
    Filed: January 23, 2014
    Publication date: August 14, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Sjoerd Nicolaas Lambertus Donders, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens
  • Patent number: 8804097
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Grant
    Filed: September 22, 2011
    Date of Patent: August 12, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens
  • Publication number: 20140218706
    Abstract: A radiation source comprises a nozzle configured to direct a stream of fuel droplets (400) along a trajectory towards a plasma formation location and a laser configured to direct laser radiation to the plasma formation location to convert the fuel droplets at the plasma formation location into a plasma. The laser comprises an amplifier (310, 320) and an optical element (500) configured to define a divergent beam path for radiation passing through the amplifier.
    Type: Application
    Filed: July 27, 2012
    Publication date: August 7, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Christian Wagner, Erik Roelof Loopstra
  • Patent number: 8797503
    Abstract: In a lithographic apparatus, a liquid supply system to provide a liquid to a space between the table and an optical element and to contact a surface of the optical element, the space having a cross-sectional area smaller than the area of the substrate, the liquid supply system comprising a liquid confinement structure extending along at least a part of a boundary of the space between the optical element surface and the table, wherein at least part of the liquid confinement structure is positioned between the optical element surface and the table, the at least part of the liquid confinement structure has an aperture through which the patterned beam can pass, the liquid confinement structure comprises an inlet to supply the liquid to the space above the aperture, and the liquid confinement structure comprises an outlet to remove the liquid, supplied by the inlet, from the space below the aperture.
    Type: Grant
    Filed: May 31, 2011
    Date of Patent: August 5, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Publication number: 20140211184
    Abstract: According to a first aspect of the present invention, there is provided a radiation source comprising: a nozzle configured to direct a stream of fuel droplets (70) along a trajectory towards a plasma formation location; a laser configured to direct laser radiation at a fuel droplet at the plasma formation location to generate, in use, a radiation generating plasma; wherein the laser comprises: a seed laser (50) for providing a seed laser beam (52); a beam splitter (54) for receiving the seed laser beam from the seed laser; an optical amplifier (58) for receiving the seed laser beam from the beam splitter and performing optical amplification; a first reflector (60) located downstream of the optical amplifier, configured to direct the seed laser beam back through the optical amplifier and on to the beam splitter; and a second reflector (70) located further downstream of the beam splitter, configured to receive the seed laser beam from the beam splitter and to direct at least a portion of the seed laser beam bac
    Type: Application
    Filed: July 27, 2012
    Publication date: July 31, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Christian Wagner, Erik Roelof Loopstra
  • Publication number: 20140203193
    Abstract: A radiation source having a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location, a laser configured to direct laser radiation at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma. The nozzle has an internal surface that is configured to prevent contamination present in fuel used to form the fuel droplets from being deposited on that internal surface.
    Type: Application
    Filed: July 27, 2012
    Publication date: July 24, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Antonius Theodorus Wilhelmus Kempen, Erik Roelof Loopstra, Corne Rentrop, Dennis De Graaf, Frits Gubbels, Gregory Richard Hayes, Hubertus Johannes Van De Wiel
  • Publication number: 20140192337
    Abstract: A lithographic apparatus having a programmable patterning device and a projection system. The programmable patterning device is configured to provide a plurality of radiation beams. The projection system has a lens group array configured to project the plurality of radiation beams onto a substrate. The projection system further includes a focus adjuster in an optical path corresponding to a lens group of the lens group array. The focus adjuster has an optical element having substantially zero optical power.
    Type: Application
    Filed: July 24, 2012
    Publication date: July 10, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Arno Jan Bleeker, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Danny Maria Hubertus Philips, Ruud Antonius Catharina Maria Beerens
  • Patent number: 8760615
    Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
    Type: Grant
    Filed: May 23, 2008
    Date of Patent: June 24, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Steijaert, Wilhelmus Josephus Box, Emiel Jozef Eussen, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Albertus Adrianus Smits
  • Patent number: 8755032
    Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.
    Type: Grant
    Filed: July 21, 2009
    Date of Patent: June 17, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Vladimir Mihailovitch Krivtsun, Gerardus Hubertus Petrus Maria Swinkels, Dzmitry Labetski
  • Publication number: 20140160453
    Abstract: A radiation source includes a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location; a laser configured to output laser radiation, the laser radiation directed at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma; and a catch configured to catch fuel droplets that pass the plasma formation location. The catch includes a container configured to contain a fluid; a driver configured to drive the fluid, to cause the fluid to move; the catch being configured such that the fuel droplets are incident on that moving fluid.
    Type: Application
    Filed: December 13, 2011
    Publication date: June 12, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Antonius Theodorus Wilhelmus Kempen, Erik Roelof Loopstra, Christian Wagner, Henricus Gerardus Tegenbosch, Gerardus Hubertus Petrus Maria Swinkels
  • Publication number: 20140160455
    Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
    Type: Application
    Filed: February 14, 2014
    Publication date: June 12, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrei Mikhailovich YAKUNIN, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Ven Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen