Patents by Inventor Feng Chen

Feng Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230046174
    Abstract: A power device includes: a semiconductor layer, a well region, a body region, a gate, a source, a drain, a first salicide block (SAB) layer and a second SAB layer. The first SAB layer is formed on a top surface of the semiconductor layer, and is located between the gate and the drain, wherein a part of the well is located vertically below and in contact with the first SAB layer. The second SAB layer is formed vertically above and in contact with the first SAB layer.
    Type: Application
    Filed: May 5, 2022
    Publication date: February 16, 2023
    Inventors: Kuo-Hsuan Lo, Chien-Hao Huang, Chu-Feng Chen, Wu-Te Weng
  • Publication number: 20230037294
    Abstract: Disclosed herein are nanoparticle immunoconjugates useful for therapeutics and/or diagnostics. The immunoconjugates have diameter (e.g., average diameter) no greater than 20 nanometers (e.g., as measured by dynamic light scattering (DLS) in aqueous solution, e.g., saline solution). In certain embodiments, the conjugates are silica-based nanoparticles with single chain antibody fragments attached thereto.
    Type: Application
    Filed: October 7, 2022
    Publication date: February 9, 2023
    Inventors: Michelle S. Bradbury, Thomas P. Quinn, Feng Chen, Barney Yoo, Jason Lewis, Ulrich Wiesner, Kai Ma
  • Publication number: 20230044130
    Abstract: A floating connector and an assembly thereof are provided.
    Type: Application
    Filed: August 4, 2022
    Publication date: February 9, 2023
    Applicant: Molex, LLC
    Inventors: Yu SHEN, Feng CHEN
  • Patent number: 11576250
    Abstract: Some implementations described herein provide techniques and apparatuses for an extreme ultraviolet (EUV) radiation source that includes a backsplash-prevention system to reduce, minimize, and/or prevent the formation of tin (Sn) build-up in a tunnel structure of a collector flow ring that might otherwise be caused by the accumulation of Sn satellites. This reduces backsplash of Sn onto a collector of the EUV radiation source, increases the operational life of the collector (e.g., by increasing the time duration between cleaning and/or replacement of the collector), reduces downtime of the EUV radiation source, and/or enables the performance of the EUV radiation source to be sustained for longer time durations (e.g., by reducing, minimizing, and/or preventing the rate of Sn contamination of the collector), among other examples.
    Type: Grant
    Filed: August 19, 2021
    Date of Patent: February 7, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Cheng-Hao Lai, Ming-Hsun Tsai, Hsin-Feng Chen, Wei-Shin Cheng, Yu-Kuang Sun, Cheng-Hsuan Wu, Shang-Chieh Chien, Li-Jui Chen, Heng-Hsin Liu
  • Patent number: 11572577
    Abstract: The invention discloses a fermentation method for production of fucoxanthin by Nitzschia laevis, including the following steps of: step A, preparation of inocula; step B, fermentation culture: inoculating of Nitzschia laevis according to a certain volume ratio to reaction kettle containing sterile fermentation medium for aeration fermentation, preparing fucoxanthin fermentation broth through culture mean of fed-batch nutrient components; step C, obtaining high fucoxanthin induction culture solution by aeration induction culture under irradiation of monochromatic light or mixed light; extracting fucoxanthin from high fucoxanthin induction culture solution.
    Type: Grant
    Filed: June 29, 2018
    Date of Patent: February 7, 2023
    Assignee: PEKING UNIVERSITY
    Inventors: Feng Chen, Bin Liu
  • Publication number: 20230030179
    Abstract: A brightness parameter correction method and device and a brightness compensation system.
    Type: Application
    Filed: October 14, 2022
    Publication date: February 2, 2023
    Applicant: Kunshan New Flat Panel Display Technology Center Co., Ltd.
    Inventors: Feng CHEN, Xiaoyu GAO
  • Patent number: 11570605
    Abstract: There is provided an electronic device having Bluetooth communication function. The electronic device confirms whether a current packet received in a receive slot is a retransmitted packet according to a SEQN bit in the packet header so as to determine whether to continuously turn on an RF receiver in the receive slot or early turn off the RF receiver to save power.
    Type: Grant
    Filed: May 21, 2021
    Date of Patent: January 31, 2023
    Assignee: Airoha Technology Corp.
    Inventors: Yu-Feng Chen, Chih-Wei Sung
  • Patent number: 11569854
    Abstract: A radio frequency (RF) receiver has an antenna, a low-noise amplifier, a sigma-delta frequency synthesizer/voltage-controlled oscillator (VCO), an in-phase and quadrature (I/Q) mixer, a channel filter, and a digital baseband circuit. The digital baseband circuit has a demodulator, a preamble detection and carrier frequency offset (CFO) estimation circuit, and a CFO to sigma-delta modulation (SDM) input mapper. A preamble field of a digital demodulated signal generated by the demodulator is detected by the preamble detection and CFO estimation circuit. The RF receiver simultaneously compensates its CFO and optimizes a bandwidth of the channel filter based on the detection of the preamble field of the digital demodulated signal by the preamble detection and CFO estimation circuit.
    Type: Grant
    Filed: February 8, 2022
    Date of Patent: January 31, 2023
    Assignee: Uniband Electronic Corp.
    Inventors: Yiping Fan, Li-Feng Chen
  • Patent number: 11568123
    Abstract: A method for determining an etch profile is described. The method includes determining a masking layer profile. Loading information can be determined. The loading information indicates dependence of an etch rate for the masking layer profile on a quantity and pattern of material being etched. Flux information can be determined. The flux information indicates dependence of the etch rate on an intensity and a spread angle of radiation incident on the masking layer profile. Re-deposition information can be determined. The re-deposition information indicates dependence of the etch rate on an amount of material removed from the masking layer profile that is re-deposited back on the masking layer profile. An output etch profile for the layer of the wafer is determined based on the loading information, the flux information, and/or the re-deposition information.
    Type: Grant
    Filed: January 25, 2021
    Date of Patent: January 31, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Chi-Hsiang Fan, Feng Chen, Wangshi Zhao, Youping Zhang
  • Publication number: 20230024022
    Abstract: A semiconductor structure includes a semiconductor substrate and an isolation structure disposed in the semiconductor substrate, wherein the isolation structure includes a first dielectric layer in contact with the semiconductor substrate and a second dielectric layer over the first dielectric layer, wherein the first dielectric layer is between the second dielectric layer and the semiconductor substrate, the first dielectric layer comprises a bottom portion and a sidewall portion, and a thickness of the bottom portion is greater than a thickness of the sidewall portion.
    Type: Application
    Filed: July 23, 2021
    Publication date: January 26, 2023
    Inventors: HUNG-YU YEN, KO-FENG CHEN, KENG-CHU LIN
  • Publication number: 20230027203
    Abstract: An integrated circuit (IC) package apparatus is disclosed. The IC package includes one or more processing units and a bridge, mounted below the one or more processing unit, including one or more arithmetic logic units (ALUs) to perform atomic operations.
    Type: Application
    Filed: May 27, 2022
    Publication date: January 26, 2023
    Applicant: Intel Corporation
    Inventors: Altug Koker, Farshad Akhbari, Feng Chen, Dukhwan Kim, Narayan Srinivasa, Nadathur Rajagopalan Satish, Liwei Ma, Jeremy Bottleson, Eriko Nurvitadhi, Joydeep Ray, Ping T. Tang, Michael S. Strickland, Xiaoming Chen, Tatiana Shpeisman, Abhishek R. Appu
  • Publication number: 20230025782
    Abstract: A display includes a screen, a stand and a hanging element. The stand is connected to the screen and has a first end and a second end. The hanging element is selectively disposed on the first end or the second end. When the hanging element is disposed on the first end, the hanging element could clamp a first plate; when the hanging element is disposed on the second end, the hanging piece could clamp a second plate, wherein the first plate is perpendicular to the second plate.
    Type: Application
    Filed: February 15, 2022
    Publication date: January 26, 2023
    Applicant: Qisda Corporation
    Inventors: Jen-Feng CHEN, Yien-Bo CHEN, Kuan-Hsu LIN, Hsin-Hung LIN, Nien-Tsung HSU
  • Publication number: 20230024100
    Abstract: Disclosed are an integrated dual circulation oxidization ditch apparatus for municipal wastewater and a treatment method. The apparatus comprises an anaerobic zone, an anoxic zone, an aerobic zone and a secondary sedimentation tank communicated in sequence. The anoxic zone comprises a first anoxic zone and a second anoxic zone. The aerobic zone comprises a first aerobic zone and a second aerobic zone, and a reflux pump is arranged between the anoxic zone and the aerobic zone. The anaerobic zone, the anoxic zone and the aerobic zone are internally provided with submersible mixers. Both the anoxic zone and the aerobic zone are internally provided with partition walls and guide walls, thereby forming circulation in each zone.
    Type: Application
    Filed: September 30, 2022
    Publication date: January 26, 2023
    Applicant: GUIZHOU UNIVERSITY
    Inventors: Shaoqi ZHOU, Yanwu ZHOU, Feng Chen, Juan ZHOU, Dan CHEN
  • Patent number: 11562461
    Abstract: An apparatus to facilitate compute optimization is disclosed. The apparatus includes one or more processing units to provide a first set of shader operations associated with a shader stage of a graphics pipeline, a scheduler to schedule shader threads for processing, and a field-programmable gate array (FPGA) dynamically configured to provide a second set of shader operations associated with the shader stage of the graphics pipeline.
    Type: Grant
    Filed: November 18, 2021
    Date of Patent: January 24, 2023
    Assignee: Intel Corporation
    Inventors: Prasoonkumar Surti, Narayan Srinivasa, Feng Chen, Joydeep Ray, Ben J. Ashbaugh, Nicolas C. Galoppo Von Borries, Eriko Nurvitadhi, Balaji Vembu, Tsung-Han Lin, Kamal Sinha, Rajkishore Barik, Sara S. Baghsorkhi, Justin E. Gottschlich, Altug Koker, Nadathur Rajagopalan Satish, Farshad Akhbari, Dukhwan Kim, Wenyin Fu, Travis T. Schluessler, Josh B. Mastronarde, Linda L. Hurd, John H. Feit, Jeffery S. Boles, Adam T. Lake, Karthik Vaidyanathan, Devan Burke, Subramaniam Maiyuran, Abhishek R. Appu
  • Patent number: 11559591
    Abstract: Described herein are nanoprobes comprising ultrasmall aminated and cRGDY-conjugated nanoparticles labeled with Zirconium-89 (89Zr) and methods of their use. The provided compositions are renally clearable and possess suitable blood circulation half-time, high tumor active targeting capability, dominant renal clearance, low liver accumulation, and a high tumor-to-background ratio. The described nanoprobes exhibit great potential as “target-or-clear” tracers to human subjects for systemic targeted imaging (or treatment) of cancer.
    Type: Grant
    Filed: May 17, 2018
    Date of Patent: January 24, 2023
    Assignees: Memorial Sloan Kettering Cancer Center, Cornell University
    Inventors: Michelle S. Bradbury, Feng Chen, Ulrich Wiesner, Kai Ma
  • Publication number: 20230015099
    Abstract: Described herein are absorbent composites containing a superabsorbent material and a fibril filler substantially distributed throughout the superabsorbent material. Also described herein are methods of producing absorbent composites containing a superabsorbent material and a fibril filler substantially distributed throughout the superabsorbent material. Compositions and methods described herein are useful in a variety of absorbent products.
    Type: Application
    Filed: April 30, 2020
    Publication date: January 19, 2023
    Inventors: Feng CHEN, Jian QIN
  • Publication number: 20230021059
    Abstract: This disclosure relates to methods of functionalizing a nanoparticle, e.g., for conjugation to a targeting ligand and/or payload moiety, such as for the production of a nanoparticle drug conjugate (NDC).
    Type: Application
    Filed: July 18, 2022
    Publication date: January 19, 2023
    Inventors: Kai MA, Melik Ziya TÜRKER, Fei WU, Feng CHEN, Thomas Courtney GARDINIER, II, Aranapakam M. VENKATESAN, Geno J. GERMANO, JR.
  • Publication number: 20230017304
    Abstract: A mechanism is described for facilitating smart distribution of resources for deep learning autonomous machines. A method of embodiments, as described herein, includes detecting one or more sets of data from one or more sources over one or more networks, and introducing a library to a neural network application to determine optimal point at which to apply frequency scaling without degrading performance of the neural network application at a computing device.
    Type: Application
    Filed: July 27, 2022
    Publication date: January 19, 2023
    Applicant: Intel Corporation
    Inventors: Rajkishore Barik, Brian T. Lewis, Murali Sundaresan, Jeffrey Jackson, Feng Chen, Xiaoming Chen, Mike Macpherson
  • Patent number: 11557359
    Abstract: A shift register and a gate driver circuit are provided. The shift register includes an input unit, an output unit, an electrostatic discharge unit and a reset unit. The input unit provides an input signal. The output unit is coupled to the input unit and a gate output terminal. The output unit outputs an output signal through the gate output terminal according to the input signal. The electrostatic discharge unit is coupled to the output unit. After the gate output terminal outputs the output signal, the electrostatic discharge unit pulls down a voltage of the gate output terminal according to a low gate voltage. The reset unit is coupled to the input unit and the output unit. After the electrostatic discharge unit pulls down the voltage of the gate output terminal, the reset unit resets a voltage of a bootstrap node.
    Type: Grant
    Filed: November 7, 2019
    Date of Patent: January 17, 2023
    Assignee: E Ink Holdings Inc.
    Inventors: Shyh-Feng Chen, Wen-Yu Kuo
  • Patent number: 11557054
    Abstract: A method for performing region-of-interest (ROI)-based depth detection with aid of a pattern-adjustable projector and associated apparatus are provided.
    Type: Grant
    Filed: June 24, 2021
    Date of Patent: January 17, 2023
    Assignee: HIMAX TECHNOLOGIES LIMITED
    Inventors: Hsueh-Tsung Lu, Ching-Wen Wang, Cheng-Che Tsai, Wu-Feng Chen