Patents by Inventor Erik Roelof Loopstra

Erik Roelof Loopstra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20080218722
    Abstract: A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.
    Type: Application
    Filed: April 24, 2008
    Publication date: September 11, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marc Wilhelmus Maria VAN DER WIJST, Dominicus Jacobus Petrus Adrianus FRANKEN, Erik Roelof LOOPSTRA, Marius RAVENSBERGEN
  • Lithographic apparatus and device manufacturing method
    Publication number: 20080218717
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Application
    Filed: February 7, 2008
    Publication date: September 11, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • Lithographic apparatus and device manufacturing method
    Publication number: 20080218726
    Abstract: Lithographic Apparatus and Device Manufacturing Method In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.
    Type: Application
    Filed: April 9, 2008
    Publication date: September 11, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen, Sjoerd Nicolaas Lambertus Donders
  • Lithographic apparatus, device manufacturing method, and device manufactured thereby with docking system for positioning a patterning device
    Patent number: 7423733
    Abstract: The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries the patterning device and an exchange phase, in which the patterning device is exchanged and the docking system positions the patterning device relative to the reticle stage. The docking system is configured to be spaced from the patterning device during the projection phase in order to ensure that a higher accuracy of the projected image is obtained.
    Type: Grant
    Filed: July 20, 2004
    Date of Patent: September 9, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Gert-Jan Heerens, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra
  • Lithographic apparatus and device manufacturing method
    Patent number: 7423722
    Abstract: A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.
    Type: Grant
    Filed: January 29, 2004
    Date of Patent: September 9, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Albert Johannes Maria Jansen, Jan Jaap Kuit, Erik Roelof Loopstra, Raymond Laurentius Johannes Schrijver
  • Lithographic apparatus
    Patent number: 7423730
    Abstract: A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.
    Type: Grant
    Filed: May 19, 2004
    Date of Patent: September 9, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Gerard Van Schothorst, Fransiscus Hendrikus Van Deuren, Jan Van Eijk, Erik Roelof Loopstra, Robert-Han Munnig Schmidt, Felix Godfried Peter Peeters
  • Imprint lithography including alignment
    Patent number: 7418902
    Abstract: An imprint lithography apparatus is disclosed that has a substrate table configured to hold a substrate, a template holder configured to hold an imprint template, the imprint template or the template holder having a template alignment mark configured to be imprinted onto the substrate table or onto a substrate to form an imprinted alignment mark, the imprint template having a functional pattern, and the template alignment mark and the functional pattern having a known spatial relationship, and an alignment sensor configured to determine the location of the imprinted alignment mark.
    Type: Grant
    Filed: May 31, 2005
    Date of Patent: September 2, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Yvonne Wendela Kruijt-Stegeman, Aleksey Yurievich Kolensnychenko, Helmar Van Santen, Erik Roelof Loopstra
  • Lithographic apparatus and device manufacturing method
    Publication number: 20080204679
    Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
    Type: Application
    Filed: January 29, 2008
    Publication date: August 28, 2008
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernard Gellrich, Andreas Wurmbrand
  • Stage apparatus, lithographic apparatus and device manufacturing method using two patterning devices
    Patent number: 7417715
    Abstract: In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: August 26, 2008
    Assignee: ASML Netherlands B.V.
    Inventor: Erik Roelof Loopstra
  • Lithographic apparatus and method of removing liquid
    Publication number: 20080198344
    Abstract: A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the-substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35° and 90° to the local tangent of the gap.
    Type: Application
    Filed: February 21, 2007
    Publication date: August 21, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Hernes Jacobs, Erik Roelof Loopstra, Michel Riepen, Eva Mondt
  • Lithographic apparatus
    Patent number: 7411653
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Grant
    Filed: October 18, 2004
    Date of Patent: August 12, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
  • Lithographic apparatus and method for calibrating the same
    Patent number: 7408655
    Abstract: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system.
    Type: Grant
    Filed: July 9, 2007
    Date of Patent: August 5, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Leon Martin Levasier, Rene Oesterholt
  • Lithographic apparatus and device manufacturing method
    Patent number: 7405805
    Abstract: In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.
    Type: Grant
    Filed: December 28, 2004
    Date of Patent: July 29, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Tammo Uitterdijk, Erik Roelof Loopstra, Laurens Anthony Sanderse
  • Lithographic apparatus, device manufacturing method and computer program product
    Publication number: 20080158528
    Abstract: In a lithographic apparatus, a corrective irradiation procedure is performed using an illumination mode arranged so as to heat a selected part of an element of the projection system near a pupil plane thereof that is relatively unheated during production exposure. The corrective irradiation procedure aims to improve uniformity of optical element heating of the projective system and/or to reduce a phase gradient.
    Type: Application
    Filed: November 21, 2007
    Publication date: July 3, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Judocus Marie Dominicus Stoeldraijer, Erik Roelof Loopstra, Heine Melle Mulder, Timotheus Franciscus Sengers, Freerk Adriaan Stoffels, Laurentius Catrinus Jorritsma, Reiner Maria Jungblut
  • Lithographic projection apparatus
    Patent number: 7388648
    Abstract: A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table. The liquid confinement structure is positioned adjacent a final surface of the projection system and includes a first inlet configured to supply a liquid, through which a patterned beam is to be projected, to the space, and a second inlet configured to supply gas and formed in a face of the structure. The face is arranged to oppose a surface of the substrate and the second inlet is located radially outward, with respect to an optical axis of the projection system, of the space and has a porous member to evenly distribute gas flow over an area of the second inlet.
    Type: Grant
    Filed: September 30, 2005
    Date of Patent: June 17, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20080123066
    Abstract: A lithographic apparatus is disclosed that includes an optical arrangement having an array of optical elements arranged in a plane perpendicular to the radiation beam. Each optical element comprises an electrical heating device to change an optical path length of the radiation beam. By selectively actuating the electrical heating devices, a position dependent change in optical path length can be achieved in order to correct for irradiation-induced optical path length errors.
    Type: Application
    Filed: November 7, 2006
    Publication date: May 29, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bastiaan Stephanus Hendricus Jansen, Erik Roelof Loopstra, Marius Ravensbergen, Markus Josef Hauf
  • Imprint lithography
    Patent number: 7377764
    Abstract: A lithographic apparatus is disclosed that has an imprint template or a template holder configured to hold an imprint template, and a substrate table arranged to receive a substrate, the apparatus further comprising walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding area.
    Type: Grant
    Filed: June 13, 2005
    Date of Patent: May 27, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Yvonne Wendela Kruijt-Stegeman, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Johan Frederik Dijksman, Helmar Van Santen, Sander Frederik Wuister
  • Lithographic apparatus and device manufacturing method
    Patent number: 7372541
    Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.
    Type: Grant
    Filed: September 30, 2005
    Date of Patent: May 13, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen, Sjoerd Nicolaas Lambertus Donders
  • Lithographic apparatus and device manufacturing method
    Publication number: 20080105026
    Abstract: The present invention relates to a method for calibrating a grating of an encoder measurement system between two adjacent calibrated locations, the method includes moving one of a sensor object including an encoder-type sensor and a grating along the other one of the sensor object and the grating with a speed, wherein the speed is selected such that disturbances in the grating substantially extending over a distance smaller than a distance between the two calibrated locations can not or only partly be followed by the one of the sensor object and the grating, and measuring during the moving the position of the sensor object with respect to the grating at a plurality of locations between the two calibrated locations.
    Type: Application
    Filed: November 8, 2006
    Publication date: May 8, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Emiel Jozef Melanie Eussen, Engelbertus Antonius Fransiscus Van Der Pasch, Onno Bram Loopstra
  • Lithographic apparatus and method
    Publication number: 20080100819
    Abstract: In a lithographic apparatus, a slip of a patterning device relative to a support, the support being constructed to support the patterning device, may be provided by: measuring a position of the support relative to a structure of the lithographic apparatus; measuring a position of the patterning device relative to the structure of the lithographic apparatus; determining a correlation between the position of the patterning device and the position of the support; and deriving from the correlation a slip of the patterning device relative to the support. The structure may include a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. The projection system may be connected to a frame, such as a metrology frame of the lithographic apparatus.
    Type: Application
    Filed: October 30, 2006
    Publication date: May 1, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Onvlee, Erik Roelof Loopstra