Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker component that comprises a structure of the following Formula (I):

Abstract: Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer comprising first units comprising a reactive nitrogen-containing moiety spaced from the polymer backbone, wherein the nitrogen-containing moiety produces a basic cleavage product during lithographic processing of the photoresist composition.

Abstract: New photoresists are provided that are useful in a variety of applications, including negative-tone development processes. Preferred resists comprise a first polymer comprising first units comprising a reactive nitrogen-containing moiety spaced from the polymer backbone, wherein the nitrogen-containing moiety produces a basic cleavage product during lithographic processing of the photoresist composition.

Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a crosslinker component that comprises a structure of the following Formula (I):

Abstract: New photobase generators suitable for use in photoresists are provided that correspond to Formula (I): X1—R1—O—C(?O)N(R2)R3??(I) wherein X1 is an optionally substituted aromatic group; R1 is a linker; and R2 and R3 are the same or different optionally substituted linear, branched or cyclic aliphatic group or an optionally substituted aromatic group, wherein at least one of R2 and R3 is an optionally substituted branched alkyl group having 4 or more carbon atoms.

Abstract: Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.

Abstract: New photoresists are provided that are useful in a variety of applications, including negative-tone development processes. Preferred resists comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.

Abstract: A method of preparing a metal precursor and a method of preparing a metal ink using the same are provided. The method of preparing a metal precursor and the method of preparing a metal ink using the same can be useful in facilitating separation and purification of a precursor from impurities formed during precursor synthesis by allowing a metal precursor to form a suboligomeric aggregate as the metal precursor is synthesized using a fatty acid having a substituent at an ? position, and also enhancing solubility, enabling low-temperature sintering and improving coating film physical properties and electrical properties of the final metal ink.

Abstract: A method of preparing metal nanoparticles for metal inks, and a method of preparing a metal nanoparticle ink using the same are provided. The method includes dissolving a metal precursor having a substituent at an ? position, and applying an energy source or a mechanical force to the metal precursor solution. Also, the method includes preparing metal nanoparticles capable of adjusting an average particle size of the metal nanoparticles according to synthesis conditions, and preparing a metal nanoparticle ink by dissolving the prepared metal nanoparticles. Accordingly, the prepared metal nanoparticle ink can have improved dispersion stability and electric physical properties.

Abstract: A method of preparing metal nanoparticles using a phase transfer reduction method in which a reduction reaction is adjusted by distribution equilibrium between an intermediate formed by a coordinate bond between a capping material and various metal precursors in the form of an organic phase and a reducing agent present in an aqueous phase, and a metal ink prepared from the metal nanoparticles. The method of preparing metal nanoparticles includes dissolving a metal precursor and a capping agent in an organic phase, dissolving a reducing agent in an aqueous phase, mixing the organic phase and the aqueous phase to form a precipitate, separating the precipitate, and drying the separated precipitate. The metal nanoparticles prepared using the method can be prepared to have various particle sizes according to the kind of precursors and a length of an alkyl chain of an amine used as the capping agent.

Abstract: A method of preparing a toner. A toner having a low residual VOC content, a narrow particle size distribution, excellent fixing properties at low temperature, and high image quality may be prepared using the method by which a polyester resin dispersion is prepared by adding ingredients to a single reactor in a predetermined order.