Patents by Inventor Fen Wan

Fen Wan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • NANO-IMPRINT LITHOGRAPHY TEMPLATES
    Publication number: 20100084376
    Abstract: Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a nano-imprint lithography template and substrate. The pores or channels may be formed by etch or other processes. Gaskets may be formed on an nano-imprint lithography template to restrict flow of polymerizable material during nano-imprint lithography processes.
    Type: Application
    Filed: October 2, 2009
    Publication date: April 8, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Niyaz Khusnatdinov, Weijun Liu, Frank Y. Xu, Fen Wan, Edward Brian Fletcher, Marlon Menezes
  • NANO-IMPRINT LITHOGRAPHY TEMPLATE FABRICATION AND TREATMENT
    Publication number: 20100072671
    Abstract: A nano-imprint lithography template includes a rigid support layer, a cap layer, and a flexible cushion layer positioned between the support layer and the cap layer. Treating an imprint lithography template includes heating the template to desorb gases from the template. Heating the template includes radiating the template at a selected wavelength with, for example, infrared radiation. The selected wavelength may correspond to a wavelength at which the template material is strongly absorbing.
    Type: Application
    Filed: September 25, 2009
    Publication date: March 25, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Gerard M. Schmid, Weijun Liu, Edward Brian Fletcher, Frank Y. Xu, Fen Wan