Patents by Inventor Eui Hyun Ryu

Eui Hyun Ryu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230418161
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker component that comprises a structure of the following Formula (I):
    Type: Application
    Filed: September 11, 2023
    Publication date: December 28, 2023
    Inventors: Eui-Hyun Ryu, Jin Hong Park, You Rim Shin, Ji-Hon Kang, Jung-June Lee, Jae-Bong Lim
  • Patent number: 11822248
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker component that comprises a structure of the following Formula (I):
    Type: Grant
    Filed: October 28, 2016
    Date of Patent: November 21, 2023
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Eui-Hyun Ryu, Jin Hong Park, You Rim Shin, Ji-Hon Kang, Jung-June Lee, Jae-Bong Lim
  • Patent number: 11487203
    Abstract: Monomers and polymers are provided that comprise a carbon alicyclic group or heteroalicyclic group that comprises 1) one or more acid-labile ring substituents and 2) one or more ether or thioether ring substituents. Photoresists that comprise such polymers also are provided.
    Type: Grant
    Filed: December 29, 2017
    Date of Patent: November 1, 2022
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Eui Hyun Ryu, Myung-Yeol Kim, Woo-Hyung Lee, Haemi Jeong, Kwang-Hwyi Im
  • Patent number: 11480878
    Abstract: In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I): Photoresists that comprises such polymers also are provided.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: October 25, 2022
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Eui Hyun Ryu, Min Kyung Jang, Jung Woo Kim, Kwang-Mo Choi, Hyun Jeon, Woo-Hyung Lee, Myung-Yeol Kim
  • Patent number: 11262656
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that a blend of two or more resins, where one resin has epoxy groups either pendant or fused to the polymer backbone. Preferred coating compositions include: 1) a first resin that comprises one or more epoxy reactive groups; and 2) a crosslinker resin that is distinct from the first resin and comprises epoxy groups.
    Type: Grant
    Filed: March 31, 2016
    Date of Patent: March 1, 2022
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Jae Hwan Sim, Hye-Won Lee, Eunhye Cho, Jung Kyu Jo, Jin Hong Park, Eui Hyun Ryu, Jae-Bong Lim
  • Patent number: 11016388
    Abstract: Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer comprising first units comprising a reactive nitrogen-containing moiety spaced from the polymer backbone, wherein the nitrogen-containing moiety produces a basic cleavage product during lithographic processing of the photoresist composition.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: May 25, 2021
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Chang-Young Hong, Eui Hyun Ryu, Min-Kyung Jang, Dong-Yong Kim
  • Patent number: 10788751
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a crosslinker component that comprises a structure of the following Formula (I):
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: September 29, 2020
    Assignees: Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Matthew Grandbois, Myung Yeol Kim, Eui Hyun Ryu, Jae Hwan Sim, Min Kyung Jang, Jung-June Lee
  • Patent number: 10564542
    Abstract: New photoresists are provided that are useful in a variety of applications, including negative-tone development processes. Preferred resists comprise a first polymer comprising first units comprising a reactive nitrogen-containing moiety spaced from the polymer backbone, wherein the nitrogen-containing moiety produces a basic cleavage product during lithographic processing of the photoresist composition.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: February 18, 2020
    Inventors: Min-Kyung Jang, Eui-Hyun Ryu, Chang-Young Hong, Dong-Yong Kim
  • Patent number: 10527942
    Abstract: In a preferred aspect, organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more glycidyl groups; and 2) one or more aromatic groups that each comprises two or more substituents that comprise hydroxy, thiol and/or amine moieties. Catechol-containing polymers and methods for producing same also are provided.
    Type: Grant
    Filed: November 29, 2016
    Date of Patent: January 7, 2020
    Assignee: Rohm and Haas Electronics Materials Korea Ltd.
    Inventors: Jae Hwan Sim, Jung Kyu Jo, EunHye Cho, Hye-Won Lee, Jin Hong Park, Eui-Hyun Ryu, Jae-Bong Lim
  • Patent number: 10514604
    Abstract: Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.
    Type: Grant
    Filed: April 29, 2016
    Date of Patent: December 24, 2019
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Chang-Young Hong, Eui-Hyun Ryu, Min-Kyung Jang, Dong-Yong Kim, Jae Yun Ahn
  • Patent number: 10503073
    Abstract: New photoresists are provided that are useful in a variety of applications, including negative-tone development processes. Preferred resists comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.
    Type: Grant
    Filed: April 29, 2016
    Date of Patent: December 10, 2019
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Eui-Hyun Ryu, Min-Kyung Jang, Chang-Young Hong, Dong-Yong Kim, Dong-Je Hong, Hae-Jin Lim, Myung Yeol Kim, Hyun Jeon
  • Patent number: 10274824
    Abstract: New photobase generators suitable for use in photoresists are provided that correspond to Formula (I): X1—R1—O—C(?O)N(R2)R3??(I) wherein X1 is an optionally substituted aromatic group; R1 is a linker; and R2 and R3 are the same or different optionally substituted linear, branched or cyclic aliphatic group or an optionally substituted aromatic group, wherein at least one of R2 and R3 is an optionally substituted branched alkyl group having 4 or more carbon atoms.
    Type: Grant
    Filed: May 12, 2016
    Date of Patent: April 30, 2019
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Min-Kyung Jang, Eui Hyun Ryu, Chang-Young Hong, Myung Yeol Kim, Jung-June Lee, Dong Je Hong, Dong-Yong Kim, Hae-Jin Lim, Jae Yun Ahn, Ohk-Min Jeon
  • Patent number: 10203602
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more resins and 2) one or more substituted isocyanurate compounds that are distinct from the 1) one or more resins.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: February 12, 2019
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Eui-Hyun Ryu, Myung-Yeol Kim, EunHye Cho, Jung-June Lee, Jae Hwan Sim
  • Publication number: 20180203352
    Abstract: Monomers and polymers are provided that comprise a carbon alicyclic group or heteroalicyclic group that comprises 1) one or more acid-labile ring substituents and 2) one or more ether or thioether ring substituents. Photoresists that comprise such polymers also are provided.
    Type: Application
    Filed: December 29, 2017
    Publication date: July 19, 2018
    Inventors: Eui Hyun Ryu, Myung-Yeol Kim, Woo-Hyung Lee, Haemi Jeong, Kwang-Hwyi Im
  • Publication number: 20180188219
    Abstract: Disclosed herein is a gas sensor comprising a piezoelectric substrate; and a first polymeric layer disposed on the substrate; where the first polymeric layer has a first surface contacting a substrate and a second surface having a higher surface area than the first surface, where the first polymeric layer comprises a repeat unit that is effective to adsorb molecules present in the atmosphere.
    Type: Application
    Filed: December 19, 2017
    Publication date: July 5, 2018
    Inventors: Eui Hyun Ryu, Peter Trefonas, III, Bok-Hee Lee, Phillip D. Hustad
  • Publication number: 20180095367
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more resins and 2) one or more substituted isocyanurate compounds that are distinct from the 1) one or more resins.
    Type: Application
    Filed: September 30, 2016
    Publication date: April 5, 2018
    Inventors: Eui-Hyun Ryu, Myung-Yeol Kim, EunHye Cho, Jung-June Lee, Jae Hwan Sim
  • Publication number: 20180088073
    Abstract: Disclosed herein is a gas sensor comprising a substrate; a first polymeric layer having a first surface and a second surface disposed on the substrate; where the first surface contacts the substrate and where the second surface is opposed to the first surface and has a higher surface area than the first surface; where the first polymeric layer comprises repeat units that have a deprotected hydrogen donor; and a second polymeric layer disposed on the first polymeric layer; where the second polymeric layer is derived from a repeat unit that comprises a hydrogen acceptor.
    Type: Application
    Filed: September 26, 2017
    Publication date: March 29, 2018
    Inventors: Eui Hyun Ryu, Peter Trefonas, III, Bok-Hee Lee
  • Publication number: 20180059545
    Abstract: In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I): Photoresists that comprises such polymers also are provided.
    Type: Application
    Filed: August 31, 2016
    Publication date: March 1, 2018
    Inventors: Eui Hyun Ryu, Min Kyung Jang, Jung Woo Kim, Kwang-Mo Choi, Hyun Jeon, Woo-Hyung Lee, Myung-Yeol Kim
  • Publication number: 20170283651
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that a blend of two or more resins, where one resin has epoxy groups either pendant or fused to the polymer backbone. Preferred coating compositions include: 1) a first resin that comprises one or more epoxy reactive groups; and 2) a crosslinker resin that is distinct from the first resin and comprises epoxy groups.
    Type: Application
    Filed: March 31, 2016
    Publication date: October 5, 2017
    Inventors: Jae Hwan Sim, Hye-Won Lee, Eunhye Cho, Jung Kyu Jo, Jin Hong Park, Eui Hyun Ryu, Jae-Bong Lim
  • Publication number: 20170153547
    Abstract: In a preferred aspect, organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more glycidyl groups; and 2) one or more aromatic groups that each comprises two or more substituents that comprise hydroxy, thiol and/or amine moieties. Catechol-containing polymers and methods for producing same also are provided.
    Type: Application
    Filed: November 29, 2016
    Publication date: June 1, 2017
    Inventors: Jae Hwan Sim, Jung Kyu Jo, EunHye Cho, Hye-Won Lee, Jin Hong Park, Eui-Hyun Ryu, Jae-Bong Lim