Patents by Inventor Erwin Paul SMAKMAN
Erwin Paul SMAKMAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240128043Abstract: The disclosure relates to a charged particle beam apparatus configured to project charged particle beams towards a sample. The charged particle beam apparatus comprises: a plurality of charged particle-optical columns configured to project respective charged particle beams towards the sample, wherein each charged particle-optical column comprises: a charged particle source configured to emit the charged particle beam towards the sample, the charged particle sources being comprised in a source array; an objective lens comprising an electrostatic electrode configured to direct the charged particle beam towards the sample; and a detector associated with the objective lens array, configured to detect signal charged particles emitted from the sample. The objective lens is the most down-beam element of the charged particle-optical column configured to affect the charged particle beam directed towards the sample.Type: ApplicationFiled: December 5, 2023Publication date: April 18, 2024Applicant: ASML Netherlands B.V.Inventors: Jurgen VAN SOEST, Roy Ramon VEENSTRA, Erwin Paul SMAKMAN, Tom VAN ZUTPHEN, Albertus Victor Gerardus MANGNUS
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Patent number: 11942302Abstract: Apparatuses and methods for charged-particle detection may include a deflector system configured to direct charged-particle pulses, a detector having a detection element configured to detect the charged-particle pulses, and a controller having a circuitry configured to control the deflector system to direct a first and second charged-particle pulses to the detection element; obtain first and second timestamps associated with when the first charged-particle pulse is directed by the deflector system and detected by the detection element, respectively, and third and fourth timestamps associated with when the second charged-particle pulse is directed by the deflector system and detected by the detection element, respectively; and identify a first and second exiting beams based on the first and second timestamps, and the third and fourth timestamps, respectively.Type: GrantFiled: December 17, 2019Date of Patent: March 26, 2024Assignee: ASML Netherlands B.V.Inventors: Arno Jan Bleeker, Pieter Willem Herman De Jager, Maikel Robert Goosen, Erwin Paul Smakman, Albertus Victor Gerardus Mangnus, Yan Ren, Adam Lassise
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Patent number: 11881374Abstract: Disclosed among other aspects is a charged particle inspection system including an absorbing component and a programmable charged-particle mirror plate arranged to modify the energy distribution of electrons in a beam and shape the beam to reduce the energy spread of the electrons and aberrations of the beam, with the absorbing component including a set of absorbing structures configured as absorbing structures provided on a transparent conductive layer and a method using such an absorbing component and with the programmable charged-particle mirror plate including a set of pixels configured to generate a customized electric field to shape the beam and using such a programmable charged-particle mirror plate.Type: GrantFiled: February 4, 2020Date of Patent: January 23, 2024Assignee: ASML Netherlands B.V.Inventors: Shakeeb Bin Hasan, Yan Ren, Maikel Robert Goosen, Albertus Victor Gerardus Mangnus, Erwin Paul Smakman
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Patent number: 11875966Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns, the actuator system including a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.Type: GrantFiled: August 16, 2021Date of Patent: January 16, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Bernardo Kastrup, Johannes Catharinus Hubertus Mulkens, Marinus Aart Van Den Brink, Jozef Petrus Henricus Benschop, Erwin Paul Smakman, Tamara Druzhinina, Coen Adrianus Verschuren
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Patent number: 11791132Abstract: Systems and methods of measuring beam current in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam, and an aperture array. The aperture array may comprise a plurality of apertures configured to form a plurality of beamlets from the primary charged-particle beam, and a detector including circuitry to detect a current of at least a portion of the primary charged-particle beam irradiating the aperture array. The method of measuring beam current may include irradiating the primary charged-particle beam on the aperture array and detecting an electric current of at least a portion of the primary charged-particle beam.Type: GrantFiled: March 25, 2020Date of Patent: October 17, 2023Assignee: ASML Netherlands B.V.Inventors: Albertus Victor Gerardus Mangnus, Maikel Robert Goosen, Erwin Paul Smakman
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Publication number: 20230324318Abstract: A charged-particle tool configured to generate a plurality of sub-beams from a beam of charged particles and direct the sub-beams downbeam toward a sample position, the tool charged-particle tool comprising at least three charged-particle-optical components; a detector module; and a controller. Thea detector module is configured to generate a detection signal in response to charged particles that propagate upbeam from the direction of the sample position. The controller is configured to operate the tool in a calibration mode. The charged-particle-optical components include: a charged-particle source configured to emit a beam of charged particles and a beam generator configured to generate the sub-beams. The detection signal contains information about alignment of at least two of the charged-particle-optical components. The charged-particle optical components comprise two or more charged-particle optical elements comprising an array of apertures for which the charged particles may be monitored.Type: ApplicationFiled: June 1, 2023Publication date: October 12, 2023Applicant: ASML Netherlands B.V.Inventors: Yan REN, Erwin SLOT, Albertus Victor, Gerardus MANGNUS, Marijke SCOTUZZI, Erwin Paul SMAKMAN
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Patent number: 11747738Abstract: A direct write exposure apparatus configured to process a plurality of substrates, the apparatus including: a substrate holder configured to hold a substrate having a usable patterning area; a patterning system configured to project different patterns onto the substrate; a processing system configured to: determine a first combination of one or more patterns that are to be applied on a first substrate of the plurality of substrates; and determine a second, different combination of one or more patterns that are to be applied on a second, subsequent, substrate of the plurality of substrates.Type: GrantFiled: June 27, 2017Date of Patent: September 5, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Coen Adrianus Verschuren, Erwin Paul Smakman
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Publication number: 20230154722Abstract: Apparatuses and methods for charged-particle detection may include a deflector system configured to direct charged-particle pulses, a detector having a detection element configured to detect the charged-particle pulses, and a controller having a circuitry configured to control the deflector system to direct a first and second charged-particle pulses to the detection element; obtain first and second timestamps associated with when the first charged-particle pulse is directed by the deflector system and detected by the detection element, respectively, and third and fourth timestamps associated with when the second charged-particle pulse is directed by the deflector system and detected by the detection element, respectively; and identify a first and second exiting beams based on the first and second timestamps, and the third and fourth timestamps, respectively.Type: ApplicationFiled: December 17, 2019Publication date: May 18, 2023Inventors: Arno Jan BLEEKER, Pieter Willem Herman DE JAGER, Maikel Robert GOOSEN, Erwin Paul SMAKMAN, Albertus Victor Gerardus MANGNUS, Yan REN, Adam LASSISE
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Publication number: 20230048580Abstract: An apparatus comprising a set of pixels configured to shape a beamlet approaching the set of pixels and a set of pixel control members respectively associated with each of the set of pixels, each pixel control member being arranged and configured to apply a signal to the associated pixel for shaping the beamlet.Type: ApplicationFiled: January 4, 2021Publication date: February 16, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Albertus Victor Gerardus MANGNUS, Maikel Robert GOOSEN, Erwin Paul SMAKMAN, Yan REN
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Publication number: 20220392741Abstract: Systems and methods of profiling a charged-particle beam are disclosed. The method of profiling a charged-particle beam may comprise activating a charged-particle source to generate the charged-particle beam along a primary optical axis, modifying the charged-particle beam by adjusting an interaction between the charged-particle beam and a standing optical wave, detecting charged particles from the modified charged-particle beam after the interaction with the standing optical wave, and determining a profile of the charged-particle beam based on the detected charged particles. Alternatively, the method may include activating an optical source, modifying the optical beam by adjusting an interaction between the optical beam and a charged-particle beam, detecting an optical signal from the modified optical beam, and determining a characteristic of the charged-particle beam based on the detected optical signal.Type: ApplicationFiled: October 15, 2020Publication date: December 8, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Maikel Robert GOOSEN, Erwin Paul SMAKMAN
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Publication number: 20220148842Abstract: Disclosed among other aspects is a charged particle inspection system including an absorbing component and a programmable charged-particle mirror plate arranged to modify the energy distribution of electrons in a beam and shape the beam to reduce the energy spread of the electrons and aberrations of the beam, with the absorbing component including a set of absorbing structures configured as absorbing structures provided on a transparent conductive layer and a method using such an absorbing component and with the programmable charged-particle mirror plate including a set of pixels configured to generate a customized electric field to shape the beam and using such a programmable charged-particle mirror plate.Type: ApplicationFiled: February 4, 2020Publication date: May 12, 2022Applicant: ASML Netherlands B.V.Inventors: Shakeeb Bin HASAN, Yan REN, Maikel Robert GOOSEN, Albertus Victor Gerardus MANGNUS, Erwin Paul SMAKMAN
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Patent number: 11243179Abstract: An inspection method for a substrate, the inspection method including: providing an electron beam having a first polarization state to a sample of the semiconductor substrate; detecting a first response signal of the sample caused by interaction of the electron beam having the first polarization state with the sample; providing an electron beam having a second polarization state to the sample of the semiconductor substrate; detecting a second response signal of the sample caused by interaction of the electron beam having the second polarization state with the sample; and determining a geometric or material property of the sample, based on the first response signal and the second response signal.Type: GrantFiled: October 1, 2018Date of Patent: February 8, 2022Assignee: ASML Netherlands B.V.Inventors: Erwin Paul Smakman, Albertus Victor Gerardus Mangnus, Thomas Jarik Huisman
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Publication number: 20210375581Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns, the actuator system including a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.Type: ApplicationFiled: August 16, 2021Publication date: December 2, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Bernardo KASTRUP, Johannes Catharinus Hubertus MULKENS, Marinus Aart VAN DEN BRINK, Jozef Petrus Henricus BENSCHOP, Erwin Paul SMAKMAN, Tamara DRUZHININA, Coen Adrianus VERSCHUREN
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Patent number: 11094502Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns. The actuator system may include a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.Type: GrantFiled: December 9, 2016Date of Patent: August 17, 2021Assignee: ASML Netherlands B.V.Inventors: Bernardo Kastrup, Johannes Catharinus Hubertus Mulkens, Marinus Aart Van Den Brink, Jozef Petrus Henricus Benschop, Erwin Paul Smakman, Tamara Druzhinina, Coen Adrianus Verschuren
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Publication number: 20210249224Abstract: An electron beam apparatus including: an electron beam source configured to generate an electron beam; a beam conversion unit including an aperture array configured to generate a plurality of beamlets from the electron beam, and a deflector unit configured to deflect one or more groups of the plurality of beamlets; and a projection system configured to project the plurality of beamlets onto an object, wherein the deflector unit is configured to deflect the one or more groups of the plurality of beamlets to impinge on the object at different angles of incidence, each beamlet in a group having substantially the same angle of incidence on the object.Type: ApplicationFiled: May 24, 2019Publication date: August 12, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Erwin Paul SMAKMAN, Albertus Victor Gerardus MANGNUS, Maikel Robert GOOSEN
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Publication number: 20210055660Abstract: An inspection system that include a selective deposition tool configured to receive a sample and selectively deposit a material onto the sample, an inspection tool configured to perform an inspection process on the sample provided with the deposited material, and an enclosure configured to enclose the selective deposition tool and the inspection tool.Type: ApplicationFiled: February 25, 2019Publication date: February 25, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Alexey Olegovich POLYAKOV, Erwin Paul SMAKMAN, Andrey NIKIPELOV, Albertus Victor Gerardus MANGNUS
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Patent number: 10928736Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.Type: GrantFiled: December 13, 2016Date of Patent: February 23, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Pieter Willem Herman De Jager, Coen Adrianus Verschuren, Erwin Paul Smakman, Erwin John Van Zwet, Wouter Frans Willem Mulckhuyse, Pieter Verhoeff, Robert Albertus Johannes Van Der Werf
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Publication number: 20200312619Abstract: Systems and methods of measuring beam current in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam, and an aperture array. The aperture array may comprise a plurality of apertures configured to form a plurality of beamlets from the primary charged-particle beam, and a detector including circuitry to detect a current of at least a portion of the primary charged-particle beam irradiating the aperture array. The method of measuring beam current may include irradiating the primary charged-particle beam on the aperture array and detecting an electric current of at least a portion of the primary charged-particle beam.Type: ApplicationFiled: March 25, 2020Publication date: October 1, 2020Inventors: Albertus Victor Gerardus MANGNUS, Maikel Robert GOOSEN, Erwin Paul SMAKMAN
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Publication number: 20200249181Abstract: An inspection method for a substrate, the inspection method including: providing an electron beam having a first polarization state to a sample of the semiconductor substrate; detecting a first response signal of the sample caused by interaction of the electron beam having the first polarization state with the sample; providing an electron beam having a second polarization state to the sample of the semiconductor substrate; detecting a second response signal of the sample caused by interaction of the electron beam having the second polarization state with the sample; and determining a geometric or material property of the sample, based on the first response signal and the second response signal.Type: ApplicationFiled: October 1, 2018Publication date: August 6, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Erwin Paul SMAKMAN, Albertus Victor Gerardus MANGNUS, Thomas Jarik HUISMAN
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Patent number: 10712669Abstract: A method and apparatus to provide a plurality of radiation beams modulated according to at least two sub patterns of a pattern using radiation sources, the radiation sources producing radiation beams of at least two spot sizes such that each of the radiation beams having a same spot size of the at least two spot sizes is used to produce one of the at least two sub patterns, project the plurality of beams onto a substrate, and provide relative motion between the substrate and the plurality of radiation sources, in a scanning direction to expose the substrate. A method and apparatus to provide radiation modulated according to a desired pattern using a plurality of rows of two-dimensional arrays of radiation sources, project the modulated radiation onto a substrate using a projection system, and remove fluid from between the projection system and the substrate using one or more fluid removal units.Type: GrantFiled: December 14, 2016Date of Patent: July 14, 2020Assignee: ASML NETHERLANDS B.V.Inventors: Erwin Paul Smakman, Coen Adrianus Verschuren