Patents by Inventor Erik Roelof Loopstra

Erik Roelof Loopstra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8427629
    Abstract: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.
    Type: Grant
    Filed: August 30, 2010
    Date of Patent: April 23, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Carlo Cornelis Maria Luijten, Sjoerd Nicolaas Lambertus Donders, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Bob Streefkerk, Marcel Beckers, Herman Boom, Richard Moerman
  • Publication number: 20130088697
    Abstract: A collector mirror assembly includes a collector mirror that includes a reflective surface and a hole having an edge. The hole extends through the reflective surface. The assembly also includes a tubular body having an inner surface and an outer surface. The tubular body is constructed and arranged to guide a gas flow in a direction substantially transverse to the reflective surface. The outer surface of the tubular body and the edge of the hole form an opening arranged to guide a further gas flow that diverges with respect the gas flow substantially transverse to the reflective surface.
    Type: Application
    Filed: March 18, 2011
    Publication date: April 11, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Dzmitry Labetski, Erik Roelof Loopstra, Antonius Theodorus Wilhelmus Kempen
  • Publication number: 20130088699
    Abstract: A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.
    Type: Application
    Filed: March 17, 2011
    Publication date: April 11, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
  • Patent number: 8405055
    Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a fuel supply configured to supply a fuel to a plasma formation site; a laser configured to emit a beam of radiation to the plasma formation site so that a plasma that emits extreme ultraviolet radiation is generated when the beam of radiation impacts the fuel; a fuel particulate interceptor constructed and arranged to shield at least part of the radiation source from fuel particulates that are emitted by the plasma, the fuel particulate interceptor comprising a first portion and a second portion, the second portion being positioned closer to the plasma formation site than the first portion, and the first portion being rotatable; and a fuel particulate remover constructed and arranged to remove fuel particulates from a surface of the fuel particulate interceptor and to direct the fuel particulates towards a collection location.
    Type: Grant
    Filed: September 24, 2009
    Date of Patent: March 26, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Dzmitry Labetski, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Gerardus Hubertus Petrus Maria Swinkels
  • Publication number: 20130070218
    Abstract: A system for removing contaminant particles from the path of the beam of EUV radiation is provided in which at least a first AC voltage is provided to a pair of electrodes on opposite sides of the path of the beam of EUV radiation as a first stage of a regime of voltages and, as a second stage of the regime of voltages, a DC voltage is provided to the electrodes.
    Type: Application
    Filed: March 3, 2011
    Publication date: March 21, 2013
    Applicant: ASML Netherland B.V.
    Inventors: Vladimir Vitalevich Ivanov, Pavel Stanislavovich Antsiferov, Yurii Victorovitch Sidelnikov, Luigi Scaccabarozzi, Hendrik Antony Johannes Neerhof, Andrei Mikhailovich Yakunin, Erik Roelof Loopstra, Vadim Yevgenyevich Banine, Richard Joseph Bruls
  • Patent number: 8390820
    Abstract: A displacement measurement system configured to provide measurement of the relative displacement of two components in six degrees of freedom with improved consistency and without requiring excessive space.
    Type: Grant
    Filed: November 10, 2009
    Date of Patent: March 5, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Renatus Gerardus Klaver, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch
  • Publication number: 20130038926
    Abstract: A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000° C.
    Type: Application
    Filed: February 22, 2011
    Publication date: February 14, 2013
    Inventors: Wouter Anthon Soer, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Andrei Mikhailovich Yakunin, Martin Jacobus Johan Jak
  • Patent number: 8373846
    Abstract: A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.
    Type: Grant
    Filed: September 3, 2009
    Date of Patent: February 12, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Gerardus Hubertus Petrus Maria Swinkels, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors
  • Patent number: 8368040
    Abstract: A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.
    Type: Grant
    Filed: July 8, 2010
    Date of Patent: February 5, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Vladimir Vitalevich Ivanov, Johannes Hubertus Josephina Moors, Gerardus Hubertus Petrus Maria Swinkels, Andrei Mikhailovich Yakunin, Dennis De Graaf, Uwe Bruno Heini Stamm
  • Patent number: 8368032
    Abstract: A plasma radiation source includes a vessel configured to catch a source material transmitted along a trajectory, and a decelerator configured to reduce a speed of the source material in a section of the trajectory downstream of a plasma initiation site.
    Type: Grant
    Filed: February 25, 2010
    Date of Patent: February 5, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Dzmitry Labetski, Erik Roelof Loopstra, Gerardus Hubertus Petrus Maria Swinkels, Tom Van Zutphen
  • Patent number: 8368902
    Abstract: A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.
    Type: Grant
    Filed: December 9, 2010
    Date of Patent: February 5, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Leon Martin Levasier, Rene Oesterholt
  • Patent number: 8344341
    Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
    Type: Grant
    Filed: August 9, 2010
    Date of Patent: January 1, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Joannes Theodoor De Smit, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Hendricus Johannes Maria Meijer, Erik Roelof Loopstra
  • Publication number: 20120327381
    Abstract: A radiation source for generating extreme ultraviolet radiation for a lithographic apparatus has a debris mitigation device comprising a nozzle arranged at or near an intermediate focus (IF) of the beam of radiation. The nozzle serves to direct a flow of gas (330) towards the radiation source or collector optic in order to deflect particulate debris (43) emitted by the radiation source.
    Type: Application
    Filed: January 31, 2011
    Publication date: December 27, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Dzmitry Labetski, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Andrei Mikhailovich Yakunin
  • Patent number: 8319200
    Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a laser constructed and arranged to generate a beam of radiation directed to a plasma generation site where a plasma is generated when the beam of radiation interacts with a fuel, an optical component having a surface that is arranged and positioned to be hit by a droplet of fuel, and a temperature conditioner constructed and arranged to elevate the temperature of the surface.
    Type: Grant
    Filed: August 13, 2009
    Date of Patent: November 27, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Hendrikus Gijsbertus Schimmel, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Karel Joop Bosschaart
  • Publication number: 20120295205
    Abstract: A radiation source generates extreme ultraviolet radiation for a lithographic apparatus as a chamber that is provided with a low pressure hydrogen environment. A trace amount of a protective compound, e.g., H2O, H2O2, O2, NH3 or NOx, is provided to the chamber to assist in maintaining a protective oxide film on metal, e.g., titanium, components in the chamber.
    Type: Application
    Filed: December 8, 2010
    Publication date: November 22, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Antonius Theodorus Wilhelmus Kempen, Richard Joseph Bruls, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Gerardus Hubertus Petrus Maria Swinkels, Wilbert Jan Mestrom
  • Publication number: 20120280148
    Abstract: An EUV radiation source that includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a reservoir configured to hold fuel at a temperature that is sufficiently high to maintain the fuel in liquid form, and a pressure vessel configured to contain the reservoir, the pressure vessel being at least partially thermally isolated from the reservoir. The EUV radiation source also includes a laser radiation source configured to irradiate fuel supplied by the fuel supply at the plasma formation location.
    Type: Application
    Filed: November 30, 2010
    Publication date: November 8, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Gerardus Hubertus Petrus Maria Swinkels, Erik Petrus Buurman, Wilbert Jan Mestrom
  • Publication number: 20120280149
    Abstract: An EUV radiation source includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a nozzle configured to eject droplets of fuel, and a droplet accelerator configured to accelerate the fuel droplets. The EUV radiation source includes a laser radiation source configured to irradiate the fuel supplied by the fuel supply at the plasma formation location.
    Type: Application
    Filed: November 29, 2010
    Publication date: November 8, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Wilbert Jan Mestrom, Erik Roelof Loopstra, Gerardus Hubertus Petrus Maria Swinkels, Erik Petrus Buurman
  • Publication number: 20120281193
    Abstract: A lithographic apparatus includes a projection system that includes a plurality of reflective optics. One of the reflective optics is provided with an opening which passes through the reflective optic. The opening is closed by a covering layer that is substantially transparent to EUV radiation. The covering layer prevents contamination from entering the projection system, while allowing patterned EUV radiation to pass from the projection system onto a substrate.
    Type: Application
    Filed: April 9, 2012
    Publication date: November 8, 2012
    Applicant: ASML Netherland B.V.
    Inventors: Erik Roelof Loopstra, Sven Pekelder, Han-Kwang Nienhuys
  • Publication number: 20120274911
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Application
    Filed: November 29, 2011
    Publication date: November 1, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolesnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Joannes Theodoor De Smit, Johannes Catherinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Patent number: 8300208
    Abstract: Embodiments of the invention provide a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an active air mount to support the projection system, the active air mount including at least one actuator, and a feed-forward device, the feed-forward device being configured to provide on the basis of a set-point signal of a movable object, a feed-forward signal to the at least one actuator, wherein the feed-forward signal is designed to decrease a disturbance effect on the projection system due to movement of the movable object.
    Type: Grant
    Filed: November 11, 2009
    Date of Patent: October 30, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Maurice Willem Jozef Etiënne Wijckmans, Robertus Leonardus Tousain, Adrianus Hendrik Koevoets