Patents by Inventor Erik Roelof Loopstra

Erik Roelof Loopstra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS, ALIGNMENT APPARATUS, DEVICE MANUFACTURING METHOD, AND A METHOD OF CONVERTING AN APPARATUS
    Publication number: 20090296061
    Abstract: A detector detects liquid in the path of a projection beam or alignment beam. A controller then determines which one or more of a plurality of compensating optical elements may be provided in the optical path of the projection beam or alignment beam in order to focus the projection beam or alignment beam on the surface of the substrate. The appropriate optical element may be placed in the path of the projection beam or alignment beam directly as a final element of the projection system or alignment system respectively.
    Type: Application
    Filed: August 7, 2009
    Publication date: December 3, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Catharinus Hubertus Mulkens, Marinus Aart Van Den Brink, Erik Roelof Loopstra
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090290135
    Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface configured to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
    Type: Application
    Filed: July 30, 2009
    Publication date: November 26, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Helmar San Santen
  • Lithographic apparatus and device manufacturing method
    Patent number: 7619207
    Abstract: The present invention relates to a method for calibrating a grating of an encoder measurement system between two adjacent calibrated locations, the method includes moving one of a sensor object including an encoder-type sensor and a grating along the other one of the sensor object and the grating with a speed, wherein the speed is selected such that disturbances in the grating substantially extending over a distance smaller than a distance between the two calibrated locations can not or only partly be followed by the one of the sensor object and the grating, and measuring during the moving the position of the sensor object with respect to the grating at a plurality of locations between the two calibrated locations.
    Type: Grant
    Filed: November 8, 2006
    Date of Patent: November 17, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Emiel Jozef Melanie Eussen, Engelbertus Antonius Fransiscus Van Der Pasch, Onno Bram Loopstra
  • Lithographic apparatus and device manufacturing method
    Patent number: 7616383
    Abstract: A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.
    Type: Grant
    Filed: May 18, 2004
    Date of Patent: November 10, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens
  • RADIATION SOURCE
    Publication number: 20090272917
    Abstract: A radiation source includes a radiation emitter configured to emit radiation, a collector configured to collect the radiation, and a contamination trap configured to trap contamination emitted by the radiation source. The contamination trap includes a plurality of foils that extend substantially radially, a first magnet ring configured to lie outside of an outer conical trajectory of radiation that is collected by the collector, and a second magnet ring configured to lie within the trajectory of radiation that is collected by the collector. The magnet rings are configured to provide a magnetic field that includes a component that is parallel to the foils.
    Type: Application
    Filed: April 28, 2009
    Publication date: November 5, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wouter Anthon Soer, Vadim Yevgenyevich Banine, Tjarko Adriaan Rudolf Van Empel, Erik Roelof Loopstra, Maarten Marinus Johannes Wilhelmus Van Herpen
  • Lithographic apparatus
    Patent number: 7612867
    Abstract: A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.
    Type: Grant
    Filed: August 11, 2008
    Date of Patent: November 3, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Gerard Van Schothorst, Fransiscus Hendrikus Van Deuren, Jan Van Eijk, Erik Roelof Loopstra, Robert-Han Munnig Schmidt, Felix Godfried Peter Peeters
  • ILLUMINATION SYSTEM AND LITHOGRAPHIC METHOD
    Publication number: 20090262328
    Abstract: An illumination system of a lithographic apparatus is disclosed that includes a first optical element to receive a radiation beam, the first optical element comprising first raster elements that partition the radiation beam into a plurality of radiation channels, and a second optical element to receive the plurality of radiation channels, the second optical element comprising second raster elements. For each of the radiation channels a raster element of said first raster elements is associated with a respective raster element of said second raster elements to provide a continuous beam path from said first optical element to an object plane. A filter is disposed in a path traversed by the radiation beam to create a desired spatial intensity distribution in a pupil of the illumination system, by, for example, reducing a transmittance of a selection of one or more of the radiation channels.
    Type: Application
    Filed: April 20, 2009
    Publication date: October 22, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jan Bernard Plechelmus VAN SCHOOT, Erik Roelof Loopstra
  • Lithographic apparatus and device manufacturing method
    Patent number: 7593092
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
    Type: Grant
    Filed: June 8, 2006
    Date of Patent: September 22, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Patent number: 7593096
    Abstract: An article support constructed to support an article for lithographic processing purposes is described. The article support includes a channel configuration arranged to guide thermally stabilizing media in the article support to provide thermal stabilization to the article, wherein the channel configuration comprises an input channel structure and an output channel structure, the input and output channel structures arranged in a nested configuration and connected to each other by a fine grid structure provided at or near a surface of the article support. A lithographic apparatus and device manufacturing incorporating the article support is also described.
    Type: Grant
    Filed: May 15, 2006
    Date of Patent: September 22, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Joost Jeroen Ottens
  • Lithographic apparatus and device manufacturing method
    Patent number: 7593093
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
    Type: Grant
    Filed: February 26, 2007
    Date of Patent: September 22, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Helmar Van Santen
  • Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
    Patent number: 7589818
    Abstract: A detector detects liquid in the path of a projection beam or alignment beam. A controller then determines which one or more of a plurality of compensating optical elements may be provided in the optical path of the projection beam or alignment beam in order to focus the projection beam or alignment beam on the surface of the substrate. The appropriate optical element may be placed in the path of the projection beam or alignment beam directly as a final element of the projection system or alignment system respectively.
    Type: Grant
    Filed: December 23, 2003
    Date of Patent: September 15, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Catharinus Hubertus Mulkens, Marinus Aart Van Den Brink, Erik Roelof Loopstra
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090214986
    Abstract: The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.
    Type: Application
    Filed: May 8, 2009
    Publication date: August 27, 2009
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Paul GRAUPNER, Jan HAISMA, Nicodemus HATTU, Christiaan Alexander HOOGENDAM, Erik Roelof LOOPSTRA, Johannes Catharinus Hubertus MULKENS, Bernard GELLRICH
  • Lithographic System, Lithographic Apparatus and Device Manufacturing Method
    Publication number: 20090208878
    Abstract: A lithographic system includes two lithographic apparatus. A first lithographic apparatus is configured to project a patterned radiation beam onto a first target portion of a substrate. The second lithographic apparatus includes an interferometric arrangement configured to split the radiation beam and to recombine the split beams so as to produce an interference pattern. A masking arrangement is configured to selectively transmit a portion of the interference pattern and a projection system is configured to project the selectively transmitted portion of the interference pattern onto a second target portion of the substrate.
    Type: Application
    Filed: September 17, 2008
    Publication date: August 20, 2009
    Applicant: ASML Netherlands B.V.
    Inventors: Erik Roelof LOOPSTRA, Donis George Flagello
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090207397
    Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
    Type: Application
    Filed: March 26, 2009
    Publication date: August 20, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
  • LITHOGRAPHIC APPARATUS AND METHOD FOR CALIBRATING THE SAME
    Publication number: 20090207422
    Abstract: A measurement system configured to measure a position of an object in a lithographic apparatus, includes at least three position detectors configured to detect the position of the object, the at least three position detectors each including a single or multi-dimensional optical encoder to provide at least six position values, the optical encoders being coupled to the object at different locations within a three dimensional coordinate system, wherein at least one position value is provided for each dimension of the three dimensional coordinate system, and wherein the measurement system is configured to calculate the position of the object within the three dimensional coordinate system from a subset of at least three of the six position values and to calculate an orientation of the object with respect to the three dimensional coordinate system from another subset of at least three of the six position values.
    Type: Application
    Filed: April 20, 2009
    Publication date: August 20, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof LOOPSTRA, Leon Martin LEVASIER, Rene OESTERHOLT
  • Method and apparatus for maintaining a machine part
    Patent number: 7576831
    Abstract: A method of and apparatus for maintaining a machine part arranged in an interior space of a machine, where the interior space is kept at a first pressure and is separated from an environment having a second pressure via a load lock. The method includes transporting a machine part via the load lock out of the interior space and transporting via the load lock into the interior space one of the maintained machine part and a separate replacement machine part.
    Type: Grant
    Filed: March 11, 2004
    Date of Patent: August 18, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Pieter Johannes Marius Van Groos, Jan Frederik Hoogkamp, Josephus Cornelius Johannes Antonius Vugts, Robert Gordon Livesey, Johannes Hendrikus Gertrudis Franssen, Albert Jan Hendrik Klomp, Johannes Petrus Martinus Bernardus Vermeulen, Erik Roelof Loopstra
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090197211
    Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
    Type: Application
    Filed: April 10, 2009
    Publication date: August 6, 2009
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Christiaan Alexander HOOGENDAM, Erik Roelof Loopstra, Bob Streefkerk, Bernhard Gellrich, Andreas Wurmbrand
  • Lithographic apparatus and device manufacturing method
    Publication number: 20090184270
    Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
    Type: Application
    Filed: December 19, 2008
    Publication date: July 23, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Joannes Theodoor De Smit, Roelof Aeilko Siebrand Ritsema, Klaus Simon, theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Hendricus Johannes Maria Meijer, Erik Roelof Loopstra
  • IMMERSION LITHOGRAPHIC APPARATUS WITH IMMERSION FLUID RE-CIRCULATING SYSTEM
    Publication number: 20090185149
    Abstract: A lithographic apparatus includes a projection system, a fluid handling structure, a metrology device, and a recycling control device. The projection system is configured to project a patterned radiation beam onto a target portion of a substrate, the substrate being supported on a substrate table. The fluid handling structure is configured to provide an immersion fluid to a space between the projection system and the substrate and/or substrate table. The metrology device is configured to monitor a parameter of the immersion fluid. The recycling control device regulates a routing of the immersion fluid either to be reused by the fluid handling structure or to be reconditioned based on the quality of immersion fluid indicated by the metrology device.
    Type: Application
    Filed: January 16, 2009
    Publication date: July 23, 2009
    Applicant: ASML HOLDING NV
    Inventors: Harry SEWELL, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Louis John Markoya, Diane McCafferty
  • Lithographic apparatus having parts with a coated film adhered thereto
    Patent number: 7561250
    Abstract: A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.
    Type: Grant
    Filed: June 19, 2007
    Date of Patent: July 14, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Paulus Martinus Maria Liebregts, Menno Fien, Erik Roelof Loopstra, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens