Abstract: The present invention relates to oral compositions comprising cabozantinib salts and at least one pharmaceutically acceptable excipient and methods of using the oral compositions to increase the oral bioavailability of the cabozantinib and reduce the adverse events associate with the oral administration of cabozantinib. The invention also relates to methods for preparing cabozantinib lauryl sulfate salts.

Abstract: The present invention relates to oral compositions comprising cabozantinib salts and at least one pharmaceutically acceptable excipient and methods of using the oral compositions to increase the oral bioavailability of the cabozantinib and reduce the adverse events associate with the oral administration of cabozantinib. The invention also relates to methods for preparing cabozantinib lauryl sulfate salts.

Abstract: Electronic packages and methods of fabrication are described. In an embodiment, an electronic package includes a die stack of a plurality of vertically stacked dies, a first interposer laterally adjacent to the die stack, a first plurality of bond wires electrically connecting a first group of the plurality of vertically stacked dies to the interposer, and a molding compound layer encapsulating the die stack, the interposer, and the plurality of first plurality of bond wires.

Abstract: A communication method, device, and medium are provided, the method including determining, by a terminal device, whether the terminal device supports at least one of a time sensitive networking (TSN) service, a packet data unit (PDU) session corresponding to a TSN service needs to be established, a currently established PDU session needs to carry a TSN stream, or an established PDU session needs to carry a TSN stream, and sending, by the terminal device, port information of the terminal device to a session management network element, where the port information of the terminal device includes a port identifier of the terminal device, and further includes information about a transmission delay between a port of the terminal device and an external neighbor node.

Abstract: An EUV lithography mask including a substrate, a patterned absorber layer including an alloy of rhodium. In some embodiments, the alloy of rhodium includes a group 5, group 6, group 9, group 10, or group 11 transition metal having a specific EUV refractive index and a specific EUV extinction coefficient. The disclosed EUV lithography masks reduce undesirable mask 3D effects.

Abstract: An apparatus includes a first portion and a second portion. The first portion includes a first front side wall, a first rear side wall, a top wall, and at least one pivotal pin structure extending from the first rear side wall. The at least one pivotal pin structure comprises a base, a shaft, and a head having a non-circular cross-sectional shape. The second portion includes a second front side wall, a second rear side wall, a bottom wall, and at least one pin holder extending from the second rear side wall. The at least one pin holder defines an opening for accepting the head of the at least one pivotal pin structure at an alignment. The head of the at least one pivotal pin structure extends through the opening. The first portion and the second portion are pivotally movable between an open configuration and a closed container configuration.

Abstract: An apparatus includes a wafer stage and a particle removing assembly. The wafer stage includes a cup adjacent to a wafer chuck. The particle removing assembly is configured to remove contaminant particles from the cup. In some embodiments, the particle removing assembly comprises a flexible ejecting member that includes one or more elongated tubes, a front tip, and a cleaning tip adapter configured to attach the front tip to each of the one or more elongated tubes. The front tip includes front openings and lateral openings from which pressurized cleaning material are introduced onto an unreachable area of the cup to remove the contaminant particles from the cup.

Abstract: An apparatus having a first portion including a first front wall, a first rear wall, and a bottom wall integrally coupled to the first front wall and the first rear wall, and pivotal pin structures integrally coupled to and extending from the first rear wall. The apparatus includes a second portion having a second front wall, a second rear wall, and a top wall integrally coupled to the second front wall and the second rear wall, and pin holders integrally coupled to and extending from the second rear wall and at an offset angle with reference to the top wall. The pivotal pin structure includes a base support connected to the first rear wall and a shaft connected to the base support, and the pin holder defines an opening sized and shaped to accept the shaft. The first and second portions are sized and shaped to be pivotally movable between open and closed configurations.

Abstract: Systems and methods for enabling real-time graph machine learning models using bitwise transaction graph frameworks are disclosed. According to one embodiment, a method may include: (1) receiving, by a bitwise transaction graph computer program, a plurality of historical transactions, wherein each historical transaction comprises a customer identifier for a customer, a card number or card reference number, a merchant identifier for a merchant, a transaction authorization time, a transaction risk score, and a set of real-time fraud risk attributes; (2) converting, by the bitwise transaction graph computer program, the historical transactions to a fixed length data structure; and (3) loading, by the bitwise transaction graph computer program, the fixed length data structure onto edges of a transaction graph, wherein each vertex of the transaction graph represents one of the customers or one of the merchants.

Abstract: An extreme ultraviolet (EUV) mask and method of forming an EUV mask are provided. The method includes forming a mask layer on a semiconductor wafer, generating extreme ultraviolet (EUV) light by a lithography exposure system, forming patterned EUV light by patterning the EUV light by a mask including an absorber having extinction coefficient at an EUV wavelength that exceeds extinction coefficients of TaBN and TaN at the EUV wavelength, and exposing the mask layer by the patterned EUV light.

Abstract: A tracking method, for tracking an object based on a computer vision, includes following steps. A series of images is captured by a tracking camera. A first position of a trackable device is tracked within the images. An object is recognized around the first position in the images. In response to the object being recognized, a second position of the object is tracked in the images.

Abstract: A service packet transmission method and apparatus, the method including receiving, by the source mobile edge computing network element, after a source mobile edge computing network element receives a second uplink service packet, a first uplink service packet sent by a source user plane network element and that is from a target user plane network element, where the second uplink service packet is the last uplink service packet sent by the source mobile edge computing network element to a source application server, sending, by the source mobile edge computing network element, the first uplink service packet to a target mobile edge computing network element, and sending, by the source mobile edge computing network element, first indication information to the target mobile edge computing network element, the first indication information indicating that the sending of the first uplink service packet by the source mobile edge computing network element ends.

Abstract: An extreme ultraviolet mask including a substrate, a reflective multilayer stack on the substrate and a capping layer on the reflective multilayer stack is provided. The reflective multilayer stack is treated prior to formation of the capping layer on the reflective multilayer stack. The capping layer is formed by an ion-assisted ion beam deposition or an ion-assisted sputtering process.

Abstract: This application provides a method for controlling disorder of downlink data and an apparatus thereof. The method includes: A control plane network element determines to switch from a first user plane device to a second user plane device, and sends indication information to the second user plane device. The second user plane device buffers, according to the received indication information, downlink data received from a session anchor, and sends the buffered downlink data after reception of an end marker from the first user plane device.

Abstract: An apparatus includes a wafer stage and a particle removing assembly. The wafer stage includes a cup adjacent to a wafer chuck. The particle removing assembly is configured to remove contaminant particles from the cup. In some embodiments, the particle removing assembly comprises a flexible ejecting member that includes one or more elongated tubes, a front tip, and a cleaning tip adapter configured to attach the front tip to each of the one or more elongated tubes. The front tip includes front openings and lateral openings from which pressurized cleaning material are introduced onto an unreachable area of the cup to remove the contaminant particles from the cup.

Abstract: Disclosed herein is a system for implementing medical data exchange and medical claim settlement via Fast Healthcare Interoperability Resources (FHIR) standard data. The system includes a data exchange module, a blockchain database, a service-provider server, and an authority management module, all of which are communicatively connected to each other. The system receives and converts raw medical data into FHIR standard data for transmission to insurance institutions, and encrypts the FHIR standard data, and facilitates medical claims settlement. Also disclosed herein is a method for implementing medical data exchange and claims settlement based on FHIR standards.

Abstract: Semiconductor processing apparatuses and methods are provided in which an electrostatic discharge (ESD) prevention layer is utilized to prevent or reduce ESD events from occurring between a semiconductor wafer and one or more components of the apparatuses. In some embodiments, a semiconductor processing apparatus includes a wafer handling structure that is configured to support a semiconductor wafer during processing of the semiconductor wafer. The apparatus further includes an ESD prevention layer on the wafer handling structure. The ESD prevention layer includes a first material and a second material, and the second material has an electrical conductivity that is greater than an electrical conductivity of the first material.

Abstract: This application provides example path switching methods, example communication apparatuses, and example communication systems. One example method includes obtaining, by a session management network element, a context of a first transport layer connection, where the first transport layer connection is between a source transport layer proxy network element and a terminal device. In response to determining that a protocol data unit (PDU) session anchor for the terminal device needs to be changed, the session management network element can send the context of the first transport layer connection to a target transport layer proxy network element, where the context is used to establish a third transport layer connection between the target transport layer proxy network element and the terminal device.

Abstract: The present invention relates to oral compositions comprising cabozantinib salts and at least one pharmaceutically acceptable excipient and methods of using the oral compositions to increase the oral bioavailability of the cabozantinib and reduce the adverse events associate with the oral administration of cabozantinib. The invention also relates to methods for preparing cabozantinib lauryl sulfate salts.

Abstract: A method includes: generating a designed mask overlay mark associated with an actual mask overlay mark to be formed in a mask; forming the actual mask overlay mark in the mask based on the designed mask overlay mark, the actual mask overlay mark including a plurality of overlay patterns; forming a device feature pattern adjacent to the actual mask overlay mark; forming an alignment of the mask by a mask metrology apparatus including a light source having a wavelength and a numerical aperture, wherein a pitch between adjacent two of the plurality of overlay patterns does not exceed the wavelength divided by twice the numerical aperture; and forming a pattern in a layer of a wafer by transferring the device feature pattern while the mask is under the alignment.